Target profile for a physical vapor deposition chamber target

Description

FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;

FIG. 2 is a bottom perspective view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a front elevational view thereof;

FIG. 8 is a back elevational view thereof; and,

FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.

The dashed lines of the cut line showing the plane upon which FIG. 9 is taken in FIG. 4 forms no part of the claimed design.

Claims

CLAIM The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

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Inventors:	Johanson; William (Gilroy, CA), Savandaiah; Kirankumar (Bangalore, IN), Chan; Anthony Chih-Tang (Sunnyvale, CA), Hoi; Siew Kit (Singapore, SG), Prabhu; Prashant Prabhakar (Karwar, IN)
Applicant:	Name City State Country Type APPLIED MATERIALS, INC. Santa Clara CA US
Assignee:	APPLIED MATERIALS, INC. (Santa Clara, CA)
Appl. No.:	D/621,221
Filed:	October 5, 2017

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Current U.S. Class:	D13/182
Current International Class:	1303
Field of Search:	;D13/182 ;D15/144.1,144.2,199

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References Cited [Referenced By]

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Foreign Patent Documents

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Other References

Search Report for Taiwan Design Application No. 106301373 dated Jun. 20, 2017. cited by applicant . Search Report for Taiwan Design Application No. 107305358 dated Feb. 21, 2019. cited by applicant.

Primary Examiner: Oswecki; Elizabeth J
Attorney, Agent or Firm: Moser Taboada Taboada; Alan

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