Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass

Chung , et al. July 24, 2

Patent Grant D664170

U.S. patent number D664,170 [Application Number D/386,850] was granted by the patent office on 2012-07-24 for cleaning plate for inducing turbulent flow of a processing chamber cleaning glass. This patent grant is currently assigned to Applied Materials, Inc.. Invention is credited to Sumedh Acharya, David Bour, Anzhong Chang, Hua Chung, Xizi Dong, Hiroji Hanawa, Wei-Yung Hsu, Sang Won Kang, Kyawwin Jason Maung, Donald J. K. Olgado, David H. Quach, Alexander Tam.


United States Patent D664,170
Chung ,   et al. July 24, 2012

Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass

Claims

CLAIM The ornamental design for a cleaning plate for inducing turbulent flow of a processing chamber cleaning glass, as shown.
Inventors: Chung; Hua (San Jose, CA), Dong; Xizi (Sunnyvale, CA), Maung; Kyawwin Jason (Daly City, CA), Hanawa; Hiroji (Sunnyvale, CA), Kang; Sang Won (San Jose, CA), Quach; David H. (San Jose, CA), Olgado; Donald J. K. (Palo Alto, CA), Bour; David (Cupertino, CA), Hsu; Wei-Yung (San Jose, CA), Tam; Alexander (Union City, CA), Chang; Anzhong (San Jose, CA), Acharya; Sumedh (Pune, IN)
Assignee: Applied Materials, Inc. (Santa Clara, CA)
Appl. No.: D/386,850
Filed: March 4, 2011

Current U.S. Class: D15/144
Current International Class: 1509
Field of Search: ;D15/144

References Cited [Referenced By]

U.S. Patent Documents
D263678 April 1982 Dewey
D320361 October 1991 Karasawa
D327111 June 1992 Hemming
D414406 September 1999 Meyer
6155203 December 2000 Kennedy et al.
6277235 August 2001 Wing et al.
6652712 November 2003 Wang et al.
D528407 September 2006 Schwab
7431772 October 2008 Murugesh et al.
D619152 July 2010 Evatt et al.
D651062 December 2011 Wackwitz
2002/0020429 February 2002 Selbrede et al.
2006/0254519 November 2006 Brcka
2011/0308551 December 2011 Chung et al.
2012/0000490 January 2012 Chung et al.
2012/0037190 February 2012 Jakob et al.
Foreign Patent Documents
2005-072291 Mar 2005 JP

Other References

International Search Report dated Feb. 9, 2012 for International Application No. PCT/US2011/040197. cited by other .
Taiwan Office Action dated Feb. 17, 2012 for Taiwan Design Patent Application No. 100304292. cited by other .
International Search Report dated Feb. 9, 2012, Application No. PCT/US2011/040197. cited by other .
Japanese Office Action issued Feb. 21, 2012 for Japanese Application No. 2011-019695. cited by other.

Primary Examiner: Palasik; Patricia
Attorney, Agent or Firm: Patterson & Sheridan, LLP

Description



This invention was made with Government support under DE-EE0003331 awarded by DOE. The Government has certain rights in this invention.

FIG. 1 is a cleaning plate for inducing turbulent flow of a processing chamber cleaning gas.

FIG. 2 is a top plan view of the cleaning plate of FIG. 1.

FIG. 3 is a bottom isometric view of the cleaning plate of FIG. 1.

FIG. 4 is a bottom plan view of the cleaning plate of FIG. 1.

FIG. 5 is a side perspective view of the cleaning plate of 1; and,

FIG. 6 is an enlarged partial view of FIG. 3.

The broken lines in the figures form no part of the claimed design.

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