BRASK; Justin K.

Patent Applications and Registrations

Patent applications and USPTO patent grants for BRASK; Justin K..The latest application filed is for "gate electrode having a capping layer".

Company Profile

6.193.200

BRASK; Justin K. - Portland OR
Brask; Justin K - Portland OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Gate Electrode Having A Capping Layer App 20210265482 - DEWEY; Gilbert ; et al.	2021-08-26
Gate Electrode Having A Capping Layer App 20210242325 - DEWEY; Gilbert ; et al.	2021-08-05
Gate electrode having a capping layer Grant 11,031,482 - Dewey , et al. June 8, 2	2021-06-08
Method For Fabricating Transistor With Thinned Channel App 20210135007 - Brask; Justin K. ; et al.	2021-05-06
Method for fabricating transistor with thinned channel Grant 10,937,907 - Brask , et al. March 2, 2	2021-03-02
Gate Electrode Having A Capping Layer App 20200295153 - DEWEY; Gilbert ; et al.	2020-09-17
Gate electrode having a capping layer Grant 10,707,319 - Dewey , et al.	2020-07-07
Method For Fabricating Transistor With Thinned Channel App 20190371940 - Brask; Justin K. ; et al.	2019-12-05
Method for fabricating transistor with thinned channel Grant 10,367,093 - Brask , et al. July 30, 2	2019-07-30
Nonplanar device with thinned lower body portion and method of fabrication Grant 10,236,356 - Shah , et al.	2019-03-19
Extreme high mobility CMOS logic Grant 10,141,437 - Datta , et al. Nov	2018-11-27
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 10,121,897 - Chau , et al. November 6, 2	2018-11-06
Method For Fabricating Transistor With Thinned Channel App 20180047846 - Brask; Justin K. ; et al.	2018-02-15
Nonplanar Device With Thinned Lower Body Portion And Method Of Fabrication App 20170365677 - SHAH; Uday ; et al.	2017-12-21
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20170323972 - CHAU; Robert S. ; et al.	2017-11-09
Method for fabricating transistor with thinned channel Grant 9,806,195 - Brask , et al. October 31, 2	2017-10-31
Extreme High Mobility Cmos Logic App 20170309734 - DATTA; Suman ; et al.	2017-10-26
Semiconductor device structures and methods of forming semiconductor structures Grant 9,761,724 - Brask , et al. September 12, 2	2017-09-12
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 9,748,391 - Chau , et al. August 29, 2	2017-08-29
Nonplanar device with thinned lower body portion and method of fabrication Grant 9,741,809 - Shah , et al. August 22, 2	2017-08-22
Extreme high mobility CMOS logic Grant 9,691,856 - Datta , et al. June 27, 2	2017-06-27
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20170170318 - Chau; Robert S. ; et al.	2017-06-15
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 9,614,083 - Chau , et al. April 4, 2	2017-04-04
Extreme high mobility CMOS logic Grant 9,548,363 - Datta , et al. January 17, 2	2017-01-17
Fabrication Of Channel Wraparound Gate Structure For Field-effect Transistor App 20160308014 - Radosavljevic; Marko ; et al.	2016-10-20
Semiconductor Device Structures And Methods Of Forming Semiconductor Structures App 20160293765 - Brask; Justin K. ; et al.	2016-10-06
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20160284847 - Chau; Robert S. ; et al.	2016-09-29
Method For Fabricating Transistor With Thinned Channel App 20160197185 - Brask; Justin K. ; et al.	2016-07-07
Gate Electrode Having A Capping Layer App 20160197159 - Dewey; Gilbert ; et al.	2016-07-07
Semiconductor device structures and methods of forming semiconductor structures Grant 9,385,180 - Brask , et al. July 5, 2	2016-07-05
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 9,368,583 - Chau , et al. June 14, 2	2016-06-14
Method for fabricating transistor with thinned channel Grant 9,337,307 - Brask , et al. May 10, 2	2016-05-10
Extreme High Mobility Cmos Logic App 20160111423 - Datta; Suman ; et al.	2016-04-21
Gate electrode having a capping layer Grant 9,287,380 - Dewey , et al. March 15, 2	2016-03-15
Nonplanar Device With Thinned Lower Body Portion And Method Of Fabrication App 20160005829 - Shah; Uday ; et al.	2016-01-07
Nonplanar device with thinned lower body portion and method of fabrication Grant 9,190,518 - Shah , et al. November 17, 2	2015-11-17
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20150236100 - Chau; Robert S. ; et al.	2015-08-20
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 9,048,314 - Chau , et al. June 2, 2	2015-06-02
Semiconductor Device Structures And Methods Of Forming Semiconductor Structures App 20150102429 - Brask; Justin K. ; et al.	2015-04-16
Semiconductor device structures and methods of forming semiconductor structures Grant 8,933,458 - Brask , et al. January 13, 2	2015-01-13
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20140361363 - Chau; Robert S. ; et al.	2014-12-11
Extreme High Mobility Cmos Logic App 20140291615 - Datta; Suman ; et al.	2014-10-02
Nonplanar Device With Thinned Lower Body Portion And Method Of Fabrication App 20140239358 - Shah; Uday ; et al.	2014-08-28
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 8,816,394 - Chau , et al. August 26, 2	2014-08-26
Gate electrode having a capping layer Grant 8,803,255 - Dewey , et al. August 12, 2	2014-08-12
Extreme high mobility CMOS logic Grant 8,802,517 - Datta , et al. August 12, 2	2014-08-12
Nonplanar device with thinned lower body portion and method of fabrication Grant 8,749,026 - Shah , et al. June 10, 2	2014-06-10
Gate Electrode Having A Capping Layer App 20140103458 - Dewey; Gilbert ; et al.	2014-04-17
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20140103456 - Chau; Robert S. ; et al.	2014-04-17
