Cover ring for a plasma processing apparatus

Description

FIG. 1 is a front, top and right side perspective view of a cover ring for a plasma processing apparatus showing my new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a top plan view thereof;

FIG. 7 is a bottom plan view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,

FIG. 9 is an enlarged portion view taken along line 9-9 of FIG. 8.

Claims

CLAIM The ornamental design for a cover ring for a plasma processing apparatus, as shown and described.

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Inventors:	Tauchi; Susumu (Tokyo, JP), Uemura; Takashi (Tokyo, JP), Sato; Kohei (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Technologies Corporation Minato-ku, Tokyo N/A JP
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/544,069
Filed:	October 30, 2015

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Foreign Application Priority Data

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Jun 12, 2015 [JP]			2015-013036

Current U.S. Class:	D24/232; D13/182
Current International Class:	2401
Field of Search:	;D24/169,186,216,231,232 ;D13/122,138,144,182,199,158-177 ;D15/144,144.1,199,138,133

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References Cited [Referenced By]

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U.S. Patent Documents

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Foreign Patent Documents

	1052359		Oct 1999		JP
	1267921		Apr 2006		JP

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Crowell & Moring LLP