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name:-0.025982856750488
name:-0.032871007919312
name:-0.0099740028381348
Yamaki; Satoru Patent Filings

Yamaki; Satoru

Patent Applications and Registrations

Patent applications and USPTO patent grants for Yamaki; Satoru.The latest application filed is for "substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane".

Company Profile
10.33.23
  • Yamaki; Satoru - Tokyo JP
  • Yamaki; Satoru - Toyko JP
  • Yamaki; Satoru - Ohta-ku JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate Holding Apparatus, Elastic Membrane, Polishing Apparatus, And Method For Replacing Elastic Membrane
App 20220048157 - Nabeya; Osamu ;   et al.
2022-02-17
Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membrane
Grant 11,179,823 - Nabeya , et al. November 23, 2
2021-11-23
Elastic Membrane, Substrate Holding Device, And Polishing Apparatus
App 20210335650 - Yamaki; Satoru ;   et al.
2021-10-28
Elastic membrane, substrate holding device, and polishing apparatus
Grant 11,088,011 - Yamaki , et al. August 10, 2
2021-08-10
Substrate Holding Apparatus, Substrate Suction Determination Method, Substrate Polishing Apparatus, Substrate Polishing Method, Method Of Removing Liquid From Upper Suface Of Wafer To Be Polished, Elastic Film For Pressing Wafer Against Polishing Pad, Substrate Release Method, And Constant Amount Ga
App 20210217647 - Nabeya; Osamu ;   et al.
2021-07-15
Elastic membrane
Grant D918,161 - Togashi , et al. May 4, 2
2021-05-04
Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount g
Grant 10,991,613 - Nabeya , et al. April 27, 2
2021-04-27
Elastic membrane for semiconductor wafer polishing
Grant D913,977 - Yamaki , et al. March 23, 2
2021-03-23
Polishing Apparatus
App 20200361056 - Fukushima; Makoto ;   et al.
2020-11-19
Polishing apparatus
Grant 10,702,972 - Fukushima , et al.
2020-07-07
Polishing Apparatus And Method Of Controlling Inclination Of Stationary Ring
App 20200206868 - Owada; Tomoko ;   et al.
2020-07-02
Polishing Apparatus And Polishing Method
App 20200206867 - Togashi; Shingo ;   et al.
2020-07-02
Substrate Holding Apparatus, Substrate Suction Determination Method, Substrate Polishing Apparatus, Substrate Polishing Method,
App 20200043773 - Nabeya; Osamu ;   et al.
2020-02-06
Substrate polishing method, top ring, and substrate polishing apparatus
Grant 10,464,185 - Isono , et al. No
2019-11-05
Elastic membrane for semiconductor wafer polishing
Grant D859,332 - Yamaki , et al. Sept
2019-09-10
Polishing apparatus, control method and recording medium
Grant 10,391,603 - Yamaki , et al. A
2019-08-27
Elastic membrane, substrate holding apparatus, and polishing apparatus
Grant 10,213,896 - Fukushima , et al. Feb
2019-02-26
Elastic membrane for semiconductor wafer polishing
Grant D839,224 - Yamaki , et al. Ja
2019-01-29
Elastic Membrane, Substrate Holding Device, And Polishing Apparatus
App 20180301367 - YAMAKI; Satoru ;   et al.
2018-10-18
Polishing device and polishing method
Grant 9,999,956 - Namiki , et al. June 19, 2
2018-06-19
Substrate Holding Apparatus, Elastic Membrane, Polishing Apparatus, And Method For Replacing Elastic Membrane
App 20180117730 - NABEYA; Osamu ;   et al.
2018-05-03
Elastic membrane for semiconductor wafer polishing apparatus
Grant D813,180 - Fukushima , et al. March 20, 2
2018-03-20
Elastic membrane for semiconductor wafer polishing apparatus
Grant D808,349 - Fukushima , et al. January 23, 2
