Deposition ring for a substrate processing chamber
Koppa , et al. October 19, 2
U.S. patent number D933,725 [Application Number D/679,746] was granted by the patent office on 2021-10-19 for deposition ring for a substrate processing chamber. This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to Aravind Kamath, Manjunatha P. Koppa, David Or, Steven V. sansoni, Cheng-Hsiung Matt Tsai, Manjunath H. Venkataswamappa.
| United States Patent | D933,725 |
| Koppa , et al. | October 19, 2021 |
Deposition ring for a substrate processing chamber
Claims
CLAIM The ornamental design for a deposition ring for a substrate processing chamber, as shown and described.
| Inventors: | Koppa; Manjunatha P. (Bengaluru, IN), Kamath; Aravind (Santa Clara, CA), Tsai; Cheng-Hsiung Matt (Cupertino, CA), Venkataswamappa; Manjunath H. (Bangalore, IN), sansoni; Steven V. (Livermore, CA), Or; David (Santa Clara, CA) | ||||||||||
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| Applicant: |
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| Assignee: | APPLIED MATERIALS, INC. (Santa
Clara, CA) |
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| Appl. No.: | D/679,746 | ||||||||||
| Filed: | February 8, 2019 |
| Current U.S. Class: | D15/138; D13/182 |
| Current International Class: | 1509 |
| Field of Search: | ;D23/249,259,262,269 ;D15/138,139,143,144,144.1,144.2,150,199 ;D13/118,122,133,162,182,184,199 ;D22/113,119 |
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Other References
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Search Report for Taiwan Design Application No. 1068304729, dated Aug. 5, 2020. cited by applicant . Search Report for Taiwan Design Application No. 108304735001, dated Dec. 2, 2020. cited by applicant. |
Primary Examiner: Lane; Sheryl
Assistant Examiner: Philipps; Mark T.
Attorney, Agent or Firm: Moser Taboada
Description
FIG. 1 is an enlarged top isometric view of a deposition ring for a substrate processing chamber, according to the first embodiment of the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a right side elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2, enlarged for clarity.
FIG. 9 is an enlarged top isometric view of a deposition ring for a substrate processing chamber, according to the second embodiment of the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a left side elevation view thereof.
FIG. 15 is a right side elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16 in FIG. 10, enlarged for clarity.
The dashed lines in FIGS. 1-8 represent unclaimed environment forming no part of the claimed design.
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