U.S. patent number D654,884 [Application Number D/389,562] was granted by the patent office on 2012-02-28 for top plate for reactor for manufacturing semiconductor.
This patent grant is currently assigned to Tokyo Electron Limited. Invention is credited to Katsuyuki Hishiya, Manabu Honma.
United States Patent |
D654,884 |
Honma , et al. |
February 28, 2012 |
Top plate for reactor for manufacturing semiconductor
Claims
CLAIM The ornamental design for top plate for reactor for
manufacturing semiconductor, as shown and described.
Inventors: |
Honma; Manabu (Oshu,
JP), Hishiya; Katsuyuki (Oshu, JP) |
Assignee: |
Tokyo Electron Limited
(Minato-Ku, JP)
|
Appl.
No.: |
D/389,562 |
Filed: |
April 13, 2011 |
Foreign Application Priority Data
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|
|
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Oct 21, 2010 [JP] |
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2010-025239 |
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Current U.S.
Class: |
D13/182 |
Current International
Class: |
1303 |
Field of
Search: |
;D13/182 ;D7/585
;174/250,253,255 ;257/690,692,697,695,748,786,773 ;361/777
;29/829 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Burr & Brown
Description
FIG. 1 is front perspective view of a top plate for reactor for
manufacturing semiconductor illustrating our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom view thereof;
FIG. 8 is a reference front view indicating the plane upon which a
sectional view is taken; and,
FIG. 9 is a sectional view taken along line 9-9-9 of FIG. 8.
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