2018-01-23
Substrate holder, polishing apparatus, polishing method, and retaining ring
Grant 9,815,171 - Yamaki , et al. November 14, 2
2017-11-14
Substrate retaining ring
Grant D799,437 - Nabeya , et al. October 10, 2
2017-10-10
Substrate Polishing Method, Top Ring, And Substrate Polishing Apparatus
App 20170266779 - ISONO; Shintaro ;   et al.
2017-09-21
Retainer ring for substrate
Grant D794,585 - Nabeya , et al. August 15, 2
2017-08-15
Substrate retaining ring
Grant D793,976 - Fukushima , et al. August 8, 2
2017-08-08
Polishing Apparatus, Control Method And Recording Medium
App 20170173756 - YAMAKI; Satoru ;   et al.
2017-06-22
Substrate holder, polishing apparatus, and polishing method
Grant 9,662,764 - Fukushima , et al. May 30, 2
2017-05-30
Elastic Membrane, Substrate Holding Apparatus, And Polishing Apparatus
App 20170144267 - FUKUSHIMA; Makoto ;   et al.
2017-05-25
Elastic membrane, substrate holding apparatus, and polishing apparatus
Grant 9,573,244 - Fukushima , et al. February 21, 2
2017-02-21
Elastic membrane for semiconductor wafer polishing apparatus
Grant D770,990 - Fukushima , et al. November 8, 2
2016-11-08
Elastic membrane for semiconductor wafer polishing apparatus
Grant D769,200 - Fukushima , et al. October 18, 2
2016-10-18
Substrate retaining ring
Grant D766,849 - Fukushima , et al. September 20, 2
2016-09-20
Polishing apparatus and polishing method
Grant 9,403,255 - Fukushima , et al. August 2, 2
2016-08-02
Polishing apparatus having substrate holding apparatus
Grant 9,149,903 - Fukushima , et al. October 6, 2
2015-10-06
Polishing Device And Polishing Method
App 20150273650 - Namiki; Keisuke ;   et al.
2015-10-01
Elastic Membrane, Substrate Holding Apparatus, And Polishing Apparatus
App 20150273657 - FUKUSHIMA; Makoto ;   et al.
2015-10-01
Polishing apparatus having thermal energy measuring means
Grant 9,073,170 - Fukushima , et al. July 7, 2
2015-07-07
Substrate Holder, Polishing Apparatus, Polishing Method, And Retaining Ring
App 20150133038 - YAMAKI; Satoru ;   et al.
2015-05-14
Polishing Apparatus And Method
App 20150093968 - FUKUSHIMA; Makoto ;   et al.
2015-04-02
Polishing Apparatus And Method
App 20150093971 - FUKUSHIMA; Makoto ;   et al.
2015-04-02
Polishing apparatus having thermal energy measuring means
Grant 8,932,106 - Fukushima , et al. January 13, 2
2015-01-13
Polishing Apparatus
App 20140370794 - FUKUSHIMA; Makoto ;   et al.
2014-12-18
Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing method
Grant 8,870,625 - Togawa , et al. October 28, 2
2014-10-28
Elastic membrane
Grant 8,859,070 - Yasuda , et al. October 14, 2
2014-10-14
Polishing Apparatus And Polishing Method
App 20130324012 - FUKUSHIMA; Makoto ;   et al.
2013-12-05
Substrate Holder, Polishing Apparatus, And Polishing Method
App 20130196573 - FUKUSHIMA; Makoto ;   et al.
2013-08-01
Elastic Membrane
App 20130136884 - YASUDA; Hozumi ;   et al.
2013-05-30
Polishing Apparatus And Method
App 20120058709 - FUKUSHIMA; Makoto ;   et al.
2012-03-08
Elastic membrane for semiconductor wafer polishing apparatus
Grant D634,719 - Yasuda , et al. March 22, 2
2011-03-22
Elastic membrane for semiconductor wafer polishing apparatus
Grant D633,452 - Namiki , et al. March 1, 2
2011-03-01
Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing method
App 20090137190 - Togawa; Tetsuji ;   et al.
2009-05-28

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