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 8,664,694 - Chau , et al. March 4, 2	2014-03-04
Semiconductor Device Structures And Methods Of Forming Semiconductor Structures App 20140035009 - Brask; Justin K. ; et al.	2014-02-06
Extreme High Mobility Cmos Logic App 20130328015 - Datta; Suman ; et al.	2013-12-12
Semiconductor device structures and methods of forming semiconductor structures Grant 8,581,258 - Brask , et al. November 12, 2	2013-11-12
Nonplanar Device With Thinned Lower Body Portion And Method Of Fabrication App 20130264642 - Shah; Uday ; et al.	2013-10-10
Extreme high mobility CMOS logic Grant 8,518,768 - Datta , et al. August 27, 2	2013-08-27
Nonplanar device with thinned lower body portion and method of fabrication Grant 8,502,351 - Shah , et al. August 6, 2	2013-08-06
Gate Electrode Having A Capping Layer App 20130161766 - Dewey; Gilbert ; et al.	2013-06-27
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20130146945 - Chau; Robert S. ; et al.	2013-06-13
Gate electrode having a capping layer Grant 8,390,082 - Dewey , et al. March 5, 2	2013-03-05
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 8,368,135 - Chau , et al. February 5, 2	2013-02-05
Metal gate transistors with raised source and drain regions formed on heavily doped substrate Grant 8,344,452 - Lindert , et al. January 1, 2	2013-01-01
CMOS devices with a single work function gate electrode and method of fabrication Grant 8,294,180 - Doyle , et al. October 23, 2	2012-10-23
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20120205729 - Chau; Robert S. ; et al.	2012-08-16
Extreme High Mobility Cmos Logic App 20120199813 - Datta; Suman ; et al.	2012-08-09
Process for integrating planar and non-planar CMOS transistors on a bulk substrate and article made thereby Grant 8,193,567 - Kavalieros , et al. June 5, 2	2012-06-05
Extreme high mobility CMOS logic Grant 8,183,556 - May 22, 2	2012-05-22
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 8,183,646 - Chau , et al. May 22, 2	2012-05-22
Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate Grant 8,148,786 - Kavalieros , et al. April 3, 2	2012-04-03
Inducing strain in the channels of metal gate transistors Grant 8,129,795 - Datta , et al. March 6, 2	2012-03-06
Forming integrated circuits with replacement metal gate electrodes Grant 8,119,508 - Kavalieros , et al. February 21, 2	2012-02-21
Tensile strained NMOS transistor using group III-N source/drain regions Grant 8,120,065 - Datta , et al. February 21, 2	2012-02-21
Semiconductor Device Structures And Methods Of Forming Semiconductor Structures App 20120032237 - Brask; Justin K. ; et al.	2012-02-09
Nonplanar Device With Thinned Lower Body Portion And Method Of Fabrication App 20120012934 - Shah; Uday ; et al.	2012-01-19
Semiconductor device structures and methods of forming semiconductor structures Grant 8,071,983 - Brask , et al. December 6, 2	2011-12-06
Nonplanar device with thinned lower body portion and method of fabrication Grant 8,067,818 - Shah , et al. November 29, 2	2011-11-29
Dielectric interface for group III-V semiconductor device Grant 7,989,280 - Brask , et al. August 2, 2	2011-08-02
Cmos Devices With A Single Work Function Gate Electrode And Method Of Fabrication App 20110180851 - Doyle; Brian S. ; et al.	2011-07-28
Gate Electrode Having A Capping Layer App 20110156174 - Dewey; Gilbert ; et al.	2011-06-30
Fabrication Of Channel Wraparound Gate Structure For Field-effect Transistor App 20110156145 - Radosavljevic; Marko ; et al.	2011-06-30
Forming abrupt source drain metal gate transistors Grant 7,951,673 - Lindert , et al. May 31, 2	2011-05-31
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20110121393 - Chau; Robert S. ; et al.	2011-05-26
Inducing Strain in the Channels of Metal Gate Transistors App 20110115028 - Datta; Suman ; et al.	2011-05-19
Gate electrode having a capping layer Grant 7,915,694 - Dewey , et al. March 29, 2	2011-03-29
Fabrication of channel wraparound gate structure for field-effect transistor Grant 7,915,167 - Radosavljevic , et al. March 29, 2	2011-03-29
Nonplanar Device With Thinned Lower Body Portion And Method Of Fabrication App 20110062512 - Shah; Uday ; et al.	2011-03-17
Method For Fabricating Transistor With Thinned Channel App 20110062520 - Brask; Justin K. ; et al.	2011-03-17
Inducing strain in the channels of metal gate transistors Grant 7,902,058 - Datta , et al. March 8, 2	2011-03-08
CMOS devices with a single work function gate electrode and method of fabrication Grant 7,902,014 - Doyle , et al. March 8, 2	2011-03-08
Block contact architectures for nanoscale channel transistors Grant 7,898,041 - Radosavljevic , et al. March 1, 2	2011-03-01
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 7,893,506 - Chau , et al. February 22, 2	2011-02-22
Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions Grant 7,888,221 - Kavalieros , et al. February 15, 2	2011-02-15
CMOS device with metal and silicide gate electrodes and a method for making it Grant 7,883,951 - Brask , et al. February 8, 2	2011-02-08
Field effect transistor with metal source/drain regions Grant 7,879,675 - Radosavljevic , et al. February 1, 2	2011-02-01
Semiconductor device with a high-k gate dielectric and a metal gate electrode Grant 7,875,937 - Metz , et al. January 25, 2	2011-01-25
Method for fabricating transistor with thinned channel Grant 7,858,481 - Brask , et al. December 28, 2	2010-12-28
Epitaxial silicon germanium for reduced contact resistance in field-effect transistors Grant 7,851,291 - Shifren , et al. December 14, 2	2010-12-14
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20100295129 - Chau; Robert S. ; et al.	2010-11-25
