U.S. patent number D933,725 [Application Number D/679,746] was granted by the patent office on 2021-10-19 for deposition ring for a substrate processing chamber.
This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to Aravind Kamath, Manjunatha P. Koppa, David Or, Steven V. sansoni, Cheng-Hsiung Matt Tsai, Manjunath H. Venkataswamappa.
United States Patent |
D933,725 |
Koppa , et al. |
October 19, 2021 |
Deposition ring for a substrate processing chamber
Claims
CLAIM The ornamental design for a deposition ring for a substrate
processing chamber, as shown and described.
Inventors: |
Koppa; Manjunatha P.
(Bengaluru, IN), Kamath; Aravind (Santa Clara,
CA), Tsai; Cheng-Hsiung Matt (Cupertino, CA),
Venkataswamappa; Manjunath H. (Bangalore, IN),
sansoni; Steven V. (Livermore, CA), Or; David (Santa
Clara, CA) |
Applicant: |
Name |
City |
State |
Country |
Type |
APPLIED MATERIALS, INC. |
Santa Clara |
CA |
US |
|
|
Assignee: |
APPLIED MATERIALS, INC. (Santa
Clara, CA)
|
Appl.
No.: |
D/679,746 |
Filed: |
February 8, 2019 |
Current U.S.
Class: |
D15/138;
D13/182 |
Current International
Class: |
1509 |
Field of
Search: |
;D23/249,259,262,269
;D15/138,139,143,144,144.1,144.2,150,199
;D13/118,122,133,162,182,184,199 ;D22/113,119 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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D1481081 |
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Oct 2013 |
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D1509910 |
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D1549498 |
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D1570910 |
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D1575876 |
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D1584875 |
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D1584906 |
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D161030 |
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Jun 2014 |
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D166552 |
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Mar 2015 |
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TW |
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D167109 |
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D187432 |
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Other References
Search Report for Taiwan Design Application No. 1068304729, dated
Aug. 5, 2020. cited by applicant .
Search Report for Taiwan Design Application No. 108304735001, dated
Dec. 2, 2020. cited by applicant.
|
Primary Examiner: Lane; Sheryl
Assistant Examiner: Philipps; Mark T.
Attorney, Agent or Firm: Moser Taboada
Description
FIG. 1 is an enlarged top isometric view of a deposition ring for a
substrate processing chamber, according to the first embodiment of
the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a right side elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2,
enlarged for clarity.
FIG. 9 is an enlarged top isometric view of a deposition ring for a
substrate processing chamber, according to the second embodiment of
the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a left side elevation view thereof.
FIG. 15 is a right side elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16 in FIG.
10, enlarged for clarity.
The dashed lines in FIGS. 1-8 represent unclaimed environment
forming no part of the claimed design.
* * * * *