U.S. patent application number 11/488242 was filed with the patent office on 2008-01-24 for semiconductor integrated circuit devices having high-q wafer backside inductors and methods of fabricating same.
This patent application is currently assigned to INTERNATIONAL BUSINESS MACHINES CORPORATION. Invention is credited to Lawrence Clevenger, Timothy Joseph Dalton, Louis Hsu, Carl Radens, Vidhya Ramachandran, Keith Kwong Hon Wong, Chih-Chao Yang.
Application Number | 20080020488 11/488242 |
Document ID | / |
Family ID | 38971928 |
Filed Date | 2008-01-24 |
United States Patent
Application |
20080020488 |
Kind Code |
A1 |
Clevenger; Lawrence ; et
al. |
January 24, 2008 |
Semiconductor integrated circuit devices having high-Q wafer
backside inductors and methods of fabricating same
Abstract
Methods are provided for fabricating semiconductor IC
(integrated circuit) chips having high-Q on-chip inductors formed
on the chip backside and connected to integrated circuits on the
chip frontside using through-wafer interconnects. For example, a
semiconductor device with a backside integrated inductor includes a
semiconductor substrate having a frontside, a backside and a buried
insulating layer interposed between the front and backsides of the
substrate. An integrated circuit is formed on the frontside of the
semiconductor substrate and an integrated inductor is formed on the
backside of the semiconductor substrate. An interconnection
structure is formed through the buried insulating layer to connect
the integrated inductor to the integrated circuit. The
semiconductor substrate may be an SOI (silicon on insulator)
structure.
Inventors: |
Clevenger; Lawrence;
(LaGrangeville, NY) ; Dalton; Timothy Joseph;
(Ridgefield, CT) ; Hsu; Louis; (Fishkill, NY)
; Radens; Carl; (LaGrangeville, NY) ;
Ramachandran; Vidhya; (Ossining, NY) ; Wong; Keith
Kwong Hon; (Wappingers Falls, NY) ; Yang;
Chih-Chao; (Poughkeepsie, NY) |
Correspondence
Address: |
F. CHAU & ASSOCIATES, LLC
130 WOODBURY ROAD
WOODBURY
NY
11797
US
|
Assignee: |
INTERNATIONAL BUSINESS MACHINES
CORPORATION
|
Family ID: |
38971928 |
Appl. No.: |
11/488242 |
Filed: |
July 18, 2006 |
Current U.S.
Class: |
438/3 |
Current CPC
Class: |
H01L 2924/0002 20130101;
H01L 2924/3011 20130101; H01L 23/5227 20130101; H01L 23/481
20130101; H01L 28/10 20130101; H01L 21/76898 20130101; H01L
2924/0002 20130101; H01L 2924/00 20130101 |
Class at
Publication: |
438/3 |
International
Class: |
H01L 21/00 20060101
H01L021/00 |
Claims
1. A semiconductor device, comprising: a semiconductor substrate
having a frontside, a backside and a buried insulating layer
interposed between the front and backsides of the substrate; an
integrated circuit formed on the frontside of the semiconductor
substrate; an integrated inductor formed on the backside of the
semiconductor substrate; and an interconnection structure formed
through the buried insulating layer to connect the integrated
inductor to the integrated circuit.
2. The device of claim 1, wherein the semiconductor substrate is
SOI (silicon on insulator) structure.
3. The device of claim 1, wherein the interconnection structure
comprises: a through-wafer frontside contact plug having a first
end in the semiconductor substrate and a second end contacting a
frontside metal level; and a through-wafer backside contact plug
having a first end in the semiconductor substrate and a second end
contacting an inductor coil structure, wherein the first ends of
the through-wafer frontside and backside contact plugs are in
electrical contact.
4. The device of claim 3, wherein the first ends of the
through-wafer frontside and backside contact plugs are disposed in
the buried insulating layer of the semiconductor substrate.
5. The device of claim 1, wherein the integrated inductor comprises
one or more layers of metal embedded in a dielectric layer on the
backside of the semiconductor substrate.
6. The device of claim 1, further comprising a ground plane
disposed between the integrated inductor and the integrated
circuit.
7. The device of claim 6, wherein the ground plane comprises
insulating islands formed by oxygen ion implantation on the
backside of the semiconductor substrate.
8. The device of claim 6, wherein the ground plane comprises
shallow trench isolation pattern formed on the backside of the
semiconductor substrate.
9. The device of claim 6, wherein the ground plane comprises doped
regions of silicon on the backside of the semiconductor
substrate.
10. The device of claim 1, wherein the integrated inductor
comprises a planar spiral inductor structure.
11. The device of claim 1, wherein the integrated inductor
structure comprises: a first level of metallization formed in via
holes etched in a backside insulating layer which comprise backside
contact plugs; and a second level of metallization formed in a
trench etched in the backside insulating layer which comprise an
inductor coil, wherein the backside contact plugs form part of the
interconnection structure for connecting the inductor coil to the
frontside integrated circuit.
12. The device of claim 11, further comprising dummy contact plugs
that are formed as part of the first level of metallization to
support the inductor coil structure for use with air gap inductor
isolation.
13. The device of claim 11, further comprising a liner layer
interposed between the backside contact plugs and surrounding
material of the backside insulating layer.
14. A method of forming a semiconductor device, comprising: forming
an integrated circuit on a frontside of a semiconductor substrate;
forming an integrated inductor on a backside of the semiconductor
substrate; and forming an interconnection structure through a
buried insulating layer interposed between the frontside and
backside of the semiconductor substrate, which connects the
integrated inductor to the integrated circuit.
15. The method of claim 14, wherein the semiconductor substrate is
SOI (silicon on insulator) structure.
