Vaporizer for substrate processing apparatus

Description

FIG. 1 is a front, perspective view of a vaporizer for substrate processing apparatus showing our new design;

FIG. 2 is a front, bottom perspective view thereof;

FIG. 3 is a front elevational view thereof, the back elevation view being the same therefore omitted;

FIG. 4 is a left side elevational view thereof, the right side elevation view being the same therefore omitted;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a cross-sectional view taken along line 7-7 in FIG. 5.

The back elevational view is the same as the front elevational view and has, therefore, been omitted; the right side elevational view is the same as the left side elevational view and has, therefore been omitted.

Claims

CLAIM The ornamental design for a vaporizer for substrate processing apparatus, as shown and described.

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Inventors:	Tateno; Hideto (Toyama, JP), Hara; Daisuke (Toyama, JP), Okuno; Masahisa (Toyama, JP), Joda; Takuya (Toyama, JP)
Applicant:	Name City State Country Type HITACHI KOKUSAI ELECTRIC INC. Tokyo N/A JP
Assignee:	HITACHI KOKUSAI ELECTRIC INC. (Tokyo, JP)
Appl. No.:	D/478,836
Filed:	January 9, 2014

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Foreign Application Priority Data

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Jul 10, 2013 [JP]			2013-015793

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/158,177,182,184 ;D15/144,144.1,144.2,199 ;414/935-941,217,147

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References Cited [Referenced By]

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Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Fitch, Even, Tabin and Flannery LLP