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 7,825,481 - Chau , et al. November 2, 2	2010-11-02
Three-dimensional integrated circuit for analyte detection App 20100248209 - Datta; Suman ; et al.	2010-09-30
Forming Integrated Circuits With Replacement Metal Gate Electrodes App 20100219456 - Kavalieros; Jack ; et al.	2010-09-02
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,785,958 - Doczy , et al. August 31, 2	2010-08-31
Preventing silicide formation at the gate electrode in a replacement metal gate technology Grant 7,754,552 - Barns , et al. July 13, 2	2010-07-13
Forming Abrupt Source Drain Metal Gate Transistors App 20100151669 - Lindert; Nick ; et al.	2010-06-17
Lateral undercut of metal gate in SOI device Grant 7,736,956 - Datta , et al. June 15, 2	2010-06-15
Forming integrated circuits with replacement metal gate electrodes Grant 7,718,479 - Kavalieros , et al. May 18, 2	2010-05-18
Method for making a semiconductor device having a high-k gate dielectric Grant 7,709,909 - Doczy , et al. May 4, 2	2010-05-04
Method of forming abrupt source drain metal gate transistors Grant 7,704,833 - Lindert , et al. April 27, 2	2010-04-27
Method for making a semiconductor device having a high-k dielectric layer and a metal gate electrode Grant 7,671,471 - Brask , et al. March 2, 2	2010-03-02
Field Effect Transistor With Metal Source/drain Regions App 20090325350 - Radosavljevic; Marko ; et al.	2009-12-31
Tensile Strained NMOS Transistor Using Group III-N Source/Drain Regions App 20090302350 - Datta; Suman ; et al.	2009-12-10
Cmos Device With Metal And Silicide Gate Electrodes And A Method For Making It App 20090280608 - Brask; Justin K. ; et al.	2009-11-12
Forming high-k dielectric layers on smooth substrates Grant 7,615,441 - Brask , et al. November 10, 2	2009-11-10
Complementary Metal Oxide Semiconductor Integrated Circuit Using Raised Source Drain and Replacement Metal Gate App 20090261391 - KAVALIEROS; Jack ; et al.	2009-10-22
Angled implantation for removal of thin film layers Grant 7,595,248 - Hattendorf , et al. September 29, 2	2009-09-29
Tensile strained NMOS transistor using group III-N source/drain regions Grant 7,592,213 - Datta , et al. September 22, 2	2009-09-22
Epitaxial silicon germanium for reduced contact resistance in field-effect transistors App 20090230480 - Shifren; Lucian ; et al.	2009-09-17
Semiconductor Device Structures And Methods Of Forming Semiconductor Structures App 20090218603 - Brask; Justin K. ; et al.	2009-09-03
Method of patterning a film Grant 7,579,280 - Brask , et al. August 25, 2	2009-08-25
Removing a high-k gate dielectric Grant 7,575,991 - Doczy , et al. August 18, 2	2009-08-18
Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate Grant 7,569,443 - Kavalieros , et al. August 4, 2	2009-08-04
Epitaxial silicon germanium for reduced contact resistance in field-effect transistors Grant 7,566,605 - Shifren , et al. July 28, 2	2009-07-28
Metal Gate Device With Reduced Oxidation Of A High-k Gate Dielectric App 20090179282 - Doyle; Brian S. ; et al.	2009-07-16
Reducing Ambipolar Conduction in Carbon Nanotube Transistors App 20090159872 - Datta; Suman ; et al.	2009-06-25
Nonplanar device with thinned lower body portion and method of fabrication Grant 7,550,333 - Shah , et al. June 23, 2	2009-06-23
Methods for patterning a semiconductor film Grant 7,547,637 - Brask , et al. June 16, 2	2009-06-16
Selective surface exposure, cleans and conditioning of the germanium film in a Ge photodetector Grant 7,547,639 - Brask , et al. June 16, 2	2009-06-16
Method Of Forming A Nonplanar Transistor With Sidewall Spacers App 20090149012 - Brask; Justin K. ; et al.	2009-06-11
Field Effect Transistor With Narrow Bandgap Source And Drain Regions And Method Of Fabrication App 20090142897 - Chau; Robert S. ; et al.	2009-06-04
Gate Electrode Having A Capping Layer App 20090121297 - Dewey; Gilbert ; et al.	2009-05-14
Method of forming metal gate electrodes using sacrificial gate electrode material and sacrificial gate dielectric material Grant 7,531,437 - Brask , et al. May 12, 2	2009-05-12
Nonplanar transistors with metal gate electrodes Grant 7,528,025 - Brask , et al. May 5, 2	2009-05-05
Gate electrode having a capping layer Grant 7,524,727 - Dewey , et al. April 28, 2	2009-04-28
Multigate device with recessed strain regions Grant 7,525,160 - Kavalieros , et al. April 28, 2	2009-04-28
Dielectric Interface For Group Iii-v Semiconductor Device App 20090095984 - Brask; Justin K. ; et al.	2009-04-16
Field effect transistor with narrow bandgap source and drain regions and method of fabrication Grant 7,518,196 - Chau , et al. April 14, 2	2009-04-14
Process For Integrating Planar And Non-planar Cmos Transistors On A Bulk Substrate And Article Made Thereby App 20090090976 - Kavalieros; Jack T. ; et al.	2009-04-09
Complementary metal oxide semiconductor integrated circuit using uniaxial compressive stress and biaxial compressive stress App 20090075445 - Kavalieros; Jack ; et al.	2009-03-19
Metal gate device with reduced oxidation of a high-k gate dielectric Grant 7,501,336 - Doyle , et al. March 10, 2	2009-03-10
Angled implantation for removal of thin film layers App 20090057788 - Hattendorf; Michael L. ; et al.	2009-03-05
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20090042405 - Doczy; Mark L. ; et al.	2009-02-12
Semiconductor device with a high-k gate dielectric and a metal gate electrode App 20090039446 - Metz; Matthew V. ; et al.	2009-02-12
Dielectric interface for group III-V semiconductor device Grant 7,485,503 - Brask , et al. February 3, 2	2009-02-03