16. The method of claim 14, wherein forming the interconnection
structure comprises: forming a through-wafer frontside contact plug
having a first end in the buried insulating layer of the
semiconductor substrate and a second end contacting a frontside
metal level; and forming a through-wafer backside contact plug
having a first end in the buried insulating layer of the
semiconductor substrate and a second end contacting an inductor
coil structure such that the first ends of the through-wafer
frontside and backside contact plugs are electrically contacted to
each other.
17. The method of claim 14, wherein forming the integrated inductor
on the backside of the semiconductor comprises forming one or more
layers of metal embedded in a backside insulating layer.
18. The method of claim 14, further comprising forming a ground
plane disposed between the backside integrated inductor and the
frontside integrated circuit.
19. The method of claim 18, wherein forming the ground plane
comprises forming insulating islands formed by oxygen ion
implantation on the backside of the semiconductor substrate.
20. The method of claim 18, wherein forming the ground plane
comprises forming a shallow trench isolation pattern formed on the
backside of the semiconductor substrate.
21. The method of claim 18, wherein forming the ground plane
comprises forming doped regions of silicon on the backside of the
semiconductor substrate.
22. The method of claim 14, wherein forming the integrated inductor
structure comprises: filling via holes etched in a backside
insulating layer to form backside contact plugs; and filling a
trench etched in the backside insulating layer to form an inductor
coil, wherein the backside contact plugs form part of the
interconnection structure for connecting the inductor coil to the
frontside integrated circuit.
Description
TECHNICAL FIELD OF THE INVENTION
[0001] The present invention relates generally to methods for
fabricating semiconductor IC (integrated circuit) chips having
high-Q on-chip inductors and, more specifically, semiconductor IC
chips having high-Q inductors that are formed on the chip backside
and connected to integrated circuits on the chip frontside using
through-wafer interconnects.
BACKGROUND
[0002] Advances in semiconductor IC (integrated circuit) chip
fabrication and packaging technologies have enabled development of
highly integrated semiconductor IC chips and compact chip package
structures (or electronic modules). Passive components such as
capacitors, resistors and inductors are fundamental circuit
components that are commonly used in chip fabrication/packaging
designs. In particular, inductors are typically used in analog and
mixed signal chip designs for constructing various circuits such as
voltage controlled oscillators (VCOs), low-noise amplifiers (LNAs),
mixers, filters and other integrated circuits. Passive components
such as inductors can be fabricated as off-chip or on-chip
components.
[0003] By way of example, inductors components can be fabricated as
off-chip components as part of a chip package or disposed at some
other location (e.g., printed circuit board). In such off-chip
designs, the inductors can be connected to on-chip integrated
circuits through C4 contacts or other chip-package contacts such as
wire bonds, etc, which can significantly increase the series
resistance and degrade circuit performance. Moreover, off-chip
designs may not be suitable for high-density integration
designs.
[0004] Another conventional method for implementing inductors as
circuit elements includes constructing inductors as part of the
frontside integrated circuit. For instance, on-chip inductors can
be fabricated as part of the BEOL (back-end-of-line) wiring
structure, which provides interconnects between frontside
integrated circuit components. The inductor coils can be patterned
in the wiring metallization levels, or patterned in metallization
levels that are specifically designed for inductors.
[0005] There are various disadvantages to frontside inductor
designs. For example, when an inductor is formed using thin metal
films of the BEOL metallization levels, the quality (Q) factor of
the inductor can decrease due to higher parasitic resistance if the
inductor wires are not made wide enough to minimize the resistance.
Moreover, to minimize self-capacitance, the wide inductor wires
must be spaced sufficient fart apart. Consequently, the increased
width and spacing of the conductor wires results in an inductor
structure with a relatively large footprint.
[0006] Further, the Q factor of a frontside inductor can decrease
due to coupling/crosstalk with substrate devices. In particular,
eddy currents may be induced between an on-chip conductor and a
conductive region in the vicinity of the on-chip inductor which
reduces the effective inductance and limits the Q factor of the
inductor. In addition, the inductor electric field can cause
current to flow in the surrounding substrate or dielectric layers
leading to further resistive losses and reduction of inductor Q
factor.
[0007] Various techniques have been employed to shield (e.g.,
ground shields/planes) or otherwise isolate (e.g., trench isolation
regions) frontside inductors to reduce such coupling/crosstalk and
minimize eddy current, and thus improve the Q factor for frontside
inductors. The improvement of the Q factor is achieved, however, at
the expense of chip real estate as the inductor wires and
associated shielding and isolation components/structures can occupy
a relatively large 3-D space, which limits integration density of
devices on a chip.
SUMMARY OF THE INVENTION
[0008] Exemplary embodiments of the invention generally include
methods for fabricating semiconductor IC (integrated circuit) chips
having high-Q on-chip inductors formed on the chip backside and
connected to integrated circuits on the chip frontside using
through-wafer interconnects
[0009] In one exemplary embodiment of the invention, a
semiconductor device with a backside integrated inductor includes a
semiconductor substrate having a frontside, a backside and a buried
insulating layer interposed between the front and backsides of the
substrate. An integrated circuit is formed on the frontside of the
semiconductor substrate and an integrated inductor is formed on the
backside of the semiconductor substrate. An interconnection
structure is formed through the buried insulating layer to connect
the integrated inductor to the integrated circuit. The
semiconductor substrate may be an SOI (silicon on insulator)
structure.
[0010] In one exemplary embodiment, the interconnection structure
is formed by a through-wafer frontside contact plug having a first
end in the semiconductor substrate and a second end contacting a
frontside metal level, and a through-wafer backside contact plug
having a first end in the semiconductor substrate and a second end
contacting an inductor coil structure. The first ends of the
through-wafer frontside and backside contact plugs are in
electrical contact and may be disposed in the buried insulating
layer of the semiconductor substrate.
[0011] In one exemplary embodiment of the invention, the integrated
inductor comprises one or more layers of metal embedded in an
insulating layer on the backside of the semiconductor substrate.
