Process shield for a substrate processing chamber

Description

FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to the first embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a left side elevation view thereof.

FIG. 5 is a right side elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a front elevation view thereof.

FIG. 8 is a cross-sectional view taken along line 8-8' of FIG. 2.

FIG. 9 is a top isometric view of a process shield for a substrate processing chamber, according to the second embodiment of the novel design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a left side elevation view thereof.

FIG. 13 is a right side elevation view thereof.

FIG. 14 is a back elevation view thereof.

FIG. 15 is a front elevation view thereof; and,

FIG. 16 is a cross-sectional view taken along line 16-16' of FIG. 10.

The dashed lines in FIGS. 1-16 represent unclaimed environment forming no part of the claimed design.

Claims

CLAIM The ornamental design for a process shield for a substrate processing chamber, as shown and described.

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Inventors:	Lavitsky; Ilya (San Francisco, CA), Miller; Keith A (Mountain View, CA), Yoshidome; Goichi (Albany, CA)
Applicant:	Name City State Country Type APPLIED MATERIALS, INC. Santa Clara CA US
Assignee:	APPLIED MATERIALS, INC. (Santa Clara, CA)
Appl. No.:	D/728,821
Filed:	March 20, 2020

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Current U.S. Class:	D15/138; D13/182
Current International Class:	1509
Field of Search:	;D23/249,259,262,269 ;D15/138,139,143,144,144.1,144.2,150,199 ;D13/118,122,133,162,182,184,199 ;D22/113,119

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References Cited [Referenced By]

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Primary Examiner: Vansant; Calvin E
Assistant Examiner: Philipps; Mark T.
Attorney, Agent or Firm: Moser Taboada