Liner for plasma processing apparatus

Description

FIG. 1 is a front view of a liner for plasma processing apparatus showing our new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a left side view thereof;

FIG. 7 is a sectional view taken along line 7-7 of FIG. 3 thereof; and,

FIG. 8 is a perspective view thereof.

Claims

CLAIM The ornamental design for a liner for plasma processing apparatus, as shown and described.

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Inventors:	Suzuki; Kouki (Nirasaki, JP), Toriya; Daisuke (Nirasaki, JP), Yamazaki; Koichi (Nirasaki, JP)
Assignee:	Tokyo Electron Limited (Tokyo, JP)
Appl. No.:	D/401,103
Filed:	September 7, 2011

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Foreign Application Priority Data

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Mar 30, 2011 [JP]			2011-007262

Current U.S. Class:	D15/138
Current International Class:	1509
Field of Search:	;D7/501,553.6,586,587,600.4 ;D8/70,74 ;D9/445,454,456 ;D15/133,138,144.1,199 ;118/697,715,719 ;148/222 ;156/345.29,345.33,345.38,345.41,345.42,345.43,345.46 ;205/50 ;216/67,69,70 ;219/121.36,121.43 ;423/335 ;427/569,575 ;438/439,772,777,786

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References Cited [Referenced By]

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Primary Examiner: Palasik; Patricia
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.