Forming dual metal complementary metal oxide semiconductor integrated circuits App 20090020825 - Doczy; Mark ; et al.	2009-01-22
Method For Making A Semiconductor Device Having A High-k Gate Dielectric App 20090020836 - Doczy; Mark L. ; et al.	2009-01-22
Process for integrating planar and non-planar CMOS transistors on a bulk substrate and article made thereby Grant 7,479,421 - Kavalieros , et al. January 20, 2	2009-01-20
Complementary metal oxide semiconductor integrated circuit using uniaxial compressive stress and biaxial compressive stress Grant 7,470,972 - Kavalieros , et al. December 30, 2	2008-12-30
Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions App 20080318385 - Kavalieros; Jack T. ; et al.	2008-12-25
Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions Grant 7,465,976 - Kavalieros , et al. December 16, 2	2008-12-16
Semiconductor device with a high-k gate dielectric and a metal gate electrode Grant 7,449,756 - Metz , et al. November 11, 2	2008-11-11
Method for making a semiconductor device having a high-k gate dielectric Grant 7,442,983 - Doczy , et al. October 28, 2	2008-10-28
Block Contact Architectures for Nanoscale Channel Transistors App 20080258207 - Radosavljevic; Marko ; et al.	2008-10-23
Method for fabricating metal gate structures Grant 7,439,571 - Doczy , et al. October 21, 2	2008-10-21
Forming dual metal complementary metal oxide semiconductor integrated circuits Grant 7,439,113 - Doczy , et al. October 21, 2	2008-10-21
Fabricating strained channel epitaxial source/drain transistors Grant 7,427,775 - Murthy , et al. September 23, 2	2008-09-23
Uniform silicide metal on epitaxially grown source and drain regions of three-dimensional transistors Grant 7,425,500 - Metz , et al. September 16, 2	2008-09-16
Reducing reactions between polysilicon gate electrodes and high dielectric constant gate dielectrics Grant 7,425,490 - Kavalieros , et al. September 16, 2	2008-09-16
Facilitating removal of sacrificial layers via implantation to form replacement metal gates Grant 7,422,936 - Barns , et al. September 9, 2	2008-09-09
Reducing oxidation under a high K gate dielectric App 20080211033 - Turkot; Robert B. ; et al.	2008-09-04
Lateral undercut of metal gate in SOI device App 20080188041 - Datta; Suman ; et al.	2008-08-07
Chemical thinning of silicon body of an SOI substrate Grant 7,407,868 - Brask , et al. August 5, 2	2008-08-05
Stacked multi-gate transistor design and method of fabrication Grant 7,407,847 - Doyle , et al. August 5, 2	2008-08-05
Lateral undercut of metal gate in SOI device Grant 7,402,875 - Datta , et al. July 22, 2	2008-07-22
Non-planar microelectronic device having isolation element to mitigate fringe effects and method to fabricate same Grant 7,402,856 - Brask , et al. July 22, 2	2008-07-22
Method of fabricating a multi-cornered film Grant 7,396,711 - Shah , et al. July 8, 2	2008-07-08
Forming field effect transistors from conductors Grant 7,390,947 - Majumdar , et al. June 24, 2	2008-06-24
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,390,709 - Doczy , et al. June 24, 2	2008-06-24
Metal gate transistors with epitaxial source and drain regions App 20080142840 - Lindert; Nick ; et al.	2008-06-19
Reducing oxidation under a high K gate dielectric Grant 7,387,927 - Turkot, Jr. , et al. June 17, 2	2008-06-17
Method For Making A Semiconductor Device Having A High-k Dielectric Layer And A Metal Gate Electrode App 20080135952 - Brask; Justin K. ; et al.	2008-06-12
Method for making a semiconductor device having a high-k gate dielectric Grant 7,384,880 - Brask , et al. June 10, 2	2008-06-10
Method for making a semiconductor device with a high-k gate dielectric and a metal gate electrode Grant 7,381,608 - Brask , et al. June 3, 2	2008-06-03
Cmos Device With Metal And Silicide Gate Electrodes And A Method For Making It App 20080124857 - Brask; Justin K. ; et al.	2008-05-29
Threshold voltage targeting in carbon nanotube devices and structures formed thereby App 20080108214 - Majumdar; Amlan ; et al.	2008-05-08
Nonplanar transistors with metal gate electrodes Grant 7,361,958 - Brask , et al. April 22, 2	2008-04-22
Nonplanar transistors with metal gate electrodes App 20080090397 - Brask; Justin K. ; et al.	2008-04-17
Forming high-K dielectric layers on smooth substrates App 20080087985 - Brask; Justin K. ; et al.	2008-04-17
Method for making semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,355,281 - Brask , et al. April 8, 2	2008-04-08
Metal gate transistors with epitaxial source and drain regions Grant 7,332,439 - Lindert , et al. February 19, 2	2008-02-19
Nonplanar transistors with metal gate electrodes Grant 7,329,913 - Brask , et al. February 12, 2	2008-02-12
Method of forming a metal oxide dielectric Grant 7,326,656 - Brask , et al. February 5, 2	2008-02-05
Forming high-k dielectric layers on smooth substrates Grant 7,323,423 - Brask , et al. January 29, 2	2008-01-29
Integrating n-type and p-type metal gate transistors Grant 7,316,949 - Doczy , et al. January 8, 2	2008-01-08
Method for making a semiconductor device having a high-K gate dielectric and a titanium carbide gate electrode Grant 7,317,231 - Metz , et al. January 8, 2	2008-01-08
Block contact architectures for nanoscale channel transistors Grant 7,279,375 - Radosavljevic , et al. October 9, 2	2007-10-09
Stacked multi-gate transistor design and method of fabrication App 20070231997 - Doyle; Brian S. ; et al.	2007-10-04
Epitaxial silicon germanium for reduced contact resistance in field-effect transistors App 20070231983 - Shifren; Lucian ; et al.	2007-10-04
