U.S. patent application number 13/343805 was filed with the patent office on 2013-07-11 for finfet device.
This patent application is currently assigned to INTERNATIONAL BUSINESS MACHINES CORPORATION. The applicant listed for this patent is Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Theodorus E. Standaert, Tenko Yamashita. Invention is credited to Kangguo Cheng, Balasubramanian S. Haran, Shom Ponoth, Theodorus E. Standaert, Tenko Yamashita.
Application Number | 20130175618 13/343805 |
Document ID | / |
Family ID | 48743342 |
Filed Date | 2013-07-11 |
United States Patent
Application |
20130175618 |
Kind Code |
A1 |
Cheng; Kangguo ; et
al. |
July 11, 2013 |
FINFET DEVICE
Abstract
A method for fabricating a field effect transistor device
includes removing a portion of a first semiconductor layer and a
first insulator layer to expose a portion of a second semiconductor
layer, wherein the second semiconductor layer is disposed on a
second insulator layer, the first insulator layer is disposed on
the second semiconductor layer, and the first semiconductor layer
is disposed on the first insulator layer, removing portions of the
first semiconductor layer to form a first fin disposed on the first
insulator layer and removing portions of the second semiconductor
layer to form a second fin disposed on the second insulator layer,
and forming a first gate stack over a portion of the first fin and
forming a second gate stack over a portion of the second fin.
Inventors: |
Cheng; Kangguo;
(Schenectady, NY) ; Haran; Balasubramanian S.;
(Watervliet, NY) ; Ponoth; Shom; (Clifton Park,
NY) ; Standaert; Theodorus E.; (Clifton Park, NY)
; Yamashita; Tenko; (Schenectady, NY) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Cheng; Kangguo
Haran; Balasubramanian S.
Ponoth; Shom
Standaert; Theodorus E.
Yamashita; Tenko |
Schenectady
Watervliet
Clifton Park
Clifton Park
Schenectady |
NY
NY
NY
NY
NY |
US
US
US
US
US |
|
|
Assignee: |
INTERNATIONAL BUSINESS MACHINES
CORPORATION
Armonk
NY
|
Family ID: |
48743342 |
Appl. No.: |
13/343805 |
Filed: |
January 5, 2012 |
Current U.S.
Class: |
257/347 ;
257/E21.09; 257/E21.19; 257/E27.06; 438/478; 438/585 |
Current CPC
Class: |
H01L 21/823431 20130101;
H01L 21/823821 20130101; H01L 21/845 20130101; H01L 21/28008
20130101; H01L 27/1211 20130101; H01L 27/0886 20130101; H01L 29/045
20130101 |
Class at
Publication: |
257/347 ;
438/585; 438/478; 257/E21.19; 257/E21.09; 257/E27.06 |
International
Class: |
H01L 27/088 20060101
H01L027/088; H01L 21/20 20060101 H01L021/20; H01L 21/28 20060101
H01L021/28 |
Claims
1. A method for fabricating a field effect transistor device, the
method comprising: removing a portion of a first semiconductor
layer and a first insulator layer to expose a portion of a second
semiconductor layer, wherein the second semiconductor layer is
disposed on a second insulator layer, the first insulator layer is
disposed on the second semiconductor layer, and the first
semiconductor layer is disposed on the first insulator layer;
removing portions of the first semiconductor layer to form a first
fin disposed on the first insulator layer and removing portions of
the second semiconductor layer to form a second fin disposed on the
second insulator layer; and forming a first gate stack over a
portion of the first fin and forming a second gate stack over a
portion of the second fin.
2. The method of claim 1, wherein the removing portions of the
first semiconductor layer to form the first fin disposed on the
first insulator layer and removing portions of the second
semiconductor layer to form the second fin disposed on the second
insulator layer comprises: depositing a hardmask layer over exposed
portions of the first semiconductor layer and the second
semiconductor layer; removing portions of the hardmask layer to
expose portions of the first semiconductor layer and the second
semiconductor layer; and removing exposed portions of the first
semiconductor layer and the second semiconductor layer.
3. The method of claim 2, further comprising removing exposed
portions of the hardmask layer following the removing the exposed
portions of the first semiconductor layer and the second
semiconductor layer.
