U.S. patent number D913,979 [Application Number D/703,655] was granted by the patent office on 2021-03-23 for inner shield for a substrate processing chamber.
This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to Sarath Babu, Kelvin Boh, Ananthkrishna Jupudi, Yueh Sheng Ow, Yuichi Wada, Junqi Wei, Kang Zhang.
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United States Patent |
D913,979 |
Babu , et al. |
March 23, 2021 |
Inner shield for a substrate processing chamber
Claims
CLAIM The ornamental design for an inner shield for a substrate
processing chamber, as shown and described.
Inventors: |
Babu; Sarath (Singapore,
SG), Jupudi; Ananthkrishna (Singapore, SG),
Ow; Yueh Sheng (Singapore, SG), Wei; Junqi
(Singapore, SG), Boh; Kelvin (Singapore,
SG), Wada; Yuichi (Chiba, JP), Zhang;
Kang (Singapore, SG) |
Applicant: |
Name |
City |
State |
Country |
Type |
APPLIED MATERIALS, INC. |
Santa Clara |
CA |
US |
|
|
Assignee: |
APPLIED MATERIALS, INC. (Santa
Clara, CA)
|
Appl.
No.: |
D/703,655 |
Filed: |
August 28, 2019 |
Current U.S.
Class: |
D13/182 |
Current International
Class: |
1303 |
Field of
Search: |
;D13/118,133,162,182,184,199 ;D15/144.1,144.2,150,199 ;D23/213
;D24/232 |
References Cited
[Referenced By]
U.S. Patent Documents
Other References
International Search Report and Written Opinion for
PCT/US2020/048302 dated Dec. 4, 2020. cited by applicant.
|
Primary Examiner: Stout; Michael C
Assistant Examiner: Butac; Fritzgerald L
Attorney, Agent or Firm: Moser Taboada
Description
FIG. 1 is a top isometric view of the first embodiment for an inner
shield for a substrate processing chamber, according to the new
design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a right side elevation view thereof.
FIG. 7 is a left side elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG.
2.
FIG. 9 is a top isometric view of the second embodiment for an
inner shield for a substrate processing chamber, according to the
new design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a right side elevation view thereof.
FIG. 15 is a left side elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16 in FIG.
10.
The broken lines in FIGS. 1-16 show portions of an inner shield for
a substrate processing chamber which form no part of the claimed
design.
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