Uniform silicide metal on epitaxially grown source and drain regions of three-dimensional transistors App 20070231984 - Metz; Matthew V. ; et al.	2007-10-04
Etch stop and hard mask film property matching to enable improved replacement metal gate process Grant 7,271,045 - Prince , et al. September 18, 2	2007-09-18
Method of smoothing waveguide structures Grant 7,262,140 - Brask , et al. August 28, 2	2007-08-28
Fabricating strained channel epitaxial source/drain transistors App 20070194391 - Murthy; Anand ; et al.	2007-08-23
Method of varying etch selectivities of a film App 20070197042 - Brask; Justin K.	2007-08-23
Method of varying etch selectivities of a film Grant 7,247,578 - Brask July 24, 2	2007-07-24
Transistor including flatband voltage control through interface dipole engineering App 20070158702 - Doczy; Mark L. ; et al.	2007-07-12
Method and structure for reducing the external resistance of a three-dimensional transistor through use of epitaxial layers App 20070152266 - Doyle; Brian S. ; et al.	2007-07-05
Gate electrode having a capping layer App 20070152271 - Dewey; Gilbert ; et al.	2007-07-05
Tensile strained NMOS transistor using group III-N source/drain regions App 20070155063 - Datta; Suman ; et al.	2007-07-05
Method of fabricating a multi-cornered film App 20070148837 - Shah; Uday ; et al.	2007-06-28
Multigate device with recessed strain regions App 20070145487 - Kavalieros; Jack T. ; et al.	2007-06-28
Device With Scavenging Spacer Layer App 20070145498 - Metz; Matthew V. ; et al.	2007-06-28
Dual halo implant for improving short channel effect in three-dimensional tri-gate transistors App 20070148926 - Datta; Suman ; et al.	2007-06-28
Extreme high mobility CMOS logic App 20070138565 - Datta; Suman ; et al.	2007-06-21
Non-planar microelectronic device having isolation element to mitigate fringe effects and method to fabricate same App 20070134878 - Brask; Justin K. ; et al.	2007-06-14
Apparatus and method of fabricating a MOSFET transistor having a self-aligned implant App 20070128820 - Majumdar; Amlan ; et al.	2007-06-07
Angled implantation for removal of thin film layers App 20070126067 - Hattendorf; Michael L. ; et al.	2007-06-07
Device with scavenging spacer layer Grant 7,226,831 - Metz , et al. June 5, 2	2007-06-05
Fabricating strained channel epitaxial source/drain transistors Grant 7,226,842 - Murthy , et al. June 5, 2	2007-06-05
Dielectric interface for group III-V semiconductor device App 20070123003 - Brask; Justin K. ; et al.	2007-05-31
Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer Grant 7,220,635 - Brask , et al. May 22, 2	2007-05-22
CMOS Devices with a single work function gate electrode and method of fabrication App 20070111419 - Doyle; Brian S. ; et al.	2007-05-17
Methods for integrating replacement metal gate structures Grant 7,217,611 - Kavalieros , et al. May 15, 2	2007-05-15
Removing Silicon Nano-crystals App 20070105324 - Brask; Justin K.	2007-05-10
CMOS devices with a single work function gate electrode and method of fabrication App 20070090416 - Doyle; Brian S. ; et al.	2007-04-26
Narrow-body multiple-gate FET with dominant body transistor for high performance App 20070090408 - Majumdar; Amlan ; et al.	2007-04-26
Replacement gate process for making a semiconductor device that includes a metal gate electrode Grant 7,208,361 - Shah , et al. April 24, 2	2007-04-24
Capping Of Copper Structures In Hydrophobic Ild Using Aqueous Electro-less Bath App 20070085162 - O'Brien; Kevin P. ; et al.	2007-04-19
Etch stop and hard mask film property matching to enable improved replacement metal gate process App 20070077765 - Prince; Matthew J. ; et al.	2007-04-05
Process for integrating planar and non-planar CMOS transistors on a bulk substrate and article made thereby App 20070069293 - Kavalieros; Jack T. ; et al.	2007-03-29
Method of fabricating CMOS devices having a single work function gate electrode by band gap engineering and article made thereby App 20070069302 - Jin; Been-Yih ; et al.	2007-03-29
Multiple crystal orientations on the same substrate App 20070063306 - Doyle; Brian S. ; et al.	2007-03-22
Depositing an oxide Grant 7,192,890 - Zhou , et al. March 20, 2	2007-03-20
Forming dual metal complementary metal oxide semiconductor integrated circuits Grant 7,192,856 - Doczy , et al. March 20, 2	2007-03-20
Method for making a semiconductor device that includes a metal gate electrode Grant 7,183,184 - Doczy , et al. February 27, 2	2007-02-27
Lateral undercut of metal gate in SOI device App 20070040223 - Datta; Suman ; et al.	2007-02-22
Reducing gate dielectric material to form a metal gate electrode extension App 20070040227 - Datta; Suman ; et al.	2007-02-22
Planarizing a semiconductor structure to form replacement metal gates App 20070037372 - Kavalieros; Jack ; et al.	2007-02-15
Method for making a semiconductor device that includes a metal gate electrode Grant 7,176,090 - Brask , et al. February 13, 2	2007-02-13
Reducing the dielectric constant of a portion of a gate dielectric App 20070029627 - Datta; Suman ; et al.	2007-02-08
Method for making a semiconductor device having a high-k gate dielectric Grant 7,160,779 - Doczy , et al. January 9, 2	2007-01-09
Method for making a semiconductor device that includes a metal gate electrode Grant 7,160,767 - Brask , et al. January 9, 2	2007-01-09
Semiconductor device structures and methods of forming semiconductor structures App 20070001173 - Brask; Justin K. ; et al.	2007-01-04
Block contact architectures for nanoscale channel transistors App 20070001219 - Radosavljevic; Marko ; et al.	2007-01-04