4. The method of claim 1, wherein the forming the first gate stack
over the portion of the first fin and forming the second gate stack
over the portion of the second fin comprises: depositing a
dielectric layer over exposed portions of the first insulator
layer, the first fin, the second insulator layer, and the second
fin; depositing a gate conductor layer over the dielectric layer;
patterning a mask over portions of the gate conductor layer; and
removing exposed portions of the gate conductor layer and the
dielectric layer.
5. The method of claim 4, further comprising performing a
planarization process on the gate conductor layer prior to
patterning the mask over portions of the gate conductor layer.
6. The method of claim 1, wherein the first semiconductor layer is
arranged with a first crystalline orientation, and the second
semiconductor layer is arranged with a second crystalline
orientation, the first crystalline orientation is dissimilar from
the second crystalline orientation.
7. The method of claim 1, wherein the first semiconductor layer is
dissimilar from the second semiconductor layer.
8. A method for fabricating a field effect transistor device, the
method comprising: removing a portion of a first semiconductor
layer and a first insulator layer to expose a portion of a second
semiconductor layer, wherein the second semiconductor layer is
disposed on a second insulator layer, the first insulator layer is
disposed on the second semiconductor layer, and the first
semiconductor layer is disposed on the first insulator layer;
forming a spacer on a portion of the first semiconductor layer,
adjacent to the first insulator layer, and the first semiconductor
layer; growing a layer of epitaxial semiconductor material on
exposed portions of the second semiconductor layer; removing
portions of the first semiconductor layer to form a first fin
disposed on the first insulator layer, and removing portions of the
layer of epitaxial semiconductor material and the second
semiconductor layer to form a second fin disposed on the second
insulator layer; and forming a first gate stack over a portion of
the first fin and forming a second gate stack over a portion of the
second fin.
9. The method of claim 8, wherein the removing portions of the
first semiconductor layer to form the first fin disposed on the
first insulator layer and removing portions of the second
semiconductor layer to form the second fin disposed on the second
insulator layer comprises: depositing a hardmask layer over exposed
portions of the first semiconductor layer and the second
semiconductor layer; removing portions of the hardmask layer to
expose portions of the first semiconductor layer and the second
semiconductor layer; and removing exposed portions of the first
semiconductor layer and the second semiconductor layer.
10. The method of claim 9, further comprising removing exposed
portions of the hardmask layer following the removing the exposed
portions of the first semiconductor layer and the second
semiconductor layer.
11. The method of claim 8, wherein the forming the first gate stack
over the portion of the first fin and forming the second gate stack
over the portion of the second fin comprises: depositing a
dielectric layer over exposed portions of the first insulator
layer, the first fin, the second insulator layer, and the second
fin; depositing a gate conductor layer over the dielectric layer;
patterning a mask over portions of the gate conductor layer; and
removing exposed portions of the gate conductor layer and the
dielectric layer.
12. The method of claim 9, wherein the forming the first gate stack
over the portion of the first fin and forming the second gate stack
over the portion of the second fin comprises: depositing a
dielectric layer over exposed portions of the first insulator
layer, the first fin, the second insulator layer, the second fin,
and the hardmask layer; depositing a gate conductor layer over the
dielectric layer; patterning a mask over portions of the gate
conductor layer; and removing exposed portions of the gate
conductor layer and the dielectric layer.
13. The method of claim 11, further comprising performing a
planarization process on the gate conductor layer prior to
patterning the mask over portions of the gate conductor layer.
14. The method of claim 12, further comprising performing a
planarization process on the gate conductor layer prior to
patterning the mask over portions of the gate conductor layer.
15. The method of claim 8, further comprising: patterning a masking
material over portions of the first semiconductor layer prior to
removing the portion of the first semiconductor layer and the first
insulator layer; and removing the masking material following
growing the layer of epitaxial semiconductor material.
16. A field effect transistor device comprising: a substrate; a
first insulator layer disposed on the substrate; a semiconductor
layer disposed on the first insulator layer; a second insulator
layer disposed on the semiconductor layer; a first finFET device
disposed on the first insulator layer; and a second finFET device
disposed on the second insulator layer.