The integrated inductor structure can be formed from a first level
of metallization formed in via holes etched in the backside
insulating layer to form backside contact plugs, and a second level
of metallization formed in a trench etched in the backside
insulating layer to form an inductor coil. The backside contact
plugs form part of the interconnection structure for connecting the
inductor coil to the frontside integrated circuit.
[0012] In another embodiment of the invention, the backside
insulating material may be removed to form an air gap between the
inductor coil and the backside surface of the semiconductor
substrate. Dummy contact plugs can be formed as part of the first
level of metallization to server as support columns for the
inductor coil structure in the absence of the supporting backside
insulating material, where the dummy contact plugs do not serve as
electrical interconnections to the frontside integrated circuit,
but server as support and anchor structures to prevent delamination
or collapse of the inductor coil.
[0013] In another exemplary embodiment of the invention, a ground
plane may be disposed between the integrated inductor and the
integrated circuit. The ground plane may be insulating islands
formed by oxygen ion implantation on the backside of the
semiconductor substrate. The ground plane may be shallow trench
isolation patterns formed on the backside of the semiconductor
substrate. The ground plane may be doped regions of silicon formed
on the backside of the semiconductor substrate.
[0014] These and other exemplary embodiments, aspects, features and
advantages of the present invention will be described or become
apparent from the following detailed description of exemplary
embodiments, which is to be read in connection with the
accompanying drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
[0015] FIG. 1 is schematic cross-sectional view of a semiconductor
IC chip having an integrated inductor formed on the backside of the
chip and connected to an integrated circuit on the frontside of the
chip using through-wafer interconnects, according to an exemplary
embodiment of the invention.
[0016] FIG. 2 is a schematic plan view of a backside integrated
inductor structure with patterned ground plane according to an
exemplary embodiment of the invention.
[0017] FIGS. 3A.about.3L schematically illustrate a method for
fabricating a semiconductor IC chip with backside integrated
inductors according to an exemplary embodiment of the
invention.
[0018] FIG. 4 is a schematic plan view of a backside integrated
inductor structure with patterned ground plane according to another
exemplary embodiment of the invention.
[0019] FIGS. 5A.about.5G schematically illustrate a method for
fabricating a semiconductor IC chip with backside integrated
inductors according to an exemplary embodiment of the
invention.
DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS
[0020] Exemplary embodiments of the invention will be discussed in
further detail hereafter regarding semiconductor IC chips having
high-quality, integrated inductors that are fabricated on the chip
backside and connected to integrated circuits on the chip frontside
using through-wafer interconnects. For example, exemplary chip
fabrication techniques according to the invention as discussed
below include methods for constructing high-Q capacitor structures
on the backside of a semiconductor SOI (silicon-on-insulator) wafer
while preserving the frontside silicon real estate for achieving
high density integration chip design. As discussed in detail below,
exemplary chip fabrication techniques enable high density
integration and precision fabrication of high Q inductors with high
self-resonance frequencies and low cross talk to frontside
integrated circuits.
[0021] FIG. 1 is schematic cross-sectional view of a semiconductor
IC device (100) according to an exemplary embodiment of the
invention, which generally comprises a semiconductor substrate
(110) (or wafer) having a front (active) side and a back
(non-active) side. In the exemplary embodiment, the semiconductor
substrate (110) comprises a SOI (silicon on insulator) substrate
(110) (or wafer) comprising a thin surface layer of silicon (110a)
and a buried oxide (BOX) layer (110b) stacked on a bulk silicon
layer (110c) (which may also be referred to as a carrier layer or a
support layer, for example). The frontside of the substrate (110)
comprises an integrated circuit formed by FEOL (front-end-of-line)
and BEOL (back-end-of-line) structures, and the backside of the
substrate (110) comprises an integrated inductor that is connected
to the frontside integrated circuit by an interconnection structure
formed through the semiconductor substrate (110).
[0022] More specifically, on the font side of the substrate (110),
a plurality of STI (shallow trench isolation) regions (120) are
formed in the silicon layer (110a) to define active regions for
circuit components (140). In the exemplary embodiment, the circuit
components (140) are depicted as transistors comprising gate
elements (140a) and diffusion regions (140b) and (140c) formed in
the silicon layer (110a) providing drain/source elements for the
transistors. The circuit components (140) can be formed using
standard FEOL fabrication techniques known to those of ordinary
skill in the art.
[0023] The semiconductor device (100) has a frontside
interconnection structure that is formed using standard BEOL
(back-end of line) fabrication techniques. A first insulation layer
(125) (or ILD (interlayer dielectric layer) is formed to cover the
circuit components (140). A plurality of contact plugs (130) are
formed in the insulation layer (125) to provide contacts between
device terminals (140a), (140b) and/or (140c) and a first level
metallization (160). Moreover, a plurality of through-wafer
frontside contact plugs (150) are formed in the insulation layer
(125) to contact with the first level metallization (160) and
extend into the BOX layer (110b). As explained below, the
through-wafer frontside contact plugs (150) form part of the
interconnect structures that connect the frontside integrated
circuit with an inductor formed on the backside of the substrate
(110). Moreover, the through-wafer frontside contact plugs (150)
may be used as alignment marks for the backside lithographic
processes that are performed to fabricate backside inductor
structures and associated elements.
[0024] A plurality of inter-level contacts plugs (165) are formed
to provide interconnections between the first level metallization
(160) and a second level metallization (170). The first and second
level metallization (160) and (170) and inter-level contact plugs
(165) are embedded in one or more layers of ILD (inter level
dielectric) material (175). A frontside passivation layer (180) is
formed over the frontside metallization structure.
[0025] The semiconductor device (100) further comprises an
integrated inductor structure and associated elements formed on the
backside of the substrate (110). In particular, in the exemplary
embodiment of FIG. 1, an inductor ground plane (190) (or ground
shield) is formed in the bulk silicon layer (110c). A backside
insulating layer (200) is formed on the bulk silicon layer (110c).
