| Patent | Date |
|---|
Cathode assembly having a dual position magnetron and centrally fed coolant
Grant 11,189,472 - Wysok , et al. November 30, 2 | 2021-11-30 |
Biased cover ring for a substrate processing system
Grant 11,049,701 - Allen , et al. June 29, 2 | 2021-06-29 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20200357616 - ALLEN; Adolph Miller ; et al. | 2020-11-12 |
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
Grant 10,763,090 - Allen , et al. Sep | 2020-09-01 |
Target profile for a physical vapor deposition chamber target
Grant D894,137 - Johanson , et al. A | 2020-08-25 |
Process kit having a floating shadow ring
Grant 10,648,071 - Johanson , et al. | 2020-05-12 |
One-piece process kit shield
Grant 10,546,733 - Savandaiah , et al. Ja | 2020-01-28 |
Target profile for a physical vapor deposition chamber target
Grant D851,613 - Johanson , et al. | 2019-06-18 |
Methods and apparatus for rapidly cooling a substrate
Grant 10,312,116 - Ravi , et al. | 2019-06-04 |
Apparatus and method for reducing substrate sliding in process chambers
Grant 10,262,877 - Thirunavukarasu , et al. | 2019-04-16 |
Target retaining apparatus
Grant 10,199,204 - Yedla , et al. Fe | 2019-02-05 |
Cathode Assembly Having A Dual Position Magnetron And Centrally Fed Coolant
App 20190019658 - Wysok; Irena H. ; et al. | 2019-01-17 |
Apparatus for high compressive stress film deposition to improve kit life
Grant 10,115,573 - Wei , et al. October 30, 2 | 2018-10-30 |
One-piece process kit shield for reducing the impact of an electric field near the substrate
Grant 10,103,012 - Johanson , et al. October 16, 2 | 2018-10-16 |
Biased Cover Ring For A Substrate Processing System
App 20180151325 - ALLEN; ADOLPH MILLER ; et al. | 2018-05-31 |
Process Kit Having A Floating Shadow Ring
App 20180142340 - JOHANSON; WILLIAM ; et al. | 2018-05-24 |
Adjustable process spacing, centering, and improved gas conductance
Grant 9,978,569 - Hawrylchak , et al. May 22, 2 | 2018-05-22 |
Methods and apparatus for nodule control in a titanium-tungsten target
Grant 9,960,023 - Wei , et al. May 1, 2 | 2018-05-01 |
Apparatus for gas injection in a physical vapor deposition chamber
Grant 9,957,601 - Rasheed , et al. May 1, 2 | 2018-05-01 |
Physical vapor deposition (PVD) target having low friction pads
Grant 9,960,021 - Riker , et al. May 1, 2 | 2018-05-01 |
Integrated process kit for a substrate processing chamber
Grant 9,953,812 - Johanson , et al. April 24, 2 | 2018-04-24 |
Process kit having tall deposition ring and deposition ring clamp
Grant 9,909,206 - Johanson , et al. March 6, 2 | 2018-03-06 |
Methods And Apparatus For Rapidly Cooling A Substrate
App 20180025924 - Ravi; Jallepally ; et al. | 2018-01-25 |
Methods and apparatus for rapidly cooling a substrate
Grant 9,779,971 - Ravi , et al. October 3, 2 | 2017-10-03 |
Apparatus And Method For Reducing Substrate Sliding In Process Chambers
App 20170186631 - THIRUNAVUKARASU; SRISKANTHARAJAH ; et al. | 2017-06-29 |
Integrated Process Kit For A Substrate Processing Chamber
App 20170098530 - JOHANSON; William ; et al. | 2017-04-06 |
One-piece Process Kit Shield For Reducing The Impact Of An Electric Field Near The Substrate
App 20170076924 - JOHANSON; William ; et al. | 2017-03-16 |
Apparatus and method for reducing substrate sliding in process chambers
Grant 9,595,464 - Thirunavukarasu , et al. March 14, 2 | 2017-03-14 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20170029941 - ALLEN; Adolph Miller ; et al. | 2017-02-02 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance
