Lid assembly for a substrate processing chamber

Ishikawa , et al. August 2, 2

Patent Grant D642605

U.S. patent number D642,605 [Application Number D/358,979] was granted by the patent office on 2011-08-02 for lid assembly for a substrate processing chamber. This patent grant is currently assigned to Applied Materials, Inc.. Invention is credited to Tetsuya Ishikawa, David H. Quach, Alexander Tam.


United States Patent D642,605
Ishikawa ,   et al. August 2, 2011

Lid assembly for a substrate processing chamber

Claims

CLAIM The ornamental design for a lid assembly for a substrate processing chamber, as shown and described.
Inventors: Ishikawa; Tetsuya (Saratoga, CA), Tam; Alexander (Union City, CA), Quach; David H. (San Jose, CA)
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Appl. No.: D/358,979
Filed: April 2, 2010

Current U.S. Class: D15/144.1
Current International Class: 1501
Field of Search: ;D10/46 ;D15/122,144.1 ;118/723DC,723E,723ER,723IR,723R,715,69 ;134/8 ;156/345.43,345.35,345.45 ;428/64.1

References Cited [Referenced By]

U.S. Patent Documents
D291118 July 1987 Miller et al.
6050446 April 2000 Lei et al.
6110556 August 2000 Bang et al.
6302964 October 2001 Umotoy et al.
6364949 April 2002 Or et al.
6517634 February 2003 Pang et al.
6719851 April 2004 Kurita et al.
7024105 April 2006 Fodor et al.
7396480 July 2008 Kao et al.
7520957 April 2009 Kao et al.
7767024 August 2010 Kao et al.
7905959 March 2011 Tzu et al.
2002/0017243 February 2002 Pyo
2002/0092471 July 2002 Kang et al.
2006/0021573 February 2006 Monsma et al.
2008/0072820 March 2008 Burrows et al.
2009/0095221 April 2009 Tam et al.
2009/0241833 October 2009 Moshtagh et al.
2009/0308318 December 2009 Chen et al.
2010/0107977 May 2010 Kasai et al.

Other References

Tam, et al., U.S. Appl. No. 12/831,522, filed Jul. 7, 2010, entitled "Showerhead Assembly With Metrology Port Purge." cited by other.

Primary Examiner: Davis; Antoine D
Attorney, Agent or Firm: Patterson & Sheridan, L.L.P.

Description



FIG. 1 is a top plan view of a lid assembly for a substrate processing chamber showing our new design.

FIG. 2 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 2 of FIG. 1.

FIG. 3 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 3 of FIG. 1.

FIG. 4 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 4 of FIG. 1.

FIG. 5 is a side elevation view of the lid assembly of FIG. 1, rotated 180.degree., as viewed from line FIG. 5 of FIG. 1.

FIG. 6 is an isometric top view of the lid assembly of FIG. 1.

FIG. 7 is another isometric top view of the lid assembly of FIG. 1.

FIG. 8 is an isometric bottom view of the lid assembly of FIG. 1; and,

FIG. 9 is a bottom plan view of the lid assembly of FIG. 1.

The broken line showing of structural features is included for the purpose of illustrating non-claimed subject matter and forms no part of the claimed design.

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