Cover ring for a plasma processing apparatus

Description

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/610,995, filed herewith and entitled "Electrode Cover for a Plasma Processing Apparatus";

Application Ser. No. 29/610,996, filed herewith and entitled "Electrode Cover for a Plasma Processing Apparatus";

Application Ser. No. 29/610,998, filed herewith and entitled "Ring for a Plasma Processing Apparatus"; and

Application Ser. No. 29/611,001, filed herewith and entitled "Discharge Chamber for a Plasma Processing Apparatus".

FIG. 1 is a front, top and right side perspective view of a cover ring for a plasma processing apparatus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 4;

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 8; and,

FIG. 11 is a front, top, and left side perspective view of FIG. 8.

The box labelled as 10 in FIG. 8 is shown in broken lines and forms no part of the claimed design.

Claims

CLAIM The ornamental design for a cover ring for a plasma processing apparatus, as shown and described.

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Inventors:	Ichino; Takamasa (Tokyo, JP), Sato; Kohei (Tokyo, JP), Nakamoto; Kazunori (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Technologies Corporation Minato-ku, Tokyo N/A JP
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/610,999
Filed:	July 18, 2017

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Foreign Application Priority Data

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Jan 31, 2017 [JP]			2017-001755

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/158-177,182,184 ;204/286.1,297.1 ;205/118,123 ;200/1R,5R,52R,315,310,6A,302.1,308,314,317,11R,16B

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References Cited [Referenced By]

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U.S. Patent Documents

D404369	January 1999	Kawachi
D491963	June 2004	Doba
D494551	August 2004	Doba
7186171	March 2007	Oh
D557226	December 2007	Uchino et al.
D557425	December 2007	Nakamura et al.
D559993	January 2008	Nagakubo
D559994	January 2008	Nagakubo et al.
D638550	May 2011	Bedingham
D638951	May 2011	Bedingham
D667561	September 2012	Bedingham
D717746	November 2014	Lau
D770992	November 2016	Tauchi et al.
D802545	November 2017	Tauchi
D802790	November 2017	Tauchi
2003/0066484	April 2003	Morikage
2005/0150452	July 2005	Sen
2005/0258280	November 2005	Goto
2008/0121620	May 2008	Guo

Foreign Patent Documents

	D1210213		Jun 2004		JP
	D1361441		Jun 2009		JP
	D1551512		Jun 2016		JP

Other References

Ichino et al., Design U.S. Appl. No. 29/610,995, filed Jul. 18, 2017. cited by applicant . Ichino et al., Design U.S. Appl. No. 29/610,996, filed Jul. 18, 2017. cited by applicant . Ichino et al., Design U.S. Appl. No. 29/610,998, filed Jul. 18, 2017. cited by applicant . Nunomura et al., Design U.S. Appl. No. 29/611,001, filed Jul. 18, 2017. cited by applicant.

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Crowell & Moring LLP

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