An integrated inductor structure is formed by several metallization
levels formed in the backside insulation layer (200). A first level
of backside metallization is formed to provide through-wafer
backside contact plugs (211), and a second level of backside
metallization is formed to provide an inductor coil (231). A
backside passivation layer (250) is formed over the inductor coil
(231).
[0026] The through-wafer backside contact plugs (211) are formed to
connect to the through-wafer frontside contact plugs (150), thereby
providing a through-wafer interconnect structure that connects the
inductor coil (231) and frontside integrated circuit through the
substrate (110). The through-wafer backside contact plugs (211) are
lined with a relatively thick liner layer (220) to isolate the
through-wafer backside contact plugs (211) from the bulk silicon
layer (110c) of the substrate (110) and thereby reduce substrate
losses.
[0027] It is to be understood that the exemplary embodiment of FIG.
1 depicts a general framework for an integrated backside inductor
structure, and in particular, an integrated backside inductor
structure with a ground plane (or ground shield) (190) and inductor
coil (231) embedded in the layer of insulation (200). The ground
shield (190) serves to break up conductive paths that may be
induced on the chip substrate (110) and otherwise minimize or
eliminate coupling/crosstalk between the inductor (231) coil and
the substrate (110) and the frontside integrated circuit on the
active surface of the substrate (110). In one exemplary embodiment,
the inductor structure may be formed of a planar spiral inductor
such as depicted in the exemplary embodiment of FIG. 2, although
other inductor structures may be implemented (e.g., square,
hexagonal, octagonal, circular inductors, etc.).
[0028] In particular, FIG. 2 schematically illustrates an exemplary
embodiment of the inductor coil (231) in the form of a planar
spiral inductor and the ground plane (190) in the form of a
segmented radial shielding pattern. In the exemplary embodiment of
FIG. 2, the end portions of the spiral inductor coil (231) are
connected to, and aligned with, the through-wafer backside contact
plugs (211) that extend through the ground plane (190) and contact
the through-wafer frontside contact plugs (150) as described above.
In general, the backside ground plane layer (190) may be patterned
either in the substrate (110) or in the backside insulation layer
(200). In various exemplary embodiments of the invention discussed
further below, the backside ground plane (190) may be comprised of
insulating islands formed by oxygen ion implantation or shallow
trench isolation embedded in the bulk silicon layer (110c), or
doped regions of silicon providing high-resistive depletion
regions.
[0029] FIGS. 3A.about.3L schematically illustrate a method for
fabricating microelectronic chip with a backside inductor connected
to frontside circuits using through-wafer contacts, according to an
exemplary embodiment of the invention. For purposes of
illustration, methods for fabricating the semiconductor device
(100) of FIG. 1 will be discussed with reference to FIGS.
3A.about.3L. In general, FIGS. 3A.about.3D illustrate various
stages of frontside processing to fabricate active components
(e.g., transistors) metallization on a frontside of a semiconductor
substrate (110), and FIGS. 3E.about.3F illustrate various stages of
backside processing to fabricate an integrated inductor and ground
plane on the backside of the semiconductor substrate and connect
the inductor to the frontside circuit.
[0030] FIG. 3A illustrates structure that is formed as a result of
initial stages of device fabrication starting with the
semiconductor substrate (110) comprising the silicon layer (110a),
BOX layer (110b) and bulk silicon layer (110c) (which can be
prefabricated or formed using known techniques), and forming the
STI regions (120), the active devices (140), the insulation layer
(125) and the contact plugs (130) on the frontside of the
semiconductor substrate (110) using standard techniques.
[0031] The silicon layer (110a) and BOX layer (110b) together
constitute the silicon on insulator (SOI) structure that can be
formed using conventional methods for fabricating SOI structures.
For example, the SOI substrate can be fabricated using the known
SIMOX (separation by implementation of oxygen" process whereby a
high energy oxygen implantation process is performed to implant
oxygen atoms into the surface of a bare silicon wafer, followed by
wafer anneal at a high temperature to form the SOI layer (i.e.,
silicon layer (110a) on oxide layer (110b)). The thickness of the
buried oxide layer (110b) and silicon layer (110a) can vary
depending on the device requirements. For example, the thickness of
the silicon layer (110a) ranges from approximately 500 angstroms to
about 5000 angstroms, and the thickness of the buried oxide layer
(110b) can range from approximately 500 angstroms to about 1
micron. The remaining bulk silicon layer (110c) has an initial
thickness in a range of about 5 microns to about 15 microns
depending on the wafer size (wafer thickness increases as size of
wafer increases).
[0032] The STI region (130) and active devices (140) are formed on
the frontside of the semiconductor substrate (110) using standard
FEOL fabrication techniques such as dopant diffusion and
implantation, sputtering of polysilicon gate films, oxidations, and
associated patterning steps. For example, the STI regions (120) can
be formed by depositing thin pad oxide and SiN films and patterning
the films to form a mask for etching STI trenches in the silicon
layer (110a) down to the BOX layer (110b). A thermal oxidation
process is performed to form liner of oxide material on the
sidewalls of the trenches followed by an oxide deposition to fill
the trenches (via LPCVD or HDP) and subsequent oxide etch back and
polishing (e.g., CMP).
[0033] Thereafter, active components (140) including MOS
transistors are formed in active areas of the silicon layer (110a)
defined by the STI regions (120). The active devices (140) may be
formed using standard FEOL fabrication techniques such as dopant
diffusion and implantation, sputtering of polysilicon gate films,
oxidations, and associated patterning steps. In the exemplary
embodiment, the STI regions (120) are formed down to the BOX layer
(110b) such that the SOI completely isolates each active device
(140) from a neighboring component (140). As noted above, the
active devices (140) include MOS transistors having polysilicon
gate structures (140a) and source/drain diffusion regions
(140b/140c). The active devices (140) are electrically isolated
from the bulk wafer (110c) by the BOX layer (110b) and electrically
isolated from each other by the STI regions (120). The active
devices (140) may be formed using standard FEOL fabrication
techniques such as dopant diffusion and implantation, sputtering of
polysilicon gate films, oxidations, and associated patterning
steps.