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,157,378 - Brask , et al. January 2, 2	2007-01-02
Strained field effect transistors App 20060292776 - Jin; Been-Yih ; et al.	2006-12-28
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode Grant 7,153,784 - Brask , et al. December 26, 2	2006-12-26
CMOS device with metal and silicide gate electrodes and a method for making it Grant 7,153,734 - Brask , et al. December 26, 2	2006-12-26
Metal gate device with reduced oxidation of a high-k gate dielectric App 20060284271 - Doyle; Brian S. ; et al.	2006-12-21
Method for fabricating transistor with thinned channel App 20060286755 - Brask; Justin K. ; et al.	2006-12-21
Complementary metal oxide semiconductor integrated circuit using raised source drain and replacement metal gate App 20060286729 - Kavalieros; Jack ; et al.	2006-12-21
Semiconductor device with a high-k gate dielectric and a metal gate electrode App 20060278941 - Metz; Matthew V. ; et al.	2006-12-14
Semiconductor device with a high-k gate dielectric and a metal gate electrode Grant 7,148,548 - Doczy , et al. December 12, 2	2006-12-12
Reducing the dielectric constant of a portion of a gate dielectric Grant 7,148,099 - Datta , et al. December 12, 2	2006-12-12
Reducing gate dielectric material to form a metal gate electrode extension Grant 7,144,783 - Datta , et al. December 5, 2	2006-12-05
Planarizing a semiconductor structure to form replacement metal gates Grant 7,138,323 - Kavalieros , et al. November 21, 2	2006-11-21
Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions App 20060258072 - Kavalieros; Jack T. ; et al.	2006-11-16
Method for etching a thin metal layer Grant 7,129,182 - Brask , et al. October 31, 2	2006-10-31
Compensating for induced strain in the channels of metal gate transistors App 20060237801 - Kavalieros; Jack ; et al.	2006-10-26
Replacement gate flow facilitating high yield and incorporation of etch stop layers and/or stressed films App 20060237804 - Chau; Robert S. ; et al.	2006-10-26
Compensating the workfunction of a metal gate transistor for abstraction by the gate dielectric layer Grant 7,125,762 - Brask , et al. October 24, 2	2006-10-24
Multilayer metal gate electrode Grant 7,126,199 - Doczy , et al. October 24, 2	2006-10-24
Capping of copper structures in hydrophobic ILD using aqueous electro-less bath Grant 7,119,019 - O'Brien , et al. October 10, 2	2006-10-10
Semiconductor device with a high-k gate dielectric and a metal gate electrode App 20060220090 - Metz; Matthew V. ; et al.	2006-10-05
Sacrificial annealing layer for a semiconductor device and a method of fabrication Grant 7,115,479 - Liu , et al. October 3, 2	2006-10-03
Nonplanar device with thinned lower body portion and method of fabrication App 20060214231 - Shah; Uday ; et al.	2006-09-28
Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit App 20060214237 - Metz; Matthew V. ; et al.	2006-09-28
Complementary metal oxide semiconductor integrated circuit using uniaxial compressive stress and biaxial compressive stress App 20060205167 - Kavalieros; Jack ; et al.	2006-09-14
Field effect transistor with metal source/drain regions App 20060202266 - Radosavljevic; Marko ; et al.	2006-09-14
Nonplanar transistors with metal gate electrodes Grant 7,105,390 - Brask , et al. September 12, 2	2006-09-12
Epitaxially deposited source/drain App 20060197164 - Lindert; Nick ; et al.	2006-09-07
Method of fabricating semiconductor devices with replacement, coaxial gate structure Grant 7,101,761 - Chau , et al. September 5, 2	2006-09-05
Method for making a semiconductor device having a high-k gate dielectric App 20060189156 - Doczy; Mark L. ; et al.	2006-08-24
Selective surface exposure, cleans and conditioning of the germanium film in a Ge photodetector App 20060188827 - Brask; Justin K. ; et al.	2006-08-24
Field effect transistor with narrow bandgap source and drain regions and method of fabrication App 20060186484 - Chau; Robert S. ; et al.	2006-08-24
Metal gate carbon nanotube transistor App 20060180859 - Radosavljevic; Marko ; et al.	2006-08-17
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20060180878 - Brask; Justin K. ; et al.	2006-08-17
Etching metal silicides and germanides App 20060180874 - Brask; Justin K. ; et al.	2006-08-17
Method for making a semiconductor device with a metal gate electrode that is formed on an annealed high-k gate dielectric layer App 20060183277 - Brask; Justin K. ; et al.	2006-08-17
Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit Grant 7,087,476 - Metz , et al. August 8, 2	2006-08-08
Method for making a semiconductor device having a high-k gate dielectric Grant 7,084,038 - Doczy , et al. August 1, 2	2006-08-01
Method for making a semiconductor device having a high-k gate dielectric App 20060166447 - Doczy; Mark L. ; et al.	2006-07-27
Inhibiting growth under high dielectric constant films App 20060160371 - Metz; Matthew V. ; et al.	2006-07-20
Forming field effect transistors from conductors App 20060157747 - Majumdar; Amlan ; et al.	2006-07-20
Forming dual metal complementary metal oxide semiconductor integrated circuits App 20060160342 - Doczy; Mark ; et al.	2006-07-20
Selective surface exposure, cleans, and conditioning of the germanium film in a Ge photodetector Grant 7,078,160 - Brask , et al. July 18, 2	2006-07-18
Replacement gate flow facilitating high yield and incorporation of etch stop layers and/or stressed films Grant 7,078,282 - Chau , et al. July 18, 2	2006-07-18
Method for making a semiconductor device having a high-k gate dielectric Grant 7,074,680 - Doczy , et al. July 11, 2	2006-07-11
Tailoring channel dopant profiles App 20060148150 - Kavalieros; Jack T. ; et al.	2006-07-06
