loadpatents
Patent applications and USPTO patent grants for Suzuki; Kouki.The latest application filed is for "substrate holder and film forming apparatus".
Patent | Date |
---|---|
Substrate holder and film forming apparatus Grant 11,396,704 - Fujisato , et al. July 26, 2 | 2022-07-26 |
Substrate Holder and Film Forming Apparatus App 20200165723 - FUJISATO; Toshiaki ;   et al. | 2020-05-28 |
Wireless communication system, communication method, base station, and mobile terminal Grant 9,510,249 - Suzuki , et al. November 29, 2 | 2016-11-29 |
Wireless Communication System, Communication Method, Base Station, And Communication Terminal App 20150050941 - Sawada; Shinichi ;   et al. | 2015-02-19 |
Wireless Communication System, Communication Method, Base Station, And Mobile Terminal App 20150030000 - Suzuki; Kouki ;   et al. | 2015-01-29 |
Chamber block Grant D678,228 - Suzuki , et al. March 19, 2 | 2013-03-19 |
Liner for plasma processing apparatus Grant D658,691 - Suzuki , et al. May 1, 2 | 2012-05-01 |
Liner for plasma processing apparatus Grant D658,693 - Suzuki , et al. May 1, 2 | 2012-05-01 |
Liner for plasma processing apparatus Grant D658,692 - Suzuki , et al. May 1, 2 | 2012-05-01 |
Substrate processing apparatus and substrate rotating device Grant 7,842,229 - Tanaka , et al. November 30, 2 | 2010-11-30 |
Heat treatment apparatus Grant 7,769,279 - Tanaka , et al. August 3, 2 | 2010-08-03 |
Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system Grant 7,592,261 - Ueda , et al. September 22, 2 | 2009-09-22 |
Substrate Processing Apparatus and Substrate Rotating Device App 20080042328 - Tanaka; Sumi ;   et al. | 2008-02-21 |
Heat-treating Apparatus App 20080011734 - TANAKA; Sumi ;   et al. | 2008-01-17 |
Heat treatment apparatus Grant 7,250,094 - Tanaka , et al. July 31, 2 | 2007-07-31 |
Heat-treating apparatus App 20060124060 - Tanaka; Sumi ;   et al. | 2006-06-15 |
Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system App 20050146277 - Ueda, Takehiro ;   et al. | 2005-07-07 |
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