17. The device of claim 16, wherein the first finFet device
includes a fin including a first semiconductor material and a gate
portion arranged substantially perpendicular to the fin, the second
finFet device includes a fin including a second semiconductor
material and a gate portion arranged substantially perpendicular to
the fin, and the semiconductor layer includes the first
semiconductor material, wherein the fin of the first finFet device
is substantially parallel to the fin of the second finFet
device.
18. The device of claim 17, wherein the first semiconductor
material is arranged with a first crystalline orientation, and the
second semiconductor material is arranged with a second crystalline
orientation, the first crystalline orientation is dissimilar from
the second crystalline orientation.
19. The device of claim 17, wherein a height of the fin of the
first finFet device is substantially similar to a height of the fin
of the second finFet device.
20. The device of claim 17, wherein a height of the fin of the
first finFet device is substantially dissimilar to a height of the
fin of the second finFet device.
Description
FIELD OF INVENTION
[0001] The present invention relates generally to field effect
transistor devices, and more specifically, to finFET devices.
DESCRIPTION OF RELATED ART
[0002] Field effect transistor (FET) devices may be fabricated
using fins that may define channel regions and source/drain and
extensions of the FET device. Such finFET devices are often
fabricated from a crystalline material such as, for example,
silicon or germanium, that is disposed on an insulator layer. The
crystalline material has a crystalline orientation that may be
defined by Miller indices. The orientation of the fins relative to
the crystalline orientation of the crystalline material, or the
type of crystalline material used to fabricate the fins may affect
the performance of the devices depending on the type of device that
is fabricated. For example, nFET devices tend to have desirable
performance characteristics (e.g., mobility) when the fin is formed
on a crystalline surface having a (100) orientation while pFET
devices tend to have desirable performance characteristics when
formed on a surface having a (110) orientation. The use of
different materials, regardless of crystalline orientation, may
also result in desirable performance characteristics for nFET and
pFET devices.
BRIEF SUMMARY
[0003] According to one embodiment of the present invention, a
method for fabricating a field effect transistor device includes
removing a portion of a first semiconductor layer and a first
insulator layer to expose a portion of a second semiconductor
layer, wherein the second semiconductor layer is disposed on a
second insulator layer, the first insulator layer is disposed on
the second semiconductor layer, and the first semiconductor layer
is disposed on the first insulator layer, removing portions of the
first semiconductor layer to form a first fin disposed on the first
insulator layer and removing portions of the second semiconductor
layer to form a second fin disposed on the second insulator layer,
and forming a first gate stack over a portion of the first fin and
forming a second gate stack over a portion of the second fin.
[0004] According to another embodiment of the present invention,
method for fabricating a field effect transistor device includes
removing a portion of a first semiconductor layer and a first
insulator layer to expose a portion of a second semiconductor
layer, wherein the second semiconductor layer is disposed on a
second insulator layer, the first insulator layer is disposed on
the second semiconductor layer, and the first semiconductor layer
is disposed on the first insulator layer, forming a spacer on a
portion of the first semiconductor layer, adjacent to the first
insulator layer, and the first semiconductor layer, growing a layer
of epitaxial semiconductor material on exposed portions of the
second semiconductor layer, removing portions of the first
semiconductor layer to form a first fin disposed on the first
insulator layer, and removing portions of the layer of epitaxial
semiconductor material and the second semiconductor layer to form a
second fin disposed on the second insulator layer, and forming a
first gate stack over a portion of the first fin and forming a
second gate stack over a portion of the second fin.
[0005] According to yet another embodiment of the present
invention, a field effect transistor device includes a substrate, a
first insulator layer disposed on the substrate, a semiconductor
layer disposed on the first insulator layer, a second insulator
layer disposed on the semiconductor layer, a first finFET device
disposed on the first insulator layer, and a second finFET device
disposed on the second insulator layer.
[0006] Additional features and advantages are realized through the
techniques of the present invention. Other embodiments and aspects
of the invention are described in detail herein and are considered
a part of the claimed invention. For a better understanding of the
invention with the advantages and the features, refer to the
description and to the drawings.
