Target profile for a physical vapor deposition chamber target

Description

FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a bottom perspective view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a left side elevation view thereof;

FIG. 7 is a front elevation view thereof;

FIG. 8 is a back elevation view thereof; and,

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.

Claims

CLAIM The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

---

Inventors:	Johanson; William R. (Gilroy, CA), Savandaiah; Kirankumar Neelasandra (Bangalore, IN), Prabhu; Prashant Prabhakar (Karwar, IN)
Applicant:	Name City State Country Type APPLIED MATERIALS, INC. Santa Clara CA US
Assignee:	APPLIED MATERIALS, INC. (Santa Clara, CA)
Appl. No.:	D/639,953
Filed:	March 9, 2018

---

Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;D15/144.1,144.2,199

---

References Cited [Referenced By]

---

U.S. Patent Documents

5320728	June 1994	Tepman
D351450	October 1994	Maryska
6086725	July 2000	Abburi et al.
6114216	September 2000	Yieh et al.
6390905	May 2002	Korovin
6659850	December 2003	Korovin et al.
D487254	March 2004	Suenaga
6815352	November 2004	Tamura et al.
D503729	April 2005	Leeuw et al.
D553104	October 2007	Oohashi et al.
D557226	December 2007	Uchino
D559993	January 2008	Nagakubo et al.
D559994	January 2008	Nagakubo et al.
7402098	July 2008	Severson
D600660	September 2009	Sato
D614593	April 2010	Lee et al.
D616390	May 2010	Sato
D633452	March 2011	Namiki et al.
D649126	November 2011	Takahashi
D669509	October 2012	Krink et al.
D683806	June 2013	Dueck
D687790	August 2013	Krishnan et al.
D687791	August 2013	Krishnan et al.
D691974	October 2013	Osada
D716742	November 2014	Jang et al.
D724553	March 2015	Choi et al.
D732094	June 2015	Jussel et al.
D741823	October 2015	Tateno et al.
D750728	March 2016	Kremer
D767234	September 2016	Kirkland et al.
D769200	October 2016	Fukushima et al.
D770992	November 2016	Tauchi et al.
D790041	June 2017	Jang et al.
D793572	August 2017	Kozuka et al.
D795208	August 2017	Sasaki et al.
D796458	September 2017	Jang et al.
D797067	September 2017	Zhang et al.
D797691	September 2017	Joubert et al.
D798248	September 2017	Hanson et al.
D801942	November 2017	Riker et al.
D808349	January 2018	Fukushima et al.
D810705	February 2018	Krishnan et al.
D813181	March 2018	Okajima et al.
D825504	August 2018	Zhang
D825505	August 2018	Hanson
D830435	October 2018	Wakisaka et al.
D830981	October 2018	Jeong et al.
D836572	December 2018	Riker
D837755	January 2019	Riker
D839224	January 2019	Yamaki et al.
2004/0149567	August 2004	Kosyachkov
2005/0152089	July 2005	Matsuda et al.
2005/0193952	September 2005	Goodman et al.
2007/0076345	April 2007	Bang
2008/0308416	December 2008	Allen et al.
2009/0260982	October 2009	Riker et al.
2010/0096261	April 2010	Hoffman et al.
2010/0108500	May 2010	Hawrylchak et al.
2010/0170786	July 2010	Wang et al.
2012/0033340	February 2012	Roy et al.
2013/0316628	November 2013	Jang et al.
2014/0261180	September 2014	Yoshidome et al.
2015/0170888	June 2015	Riker et al.
2016/0002776	January 2016	Nal et al.
2016/0002788	January 2016	Nal et al.
2016/0035547	February 2016	Johanson et al.

Foreign Patent Documents

	206573738		Oct 2017		CN
	D1420846		Aug 2011		JP
	D1421157		Aug 2011		JP
	D1422692		Sep 2014		JP
	223429		May 1994		TW
	223430		May 1994		TW
	D146490		Apr 2012		TW

Other References

Search Report for Taiwan Design Application No. 106301373 dated Jun. 20, 2017. cited by applicant . Search Report for Taiwan Design Application No. 107305358 dated Feb. 21, 2019. cited by applicant . Search Report for Taiwan Design Application No. 1077303086 dated Jul. 6, 2018. cited by applicant . Sputtering Targets, posted at Angstrom Sciences, posting date May 5, 2016. Site visited Apr. 1, 2019. URL: <https://web.archive.org/web/20160505015447/https://www.angstromscienc- es.com/sputtering-targets> (Year: 2016). cited by applicant . Sputtering Targets for LSis, posted at JX Nippon Mining & Metals, posting date Mar. 22, 2016. Site visited Apr. 1, 2019. URL: <https://web .archive .org/web/20 160322055046/http :1/www.nmm.jx-group.co.jp/english/products/04_supa/target_adv.html> (Year: 2016). cited by applicant.

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Moser Taboada Taboada; Alan

Images