Electrode member for a plasma processing apparatus

Nagakubo February 11, 2

Patent Grant D699200

U.S. patent number D699,200 [Application Number D/417,071] was granted by the patent office on 2014-02-11 for electrode member for a plasma processing apparatus. This patent grant is currently assigned to Tokyo Electron Limited. The grantee listed for this patent is Keiichi Nagakubo. Invention is credited to Keiichi Nagakubo.


United States Patent D699,200
Nagakubo February 11, 2014

Electrode member for a plasma processing apparatus

Claims

CLAIM The ornamental design for a electrode member for a plasma processing apparatus, as shown and described.
Inventors: Nagakubo; Keiichi (Nirasaki, JP)
Applicant:
Name City State Country Type

Nagakubo; Keiichi

Nirasaki

N/A

JP
Assignee: Tokyo Electron Limited (Tokyo, JP)
Appl. No.: D/417,071
Filed: March 29, 2012

Foreign Application Priority Data

Sep 30, 2011 [JP] D2011-022449
Current U.S. Class: D13/182
Current International Class: 1303
Field of Search: ;D13/182 ;D15/144,144.1,199 ;118/715 ;414/935-941,147,217 ;156/345.53 ;279/128 ;361/230,233,234 ;204/193,194,279,280,281,282,283,284,285,286.1,297.01 ;205/118,123 ;200/293,302.1,308

References Cited [Referenced By]

U.S. Patent Documents
D363464 October 1995 Fukasawa
D404370 January 1999 Kimura
D404372 January 1999 Ishii
6815352 November 2004 Tamura et al.
6818097 November 2004 Yamaguchi et al.
D546784 July 2007 Hayashi
D548705 August 2007 Hayashi
D556704 December 2007 Nakamura et al.
D557226 December 2007 Uchino et al.
7479304 January 2009 Sun et al.
D606952 December 2009 Lee et al.
D609652 February 2010 Nagasaka et al.
D609655 February 2010 Sugimoto
D614593 April 2010 Lee et al.
D648289 November 2011 Mayer et al.
D654883 February 2012 Honma et al.
D654884 February 2012 Honma et al.
D655257 March 2012 Honma et al.
D655259 March 2012 Honma et al.
2003/0066484 April 2003 Morikage et al.
Foreign Patent Documents
471052 Jan 2002 TW
201001525 Jan 2010 TW

Other References

Taiwan Office Action, Application D101301750, mailed Oct. 24, 2012. cited by applicant.

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Leydig, Voit & Mayer, Ltd.

Description



FIG. 1 is a front view of an electrode member for a plasma processing apparatus showing my new design, the rear view being identical.

FIG. 2 is a right side view of the electrode member for a plasma processing apparatus of FIG. 1, the left side view being identical.

FIG. 3 is a top plan view of the electrode member for a plasma processing apparatus of FIG. 1.

FIG. 4 is a bottom plan view of the electrode member for a plasma processing apparatus of FIG. 1.

FIG. 5 is a cross sectional view of the electrode member for a plasma processing apparatus of FIG. 1 taken along line 1-1 of FIG. 3; and,

FIG. 6 is a perspective view of the electrode member for a plasma processing apparatus of FIG. 1.

* * * * *


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