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS
[0007] The subject matter which is regarded as the invention is
particularly pointed out and distinctly claimed in the claims at
the conclusion of the specification. The forgoing and other
features, and advantages of the invention are apparent from the
following detailed description taken in conjunction with the
accompanying drawings in which:
[0008] FIGS. 1-6 illustrate an exemplary method for fabricating an
exemplary embodiment of a finFET device, in this regard:
[0009] FIG. 1 illustrates a side cut away view of a semiconductor
on insulator (SOI) wafer;
[0010] FIG. 2 illustrates the resultant structure following the
patterning of a lithographic mask;
[0011] FIG. 3 illustrates the formation of a hardmask layer;
[0012] FIG. 4 illustrates the resultant structure following an
etching process;
[0013] FIG. 5 illustrates a top view following the removal of the
hardmask layer and the patterning of a first gate stack and a
second gate stack; and
[0014] FIG. 6 illustrates a side-cut away view along the line 6 of
FIG. 5.
[0015] FIG. 7 illustrates an alternate exemplary embodiment of
finFET devices.
[0016] FIGS. 8-9 illustrate an alternate fabrication method and
resultant structure for finFET devices, in this regard:
[0017] FIG. 8 illustrates a top view following the patterning of
gate stacks; and
[0018] FIG. 9 illustrates a side cut away view along the line 9 of
FIG. 8.
[0019] FIG. 10 illustrates an alternate exemplary embodiment of
finFET devices.
[0020] FIGS. 11-13 illustrate an alternate fabrication method and
resultant structure of finFET devices, in this regard:
[0021] FIG. 11 illustrates the formation of a spacer;
[0022] FIG. 12 illustrates the epitaxial growth of semiconductor
material; and
[0023] FIG. 13 illustrates the resultant structure following the
patterning of fins and gate stacks.
[0024] FIG. 14 illustrates an alternate embodiment of a resultant
finFET device with a hardmask layer.
DETAILED DESCRIPTION
[0025] A finFET semiconductor device is a field effect transistor
in which the body of the field effect transistor that contains the
channel is present in a fin structure. As used herein, a "fin
structure" refers to a semiconductor material, which is employed as
the body of a semiconductor device, in which the gate structure is
positioned around the fin structure such that charge flows down the
channel on the two sidewalls of the fin structure and optionally
along the top surface of the fin structure.
[0026] It may be desirable to form finFet devices on a substrate
that include different materials or similar materials having
different crystalline orientations used to form the fins. For
example, it may be desirable to form an n-FET device with fins
formed from a crystalline material, such as, for example, Si, Ge,
or SiGe having a (100) Miller indices orientation, while it may be
desirable to form a p-FET device with fins formed from a
crystalline material having a different orientation, such as, for
example (110). Such orientations for the respective devices may
improve the performance characteristics (e.g., charge mobility) of
the respective devices. Alternatively, different types of
semiconductor materials, such as, for example, Si, Ge, SiGe or
III-V type materials may be used to form finFET devices on a
substrate, with or without consideration of the crystalline
orientation of the different semiconductor materials used for the
respective devices. The methods described below include methods for
fabricating finFET devices on a substrate, where the fins are
formed from similar materials having different crystalline
orientations, from different materials, or from different materials
having different crystalline orientations.
[0027] FIGS. 1-6 illustrate an exemplary method for fabricating an
exemplary embodiment of a finFET device. Referring to FIG. 1, a
side cut away view of a semiconductor on insulator (SOI) wafer 101
is shown that includes a substrate layer 100 with a second
insulator layer 102 disposed on the substrate layer 100. A second
semiconductor layer 104 is disposed on the second insulator layer
102. A first insulator layer 106 is disposed on the second
semiconductor layer 104, and a first semiconductor layer 108 is
disposed on the first insulator layer 106. The substrate layer 100
may include, for example, a silicon material. The first and second
insulator layers 106 and 102 may include, for example, a buried
oxide (BOX) or other insulating material such as, for example,
silicon oxide, silicon nitride, silicon oxynitride, high-k
materials, or any combination of these materials. Examples of
high-k materials include, but are not limited to, metal oxides such
as hafnium oxide, hafnium silicon oxide, hafnium silicon
oxynitride, lanthanum oxide, lanthanum aluminum oxide, zirconium
oxide, zirconium silicon oxide, zirconium silicon oxynitride,
tantalum oxide, titanium oxide, barium strontium titanium oxide,
barium titanium oxide, strontium titanium oxide, yttrium oxide,
aluminum oxide, lead scandium tantalum oxide, and lead zinc
niobate.
[0028] The SOI wafer 101 may be formed utilizing standard processes
including for example, SIMOX (separation by ion implantation of
oxygen), wafer bonding and layer transfer, or combination of those
techniques. When a layer transfer process is employed, an optional
thinning step may follow the bonding of two semiconductor wafers
together. The optional thinning step reduces the thickness of the
semiconductor layer to a layer having a thickness that is more
desirable.
[0029] The second semiconductor layer 104 and the first
semiconductor layer 108 may include any type of semiconductor
material such as, for example, Si, Ge, SiGe, type III-V materials,
and/or type II-VI materials. The second semiconductor layer 104 and
the first semiconductor layer 108 may be similar materials having
different crystalline orientations, different materials having
similar crystalline orientations, or different materials having
different crystalline orientations, or similar materials having
similar crystalline orientations. In the illustrated exemplary
embodiment, the second semiconductor layer 104 is formed from a
semiconductor material having a (110) (using Miller index notation)
crystalline orientation while the first semiconductor layer 108 is
formed from a semiconductor material having a (100) crystalline
orientation.
[0030] FIG. 2 illustrates the resultant structure following the
patterning of a lithographic mask 202 over a portion of the first
semiconductor layer 108. Following the patterning of the
lithographic mask 202, exposed portions of the first semiconductor
layer 108 and the first insulator layer 106 are removed using a
suitable etching process. Suitable etching processes may include,
for example, a dry etching process, a reactive ion etching (RIE)
process, or a wet etching process. The lithographic mask 202 may
include a softmask material such as photoresist, a hardmask
material such as silicon nitride, or a combination of so ftmask and
hardmask.
[0031] FIG. 3 illustrates the formation of a hardmask layer 302
over exposed portions of the second semiconductor layer 104 and the
first semiconductor layer 108. Once, the lithographic mask 202 (of
FIG. 2) has been removed, the hardmask layer 302 may be formed by,
for example, a spin-on deposition, chemical vapor deposition (CVD),
or plasma enhanced chemical vapor deposition (PECVD) process, and
may include silicon nitride, silicon oxide, silicon oxynitride,
amorphous carbon, or any suitable combination of those materials.
The hardmask layer 302 may include a single layer of material or
multiple layers of materials. Following the formation of the
hardmask layer 302, a lithographic mask 304 is patterned on
portions of the hardmask layer 302. The exposed portions of the
hardmask layer 302 may be removed by an etching process to expose
portions of the second semiconductor layer 104 and the first
semiconductor layer 108.
[0032] FIG. 4 illustrates the resultant structure following an
etching process such as, for example, RIE or sidewall image
transfer, that removes exposed portions of the second semiconductor
layer 104 and the first semiconductor layer 108 (of FIG. 3) to
pattern a second fin 404 and a first fin 408, where the second fin
404 is disposed on the second insulator layer 102, and the first
fin 408 is disposed on the first insulator layer 106.
[0033] FIG. 5 illustrates a top view following the removal of the
hardmask layer 302 (of FIG. 4) and the patterning of a second gate
stack 501 having a gate conductor 504 patterned over the second fin
404 and a portion of the second insulator layer 102, and a first
gate stack 503 having a gate conductor 502 patterned over the first
fin 408 and a portion of the first insulator layer 106. In one
embodiment, the first fin 408 and the second fin 404 are
substantially parallel. In one embodiment, the first gate stack 503
and the second gate stack 501 are oriented in a substantially the
same direction. Having all fins oriented in the same direction and
all gates oriented in another same direction greatly eases the
device design and fabrication.
[0034] FIG. 6 illustrates a side-cut away view along the line 6 (of
FIG. 5). The first and second gate stacks 501, 503 include a gate
dielectric layer 602 disposed on portions of the second fin 404 and
first fin 408, respectively, and the gate conductor 502 and 504 is
patterned on the dielectric layer 602. Although shown in FIG. 6
that the first and the second gate stacks have the same dielectric
layer 602, it is also conceived that the first and the second gate
stacks may have different dielectric layer to achieve different
device characteristics. The gate conductor 502 and 504 may comprise
the same or different materials.