App 20170018413 - HAWRYLCHAK; Lara ; et al. | 2017-01-19 |
Process Kit Having Tall Deposition Ring And Deposition Ring Clamp
App 20170002461 - JOHANSON; William ; et al. | 2017-01-05 |
Selectively groundable cover ring for substrate process chambers
Grant 9,472,443 - Rasheed , et al. October 18, 2 | 2016-10-18 |
Adjustable process spacing, centering, and improved gas conductance
Grant 9,464,349 - Hawrylchak , et al. October 11, 2 | 2016-10-11 |
One-piece Process Kit Shield
App 20160189938 - SAVANDAIAH; KIRANKUMAR ; et al. | 2016-06-30 |
Methods And Apparatus For Nodule Control In A Titanium-tungsten Target
App 20160189941 - Wei; Junqi ; et al. | 2016-06-30 |
Process kit shield for plasma enhanced processing chamber
Grant 9,343,274 - Rasheed , et al. May 17, 2 | 2016-05-17 |
Substrate support with radio frequency (RF) return path
Grant 9,340,866 - Ritchie , et al. May 17, 2 | 2016-05-17 |
Apparatus For High Compressive Stress Film Deposition To Improve Kit Life
App 20160104603 - WEI; JUNQI ; et al. | 2016-04-14 |
Apparatus And Method For Reducing Substrate Sliding In Process Chambers
App 20160020134 - THIRUNAVUKARASU; SRISKANTHARAJAH ; et al. | 2016-01-21 |
Pedestal Fluid-based Thermal Control
App 20150332942 - Peh; Eng Sheng ; et al. | 2015-11-19 |
Methods And Apparatus For Rapidly Cooling A Substrate
App 20150294886 - Ravi; Jallepally ; et al. | 2015-10-15 |
Adjustable process spacing, centering, and improved gas conductance
Grant 9,096,926 - Hawrylchak , et al. August 4, 2 | 2015-08-04 |
Target Retaining Apparatus
App 20150203960 - YEDLA; SRINIVASA ; et al. | 2015-07-23 |
Physical Vapor Deposition (pvd) Target Having Low Friction Pads
App 20150170888 - RIKER; MARTIN LEE ; et al. | 2015-06-18 |
Apparatus For Gas Injection In A Physical Vapor Deposition Chamber
App 20140261177 - RASHEED; MUHAMMAD ; et al. | 2014-09-18 |
Selectively Groundable Cover Ring For Substrate Process Chambers
App 20140262763 - RASHEED; MUHAMMAD M. ; et al. | 2014-09-18 |
Apparatus for physical vapor deposition having centrally fed RF energy
Grant 8,795,488 - Rasheed , et al. August 5, 2 | 2014-08-05 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance
App 20140166480 - HAWRYLCHAK; Lara ; et al. | 2014-06-19 |
Process Kit Shield For Plasma Enhanced Processing Chamber
App 20140158049 - RASHEED; MUHAMMAD ; et al. | 2014-06-12 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance
App 20140061040 - HAWRYLCHAK; Lara ; et al. | 2014-03-06 |
Process kit shield for plasma enhanced processing chamber
Grant 8,647,485 - Rasheed , et al. February 11, 2 | 2014-02-11 |
Adjustable process spacing, centering, and improved gas conductance
Grant 8,580,092 - Hawrylchak , et al. November 12, 2 | 2013-11-12 |
Substrate Support With Radio Frequency (rf) Return Path
App 20130256126 - RITCHIE; ALAN ; et al. | 2013-10-03 |
Process Kit Shield For Plasma Enhanced Processing Chamber
App 20130255576 - RASHEED; MUHAMMAD ; et al. | 2013-10-03 |
Process Kit For Rf Physical Vapor Deposition
App 20130087452 - Hawrylchak; Lara ; et al. | 2013-04-11 |
Apparatus For Physical Vapor Deposition Having Centrally Fed Rf Energy
App 20110240464 - RASHEED; MUHAMMAD ; et al. | 2011-10-06 |
Adjustable Process Spacing, Centering, And Improved Gas Conductance
App 20110186426 - HAWRYLCHAK; LARA ; et al. | 2011-08-04 |
Process Kit For Rf Physical Vapor Deposition
App 20110036709 - Hawrylchak; Lara ; et al. | 2011-02-17 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20100252417 - Allen; Adolph Miller ; et al. | 2010-10-07 |
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