Inner shield for a substrate processing chamber

Description

FIG. 1 is a top isometric view of the first embodiment for an inner shield for a substrate processing chamber, according to the new design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a front elevation view thereof.

FIG. 5 is a back elevation view thereof.

FIG. 6 is a right side elevation view thereof.

FIG. 7 is a left side elevation view thereof.

FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.

FIG. 9 is a top isometric view of the second embodiment for an inner shield for a substrate processing chamber, according to the new design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a front elevation view thereof.

FIG. 13 is a back elevation view thereof.

FIG. 14 is a right side elevation view thereof.

FIG. 15 is a left side elevation view thereof; and,

FIG. 16 is a cross-sectional view taken along line 16-16 in FIG. 10.

The broken lines in FIGS. 1-16 show portions of an inner shield for a substrate processing chamber which form no part of the claimed design.

Claims

CLAIM The ornamental design for an inner shield for a substrate processing chamber, as shown and described.

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Inventors:	Babu; Sarath (Singapore, SG), Jupudi; Ananthkrishna (Singapore, SG), Ow; Yueh Sheng (Singapore, SG), Wei; Junqi (Singapore, SG), Boh; Kelvin (Singapore, SG), Wada; Yuichi (Chiba, JP), Zhang; Kang (Singapore, SG)
Applicant:	Name City State Country Type APPLIED MATERIALS, INC. Santa Clara CA US
Assignee:	APPLIED MATERIALS, INC. (Santa Clara, CA)
Appl. No.:	D/703,655
Filed:	August 28, 2019

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Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/118,133,162,182,184,199 ;D15/144.1,144.2,150,199 ;D23/213 ;D24/232

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References Cited [Referenced By]

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U.S. Patent Documents

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Other References

International Search Report and Written Opinion for PCT/US2020/048302 dated Dec. 4, 2020. cited by applicant.

Primary Examiner: Stout; Michael C
Assistant Examiner: Butac; Fritzgerald L
Attorney, Agent or Firm: Moser Taboada

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