Process shield for a substrate processing chamber

Koppa , et al. February 1, 2

Patent Grant D942516

U.S. patent number D942,516 [Application Number D/679,734] was granted by the patent office on 2022-02-01 for process shield for a substrate processing chamber. This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to Aravind Kamath, Manjunatha P. Koppa, David Or, Steven V. Sansoni, Cheng-Hsiung Matt Tsai, Manjunath H. Venkataswamappa.


United States Patent D942,516
Koppa ,   et al. February 1, 2022

Process shield for a substrate processing chamber

Claims

CLAIM The ornamental design for a process shield for a substrate processing chamber, as shown and described.
Inventors: Koppa; Manjunatha P. (Bengaluru, IN), Kamath; Aravind (Santa Clara, CA), Tsai; Cheng-Hsiung Matt (Cupertino, CA), Venkataswamappa; Manjunath H. (Bangalore, IN), Sansoni; Steven V. (Livermore, CA), Or; David (Santa Clara, CA)
Applicant:
Name City State Country Type

APPLIED MATERIALS, INC.

Santa Clara

CA

US
Assignee: APPLIED MATERIALS, INC. (Santa Clara, CA)
Appl. No.: D/679,734
Filed: February 8, 2019

Current U.S. Class: D15/138; D13/182
Current International Class: 1509
Field of Search: ;D23/249,259,262,269 ;D15/138,139,143,144,144.1,144.2,150,199 ;D13/118,122,133,162,182,184,199 ;D22/113,119

References Cited [Referenced By]

U.S. Patent Documents
5320728 June 1994 Tepman
D351450 October 1994 Maryska
D376744 December 1996 Eisenblatter
D381030 July 1997 Tepman
D395483 June 1998 Maryska
D401252 November 1998 Tudhope
D403002 December 1998 Tudhope
D403334 December 1998 Tudhope
D403337 December 1998 Or
D491963 June 2004 Doba
D559066 January 2008 Tano
D584591 January 2009 Tano
D592029 May 2009 Tano
D592030 May 2009 Tano
D600989 September 2009 Tano
D616389 May 2010 Takahashi
8043487 October 2011 Li et al.
D665491 August 2012 Goel
8371904 February 2013 Jindal
D678745 March 2013 Nguyen
D703162 April 2014 Tamaso
D738451 September 2015 Olson
D741823 October 2015 Tateno
D741921 October 2015 Jarvius
9475996 October 2016 Mandle
D795208 August 2017 Sasaki
D796458 September 2017 Jang
D810705 February 2018 Krishnan
D819580 June 2018 Krishnan
D877101 March 2020 Johanson
D888903 June 2020 Gunther
D891382 July 2020 Koppa
D913979 March 2021 Babu
D913980 March 2021 Lee
2003/0029564 February 2003 Brown et al.
2012/0263569 October 2012 Priddy
2015/0357169 December 2015 Yuan
2017/0009367 January 2017 Harris
2020/0090915 March 2020 Kerschbaumer
Foreign Patent Documents
D1481081 Oct 2013 JP
D1509910 Oct 2014 JP
D1549498 May 2016 JP
D1570910 Mar 2017 JP
D1575876 May 2017 JP
D1584875 Aug 2017 JP
D1584906 Aug 2017 JP
D161030 Jun 2014 TW
D166552 Mar 2015 TW
D167109 Apr 2015 TW
D166431 Nov 2017 TW
D187432 Dec 2017 TW

Other References

Search Report for Taiwan Design Application No. 108304729, dated Aug. 5, 2020. cited by applicant .
Search Report for Taiwan Design Application No. 108304735001, dated Dec. 2, 2020. cited by applicant.

Primary Examiner: Lane; Sheryl
Assistant Examiner: Philipps; Mark T.
Attorney, Agent or Firm: Moser Taboada

Description



FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to one embodiment of the novel design.

FIG. 2 is a bottom isometric view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a top plan view thereof.

FIG. 5 is a front elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a left side elevation view thereof.

FIG. 8 is a right side elevation view thereof.

FIG. 9 is cross-sectional view taken along line 9-9 of FIG. 3.

FIG. 10 is a top isometric view of a process shield for a substrate processing chamber, according to another embodiment of the novel design.

FIG. 11 is a bottom isometric view thereof.

FIG. 12 is a bottom plan view thereof.

FIG. 13 is a top plan view thereof.

FIG. 14 is a front elevation view thereof.

FIG. 15 is a back elevation view thereof.

FIG. 16 is a left side elevation view thereof.

FIG. 17 is a right side elevation view thereof.

FIG. 18 is cross-sectional view taken along line 18-18 of FIG. 12; and,

FIG. 19 is cross-sectional view taken along line 19-19 of FIG. 14.

The dashed lines in FIGS. 1-19 represent unclaimed environment forming no part of the claimed design.

* * * * *


uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed