Hanawa; Hiroji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Hanawa; Hiroji.The latest application filed is for "plasma processing using multiple radio frequency power feeds for improved uniformity".

Company Profile

4.115.112

Hanawa; Hiroji - Sunnyvale CA
Hanawa; Hiroji - US
Hanawa; Hiroji - Sunnyvalle CA
Hanawa; Hiroji - Santa Clara CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma processing using multiple radio frequency power feeds for improved uniformity Grant 11,276,562 - Ye , et al. March 15, 2	2022-03-15
Plasma Processing Using Multiple Radio Frequency Power Feeds For Improved Uniformity App 20200203132 - YE; Zheng John ; et al.	2020-06-25
Plasma processing using multiple radio frequency power feeds for improved uniformity Grant 10,580,623 - Ye , et al.	2020-03-03
Rotatable substrate support having radio frequency applicator Grant 10,460,915 - Kobayashi , et al. Oc	2019-10-29
Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system Grant 10,403,535 - Ye , et al. Sep	2019-09-03
Rotatable Substrate Support Having Radio Frequency Applicator App 20170236693 - KOBAYASHI; Satoru ; et al.	2017-08-17
Method And Apparatus For Clamping And Declamping Substrates Using Electrostatic Chucks App 20170162417 - YE; Zheng John ; et al.	2017-06-08
Methods of directing magnetic fields in a plasma source, and associated systems Grant 9,305,749 - Ye , et al. April 5, 2	2016-04-05
Method And Apparatus Of Processing Wafers With Compressive Or Tensile Stress At Elevated Temperatures In A Plasma Enhanced Chemical Vapor Deposition System App 20160049323 - YE; Zheng John ; et al.	2016-02-18
Methods Of Directing Magnetic Fields In A Plasma Source, And Associated Systems App 20150228456 - YE; ZHENG JOHN ; et al.	2015-08-13
Plasma Processing Using Multiple Radio Frequency Power Feeds For Improved Uniformity App 20150136325 - YE; Zheng John ; et al.	2015-05-21
Rotatable Substrate Support Having Radio Frequency Applicator App 20150083042 - KOBAYASHI; Satoru ; et al.	2015-03-26
Gas distribution showerhead and method of cleaning Grant 8,980,379 - Hanawa , et al. March 17, 2	2015-03-17
In-situ VHF current sensor for a plasma reactor Grant 8,970,226 - Hanawa , et al. March 3, 2	2015-03-03
Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas Grant 8,910,644 - Chung , et al. December 16, 2	2014-12-16
Plasma immersion ion implantation reactor with extended cathode process ring Grant 8,900,405 - Porshnev , et al. December 2, 2	2014-12-02
Method for conformal plasma immersed ion implantation assisted by atomic layer deposition Grant 8,709,924 - Hanawa , et al. April 29, 2	2014-04-29
In-situ Vhf Current Sensor For A Plasma Reactor App 20130320998 - HANAWA; HIROJI ; et al.	2013-12-05
Apparatus for VHF impedance match tuning Grant 8,578,879 - Ramaswamy , et al. November 12, 2	2013-11-12
In-situ VHF voltage sensor for a plasma reactor Grant 8,513,939 - Hanawa , et al. August 20, 2	2013-08-20
Radiation heating efficiency by increasing optical absorption of a silicon containing material Grant 8,455,374 - Hanawa , et al. June 4, 2	2013-06-04
Apparatus And Method For Hvpe Processing Using A Plasma App 20130087093 - Olgado; Donald J.K. ; et al.	2013-04-11
Plasma Assisted Hvpe Chamber Design App 20130032085 - HANAWA; Hiroji ; et al.	2013-02-07
Plasma reactor with uniform process rate distribution by improved RF ground return path Grant 8,360,003 - Nguyen , et al. January 29, 2	2013-01-29
Substrate support having fluid channel Grant 8,279,577 - Nguyen , et al. October 2, 2	2012-10-02
Plasma Immersion Chamber App 20120199071 - COLLINS; KENNETH S. ; et al.	2012-08-09
Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass Grant D664,170 - Chung , et al. July 24, 2	2012-07-24
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces Grant 8,168,519 - Li , et al. May 1, 2	2012-05-01
In-situ Vhf Voltage/current Sensors For A Plasma Reactor App 20120086464 - Hanawa; Hiroji ; et al.	2012-04-12
Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system Grant 8,148,977 - Ramaswamy , et al. April 3, 2	2012-04-03
Gas Distribution Showerhead With High Emissivity Surface App 20120052216 - Hanawa; Hiroji ; et al.	2012-03-01
Method And Apparatus For Inducing Turbulent Flow Of A Processing Chamber Cleaning Gas App 20110308551 - Chung; Hua ; et al.	2011-12-22
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator Grant 8,080,479 - Collins , et al. December 20, 2	2011-12-20
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes Grant 8,076,247 - Collins , et al. December 13, 2	2011-12-13
Plasma immersion ion implantation reactor having multiple ion shower grids Grant 8,058,156 - Hanawa , et al. November 15, 2	2011-11-15
Radiation Heating Efficiency By Increasing Optical Absorption Of A Silicon Containing Material App 20110272709 - HANAWA; HIROJI ; et al.	2011-11-10
Multi-Zone Induction Heating for Improved Temperature Uniformity in MOCVD and HVPE Chambers App 20110259879 - Hanawa; Hiroji ; et al.	2011-10-27
Removal Of Surface Dopants From A Substrate App 20110256691 - Ramaswamy; Kartik ; et al.	2011-10-20
Plasma Immersion Ion Implantation Method Using A Pure Or Nearly Pure Silicon Seasoning Layer On The Chamber Interior Surfaces App 20110207307 - Li; Shijian ; et al.	2011-08-25
Removal of surface dopants from a substrate Grant 7,989,329 - Ramaswamy , et al. August 2, 2	2011-08-02
Plasma reactor with reduced electrical skew using electrical bypass elements Grant 7,988,815 - Rauf , et al. August 2, 2	2011-08-02
Plasma processing apparatus Grant 7,972,469 - Hanawa , et al. July 5, 2	2011-07-05
Novel Method For Conformal Plasma Immersed Ion Implantation Assisted By Atomic Layer Deposition App 20110159673 - Hanawa; Hiroji ; et al.	2011-06-30
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces Grant 7,968,439 - Li , et al. June 28, 2	2011-06-28
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity Grant 7,968,469 - Collins , et al. June 28, 2	2011-06-28
Process for wafer backside polymer removal and wafer front side photoresist removal Grant 7,967,996 - Collins , et al. June 28, 2	2011-06-28
Gas Distribution Showerhead And Method Of Cleaning App 20110052833 - HANAWA; HIROJI ; et al.	2011-03-03
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources Grant 7,884,025 - Collins , et al. February 8, 2	2011-02-08
Substrate Support Having Fluid Channel App 20110024047 - NGUYEN; Andrew ; et al.	2011-02-03
Apparatus For Vhf Impedance Match Tuning App 20110023780 - RAMASWAMY; KARTIK ; et al.	2011-02-03
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources Grant 7,879,731 - Collins , et al. February 1, 2	2011-02-01
Plasma Reactor With Rf Generator And Automatic Impedance Match With Minimum Reflected Power-seeking Control App 20110009999 - Zhang; Chunlei ; et al.	2011-01-13
Plasma Uniformity Control Through Vhf Cathode Ground Return With Feedback Stabilization Of Vhf Cathode Impedance App 20110005679 - HANAWA; HIROJI ; et al.	2011-01-13
Plasma Reactor With Uniform Process Rate Distribution By Improved Rf Ground Return Path App 20110005685 - Nguyen; Andrew ; et al.	2011-01-13
Etching Low-k Dielectric Or Removing Resist With A Filtered Ionized Gas App 20100270262 - HANAWA; Hiroji ; et al.	2010-10-28
Substrate support having heat transfer system Grant 7,768,765 - Nguyen , et al. August 3, 2	2010-08-03
Plasma immersion ion implantation reactor having an ion shower grid Grant 7,767,561 - Hanawa , et al. August 3, 2	2010-08-03
Apparatus For Characterizing A Magnetic Field In A Magnetically Enhanced Substrate Processing System App 20100188077 - RAMASWAMY; KARTIK ; et al.	2010-07-29
Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage Grant 7,700,465 - Collins , et al. April 20, 2	2010-04-20
Chemical vapor deposition plasma reactor having plural ion shower grids Grant 7,695,590 - Hanawa , et al. April 13, 2	2010-04-13
RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor Grant 7,666,464 - Collins , et al. February 23, 2	2010-02-23
Workpiece Support For A Plasma Reactor With Controlled Apportionment Of Rf Power To A Process Kit Ring App 20100018648 - COLLINS; KENNETH S. ; et al.	2010-01-28
Capacitively Coupled Plasma Etch Chamber With Multiple Rf Feeds App 20100015357 - Hanawa; Hiroji ; et al.	2010-01-21
Semiconductor on insulator vertical transistor fabrication and doping process Grant 7,642,180 - Al-Bayati , et al. January 5, 2	2010-01-05
Folded Coaxial Resonators App 20090257927 - RAMASWAMY; KARTIK ; et al.	2009-10-15
Electrical Control Of Plasma Uniformity Using External Circuit App 20090230089 - BERA; KALLOL ; et al.	2009-09-17
Novel Method For Conformal Plasma Immersed Ion Implantation Assisted By Atomic Layer Deposition App 20090203197 - HANAWA; HIROJI ; et al.	2009-08-13
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces App 20090197401 - Li; Shijian ; et al.	2009-08-06
Process for wafer backside polymer removal with a ring of plasma under the wafer Grant 7,552,736 - Collins , et al. June 30, 2	2009-06-30
Removal Of Surface Dopants From A Substrate App 20090162996 - Ramaswamy; Kartik ; et al.	2009-06-25
Plasma immersion ion implantation reactor with extended cathode process ring App 20090120367 - Porshnev; Peter I. ; et al.	2009-05-14
Plasma immersion ion implantation process Grant 7,465,478 - Collins , et al. December 16, 2	2008-12-16
Plasma Processing Apparatus App 20080257261 - Hanawa; Hiroji ; et al.	2008-10-23
Plasma Processing Method App 20080260966 - Hanawa; Hiroji ; et al.	2008-10-23
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements Grant 7,430,984 - Hanawa , et al. October 7, 2	2008-10-07
O-ringless tandem throttle valve for a plasma reactor chamber Grant 7,428,915 - Nguyen , et al. September 30, 2	2008-09-30
Semiconductor substrate process using an optically writable carbon-containing mask Grant 7,429,532 - Ramaswamy , et al. September 30, 2	2008-09-30
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing Grant 7,422,775 - Ramaswamy , et al. September 9, 2	2008-09-09
Process for wafer backside polymer removal and wafer front side photoresist removal App 20080179291 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes App 20080180028 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources App 20080182416 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources App 20080179011 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources App 20080182417 - Collins; Kenneth S. ; et al.	2008-07-31
Reactor For Wafer Backside Polymer Removal Using Plasma Products In A Lower Process Zone And Purge Gases In An Upper Process Zone App 20080179007 - COLLINS; KENNETH S. ; et al.	2008-07-31
Reactor For Wafer Backside Polymer Removal Using An Etch Plasma Feeding A Lower Process Zone And A Scavenger Plasma Feeding An Upper Process Zone App 20080179008 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources App 20080178803 - COLLINS; KENNETH S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal With A Ring Of Plasma Under The Wafer App 20080178913 - COLLINS; KENNETH S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal With A Plasma Stream App 20080179289 - COLLINS; KENNETH S. ; et al.	2008-07-31
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity App 20080179181 - COLLINS; KENNETH S. ; et al.	2008-07-31
Temperature-switched Process For Wafer Backside Polymer Removal And Front Side Photoresist Strip App 20080179290 - Collins; Kenneth S. ; et al.	2008-07-31
Reactor For Wafer Backside Polymer Removal Having An Etch Plasma Jet Stream Source App 20080179009 - COLLINS; KENNETH S. ; et al.	2008-07-31
Process For Wafer Backside Polymer Removal And Wafer Front Side Scavenger Plasma App 20080179288 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator App 20080182418 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Immersion Chamber App 20080173237 - Collins; Kenneth S. ; et al.	2008-07-24
Low temperature CVD process with selected stress of the CVD layer on CMOS devices Grant 7,393,765 - Hanawa , et al. July 1, 2	2008-07-01
Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer Grant 7,335,611 - Ramaswamy , et al. February 26, 2	2008-02-26
Semiconductor on insulator vertical transistor fabrication and doping process App 20080044960 - Al-Bayati; Amir ; et al.	2008-02-21
Semiconductor substrate process using a low temperature deposited carbon-containing hard mask Grant 7,323,401 - Ramaswamy , et al. January 29, 2	2008-01-29
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage Grant 7,320,734 - Collins , et al. January 22, 2	2008-01-22
Copper barrier reflow process employing high speed optical annealing Grant 7,312,148 - Ramaswamy , et al. December 25, 2	2007-12-25
Low temperature plasma deposition process for carbon layer deposition Grant 7,312,162 - Ramaswamy , et al. December 25, 2	2007-12-25
Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage Grant 7,303,982 - Collins , et al. December 4, 2	2007-12-04
Semiconductor on insulator vertical transistor fabrication and doping process Grant 7,294,563 - Al-Bayati , et al. November 13, 2	2007-11-13
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor Grant 7,292,428 - Hanawa , et al. November 6, 2	2007-11-06
Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage Grant 7,291,545 - Collins , et al. November 6, 2	2007-11-06
Chemical vapor deposition plasma process using plural ion shower grids Grant 7,291,360 - Hanawa , et al. November 6, 2	2007-11-06
Plasma immersion ion implantation process Grant 7,288,491 - Collins , et al. October 30, 2	2007-10-30
Monitoring A Metal Layer During Chemical Mechanical Polishing App 20070212987 - Hanawa; Hiroji ; et al.	2007-09-13
Low temperature CVD process with selected stress of the CVD layer on CMOS devices App 20070212811 - Hanawa; Hiroji ; et al.	2007-09-13
Substrate Support Having Heat Transfer System App 20070165356 - Nguyen; Andrew ; et al.	2007-07-19
Chemical vapor deposition plasma process using an ion shower grid Grant 7,244,474 - Hanawa , et al. July 17, 2	2007-07-17
Monitoring a metal layer during chemical mechanical polishing Grant 7,229,340 - Hanawa , et al. June 12, 2	2007-06-12
Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20070119546 - Collins; Kenneth S. ; et al.	2007-05-31
Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer Grant 7,223,676 - Hanawa , et al. May 29, 2	2007-05-29
Substrate support having heat transfer system Grant 7,221,553 - Nguyen , et al. May 22, 2	2007-05-22
Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement Grant 7,183,177 - Al-Bayati , et al. February 27, 2	2007-02-27
Ion Implanted Insulator Material With Reduced Dielectric Constant App 20070042580 - Al-Bayati; Amir ; et al.	2007-02-22
Copper barrier reflow process employing high speed optical annealing App 20070032004 - Ramaswamy; Kartik ; et al.	2007-02-08
Semiconductor substrate process using a low temperature deposited carbon-containing hard mask App 20070032054 - Ramaswamy; Kartik ; et al.	2007-02-08
Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer App 20070032095 - Ramaswamy; Kartik ; et al.	2007-02-08
Semiconductor substrate process using an optically writable carbon-containing mask App 20070032082 - Ramaswamy; Kartik ; et al.	2007-02-08
Method for ion implanting insulator material to reduce dielectric constant Grant 7,166,524 - Al-Bayati , et al. January 23, 2	2007-01-23
Low temperature absorption layer deposition and high speed optical annealing system App 20060260545 - Ramaswamy; Kartik ; et al.	2006-11-23
Low temperature plasma deposition process for carbon layer deposition App 20060264060 - Ramaswamy; Kartik ; et al.	2006-11-23
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing App 20060263540 - Ramaswamy; Kartik ; et al.	2006-11-23
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage Grant 7,137,354 - Collins , et al. November 21, 2	2006-11-21
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor App 20060238953 - Hanawa; Hiroji ; et al.	2006-10-26
O-ringless tandem throttle valve for a plasma reactor chamber App 20060237136 - Nguyen; Andrew ; et al.	2006-10-26
Electron flood apparatus and ion implantation system Grant 7,126,138 - Ito , et al. October 24, 2	2006-10-24
Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing Grant 7,109,098 - Ramaswamy , et al. September 19, 2	2006-09-19
Externally excited torroidal plasma source Grant 7,094,316 - Hanawa , et al. August 22, 2	2006-08-22
Plasma immersion ion implantation process Grant 7,094,670 - Collins , et al. August 22, 2	2006-08-22
Monitoring a metal layer during chemical mechanical polishing App 20060154570 - Hanawa; Hiroji ; et al.	2006-07-13
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage Grant 7,037,813 - Collins , et al. May 2, 2	2006-05-02
RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor App 20060088655 - Collins; Kenneth S. ; et al.	2006-04-27
Plasma immersion ion implantation process App 20060081558 - Collins; Kenneth S. ; et al.	2006-04-20
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20060073683 - Collins; Kenneth S. ; et al.	2006-04-06
Method and apparatus for monitoring a metal layer during chemical mechanical polishing Grant 7,001,246 - Hanawa , et al. February 21, 2	2006-02-21
Plasma immersion ion implantation reactor having multiple ion shower grids App 20060019039 - Hanawa; Hiroji ; et al.	2006-01-26
Plasma immersion ion implantation reactor having an ion shower grid App 20060019477 - Hanawa; Hiroji ; et al.	2006-01-26
Eddy current sensing of metal removal for chemical mechanical polishing App 20060009128 - Hanawa; Hiroji ; et al.	2006-01-12
Eddy current sensing of metal removal for chemical mechanical polishing Grant 6,975,107 - Hanawa , et al. December 13, 2	2005-12-13
Plasma immersion ion implantation apparatus App 20050230047 - Collins, Kenneth S. ; et al.	2005-10-20
Chemical vapor deposition plasma process using an ion shower grid App 20050214477 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma process using plural ion shower grids App 20050214478 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma reactor having an ion shower grid App 20050211171 - Hanawa, Hiroji ; et al.	2005-09-29
Reactive sputter deposition plasma reactor and process using plural ion shower grids App 20050211547 - Hanawa, Hiroji ; et al.	2005-09-29
Reactive sputter deposition plasma process using an ion shower grid App 20050211546 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma reactor having plural ion shower grids App 20050211170 - Hanawa, Hiroji ; et al.	2005-09-29
Externally excited torroidal plasma source with magnetic control of ion distribution Grant 6,939,434 - Collins , et al. September 6, 2	2005-09-06
Method for ion implanting insulator material to reduce dielectric constant App 20050191828 - Al-Bayati, Amir ; et al.	2005-09-01
Plasma immersion ion implantation process App 20050191827 - Collins, Kenneth S. ; et al.	2005-09-01
Plasma immersion ion implantation process App 20050191830 - Collins, Kenneth S. ; et al.	2005-09-01
Method for monitoring a metal layer during chemical mechanical polishing using a phase difference signal Grant 6,930,478 - Hanawa , et al. August 16, 2	2005-08-16
Method and apparatus for monitoring a metal layer during chemical mechanical polishing Grant 6,924,641 - Hanawa , et al. August 2, 2	2005-08-02
Semiconductor on insulator vertical transistor fabrication and doping process App 20050136604 - Al-Bayati, Amir ; et al.	2005-06-23
Electron flood apparatus and ion implantation system App 20050116156 - Ito, Hiroyuki ; et al.	2005-06-02
Fabrication of silicon-on-insulator structure using plasma immersion ion implantation Grant 6,893,907 - Maydan , et al. May 17, 2	2005-05-17
Apparatus for monitoring a metal layer during chemical mechanical polishing using a phase difference signal Grant 6,878,036 - Hanawa , et al. April 12, 2	2005-04-12
Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement App 20050070073 - Al-Bayati, Amir ; et al.	2005-03-31
Plasma immersion ion implantation system including an inductively coupled plasma source having low dissociation and low minimum plasma voltage App 20050051271 - Collins, Kenneth S. ; et al.	2005-03-10
Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage App 20050051272 - Collins, Kenneth S. ; et al.	2005-03-10
High-Frequency electrostatically shielded toroidal plasma and radical source App 20040237897 - Hanawa, Hiroji ; et al.	2004-12-02
Substrate support having heat transfer system App 20040212947 - Nguyen, Andrew ; et al.	2004-10-28
Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer App 20040200417 - Hanawa, Hiroji ; et al.	2004-10-14
Fabrication of silicon-on-insulator structure using plasma immersion ion implantation App 20040166612 - Maydan, Dan ; et al.	2004-08-26
Plasma immersion ion implantation system including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20040149217 - Collins, Kenneth S. ; et al.	2004-08-05
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20040149218 - Collins, Kenneth S. ; et al.	2004-08-05
Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20040112542 - Collins, Kenneth S. ; et al.	2004-06-17
Plasma immersion ion implantation apparatus including an inductively coupled plasma source having low dissociation and low minimum plasma voltage App 20040107908 - Collins, Kenneth S. ; et al.	2004-06-10
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage App 20040107906 - Collins, Kenneth S. ; et al.	2004-06-10
Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage App 20040107909 - Collins, Kenneth S. ; et al.	2004-06-10
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage App 20040107907 - Collins, Kenneth S. ; et al.	2004-06-10
Low loss RF bias electrode for a plasma reactor with enhanced wafer edge RF coupling and highly efficient wafer cooling App 20040027781 - Hanawa, Hiroji ; et al.	2004-02-12
Inductive plasma loop enhancing magnetron sputtering Grant 6,679,981 - Pan , et al. January 20, 2	2004-01-20
Externally excited torroidal plasma source with magnetic control of ion distribution App 20030226641 - Collins, Kenneth S. ; et al.	2003-12-11
Apparatus for monitoring a metal layer during chemical mechanical polishing using a phase difference signal App 20030216105 - Hanawa, Hiroji ; et al.	2003-11-20
Method for monitoring a metal layer during chemical mechanical polishing using a phase difference signal App 20030206010 - Hanawa, Hiroji ; et al.	2003-11-06
Method and apparatus for monitoring a metal layer during chemical mechanical polishing App 20030201770 - Hanawa, Hiroji ; et al.	2003-10-30
Method for monitoring a metal layer during chemical mechanical polishing App 20030201769 - Hanawa, Hiroji ; et al.	2003-10-30
High-frequency electrostatically shielded toroidal plasma and radical source Grant 6,634,313 - Hanawa , et al. October 21, 2	2003-10-21
Externally excited torroidal plasma source with a gas distribution plate Grant 6,551,446 - Hanawa , et al. April 22, 2	2003-04-22
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements App 20030047449 - Hanawa, Hiroji ; et al.	2003-03-13
Externally excited multiple torroidal plasma source Grant 6,494,986 - Hanawa , et al. December 17, 2	2002-12-17
Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate Grant 6,468,388 - Hanawa , et al. October 22, 2	2002-10-22