[0035] The gate dielectric may include silicon oxide, silicon
nitride, silicon oxynitride, high-k materials, or any combination
of these materials. Examples of high-k materials include but are
not limited to metal oxides such as hafnium oxide, hafnium silicon
oxide, hafnium silicon oxynitride, lanthanum oxide, lanthanum
aluminum oxide, zirconium oxide, zirconium silicon oxide, zirconium
silicon oxynitride, tantalum oxide, titanium oxide, barium
strontium titanium oxide, barium titanium oxide, strontium titanium
oxide, yttrium oxide, aluminum oxide, lead scandium tantalum oxide,
and lead zinc niobate. The high-k may further include dopants such
as lanthanum, aluminum.
[0036] The gate conductor material may include polycrystalline or
amorphous silicon, germanium, silicon germanium, a metal (e.g.,
tungsten, titanium, tantalum, ruthenium, zirconium, cobalt, copper,
aluminum, lead, platinum, tin, silver, gold), a conducting metallic
compound material (e.g., tantalum nitride, titanium nitride,
tungsten silicide, tungsten nitride, ruthenium oxide, cobalt
silicide, nickel silicide), carbon nanotube, conductive carbon, or
any suitable combination of these materials. The conductive
material may further comprise dopants that are incorporated during
or after deposition.
[0037] FIG. 7 illustrates an alternate exemplary embodiment, where
following the deposition of the gate conductor material layer, and
prior to patterning the gate stacks 501 and 503, a planarization
process such as, for example, chemical mechanical polishing (CMP)
is performed on the gate conductor material layer. Following the
planarization process, the gate stacks 501 and 503 are patterned
using, for example, a lithographic and etching process. The
resultant structure includes gate stacks 503 and 501 having
substantially coplanar top surfaces 701 and 703.
[0038] Following the patterning of the gate stacks 501 and 503 as
described above, spacers may be formed adjacent to the gate stacks
501 and 503 and over portions of the fins 404 and 408. Source/drain
and extensions may be formed in the exposed fins 404 and 408 by any
suitable doping process, such as, for example, ion implantation,
gas phase doping, in-situ doped epitaxy growth, solid phase doping,
plasma doping, and any suitable combination of those techniques.
The dopants may include any suitable or desired n-type or p-type
dopants or combination of dopants. The fins 404 and 408 may be
doped with different types of dopants such that, for example, the
fin 404 and gate stack 501 become a pFET device, while the fin 408
and gate stack 503 become an nFET device. Alternatively, the fin
404 and gate stack 501 become an nFET device, while the fin 408 and
gate stack 503 become a pFET device. The different dopants may be
implanted using, for example, a succession of masking and
implantation processes, and/or an angled ion implantation process.
In an alternative embodiment, the fins 404 and 408 may be doped
with same types of dopants but different amount of dopants such
that both finFETs have the same device type but different device
characteristics such as different threshold voltages. In some
embodiments, the portion of under the gate stack may also be doped
to adjust device characteristics. Neither, one, or both fins may be
doped. Epitaxy growth (not shown) may be performed to thicken fins
in the source/drain to reduce source/drain resistance. Another
purpose of the epitaxy growth may be to merge source/drain of
adjacent multiple finFETs to handle high electrical current.
[0039] Following the ion implantation process, annealing and the
formation of a silicide (not shown) over Source/drain and
extensions of the devices may be performed. A capping layer (not
shown) and conductive contacts (not shown) may also be formed
following salicidation (self-aligned silicidation).
[0040] FIGS. 8-9 illustrate an alternate fabrication method and
resultant structure for finFET devices. In this regard, the methods
described above in FIGS. 1-4 have been performed such that the fins
404 and 408 with the hardmask layer 302 disposed on the fins 404
and 408 have been formed. FIG. 8 illustrates a top view following
the patterning of gate stacks 501 and 503 over portions of the
second insulator layer 102 and the first insulator layer 106, and
the second fin 404 and the first fin 408 respectively.
[0041] FIG. 9 illustrates a side cut away view along the line 9 (of
FIG. 8). The dielectric layer 602 has been patterned over the
second fin 404 and the first fin 408, and the hardmask layer 302.