[0034] As further depicted in FIG. 3A, after the circuit components
(140) are formed, a first planar insulation layer (125) is formed
to cover the active devices (140) and the contact plugs (130)
(referred to as CA contacts) are formed in the dielectric layer
(125) to provide contacts between gate/drain/source terminals of
the active components (140) and a first metallization level (as
described below). The contacts (130) may be formed of standard
materials such as copper or tungsten.
[0035] Referring to FIG. 3B, through-wafer frontside contact plugs
(150) are also formed in the dielectric layer (125) but are formed
to extend down into the BOX layer (110b). In one exemplary
embodiment, the through-wafer frontside contact plugs (150) may be
fabricated using standard BEOL processing techniques. For instance,
the contact plugs (150) may be defined by photolithographic ally
aligning a resist mask to the prior patterns on the wafers and
using the resist mask to drill contact holes through the contact
layer dielectric (125) and STI (120), stopping inside the BOX layer
(110b). Thereafter, a layer of metallic material, such as copper,
is deposited to fill the contact holes, and the layer of metal is
polished back to the surface of the dielectric layer (125) to form
the contact plugs (150). In one exemplary embodiment, the through
wafer frontside contacts (150) may be formed with diameters in a
range of about 5 microns to about 50 microns. However, the
through-wafer frontside contact plugs can be made as wide as
possible without resulting in undesirable loss of performance.
Indeed, if the through-wafer frontside contact plugs (150) are made
too wide, there may be a large inductor-to-substrate coupling since
the contacts (150) pass through the substrate (100), resulting in
performance loss. This substrate coupling may be reduced when the
contact plugs (150) are formed partially through the substrate but
surrounded by STI (120) and BOX (110b) insulation material, which
serves to isolate the contact plugs (150) from the silicon material
of the substrate (110).
[0036] After formation of the contacts (130) and through-wafer
frontside contact plugs (150), processing continues to complete the
frontside metallization. For instance, referring to FIG. 3C, the
first metallization layer (160), inter-level contact plugs (165)
and second level metallization layer (170) are formed of metallic
material such as copper, aluminum, or alloys thereof, using known
techniques (e.g., damascene, dual damascene, subtractive metal
etch) with metallic material such as Cu or Al, for example.
Although the exemplary embodiments described herein depict two
metal layers (160) and (170), this is merely illustrative and it
should be understood that the semiconductor device (100) may be
formed with more or less metal layers, depending on the
application.
[0037] After frontside metallization is complete, the wafer is
passivated to form a passivation layer (180) over the frontside of
the substrate, such as illustrated in FIG. 3D. The passivation
layer (180) may be a thick layer of spin-on or deposited material
such as an oxide or BPSG (boron phosphorous-doped silicate glass).
The passivation layer (180) is formed to provide electrical and
mechanical protection to the frontside of the chip for subsequent
backside processing, as will be described with reference to FIGS.
3E.about.3L.
[0038] Referring to FIG. 3E, the substrate is flipped over and a
wafer carrier (185) is temporarily bonded to the passivation layer
(180) such that mechanical and electrical stress may be placed on
the passivation layer (180) through the carrier (185) during
backside processing. In one exemplary embodiment, the bulk silicon
wafer layer (110c) is subjected to polishing/grinding process to
thin the wafer down to 50-600 microns. The thinning of the
substrate serves to reduce the length of the through-wafer
interconnects that electrically connect the backside inductor and
integrated circuit, thereby reducing the series resistance and thus
enhance performance. By making the passivation layer (180)
sufficiently thick, sufficient mechanical support for the chip can
be provided by the passivation layer (180) when the substrate is
made significantly thin.
[0039] As further depicted in FIG. 3E, after wafer thinning, the
backside inductor ground plane (190) is formed. The ground plane
(190) may be a conductive/semi-conductive region that is formed
under the inductor metallization to minimize or eliminate inductive
currents and thus reduces energy loss to the substrate by inductive
coupling. The ground plane (190) may be formed using one of various
methods according to exemplary embodiments of the invention.
[0040] In one exemplary embodiment, the ground plane (190) may be
doped regions of n-type dopants, which produce local areas of
charge depletion. The ground plane (190) can be formed by
performing a masked dopant implant process to implant n-type
dopants in the bulk layer (110c) at desired concentration and
depth.
[0041] In another embodiment, the ground plane (190) for the
backside inductor may be fabricated by forming a pattern of high
energy, high current oxygen implants on the backside of the wafer
(110c) to create embedded islands of oxide under the backside
surface of the wafer (110c). These embedded islands serve to break
up the potential inductive currents in the substrate. Chains of
implants can be used to create oxide columns which extend from the
wafer surface to deep within the wafer. The pattern for these
implants is similar to that shown for the insulating regions of the
ground-plane in FIG. 2.
[0042] In another exemplary embodiment, the ground plane (190) can
be fabricated by forming shallow trench isolation on the backside
of the wafer. In particular, the ground plane (190) can be formed
by etching trenches in the backside surface of the bulk silicon
layer (110c), depositing an insulation material (e.g., oxide) to
fill the trenches, and then polishing the insulation material down
to the backside surface of the bulk layer (110c), to thereby form
isolation islands having a pattern as shown for the insulating
areas of the ground plane (190) in FIG. 2.
