Nabeya; Osamu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Nabeya; Osamu.The latest application filed is for "polishing head and polishing apparatus".

Company Profile

20.88.90

Nabeya; Osamu - Tokyo JP
Nabeya; Osamu - Ohta-ku JP
Nabeya; Osamu - Chigasaki JP
NABEYA; Osamu - Chigasaki-shi JP
Nabeya; Osamu - Kanagawa JP
Nabeya; Osamu - Kanagawa-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method Grant 11,426,834 - Miyazaki , et al. August 30, 2	2022-08-30
Polishing Head And Polishing Apparatus App 20220134506 - Kato; Yuichi ; et al.	2022-05-05
Information Processing System, Information Processing Method, Program, And Substrate Processing Apparatus App 20220093409 - Namiki; Keisuke ; et al.	2022-03-24
Substrate Holding Apparatus, Elastic Membrane, Polishing Apparatus, And Method For Replacing Elastic Membrane App 20220048157 - Nabeya; Osamu ; et al.	2022-02-17
Polishing apparatus Grant 11,224,956 - Nabeya , et al. January 18, 2	2022-01-18
Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane Grant 11,179,823 - Nabeya , et al. November 23, 2	2021-11-23
Elastic Membrane, Substrate Holding Device, And Polishing Apparatus App 20210335650 - Yamaki; Satoru ; et al.	2021-10-28
Elastic membrane, substrate holding device, and polishing apparatus Grant 11,088,011 - Yamaki , et al. August 10, 2	2021-08-10
Substrate Holding Apparatus, Substrate Suction Determination Method, Substrate Polishing Apparatus, Substrate Polishing Method, Method Of Removing Liquid From Upper Suface Of Wafer To Be Polished, Elastic Film For Pressing Wafer Against Polishing Pad, Substrate Release Method, And Constant Amount Ga App 20210217647 - Nabeya; Osamu ; et al.	2021-07-15
Polishing apparatus Grant 11,059,144 - Nabeya July 13, 2	2021-07-13
Substrate Holding Apparatus And Method Of Manufacturing A Drive Ring App 20210138606 - NAMIKI; Keisuke ; et al.	2021-05-13
Elastic membrane Grant D918,161 - Togashi , et al. May 4, 2	2021-05-04
Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount g Grant 10,991,613 - Nabeya , et al. April 27, 2	2021-04-27
Elastic membrane for semiconductor wafer polishing Grant D913,977 - Yamaki , et al. March 23, 2	2021-03-23
Method Of Detecting Abnormality Of A Roller Which Transmits A Local Load To A Retainer Ring, And Polishing Apparatus App 20210060723 - Owada; Tomoko ; et al.	2021-03-04
Polishing Apparatus App 20200361056 - Fukushima; Makoto ; et al.	2020-11-19
Polishing apparatus Grant 10,702,972 - Fukushima , et al.	2020-07-07
Polishing Apparatus And Method Of Controlling Inclination Of Stationary Ring App 20200206868 - Owada; Tomoko ; et al.	2020-07-02
Polishing Apparatus And Polishing Method App 20200206867 - Togashi; Shingo ; et al.	2020-07-02
Substrate Adsorption Method, Substrate Holding Apparatus, Substrate Polishing Apparatus, Elastic Film, Substrate Adsorption Dete App 20200094372 - SHINOZAKI; Hiroyuki ; et al.	2020-03-26
Substrate Holding Device, Substrate Polishing Apparatus, And Method Of Manufacturing The Substrate Holding Device App 20200047308 - Togashi; Shingo ; et al.	2020-02-13
Substrate Processing Apparatus, Substrate Processing Method, Substrate Holding Mechanism, And Substrate Holding Method App 20200047309 - Miyazaki; Mitsuru ; et al.	2020-02-13
Substrate Holding Apparatus, Substrate Suction Determination Method, Substrate Polishing Apparatus, Substrate Polishing Method, App 20200043773 - Nabeya; Osamu ; et al.	2020-02-06
Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control method for substrate holding apparatus Grant 10,537,975 - Shinozaki , et al. Ja	2020-01-21
Substrate Holding Apparatus, Substrate Polishing Apparatus, Elastic Member, And Manufacturing Method Of Substrate Holding Appara App 20190375070 - Nabeya; Osamu	2019-12-12
