Grounded electrode for a plasma processing apparatus

Description

FIG. 1 is a front and bottom perspective view of a grounded electrode for a plasma processing apparatus showing our/my new design;

FIG. 2 is a front elevational view thereof with explanatory cut lines 8-8;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof; and,

FIG. 8 is a cross sectional view taken along 8-8.

Claims

CLAIM I claim the ornamental design for a grounded electrode for a plasma processing apparatus, as shown.

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Inventors:	Tanimura; Hidenobu (Kudamatsu, JP)
Applicant:	Name City State Country Type Tanimura; Hidenobu Kudamatsu N/A JP
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/397,274
Filed:	July 14, 2011

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Foreign Application Priority Data

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Jan 27, 2011 [JP]			2011-001651

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/158,177,184,182 ;D7/397 ;204/286.1,297.01 ;205/118,123 ;200/1R,5R,52R,315,310,6A,302.1,308,314,11R,16B

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References Cited [Referenced By]

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U.S. Patent Documents

D401252	November 1998	Tudhope et al.
D403002	December 1998	Tudhope et al.
D404370	January 1999	Kimura
6444101	September 2002	Stevens et al.
6495007	December 2002	Wang
D490450	May 2004	Hayashi et al.
D491963	June 2004	Doba
6773560	August 2004	Pedersen et al.
7025862	April 2006	Herchen et al.
D525127	July 2006	Cogley et al.
D556704	December 2007	Nakamura et al.
D557226	December 2007	Uchino et al.
D658693	May 2012	Suzuki et al.

Primary Examiner: Sikder; Selina
Attorney, Agent or Firm: Antonelli, Terry, Stout & Kraus, LLP.