[0043] In the exemplary embodiments described above, the mask
levels for the backside processing can be aligned to the frontside
through-wafer contact level using infra-red alignment methods,
which are capable of "seeing through" the bulk silicon layer (110c)
and aligning to the metal of the contacts. Such alignment can be
performed with respect to the contacts or alignment makes formed
simultaneously with the contacts. If the ground plane (190) is
constructed such that is provides distinct optical regions (e.g.,
STI-like isolation trenches), then subsequent levels can be aligned
back to the level of the ground plane (190). However, if the ground
plane (190) is a buried implant or formed by any other type of
invisible/sub-surface process, then the next level, which is the
inductor trench, can be aligned to the frontside contact
levels.
[0044] Upon completion of the ground-plane processing, a backside
insulation layer (200) is formed over the backside surface of the
silicon wafer (110c). The insulation layer (200) may be formed of
an insulation/dielectric material such as silicon oxide, polyimide
and other suitable materials. The insulation layer (200) can be
formed by blanket depositing an insulating or dielectric material
using spin-on, CVD or other known techniques. Preferably, the
insulating layer (200) is formed with a material having a low
dielectric constant as possible to optimize the inductor
performance. The insulation layer (200) is formed with a thickness
in a range from about 10 microns to about 100 microns, and thick
layers are preferred for improving performance.
[0045] Referring now to FIG. 3G, backside contact via holes (210)
are formed through the backside insulation layer (200) and bulk
silicon (110c) to expose end portions of the frontside contacts
(150) in the BOX layer (110b). The backside contact via holes (210)
may be formed using known photolithographic methods, where a
photoresist mask pattern is formed having openings that define the
backside contact via holes (210) that are aligned with the
through-wafer contacts (150) using infra-red techniques. In one
exemplary embodiment of the invention, the backside contact via
holes (210) are formed to define through-wafer backside contact
plugs that are formed to electrically connect the inductor coil to
the through-wafer frontside contacts (150).
[0046] Referring to FIG. 3H, a conformal liner layer (220) is
formed over the backside to line the exposed sidewall and bottom
surfaces of the backside contact via holes (210). The liner layer
(220) may be formed by depositing one or more layers of suitable
liner materials. For instance, a first layer may be deposited
providing a barrier layer which prevent migration of conductive
material into the via. A second layer may be an adhesion layer
formed on the barrier layer to that forms good adhesion to both the
barrier metal and to a third metal (e.g., copper) that fills the
via holes. For example, the liner layer (220) may be formed by
depositing one or more conformal layers of TaN or TiN using PVD,
CVD, etc. A single layer of TiN functions as both a barrier metal
and adhesion layer. The liner layer (220) may be deposited with a
thickness in a range from about 1000A to about 5 microns. The
isolation film (220) serves to isolate the contacts from the
substrate (200) to minimize substrate losses. The thickness of the
isolation film layer (220) is inversely proportional to the
substrate coupling capacitance, and thus directly impacts
capacitive losses to the substrate.
[0047] Following formation of liner layer (220), inductor trenches
(230) are formed which define the inductor structure, resulting in
the structure depicted in FIG. 3I. The trenches are formed using a
photolithographic process that aligns to the backside contacts
(150). The trenches (230) are formed by RIE etching the portion of
the insulation layer (200) exposed through a photoresist mask. In
one embodiment, the trench RIE terminates at the mid-plane of the
backside insulator layer (200), although deeper trenches may be
formed depending on the application to achieve inductor structures
with reduced series resistance and improved performance. An
anisotropic finish RIE may be performed at the end of the trench
etch to remove the portion of the liner layer (220) at the bottom
of the backside contact via holes (210), while leaving the liner
(220) on the sidewalls of the backside contact via holes (210).
[0048] Referring to FIGS. 3J and 3K, a metallic material (240) is
deposited over the backside of the wafer to fill the trenches (230)
and backside contact via holes (210) with the metallic material
(240) and form the through-wafer backside contact plugs (211) and
the inductor coil structure (231) (e.g., a planar spiral inductor
as depicted in FIG. 2). The metallic material (240) may be tungsten
W, Al, Cu, or alloys thereof, etc, or other metallic material
having relatively low resistivity so as to form a high-Q inductor
with high performance. Prior to metal deposition, a blanket
deposition step may be formed to form a thin conformal metallic
seed layer over the exposed inner walls of the trenches (230) and
backside contact via holes (210) to facilitate metal plating or
adhesion, as is understood by those of ordinary skill in the
art.
[0049] Referring to FIG. 3K, the excess metal (240) is polished
back and the wafer backside is planarized using CMP, for example.
The metal planarization process terminates at the backside
dielectric (220) by using an endpoint method typical of metal
polish processes. Then, referring to FIG. 3L, a thick
non-conductive passivation layer (250) is formed over the backside
to cover the inductor (231), resulting in the structure of FIG. 1
as discussed above (which is shown frontside down in FIG. 3L).
Various materials such as silicon oxide, silicon nitride,
polyimide, etc. may be used to form the passivation layer (250),
which serve to provide electrical and mechanical protection to the
backside features, and mechanical support to the chip module.
[0050] In the exemplary fabrication process discussed above, the
inductor structure (231) and through-wafer backside contact plugs
(211) are integrally formed using a standard via first dual
damascene process, wherein the backside contact via holes (210) and
trenches (230) are sequentially etched in a layer of dielectric
material (200) in alignment with the frontside through wafer
contact plugs (150) and wherein the backside contact via holes
(210) and trenches (230) are filled with a metallic material in a
single metal deposition process (e.g., copper electroplating) to
integrally form the through-wafer backside contact plugs (211) (and
possible dummy contact plugs) and inductor coil (231). However, it
is to be understood that other standard processes such as single
damascene or subtractive etch techniques may be used to form the
through-wafer backside contact plugs (211) and inductor coil
(231).
[0051] In the exemplary embodiment of FIG. 1, for example, the
inductor coil (231) is embedded in the layer of insulating material
(200) which serves as mechanical support for the inductor coil
(231). The performance of a backside inductor can be enhanced by
reducing the amount of dielectric material surrounding the inductor
coil metal and/or between adjacent layers of a backside inductor
structure. Indeed, in the exemplary embodiment of FIG. 1, optimal
performance can be achieved where the insulating material (200) is
fully removed leaving behind a vacuum or an air gap. However, if
the insulation material (200) is removed, the inductor coil (231)
may be left unsupported and thus susceptible to damage by
collapsing or delamination during further chip processing or
mechanical handling. In this regard, exemplary embodiments of the
invention include methods for fabricating air-gap backside inductor
structures where the backside insulation layer is removed to form
an air gap for enhanced inductor performance, while one or more
dummy or redundant and non-electrical backside contact plugs are
formed to serve as support columns for the inductor coil metal
layer in the absence of the backside insulating material.
[0052] For example, FIG. 4 is a schematic plan view illustration of
an exemplary air-gap backside integrated inductor structure
according to an exemplary embodiment of the invention. In
particular, FIG. 4 schematically illustrates an exemplary
embodiment similar to that described above with reference to FIG.
2, where the inductor coil (231) is a planar spiral inductor and
the ground plane (190) has a segmented radial shielding pattern,
and where the end portions of the spiral inductor coil (231) are
connected to, and aligned with, through-wafer backside contact
plugs (211) that extend through the ground plane (190) and contact
the through-wafer frontside contact plugs (150) as described
above.
[0053] The exemplary embodiment of FIG. 4 differs from that of FIG.
2 in that, e.g., an air/vacuum cavity or gap exists between the
inductor coil (231) and the bulk silicon layer (110c) in which the
ground shield (190) is formed. Moreover, a plurality of backside
dummy plugs (D) are formed in alignment at various points along the
inductor coil (231) to serve as support columns extending from the
bulk layer (110c) in the air cavity underneath the inductor coil
(231). The exemplary inductor structure of FIG. 4 can be fabricated
using methods discussed hereafter with reference to FIGS.
5A.about.5G.
[0054] FIGS. 5A.about.5G schematically illustrate a method for
fabricating microelectronic chip with a backside air-gap inductor
structure according to another exemplary embodiment of the
invention. For purposes of illustration, it is assumed that FIG. 5A
illustrates processing steps starting from the exemplary structure
depicted in FIG. 3F. In other words, in one exemplary embodiment of
the invention, a method for fabricating backside air gap inductor
structures implements the processing steps discussed above with
reference to FIGS. 3A.about.3F.
[0055] FIG. 5A illustrates a structure that results from etching
backside contact via holes (210) and (310) formed through the
backside insulation layer (200) and bulk silicon (110c) (in FIG.
3F) using known photolithography methods. As in the exemplary
embodiment discussed above, the backside contact via holes (210)
are formed in alignment with the through-wafer contacts (150) to
expose end portions of the frontside contacts (150) in the BOX
layer (110b). The backside contact via holes (210) are formed to
define through-wafer backside contact plugs that are formed to
electrically connect the inductor coil to the through-wafer
frontside contacts (150). The contact holes (310) are formed in
regions aligned to the inductor coil but not aligned to
through-wafer frontside contacts (150). The contact holes (310) are
formed to define support columns that support the coil
metallization as discussed in further detail below.
[0056] Referring to FIG. 5B, a conformal insulating liner layer
(320) is formed over the backside to line the exposed sidewalls and
bottom surfaces of the backside contact via holes (210) and (310).
The insulating liner (320) serves to isolate the dummy and
electrical contacts from the substrate. The liner (320) can be
formed using materials and methods discussed above with reference
to FIG. 3H, for example. Following formation of the insulating
liner layer (320), inductor trenches (330) are formed which define
the inductor structure, resulting in the structure depicted in FIG.
5C. The trenches (330) may be formed using a photolithographic
process that aligns to the backside contacts (150). The trenches
(330) can be formed by RIE etching the portion of the insulation
layer (200) exposed through a photoresist mask. As discussed above,
the depth of the trench defining the thickness of the inductor coil
can vary depending on the application and desired performance. An
anisotropic finish RIE may be performed at the end of the trench
etch to remove the portion of the liner layer (320) at the bottom
of the backside contact via holes (210) and (310), while leaving
the liner (320) on the sidewalls of backside contact via holes
(210) and (310).
[0057] Next, a metallic material is deposited over the backside of
the wafer to fill the trenches (330) and backside contact via holes
(210) and (310) with the metallic material, followed by
polishing/planarizing (e.g., CMP) of the wafer backside to remove
the excess metal down to the backside insulating layer (320) using
an endpoint method typical of metal polish processes. The resulting
structure is depicted in FIG. 5D, which has through-wafer backside
contact plugs (211), dummy contact plugs (311) and an inductor coil
structure (331). The metallic material may be tungsten W, Al, Cu,
or alloys thereof, etc, or other metallic material having
relatively low resistivity so as to form a high-Q inductor with
high performance. Prior to metal deposition, a blanket deposition
step may be formed to form a thin conformal metallic seed layer
over the exposed inner walls of the trenches (330) and the backside
contact via holes (210) and (310) to facilitate metal plating or
adhesion, as is understood by those of ordinary skill in the
art.
[0058] Referring to FIG. 5E, a thick non-conductive porous capping
layer (350) having a plurality of through pores (351) is formed
over the backside resulting in the structure of FIG. 5E. The
through pores (351) may either be an inherent property of the
material (350) or may be created by photolithographic patterning. A
hard mask film may be deposited before the porous material layer
(350) to be used for pattern transfer.
[0059] Next, as depicted in FIG. 5F, the backside insulating
material (200) is removed by selective etching of the material
through the pores (351) in the porous capping layer (350) and holes
formed in the liner layer (320). This process may be performed by
transferring the pattern of the pores (351) to the liner layer
(320) (or into a hard mask layer that is deposited before
deposition of the porous film (350)) and then flowing a selective
wet etchant or RIE species through the pores (351). The etchant
that is used does not attack the metal (331), but dissolves the
insulating material (200) between the inductor wires (331) and the
through-wafer backside contact plugs (211) and the dummy contact
plugs (311), resulting in an open cavity region (201). Then,
referring to FIG. 5G, the entire backside of the wafer is capped by
a passivation layer (360) to protect the wafer backside.