Substrate holding device, and substrate polishing apparatus Grant 10,486,284 - Togashi , et al. Nov	2019-11-26
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method Grant 10,486,285 - Miyazaki , et al. Nov	2019-11-26
Substrate polishing method, top ring, and substrate polishing apparatus Grant 10,464,185 - Isono , et al. No	2019-11-05
Substrate holding apparatus and polishing apparatus Grant 10,442,056 - Namiki , et al. Oc	2019-10-15
Elastic membrane for semiconductor wafer polishing Grant D859,332 - Yamaki , et al. Sept	2019-09-10
Polishing apparatus, control method and recording medium Grant 10,391,603 - Yamaki , et al. A	2019-08-27
Polishing Apparatus App 20190224808 - NABEYA; Osamu ; et al.	2019-07-25
Polishing apparatus Grant 10,293,455 - Nabeya , et al.	2019-05-21
Elastic membrane, substrate holding apparatus, and polishing apparatus Grant 10,213,896 - Fukushima , et al. Feb	2019-02-26
Elastic membrane for semiconductor wafer polishing Grant D839,224 - Yamaki , et al. Ja	2019-01-29
Elastic Membrane, Substrate Holding Device, And Polishing Apparatus App 20180301367 - YAMAKI; Satoru ; et al.	2018-10-18
Polishing apparatus, polishing head, and retainer ring Grant 10,092,992 - Yasuda , et al. October 9, 2	2018-10-09
Polishing apparatus Grant 10,040,166 - Nabeya , et al. August 7, 2	2018-08-07
Polishing device and polishing method Grant 9,999,956 - Namiki , et al. June 19, 2	2018-06-19
Substrate Holding Apparatus, Elastic Membrane, Polishing Apparatus, And Method For Replacing Elastic Membrane App 20180117730 - NABEYA; Osamu ; et al.	2018-05-03
Elastic membrane for semiconductor wafer polishing apparatus Grant D813,180 - Fukushima , et al. March 20, 2	2018-03-20
Polishing Apparatus App 20180065228 - NABEYA; Osamu	2018-03-08
Elastic membrane and substrate holding apparatus Grant 9,884,401 - Fukushima , et al. February 6, 2	2018-02-06
Elastic membrane for semiconductor wafer polishing apparatus Grant D808,349 - Fukushima , et al. January 23, 2	2018-01-23
Polishing apparatus and retainer ring configuration Grant 9,833,875 - Nabeya December 5, 2	2017-12-05
Substrate holder, polishing apparatus, polishing method, and retaining ring Grant 9,815,171 - Yamaki , et al. November 14, 2	2017-11-14
Substrate retaining ring Grant D799,437 - Nabeya , et al. October 10, 2	2017-10-10
Substrate Polishing Method, Top Ring, And Substrate Polishing Apparatus App 20170266779 - ISONO; Shintaro ; et al.	2017-09-21
Substrate Processing Apparatus, Substrate Processing Method, Substrate Holding Mechanism, And Substrate Holding Method App 20170252894 - MIYAZAKI; Mitsuru ; et al.	2017-09-07
Retainer ring for substrate Grant D794,585 - Nabeya , et al. August 15, 2	2017-08-15
Substrate retaining ring Grant D793,976 - Fukushima , et al. August 8, 2	2017-08-08
Polishing apparatus Grant 9,724,797 - Nabeya , et al. August 8, 2	2017-08-08
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method Grant 9,687,957 - Miyazaki , et al. June 27, 2	2017-06-27
Polishing Apparatus, Control Method And Recording Medium App 20170173756 - YAMAKI; Satoru ; et al.	2017-06-22
Polishing apparatus Grant 9,662,761 - Shinozaki , et al. May 30, 2	2017-05-30
Substrate holder, polishing apparatus, and polishing method Grant 9,662,764 - Fukushima , et al. May 30, 2	2017-05-30
Elastic Membrane, Substrate Holding Apparatus, And Polishing Apparatus App 20170144267 - FUKUSHIMA; Makoto ; et al.	2017-05-25
Substrate Holding Device, Substrate Polishing Apparatus, And Method Of Manufacturing The Substrate Holding Device App 20170106497 - Togashi; Shingo ; et al.	2017-04-20
Substrate Adsorption Method, Substrate Holding Apparatus, Substrate Polishing Apparatus, Elastic Film, Substrate Adsorption Determination Method For Substrate Holding Apparatus, And Pressure Control Method For Substrate Holding Apparatus App 20170050289 - SHINOZAKI; Hiroyuki ; et al.	2017-02-23