The gate conductors 502 and 504 have been patterned over the
dielectric layer 602 in a similar manner as described above.
[0042] FIG. 10 illustrates an alternate exemplary embodiment, where
following the deposition of the gate conductor material layer, and
prior to patterning the gate stacks 501 and 503, a planarization
process such as, for example, chemical mechanical polishing (CMP)
is performed on the gate conductor material layer. Following the
planarization process, the gate stacks 501 and 503 are patterned
using, for example, a lithographic and etching process. The
resultant structure includes gate stacks 501 and 503 having
substantially coplanar top surfaces 701 and 703.
[0043] FIGS. 11-13 illustrate an alternate fabrication method and
resultant structure of finFET devices. In this regard, the methods
described above in FIGS. 1-2 have been performed. Referring to FIG.
11, following the removal of portions of the second insulating
layer 106 and the first semiconductor layer 108, a spacer 1102 is
formed on the second semiconductor layer 104, adjacent to the
second insulating layer 106, and the first semiconductor layer 108.
The spacer may include, for example, a nitride or oxide material,
and may be formed by, for example, a conformal deposition process
such as, a CVD, or PECVD, followed by an etching process, such as,
an anisotropic etching process.
[0044] FIG. 12 illustrates the resultant structure following the
epitaxial growth of semiconductor material 1202 that is seeded by
exposed portions of the second semiconductor layer 104. In the
illustrated embodiment the epitaxially grown semiconductor material
1202 is a material similar to the second semiconductor layer 104
and has a similar crystalline orientation.
[0045] FIG. 13 illustrates the resultant structure following the
removal of the lithographic mask 202, the spacer 1102, and the
hardmask layer 302 (not shown), and the patterning of the fins 404
and 408 and the gate stacks 501 and 503 using similar methods as
described above.
[0046] FIG. 14 illustrates an alternate embodiment of a resultant
structure following the removal of the lithographic mask 202 and
the spacer 1102 and the patterning of the fins 404 and 408 and the
gate stacks 501 and 503 using similar methods as described above,
however the hardmask layer 302 has not been removed prior to the
patterning of the fins 404 and 408 and the gate stacks 501 and
503.
[0047] Though the illustrated exemplary methods and embodiments
described above illustrate the formation of two fins and gate stack
arrangements, one of ordinary skill in the art would understand
that any number of finFET devices may be fabricated on each of the
insulator layers 102 and 106 using similar methods as described
above.
[0048] The described exemplary methods and embodiments provide for
finFETs having fins with different materials and/or different
crystalline orientations to be fabricated on an SOI wafer.
[0049] The terminology used herein is for the purpose of describing
particular embodiments only and is not intended to be limiting of
the invention. As used herein, the singular forms "a", "an" and
"the" are intended to include the plural forms as well, unless the
context clearly indicates otherwise. It will be further understood
that the terms "comprises" and/or "comprising," when used in this
specification, specify the presence of stated features, integers,
steps, operations, elements, and/or components, but do not preclude
the presence or addition of one or more other features, integers,
steps, operations, element components, and/or groups thereof.
[0050] The corresponding structures, materials, acts, and
equivalents of all means or step plus function elements in the
claims below are intended to include any structure, material, or
act for performing the function in combination with other claimed
elements as specifically claimed. The description of the present
invention has been presented for purposes of illustration and
description, but is not intended to be exhaustive or limited to the
invention in the form disclosed. Many modifications and variations
will be apparent to those of ordinary skill in the art without
departing from the scope and spirit of the invention. The
embodiment was chosen and described in order to best explain the
principles of the invention and the practical application, and to
enable others of ordinary skill in the art to understand the
invention for various embodiments with various modifications as are
suited to the particular use contemplated.
[0051] The diagrams depicted herein are just one example. There may
be many variations to this diagram or the steps (or operations)
described therein without departing from the spirit of the
invention. For instance, the steps may be performed in a differing
order or steps may be added, deleted or modified. All of these
variations are considered a part of the claimed invention.
[0052] While the preferred embodiment to the invention had been
described, it will be understood that those skilled in the art,
both now and in the future, may make various improvements and
enhancements which fall within the scope of the claims which
follow. These claims should be construed to maintain the proper
protection for the invention first described.
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