Externally excited torroidal plasma source using a gas distribution plate Grant 6,453,842 - Hanawa , et al. September 24, 2	2002-09-24
High-frequency electrostatically shielded toroidal plasma and radical source App 20020108713 - Hanawa, Hiroji ; et al.	2002-08-15
Method of processing a workpiece using an externally excited torroidal plasma source Grant 6,410,449 - Hanawa , et al. June 25, 2	2002-06-25
Externally excited torroidal plasma source Grant 6,348,126 - Hanawa , et al. February 19, 2	2002-02-19
The dome: shape and temperature controlled surfaces App 20020000198 - Ishikawa, Tetsuya ; et al.	2002-01-03
Dome: shape and temperature controlled surfaces Grant 6,286,451 - Ishikawa , et al. September 11, 2	2001-09-11
RF plasma reactor with hybrid conductor and multi-radius dome ceiling Grant 6,270,617 - Yin , et al. August 7, 2	2001-08-07
RF plasma reactor with hybrid conductor and multi-radius dome ceiling Grant 6,248,250 - Hanawa , et al. June 19, 2	2001-06-19
Process kit Grant 6,189,483 - Ishikawa , et al. February 20, 2	2001-02-20
Symmetric tunable inductively coupled HDP-CVD reactor Grant 6,170,428 - Redeker , et al. January 9, 2	2001-01-09
Multi-zone RF inductively coupled source configuration Grant 6,083,344 - Hanawa , et al. July 4, 2	2000-07-04
Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor Grant 6,027,601 - Hanawa February 22, 2	2000-02-22
Inductively and multi-capacitively coupled plasma reactor Grant 6,020,686 - Ye , et al. February 1, 2	2000-02-01
Lift pin for dechucking substrates Grant 5,900,062 - Loewenhardt , et al. May 4, 1	1999-05-04
Plasma uniformity control for an inductive plasma source Grant 5,897,712 - Hanawa , et al. April 27, 1	1999-04-27
Broad-band adjustable power ratio phase-inverting plasma reactor Grant 5,865,937 - Shan , et al. February 2, 1	1999-02-02
High frequency semiconductor wafer processing apparatus and method Grant 5,849,136 - Mintz , et al. December 15, 1	1998-12-15
RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers Grant 5,817,534 - Ye , et al. October 6, 1	1998-10-06
RF plasma reactor with hybrid conductor and multi-radius dome ceiling Grant 5,777,289 - Hanawa , et al. July 7, 1	1998-07-07
RF plasma reactor with hybrid conductor and multi-radius dome ceiling Grant 5,753,044 - Hanawa , et al. May 19, 1	1998-05-19
Inductively and multi-capacitively coupled plasma reactor Grant 5,710,486 - Ye , et al. January 20, 1	1998-01-20
Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor Grant 5,688,357 - Hanawa November 18, 1	1997-11-18
High-frequency semiconductor wafer processing apparatus and method Grant 5,618,382 - Mintz , et al. April 8, 1	1997-04-08
Process and apparatus for etching metal in integrated circuit structure with high selectivity to photoresist and good metal etch residue removal Grant 5,614,060 - Hanawa March 25, 1	1997-03-25
Fluid concentration detecting apparatus Grant 5,585,729 - Toshima , et al. December 17, 1	1996-12-17
Plasma reactor with multi-section RF coil and isolated conducting lid Grant 5,540,824 - Yin , et al. July 30, 1	1996-07-30
Composite diagnostic wafer for semiconductor wafer processing systems Grant 5,451,784 - Loewenhardt , et al. September 19, 1	1995-09-19
Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication Grant 5,449,432 - Hanawa September 12, 1	1995-09-12
Collimation hardware with RF bias rings to enhance sputter and/or substrate cavity ion generation efficiency Grant 5,431,799 - Mosely , et al. July 11, 1	1995-07-11
High-frequency semiconductor wafer processing method using a negative self-bias Grant 5,223,457 - Mintz , et al. June 29, 1	1993-06-29
Process and apparatus for forming stoichiometric layer of a metal compound by closed loop voltage controlled reactive sputtering Grant 5,108,569 - Gilboa , et al. April 28, 1	1992-04-28
Ozone generator cell Grant 4,882,129 - Andrews , et al. November 21, 1	1989-11-21