[0060] In the exemplary embodiment discussed above, the dummy
contacts (311) do not serve as electrical contacts, but are used as
support and anchoring structures for the air gap inductor
structure. The backside contact via holes (210) and (310) and
trenches (330) are filled at the same time using one metallization
process such that the through-wafer backside contact plugs (211),
inductor coil (331) and the dummy contact plugs (311) are
integrally formed and consist of the same continuous layer of metal
such that one end of each dummy contact (311) is integrally
connected to the inductor coil (331). Moreover, one end of each
dummy contact (311) is embedded in the backside of the substrate.
Since one end of the dummy contacts (311) is embedded in the
substrate wafer and the other end is contiguous with the inductor
wiring (331), the dummy contacts (311) server as anchors and
support columns for the inductor coils (331), reducing the risk of
structural delamination of the inductor coil (331). Moreover, the
rigidity of the metallic dummy contacts (311) protects against
structural collapse of the inductor coils (331).
[0061] The placement of the dummy contacts and the amount of dummy
contacts used for a given design will vary depending on the
inductor coil structure. For instance, the exemplary embodiment of
FIG. 4 shows numerous dummy contacts (D) placed along the length of
the coil (231) where one dummy contact (D) is sufficient at each
point to support coil width. If the inductor coils are relatively
wide, multiple dummy contacts can be placed across the width of the
coil for added support, such as depicted in the exemplary
embodiment of FIG. 5G, for example. In particular, FIG. 5G
illustrates one exemplary embodiment where the through-wafer
backside contact plug (211) is aligned to the center point along
the width of the coil (331), where dummy contacts (311) are
disposed on opposite sides of the through-wafer backside contact
plug (211) along the width to support the ends of the inductor coil
(331).
[0062] It is to be appreciated that there are various advantages
associated with exemplary methods of the invention for fabricating
semiconductor devices with backside inductor structures according
to the invention. For instance, high-density integration can be
achieved by forming inductors (which typically have large
footprints) on the chip backside and thus, saving chip frontside
area for more dense packaging of circuit components and
interconnections. Moreover, backside inductors can be disposed in
relatively close relation to the frontside integrated circuit such
that the length of interconnects are minimized and thus minimizing
the series resistance of the through-wafer interconnect
structures.
[0063] Moreover, by forming backside inductors, the backside
processing for fabricating the inductors is decoupled from the
frontside processing for fabricating the integrated circuit on the
chip active surface. This allows the fabrication of the inductor
components with the desired conductive materials and embedding
dielectric and structural framework (pitch, metal thickness) to be
optimized for high quality performance independent from other chip
fabrication steps. For instance, the backside metallization which
comprise the inductor coils and contacts can be selected with a
high conductive metal such as copper or aluminum and embedded in a
thick insulating/dielectric layer having desirable properties to
achieve a desired performance. The insulating/dielectric layer can
be chosen to be a low-K material that can easily be deposited on
the backside to large thicknesses to achieve low parasitic
environment for the inductor circuit.
[0064] Overall, the relatively low series resistance afforded by
physical proximity of the backside inductor to the frontside
integrated circuit with space savings provided by moving the
inductor off the active area of the chip onto the backside, allows
for high density packaging. Moreover, performance enhancement is
provided though optimizing inductor layer pitches and materials,
while cost and complexity are reduced by using simple,
semiconductor-fabrication-compatible processing steps that allow
for precision fabrication of high-Q inductors with high self
resonance frequencies. For example, backside inductors can be
fabricated using exemplary methods as described herein having
inductance values of around 1-30 nH with Q-values around 80 or
higher at frequencies of 2 GHz or higher. In addition, a ground
plane can be readily formed as part of the backside processing for
maximizing inductor performance and achieving inductor structures
having high self-resonance frequency with low cross talk to
frontside integrated circuits.
[0065] It is to be appreciated that the exemplary fabrication
techniques discussed herein can be employed for constructing
integrated backside antenna structures for integrated radio
communication applications. Indeed, the exemplary methods can be
used to construct various types of backside planar antenna
structures depending on the intended application and/or frequency
of operation. For example, planar antenna structures such as dipole
antennas, folded dipole antennas, ring antennas, rectangular loop
antennas, patch antennas, coplanar patch antennas, quarter-wave
monopole antennas (such as PIFA (planar inverted F antenna), etc.,
can be fabricated backside and connected to frontside RF circuitry
(e.g., LNAs, power amplifier, etc.) using through-wafer
interconnects that are formed as part of the antenna feed lines
and/or impedance matching networks, for example. Moreover, the
inductor ground shields discussed above can be antenna ground
planes that are fabricated as part of the antenna designs for
purposes of providing reflecting ground planes (maintaining
radiation pattern in hemisphere above backside of chip) and/or
providing the necessary ground plane structures for quarter-wave
antenna radiators.
[0066] In other exemplary embodiments of the invention, the
exemplary inductor fabrication techniques discussed herein can be
combined with backside capacitor fabrication techniques to
fabricate high-Q backside RC circuits (e.g., filters), such as
those backside capacitor fabrication techniques disclosed in U.S.
patent application Ser. No. 11/443,394, filed on May 30, 2006,
entitled SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES HAVING HIGH-Q
WAFER BACK-SIDE CAPACITORS, which is fully incorporated herein by
reference.
[0067] Although exemplary embodiments have been described herein
with reference to the accompanying drawings for purposes of
illustration, it is to be understood that the present invention is
not limited to those precise embodiments, and that various other
changes and modifications may be affected herein by one skilled in
the art without departing from the scope of the invention.
* * * * *