Electrode cover for a plasma processing apparatus

Ichino , et al. Feb

Patent Grant D840364

U.S. patent number D840,364 [Application Number D/610,996] was granted by the patent office on 2019-02-12 for electrode cover for a plasma processing apparatus. This patent grant is currently assigned to Hitachi High-Technologies Corporation. The grantee listed for this patent is Hitachi High-Technologies Corporation. Invention is credited to Takamasa Ichino, Kazunori Nakamoto, Kohei Sato.


United States Patent D840,364
Ichino ,   et al. February 12, 2019

Electrode cover for a plasma processing apparatus

Claims

CLAIM The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.
Inventors: Ichino; Takamasa (Tokyo, JP), Sato; Kohei (Tokyo, JP), Nakamoto; Kazunori (Tokyo, JP)
Applicant:
Name City State Country Type

Hitachi High-Technologies Corporation

Minato-ku, Tokyo

N/A

JP
Assignee: Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.: D/610,996
Filed: July 18, 2017

Foreign Application Priority Data

Jan 31, 2017 [JP] 2017-001753
Current U.S. Class: D13/182
Current International Class: 1303
Field of Search: ;D13/158-177,182,184 ;204/286.1,297.1 ;205/118,123 ;200/1R,5R,52R,315,310,6A,302.1,308,314,317,11R,16B

References Cited [Referenced By]

U.S. Patent Documents
D404372 January 1999 Ishii
D494551 August 2004 Doba
D557226 December 2007 Uchino et al.
D557425 December 2007 Nakamura et al.
D559993 January 2008 Nagakubo
D559994 January 2008 Nagakubo et al.
D699199 February 2014 Kuwabara
D699200 February 2014 Nagakubo
D709536 July 2014 Yoshimura
D709537 July 2014 Kuwabara
D709538 July 2014 Mizukami
D709539 July 2014 Kuwabara
D717746 November 2014 Lau
D729730 May 2015 Gillespie-Brown
D770992 November 2016 Tauchi et al.
D783922 April 2017 Kirkland
D789888 June 2017 Jang
D797691 September 2017 Joubert
D803917 November 2017 Harada
D804556 December 2017 Harada
D810705 February 2018 Krishnan
D813181 March 2018 Okajima
2004/0077167 April 2004 Willis
2009/0050272 February 2009 Rosenberg
2012/0263569 October 2012 Priddy
2015/0024330 January 2015 Tian
2016/0002788 January 2016 Nal
Foreign Patent Documents
D1210213 Jun 2004 JP
D1361441 Jun 2009 JP
D1551512 Jun 2014 JP

Other References

Ichino et al., Design U.S. Appl. No. 29/610,995, filed Jul. 18, 2017. cited by applicant .
Ichino et al., Design U.S. Appl. No. 29/610,998, filed Jul. 18, 2017. cited by applicant .
Ichino et al., Design U.S. Appl. No. 29/610,999, filed Jul. 18, 2017. cited by applicant .
Nunomura et al., Design U.S. Appl. No. 29/611,001, filed Jul. 18, 2017. cited by applicant.

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Crowell & Moring LLP

Description



This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/610,995, filed herewith and entitled "Electrode Cover for a Plasma Processing Apparatus";

Application Ser. No. 29/610,998, filed herewith and entitled "Ring for a Plasma Processing Apparatus";

Application Ser. No. 29/610,999, filed herewith and entitled "Cover Ring for a Plasma Processing Apparatus"; and

Application Ser. No. 29/611,001, filed herewith and entitled "Discharge Chamber for a Plasma Processing Apparatus".

FIG. 1 is a front, top and right side perspective view of an electrode cover for a plasma processing apparatus, showing our new design;

FIG. 2 is a front, bottom and right side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 3; and,

FIG. 10 is an enlarged view of the portion shown in BOX 10 in FIG. 9.

The box labeled FIG. 10 in FIG. 9 is shown in broken lines and forms no part of the claimed design.

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