Elastic membrane, substrate holding apparatus, and polishing apparatus Grant 9,573,244 - Fukushima , et al. February 21, 2	2017-02-21
Substrate holding apparatus and polishing apparatus Grant 9,550,271 - Yasuda , et al. January 24, 2	2017-01-24
Polishing Apparatus, Polishing Head, And Retainer Ring App 20160368115 - YASUDA; Hozumi ; et al.	2016-12-22
Elastic membrane for semiconductor wafer polishing apparatus Grant D770,990 - Fukushima , et al. November 8, 2	2016-11-08
Elastic membrane for semiconductor wafer polishing apparatus Grant D769,200 - Fukushima , et al. October 18, 2	2016-10-18
Substrate retaining ring Grant D766,849 - Fukushima , et al. September 20, 2	2016-09-20
Polishing Apparatus App 20160250735 - NABEYA; Osamu ; et al.	2016-09-01
Polishing apparatus and polishing method Grant 9,403,255 - Fukushima , et al. August 2, 2	2016-08-02
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method Grant 9,358,662 - Miyazaki , et al. June 7, 2	2016-06-07
Polishing Apparatus App 20150328743 - NABEYA; Osamu	2015-11-19
Polishing Device And Polishing Method App 20150273650 - Namiki; Keisuke ; et al.	2015-10-01
Elastic Membrane, Substrate Holding Apparatus, And Polishing Apparatus App 20150273657 - FUKUSHIMA; Makoto ; et al.	2015-10-01
Substrate Holding Apparatus And Polishing Apparatus App 20150202733 - YASUDA; Hozumi ; et al.	2015-07-23
Polishing Apparatus App 20150151401 - Shinozaki; Hiroyuki ; et al.	2015-06-04
Elastic membrane for semiconductor wafer polishing Grant D729,753 - Fukushima , et al. May 19, 2	2015-05-19
Substrate Holder, Polishing Apparatus, Polishing Method, And Retaining Ring App 20150133038 - YAMAKI; Satoru ; et al.	2015-05-14
Substrate Processing Apparatus, Substrate Processing Method, Substrate Holding Mechanism, And Substrate Holding Method App 20150050863 - MIYAZAKI; Mitsuru ; et al.	2015-02-19
Polishing Apparatus App 20140370794 - FUKUSHIMA; Makoto ; et al.	2014-12-18
Polishing Apparatus App 20140357164 - NABEYA; Osamu ; et al.	2014-12-04
Polishing Apparatus App 20140329446 - NABEYA; Osamu ; et al.	2014-11-06
Elastic membrane Grant 8,859,070 - Yasuda , et al. October 14, 2	2014-10-14
Substrate Processing Apparatus, Substrate Processing Method, Substrate Holding Mechanism, And Substrate Holding Method App 20140302676 - MIYAZAKI; Mitsuru ; et al.	2014-10-09
Polishing Apparatus App 20140302754 - NABEYA; Osamu ; et al.	2014-10-09
Polishing apparatus Grant 8,845,396 - Nabeya , et al. September 30, 2	2014-09-30
Elastic membrane for semiconductor wafer polishing Grant D711,330 - Fukushima , et al. August 19, 2	2014-08-19
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method Grant 8,795,032 - Miyazaki , et al. August 5, 2	2014-08-05
Elastic Membrane And Substrate Holding Apparatus App 20140065934 - FUKUSHIMA; Makoto ; et al.	2014-03-06
Substrate Holding Apparatus And Polishing Apparatus App 20140004779 - Namiki; Keisuke ; et al.	2014-01-02
Polishing Apparatus And Polishing Method App 20130324012 - FUKUSHIMA; Makoto ; et al.	2013-12-05
Substrate Holder, Polishing Apparatus, And Polishing Method App 20130196573 - FUKUSHIMA; Makoto ; et al.	2013-08-01
Substrate holding apparatus, polishing apparatus, and polishing method Grant 8,485,866 - Yasuda , et al. July 16, 2	2013-07-16
Elastic Membrane App 20130136884 - YASUDA; Hozumi ; et al.	2013-05-30
Polishing method and polishing apparatus Grant 8,430,716 - Fukushima , et al. April 30, 2	2013-04-30
Polishing apparatus Grant 8,357,029 - Fukushima , et al. January 22, 2	2013-01-22
Substrate Holding Apparatus, Polishing Apparatus, And Polishing Method App 20120309277 - YASUDA; Hozumi ; et al.	2012-12-06
Substrate holding apparatus, polishing apparatus, and polishing method Grant 8,267,746 - Yasuda , et al. September 18, 2	2012-09-18
