| Patent | Date |
|---|
Coil For Improved Process Chamber Deposition And Etch Uniformity
App 20220293392 - Li; Rui ; et al. | 2022-09-15 |
Heated shield for physical vapor deposition chamber
Grant 11,339,466 - Lavitsky , et al. May 24, 2 | 2022-05-24 |
Process shield for a substrate processing chamber
Grant D941,372 - Lavitsky , et al. January 18, 2 | 2022-01-18 |
Process shield for a substrate processing chamber
Grant D941,371 - Lavitsky , et al. January 18, 2 | 2022-01-18 |
Deposition ring for a substrate processing chamber
Grant D934,315 - Lavitsky , et al. October 26, 2 | 2021-10-26 |
Heated Shield For Physical Vapor Deposition Chamber
App 20210292888 - Lavitsky; Ilya ; et al. | 2021-09-23 |
3d Printed Chamber Components Configured For Lower Film Stress And Lower Operating Temperature
App 20200365374 - NARENDRNATH; Kadthala R. ; et al. | 2020-11-19 |
3D printed chamber components configured for lower film stress and lower operating temperature
Grant 10,777,391 - Narendrnath , et al. Sept | 2020-09-15 |
Collimator for use in a physical vapor deposition chamber
Grant 10,697,057 - Yoshidome , et al. | 2020-06-30 |
Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers
Grant 10,563,304 - Xie , et al. Feb | 2020-02-18 |
Treatment And Doping Of Barrier Layers
App 20190385908 - Xie; Xiangjin ; et al. | 2019-12-19 |
Shield For A Substrate Processing Chamber
App 20190267220 - Scheible; Kathleen ; et al. | 2019-08-29 |
Holding assembly for substrate processing chamber
Grant 10,347,475 - Scheible , et al. July 9, 2 | 2019-07-09 |
Barrier Film Deposition And Treatment
App 20180294162 - XIE; XIANGJIN ; et al. | 2018-10-11 |
Collimator For Use In A Physical Vapor Deposition Chamber
App 20180142342 - YOSHIDOME; GOICHI ; et al. | 2018-05-24 |
Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes
Grant 9,831,075 - Yoshidome , et al. November 28, 2 | 2017-11-28 |
Self-centering process shield
Grant 9,644,262 - Hanson , et al. May 9, 2 | 2017-05-09 |
PVD target for self-centering process shield
Grant 9,534,286 - Yoshidome , et al. January 3, 2 | 2017-01-03 |
Selectively groundable cover ring for substrate process chambers
Grant 9,472,443 - Rasheed , et al. October 18, 2 | 2016-10-18 |
3d Printed Chamber Components Configured For Lower Film Stress And Lower Operating Temperature
App 20160233060 - NARENDRNATH; Kadthala R. ; et al. | 2016-08-11 |
Holding Assembly For Substrate Processing Chamber
App 20150380223 - Scheible; Kathleen ; et al. | 2015-12-31 |
Process kit and target for substrate processing chamber
Grant 9,127,362 - Scheible , et al. September 8, 2 | 2015-09-08 |
Cooling ring for physical vapor deposition chamber target
Grant 9,096,927 - West , et al. August 4, 2 | 2015-08-04 |
Source Magnet For Improved Resputtering Uniformity In Direct Current (dc) Physical Vapor Deposition (pvd) Processes
App 20150075982 - YOSHIDOME; GOICHI ; et al. | 2015-03-19 |
Selectively Groundable Cover Ring For Substrate Process Chambers
App 20140262763 - RASHEED; MUHAMMAD M. ; et al. | 2014-09-18 |
Pvd Target For Self-centering Process Shield
App 20140261180 - YOSHIDOME; GOICHI ; et al. | 2014-09-18 |
Self-centering Process Shield
App 20140261175 - HANSON; RYAN ; et al. | 2014-09-18 |
Sputtering of thermally resistive materials including metal chalcogenides
Grant 8,500,963 - Ye , et al. August 6, 2 | 2013-08-06 |
Cooling Ring For Physical Vapor Deposition Chamber Target
App 20130056347 - WEST; BRIAN ; et al. | 2013-03-07 |
Extended Life Textured Chamber Components And Method For Fabricating Same
App 20120258280 - Jackson; Michael ; et al. | 2012-10-11 |
Gap Fill Improvement Methods For Phase-change Materials
App 20120175245 - Ye; Mengqi ; et al. | 2012-07-12 |
Gap Fill Improvement Methods For Phase-change Materials
App 20100096255 - YE; MENGQI ; et al. | 2010-04-22 |
Mechanism for varying the spacing between sputter magnetron and target
Grant 7,674,360 - Hong , et al. March 9, 2 | 2010-03-09 |
Chalcogenide Target And Method
App 20090107834 - Ye; Mengqi ; et al. | 2009-04-30 |
Physical Vapor Deposition Chamber Having An Adjustable Target
App 20080116067 - Lavitsky; Ilya ; et al. | 2008-05-22 |
Sputtering Of Thermally Resistive Materials Including Metal Chalcogenides
App 20080099326 - YE; MENGQI ; et al. | 2008-05-01 |
Process Kit And Target For Substrate Processing Chamber
App 20070102286 - Scheible; Kathleen ; et al. | 2007-05-10 |
Physical vapor deposition chamber having an adjustable target
App 20060096851 - Lavitsky; Ilya ; et al. | 2006-05-11 |
Physical vapor deposition chamber having a rotatable substrate pedestal
App 20060096857 - Lavitsky; Ilya ; et al. | 2006-05-11 |
Compensation of spacing between magnetron and sputter target
App 20050133361 - Ding, Peijun ; et al. | 2005-06-23 |
Mechanism for varying the spacing between sputter magnetron and target
App 20050133365 - Hong, Ilyoung Richard ; et al. | 2005-06-23 |
| 