Quantum well transistor using high dielectric constant dielectric layer App 20060148182 - Datta; Suman ; et al.	2006-07-06
Nonplanar transistors with metal gate electrodes App 20060138553 - Brask; Justin K. ; et al.	2006-06-29
Nonplanar transistors with metal gate electrodes App 20060138552 - Brask; Justin K. ; et al.	2006-06-29
Method for making a semiconductor device having a high-k gate dielectric and a titanium carbide gate electrode Grant 7,064,066 - Metz , et al. June 20, 2	2006-06-20
Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit Grant 7,060,568 - Metz , et al. June 13, 2	2006-06-13
Epitaxially deposited source/drain Grant 7,060,576 - Lindert , et al. June 13, 2	2006-06-13
Method for making a semiconductor device having a high-k gate dielectric App 20060121742 - Metz; Matthew V. ; et al.	2006-06-08
Method For Making A Semiconductor Device Having A High-k Gate Dielectric And A Titanium Carbide Gate Electrode App 20060121727 - Metz; Matthew V. ; et al.	2006-06-08
Method for making a semiconductor device having a high-K gate dielectric and a titanium carbide gate electrode App 20060121668 - Metz; Matthew V. ; et al.	2006-06-08
Method for making a semiconductor device with a high-k gate dielectric and a metal gate electrode App 20060121678 - Brask; Justin K. ; et al.	2006-06-08
Etching metal silicides and germanides Grant 7,056,780 - Brask , et al. June 6, 2	2006-06-06
Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning App 20060108067 - Iyer; Subramanyam A. ; et al.	2006-05-25
Method for making a semiconductor device with a high-k gate dielectric and a conductor that facilitates current flow across a P/N junction Grant 7,045,428 - Brask , et al. May 16, 2	2006-05-16
Method for making a semiconductor device with a high-k gate dielectric layer and a silicide gate electrode App 20060091483 - Doczy; Mark L. ; et al.	2006-05-04
Method for making a semiconductor device with a high-k gate dielectric layer and a silicide gate electrode App 20060094180 - Doczy; Mark L. ; et al.	2006-05-04
Selective etch process for making a semiconductor device having a high-k gate dielectric Grant 7,037,845 - Brask , et al. May 2, 2	2006-05-02
Nonplanar device with thinned lower body portion and method of fabrication App 20060086977 - Shah; Uday ; et al.	2006-04-27
Forming a porous dielectric layer Grant 7,034,399 - Kloster , et al. April 25, 2	2006-04-25
Method for making a semiconductor device having a high-k gate dielectric App 20060079005 - Brask; Justin K. ; et al.	2006-04-13
Nonplanar transistors with metal gate electrodes App 20060071275 - Brask; Justin K. ; et al.	2006-04-06
Inducing strain in the channels of metal gate transistors App 20060071285 - Datta; Suman ; et al.	2006-04-06
Highly polar cleans for removal of residues from semiconductor structures Grant 7,022,655 - Brask , et al. April 4, 2	2006-04-04
Fabrication of channel wraparound gate structure for field-effect transistor App 20060068591 - Radosavljevic; Marko ; et al.	2006-03-30
Metal gate electrode semiconductor device App 20060065939 - Doczy; Mark L. ; et al.	2006-03-30
Metal gate transistors with epitaxial source and drain regions App 20060068590 - Lindert; Nick ; et al.	2006-03-30
Processing electronic devices using a combination of supercritical fluid and sonic energy App 20060065627 - Clarke; James ; et al.	2006-03-30
Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning Grant 7,018,938 - Iyer , et al. March 28, 2	2006-03-28
Atomic layer deposition of high dielectric constant gate dielectrics App 20060060930 - Metz; Matthew V. ; et al.	2006-03-23
Reducing ambipolar conduction in carbon nanotube transistors App 20060063318 - Datta; Suman ; et al.	2006-03-23
Reducing oxidation under a high K gate dielectric App 20060057808 - Turkot; Robert B. JR. ; et al.	2006-03-16
Method for making a semiconductor device having a high-k gate dielectric App 20060051882 - Doczy; Mark L. ; et al.	2006-03-09
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20060051924 - Doczy; Mark L. ; et al.	2006-03-09
Method for making a semiconductor device having a high-k gate dielectric App 20060051880 - Doczy; Mark L. ; et al.	2006-03-09
Method for making a semiconductor device that includes a metal gate electrode App 20060051957 - Brask; Justin K. ; et al.	2006-03-09
Facilitating removal of sacrificial layers via implantation to form replacement metal gates App 20060046448 - Barns; Chris E. ; et al.	2006-03-02
Forming integrated circuits with replacement metal gate electrodes App 20060046401 - Kavalieros; Jack ; et al.	2006-03-02
Atomic layer deposition of high quality high-k transition metal and rare earth oxides App 20060045968 - Metz; Matthew V. ; et al.	2006-03-02
Facilitating removal of sacrificial layers to form replacement metal gates App 20060046523 - Kavalieros; Jack ; et al.	2006-03-02
Forming abrupt source drain metal gate transistors App 20060046399 - Lindert; Nick ; et al.	2006-03-02
Methods and compositions for selectively etching metal films and structures App 20060037943 - Brask; Justin K.	2006-02-23
Integrating n-type and p-type metal gate transistors App 20060030104 - Doczy; Mark ; et al.	2006-02-09
Compensating the workfunction of a metal gate transistor for abstraction by the gate dielectric layer App 20060024892 - Brask; Justin K. ; et al.	2006-02-02
Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit App 20060022271 - Metz; Matthew V. ; et al.	2006-02-02
Planarizing a semiconductor structure to form replacement metal gates App 20060022277 - Kavalieros; Jack ; et al.	2006-02-02