Polishing apparatus Grant 8,152,594 - Saito , et al. April 10, 2	2012-04-10
Polishing Apparatus App 20120071065 - NABEYA; Osamu ; et al.	2012-03-22
Method for regenerating ion exchanger Grant 8,133,380 - Saito , et al. March 13, 2	2012-03-13
Polishing apparatus Grant 8,100,743 - Nabeya , et al. January 24, 2	2012-01-24
Substrate holding apparatus, polishing apparatus, and polishing method Grant 8,100,739 - Yasuda , et al. January 24, 2	2012-01-24
Polishing apparatus Grant 8,083,571 - Nabeya , et al. December 27, 2	2011-12-27
Substrate holding apparatus and polishing apparatus Grant 7,988,537 - Togawa , et al. August 2, 2	2011-08-02
Substrate holding apparatus, polishing apparatus, and polishing method Grant 7,967,665 - Yasuda , et al. June 28, 2	2011-06-28
Elastic membrane for semiconductor wafer polishing apparatus Grant D634,719 - Yasuda , et al. March 22, 2	2011-03-22
Elastic membrane for semiconductor wafer polishing apparatus Grant D633,452 - Namiki , et al. March 1, 2	2011-03-01
Substrate holding apparatus and polishing apparatus Grant 7,867,063 - Togawa , et al. January 11, 2	2011-01-11
Substrate holding apparatus Grant 7,850,509 - Togawa , et al. December 14, 2	2010-12-14
Polishing Apparatus App 20100273405 - Fukushima; Makoto ; et al.	2010-10-28
Polishing Apparatus And Polishing Method App 20100151771 - Nabeya; Osamu	2010-06-17
Substrate Holding Apparatus And Polishing Apparatus App 20100056028 - TOGAWA; Tetsuji ; et al.	2010-03-04
Electrolytic processing apparatus and method Grant 7,655,118 - Shirakashi , et al. February 2, 2	2010-02-02
Electrolytic processing apparatus and electrolytic processing method Grant 7,638,030 - Nabeya , et al. December 29, 2	2009-12-29
Substrate holding device and polishing apparatus Grant 7,635,292 - Togawa , et al. December 22, 2	2009-12-22
Substrate holding apparatus and polishing apparatus Grant 7,632,173 - Togawa , et al. December 15, 2	2009-12-15
Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method App 20090305612 - Miyazaki; Mitsuru ; et al.	2009-12-10
Substrate holding apparatus and polishing apparatus App 20090233532 - Togawa; Tetsuji ; et al.	2009-09-17
Polishing method and polishing apparatus App 20090191791 - Fukushima; Makoto ; et al.	2009-07-30
Polishing apparatus App 20090191797 - NABEYA; Osamu ; et al.	2009-07-30
Composite processing apparatus and method Grant 7,563,356 - Nabeya , et al. July 21, 2	2009-07-21
Polishing Apparatus App 20090111362 - Nabeya; Osamu ; et al.	2009-04-30
Substrate holding apparatus App 20090061748 - TOGAWA; Tetsuji ; et al.	2009-03-05
Substrate holding apparatus Grant 7,491,117 - Togawa , et al. February 17, 2	2009-02-17
Method and device for regenerating ion exchanger, and electrolytic processing apparatus App 20080314763 - Saito; Takayuki ; et al.	2008-12-25
Substrate holding apparatus, polishing apparatus, and polishing method App 20080318499 - Yasuda; Hozumi ; et al.	2008-12-25
Substrate holding apparatus, polishing apparatus, and polishing method App 20080318492 - Yasuda; Hozumi ; et al.	2008-12-25
Substrate holding apparatus and polishing apparatus Grant 7,465,214 - Togawa , et al. December 16, 2	2008-12-16
Polishing apparatus App 20080287043 - Saito; Kenichiro ; et al.	2008-11-20
Method and device for regenerating ion exchanger, and electrolytic processing apparatus Grant 7,427,345 - Saito , et al. September 23, 2	2008-09-23
Substrate holding apparatus and polishing apparatus App 20080166957 - Togawa; Tetsuji ; et al.	2008-07-10
Substrate holding apparatus and polishing apparatus App 20080119121 - Togawa; Tetsuji ; et al.	2008-05-22
Substrate holding apparatus and polishing apparatus Grant 7,357,699 - Togawa , et al. April 15, 2	2008-04-15
Polishing apparatus and polishing method App 20080076335 - Nabeya; Osamu	2008-03-27
