U.S. patent number D941,371 [Application Number D/728,820] was granted by the patent office on 2022-01-18 for process shield for a substrate processing chamber.
This patent grant is currently assigned to APPLIED MATERIALS, INC.. The grantee listed for this patent is APPLIED MATERIALS, INC.. Invention is credited to Ilya Lavitsky, Keith A Miller, Goichi Yoshidome.
United States Patent |
D941,371 |
Lavitsky , et al. |
January 18, 2022 |
Process shield for a substrate processing chamber
Claims
CLAIM The ornamental design for a process shield for a substrate
processing chamber, as shown and described.
Inventors: |
Lavitsky; Ilya (San Francisco,
CA), Miller; Keith A (Mountain View, CA), Yoshidome;
Goichi (Albany, CA) |
Applicant: |
Name |
City |
State |
Country |
Type |
APPLIED MATERIALS, INC. |
Santa Clara |
CA |
US |
|
|
Assignee: |
APPLIED MATERIALS, INC. (Santa
Clara, CA)
|
Appl.
No.: |
D/728,820 |
Filed: |
March 20, 2020 |
Current U.S.
Class: |
D15/138;
D13/182 |
Current International
Class: |
1509 |
Field of
Search: |
;D23/249,259,262,269
;D15/138,139,143,144,144.1,144.2,150,199
;D13/118,122,133,162,182,184,199 ;D22/113,119 |
References Cited
[Referenced By]
U.S. Patent Documents
Foreign Patent Documents
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D 1252261 |
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Oct 2005 |
|
JP |
|
D 1287922 |
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Apr 2006 |
|
JP |
|
D 1435220 |
|
Mar 2012 |
|
JP |
|
D 1646366 |
|
Nov 2019 |
|
JP |
|
D 30-0725455 |
|
Jan 2014 |
|
KR |
|
D 30-0725456 |
|
Jan 2014 |
|
KR |
|
D 30-1024426 |
|
Dec 2018 |
|
KR |
|
D 30-1064100 |
|
Sep 2019 |
|
KR |
|
D197825 |
|
Jun 2019 |
|
TW |
|
Other References
International Search Report for PCT/US2021/022445. dated Jun. 30,
2021. cited by applicant .
Search Report for Taiwan Design Application No. 109305253, dated
Jul. 29, 2020. cited by applicant.
|
Primary Examiner: Vansant; Calvin E
Assistant Examiner: Philipps; Mark T.
Attorney, Agent or Firm: Moser Taboada
Description
FIG. 1 is a top isometric view of a process shield for a substrate
processing chamber, according to the first embodiment of the novel
design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a left side elevation view thereof.
FIG. 5 is a right side elevation view thereof.
FIG. 6 is a rear elevation view thereof.
FIG. 7 is a front elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8' of FIG.
2.
FIG. 9 is a top isometric view of a process shield for a substrate
processing chamber, according to the second embodiment of the novel
design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a left side elevation view thereof.
FIG. 13 is a right side elevation view thereof.
FIG. 14 is a rear elevation view thereof.
FIG. 15 is a front elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16' of FIG.
10.
The dashed lines in FIGS. 1-16 represent unclaimed environment
forming no part of the claimed design.
* * * * *