U.S. patent number D699,200 [Application Number D/417,071] was granted by the patent office on 2014-02-11 for electrode member for a plasma processing apparatus.
This patent grant is currently assigned to Tokyo Electron Limited. The grantee listed for this patent is Keiichi Nagakubo. Invention is credited to Keiichi Nagakubo.
United States Patent |
D699,200 |
Nagakubo |
February 11, 2014 |
Electrode member for a plasma processing apparatus
Claims
CLAIM The ornamental design for a electrode member for a plasma
processing apparatus, as shown and described.
Inventors: |
Nagakubo; Keiichi (Nirasaki,
JP) |
Applicant: |
Name |
City |
State |
Country |
Type |
Nagakubo; Keiichi |
Nirasaki |
N/A |
JP |
|
|
Assignee: |
Tokyo Electron Limited (Tokyo,
JP)
|
Appl.
No.: |
D/417,071 |
Filed: |
March 29, 2012 |
Foreign Application Priority Data
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Sep 30, 2011 [JP] |
|
|
D2011-022449 |
|
Current U.S.
Class: |
D13/182 |
Current International
Class: |
1303 |
Field of
Search: |
;D13/182
;D15/144,144.1,199 ;118/715 ;414/935-941,147,217 ;156/345.53
;279/128 ;361/230,233,234
;204/193,194,279,280,281,282,283,284,285,286.1,297.01 ;205/118,123
;200/293,302.1,308 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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471052 |
|
Jan 2002 |
|
TW |
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201001525 |
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Jan 2010 |
|
TW |
|
Other References
Taiwan Office Action, Application D101301750, mailed Oct. 24, 2012.
cited by applicant.
|
Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Leydig, Voit & Mayer, Ltd.
Description
FIG. 1 is a front view of an electrode member for a plasma
processing apparatus showing my new design, the rear view being
identical.
FIG. 2 is a right side view of the electrode member for a plasma
processing apparatus of FIG. 1, the left side view being
identical.
FIG. 3 is a top plan view of the electrode member for a plasma
processing apparatus of FIG. 1.
FIG. 4 is a bottom plan view of the electrode member for a plasma
processing apparatus of FIG. 1.
FIG. 5 is a cross sectional view of the electrode member for a
plasma processing apparatus of FIG. 1 taken along line 1-1 of FIG.
3; and,
FIG. 6 is a perspective view of the electrode member for a plasma
processing apparatus of FIG. 1.
* * * * *