Semiconductor device with a high-k gate dielectric and a metal gate electrode App 20060017098 - Doczy; Mark L. ; et al.	2006-01-26
Forming dual metal complementary metal oxide semiconductor integrated circuits App 20060006522 - Doczy; Mark ; et al.	2006-01-12
Methods for integrating replacement metal gate structures App 20060008954 - Kavalieros; Jack ; et al.	2006-01-12
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20060008968 - Brask; Justin K. ; et al.	2006-01-12
Forming high-k dielectric layers on smooth substrates App 20060001071 - Brask; Justin K. ; et al.	2006-01-05
Removing a high-k gate dielectric App 20060003499 - Doczy; Mark L. ; et al.	2006-01-05
Using different gate dielectrics with NMOS and PMOS transistors of a complementary metal oxide semiconductor integrated circuit App 20060001106 - Metz; Matthew V. ; et al.	2006-01-05
Facilitating removal of sacrificial layers to form replacement metal gates App 20050287746 - Metz, Matthew V. ; et al.	2005-12-29
Reducing reactions between polysilicon gate electrodes and high dielectric constant gate dielectrics App 20050287748 - Kavalieros, Jack ; et al.	2005-12-29
Reducing the dielectric constant of a portion of a gate dielectric App 20050285213 - Datta, Suman ; et al.	2005-12-29
Method for making a semiconductor device having a metal gate electrode Grant 6,974,764 - Brask , et al. December 13, 2	2005-12-13
Method for making a semiconductor device with a high-k gate dielectric and metal layers that meet at a P/N junction App 20050272270 - Metz, Matthew V. ; et al.	2005-12-08
Forming integrated circuits with replacement metal gate electrodes App 20050269644 - Brask, Justin K. ; et al.	2005-12-08
Replacement gate process for making a semiconductor device that includes a metal gate electrode App 20050272191 - Shah, Uday ; et al.	2005-12-08
integrating n-type and P-type metal gate transistors Grant 6,972,225 - Doczy , et al. December 6, 2	2005-12-06
Method for making a semiconductor device with a high-k gate dielectric and a conductor that facilitates current flow across a P/N junction App 20050266619 - Brask, Justin K. ; et al.	2005-12-01
Controlling bubble formation during etching App 20050266694 - Brask, Justin K. ; et al.	2005-12-01
Method of patterning a film App 20050266692 - Brask, Justin K. ; et al.	2005-12-01
Modifying the viscosity of etchants App 20050263483 - Brask, Justin K. ; et al.	2005-12-01
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20050250258 - Metz, Matthew V. ; et al.	2005-11-10
Reducing gate dielectric material to form a metal gate electrode extension App 20050245036 - Datta, Suman ; et al.	2005-11-03
Method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode App 20050233527 - Brask, Justin K. ; et al.	2005-10-20
Integrating n-type and p-type metal gate transistors Grant 6,953,719 - Doczy , et al. October 11, 2	2005-10-11
Controlled faceting of source/drain regions Grant 6,946,350 - Lindert , et al. September 20, 2	2005-09-20
Method for making a semiconductor device having a high-k gate dielectric Grant 6,939,815 - Brask , et al. September 6, 2	2005-09-06
Chemical thinning of epitaxial silicon layer over buried oxide Grant 6,927,146 - Brask , et al. August 9, 2	2005-08-09
Method and apparatus for particle removal Grant 6,924,456 - Brask August 2, 2	2005-08-02
Sacrificial annealing layer for a semiconductor device and a method of fabrication Grant 6,909,154 - Liu , et al. June 21, 2	2005-06-21
Method for making a semiconductor device having a high-k gate dielectric Grant 6,897,134 - Brask , et al. May 24, 2	2005-05-24
Acoustic streaming of condensate during sputtered metal vapor deposition Grant 6,896,774 - Brask , et al. May 24, 2	2005-05-24
Method for making a semiconductor device with a metal gate electrode Grant 6,893,927 - Shah , et al. May 17, 2	2005-05-17
Method for making a semiconductor device with a high-k gate dielectric and metal layers that meet at a P/N junction Grant 6,887,800 - Metz , et al. May 3, 2	2005-05-03
Etching metal carbide films Grant 6,869,889 - Brask , et al. March 22, 2	2005-03-22
Method for making a semiconductor device having a high-k gate dielectric Grant 6,867,102 - Brask , et al. March 15, 2	2005-03-15
Generating nitride waveguides Grant 6,861,005 - Brask March 1, 2	2005-03-01
Integrating n-type and p-type metal gate transistors Grant 6,858,483 - Doczy , et al. February 22, 2	2005-02-22
Precise patterning of high-K films Grant 6,855,639 - Brask , et al. February 15, 2	2005-02-15
Method for making a semiconductor device having a high-k gate dielectric Grant 6,806,146 - Brask , et al. October 19, 2	2004-10-19
Selective etching of polysilicon Grant 6,797,622 - Brask , et al. September 28, 2	2004-09-28
Selective etching using sonication Grant 6,770,568 - Brask August 3, 2	2004-08-03
Etching metal using sonication Grant 6,746,967 - Brask , et al. June 8, 2	2004-06-08
Using sonic energy in connection with laser-assisted direct imprinting Grant 6,743,740 - Brask June 1, 2	2004-06-01
Forming a porous dielectric layer Grant 6,737,365 - Kloster , et al. May 18, 2	2004-05-18
Method for making a semiconductor device having a high-k gate dielectric Grant 6,716,707 - Brask , et al. April 6, 2	2004-04-06
Method for making a semiconductor device having a high-k gate dielectric Grant 6,709,911 - Doczy , et al. March 23, 2	2004-03-23
Method for making a semiconductor device having a high-k gate dielectric Grant 6,696,327 - Brask , et al. February 24, 2	2004-02-24
Highly polar cleans for removal of residues from semiconductor structures Grant 6,624,127 - Brask , et al. September 23, 2	2003-09-23