U.S. patent number D877,101 [Application Number D/639,953] was granted by the patent office on 2020-03-03 for target profile for a physical vapor deposition chamber target. This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to William R. Johanson, Prashant Prabhakar Prabhu, Kirankumar Neelasandra Savandaiah.
United States Patent | D877,101 |
Johanson , et al. | March 3, 2020 |
Inventors: | Johanson; William R. (Gilroy, CA), Savandaiah; Kirankumar Neelasandra (Bangalore, IN), Prabhu; Prashant Prabhakar (Karwar, IN) | ||||||||||
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Applicant: |
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Assignee: | APPLIED MATERIALS, INC. (Santa
Clara, CA) |
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Appl. No.: | D/639,953 | ||||||||||
Filed: | March 9, 2018 |
Current U.S. Class: | D13/182 |
Current International Class: | 1303 |
Field of Search: | ;D13/182 ;D15/144.1,144.2,199 |
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Search Report for Taiwan Design Application No. 106301373 dated Jun. 20, 2017. cited by applicant . Search Report for Taiwan Design Application No. 107305358 dated Feb. 21, 2019. cited by applicant . Search Report for Taiwan Design Application No. 1077303086 dated Jul. 6, 2018. cited by applicant . Sputtering Targets, posted at Angstrom Sciences, posting date May 5, 2016. Site visited Apr. 1, 2019. URL: <https://web.archive.org/web/20160505015447/https://www.angstromscienc- es.com/sputtering-targets> (Year: 2016). cited by applicant . Sputtering Targets for LSis, posted at JX Nippon Mining & Metals, posting date Mar. 22, 2016. Site visited Apr. 1, 2019. URL: <https://web .archive .org/web/20 160322055046/http :1/www.nmm.jx-group.co.jp/english/products/04_supa/target_adv.html> (Year: 2016). cited by applicant. |
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