Polishing Apparatus App 20080070479 - Nabeya; Osamu ; et al.	2008-03-20
Substrate holding apparatus and polishing apparatus Grant 7,311,585 - Togawa , et al. December 25, 2	2007-12-25
Substrate Holding Device And Polishing Apparatus App 20070293129 - Togawa; Tetsuji ; et al.	2007-12-20
Substrate holding apparatus, polishing apparatus, and polishing method App 20070232193 - Yasuda; Hozumi ; et al.	2007-10-04
Polishing apparatus App 20070212988 - Nabeya; Osamu ; et al.	2007-09-13
Polishing apparatus and polishing method App 20070135020 - Nabeya; Osamu	2007-06-14
Polishing apparatus App 20070123154 - Nabeya; Osamu	2007-05-31
Substrate holding apparatus and polishing apparatus App 20070111637 - Togawa; Tetsuji ; et al.	2007-05-17
Polishing apparatus and method for detecting foreign matter on polishing surface Grant 7,207,862 - Nabeya , et al. April 24, 2	2007-04-24
Polishing method Grant 7,163,895 - Togawa , et al. January 16, 2	2007-01-16
Substrate polishing machine Grant 7,156,725 - Togawa , et al. January 2, 2	2007-01-02
Polishing apparatus Grant 7,140,955 - Nabeya November 28, 2	2006-11-28
Substrate holding apparatus App 20060234609 - Togawa; Tetsuji ; et al.	2006-10-19
Substrate holding apparatus and polishing apparatus Grant 7,108,592 - Fukaya , et al. September 19, 2	2006-09-19
Substrate holding apparatus and polishing apparatus App 20060199479 - Togawa; Tetsuji ; et al.	2006-09-07
Composite machining device and method App 20060175191 - Nabeya; Osamu ; et al.	2006-08-10
Substrate holding apparatus Grant 7,083,507 - Togawa , et al. August 1, 2	2006-08-01
Electrochemical machining device and electrochemical machining method App 20060144711 - Kobata; Itsuki ; et al.	2006-07-06
Polishing apparatus App 20060128286 - Nabeya; Osamu ; et al.	2006-06-15
Substrate holding apparatus and polishing apparatus App 20060099892 - Togawa; Tetsuji ; et al.	2006-05-11
Substrate holding device and polishing device Grant 7,033,260 - Togawa , et al. April 25, 2	2006-04-25
Polishing method App 20060079092 - Togawa; Tetsuji ; et al.	2006-04-13
Polishing apparatus and method for detecting foreign matter on polishing surface App 20050130562 - Nabeya, Osamu ; et al.	2005-06-16
Electrolytic processing apparatus and method App 20050121328 - Shirakashi, Mitsuhiko ; et al.	2005-06-09
Substrate holding apparatus App 20050118935 - Togawa, Tetsuji ; et al.	2005-06-02
Substrate holding device and polishing device App 20050107015 - Togawa, Tetsuji ; et al.	2005-05-19
Substrate holding apparatus and polishing apparatus App 20050028931 - Fukaya, Koichi ; et al.	2005-02-10
Substrate holding apparatus Grant 6,852,019 - Togawa , et al. February 8, 2	2005-02-08
Electrolytic processing apparatus and method App 20040256237 - Kobata, Itsuki ; et al.	2004-12-23
Substrate polishing machine App 20040209560 - Togawa, Tetsuji ; et al.	2004-10-21
Polishing method App 20040198011 - Togawa, Tetsuji ; et al.	2004-10-07
Polishing apparatus Grant 6,783,440 - Togawa , et al. August 31, 2	2004-08-31
Electrolytic processing apparatus and electrolytic processing method App 20040129569 - Nabeya, Osamu ; et al.	2004-07-08
Method and device for regenerating ion exchanger, and electrolytic processing apparatus App 20040112761 - Saito, Takayuki ; et al.	2004-06-17
Dressing apparatus and polishing apparatus Grant 6,609,962 - Wakabayashi , et al. August 26, 2	2003-08-26
Dressing apparatus and polishing apparatus Grant 6,607,427 - Togawa , et al. August 19, 2	2003-08-19
Polishing apparatus App 20020187735 - Nabeya, Osamu	2002-12-12
Dressing apparatus and polishing apparatus App 20020086623 - Togawa, Tetsuji ; et al.	2002-07-04
Substrate holding apparatus App 20020042246 - Togawa, Tetsuji ; et al.	2002-04-11
Polishing apparatus App 20020006772 - Togawa, Tetsuji ; et al.	2002-01-17