U.S. patent application number 10/646460 was filed with the patent office on 2005-03-10 for plasma immersion ion implantation system including an inductively coupled plasma source having low dissociation and low minimum plasma voltage.
This patent application is currently assigned to APPLIED MATERIALS, INC.. Invention is credited to Al-Bayati, Amir, Collins, Kenneth S., Gallo, Biagio, Hanawa, Hiroji, Monroy, Gonzalo Antonio, Nguyen, Andrew, Ramaswamy, Kartik.
Application Number | 20050051271 10/646460 |
Document ID | / |
Family ID | 29710179 |
Filed Date | 2005-03-10 |
United States Patent
Application |
20050051271 |
Kind Code |
A1 |
Collins, Kenneth S. ; et
al. |
March 10, 2005 |
Plasma immersion ion implantation system including an inductively
coupled plasma source having low dissociation and low minimum
plasma voltage
Abstract
A system for processing a workpiece includes a plasma immersion
implantation reactor with an enclosure comprising a side wall and a
ceiling and defining a chamber, and a workpiece support pedestal
within the chamber having a workpiece support surface facing the
ceiling and defining a process region extending generally across
the wafer support pedestal. The reactor includes a gas distribution
apparatus for introducing a process gas containing a first species
to be ion implanted into a surface layer of the workpiece, and
inductively coupled source power applicator, and an RF plasma
source power generator coupled to the inductively coupled source
power applicator for inductively coupling RF source power into the
process zone. The reactor further includes an RF bias generator
having an RF bias frequency and coupled to the workpiece support
pedestal for applying an RF bias to the workpiece. The system
further includes a second wafer processing apparatus, and a wafer
transfer apparatus for transferring the workpiece between the
plasma immersion ion implantation reactor and the second wafer
processing apparatus.
Inventors: |
Collins, Kenneth S.; (San
Jose, CA) ; Hanawa, Hiroji; (Sunnyvale, CA) ;
Ramaswamy, Kartik; (Santa Clara, CA) ; Nguyen,
Andrew; (San Jose, CA) ; Al-Bayati, Amir; (San
Jose, CA) ; Gallo, Biagio; (Los Gatos, CA) ;
Monroy, Gonzalo Antonio; (San Francisco, CA) |
Correspondence
Address: |
Patent Counsel, M/S 2061
Legal Affairs Dept.
Applied Materials, Inc.
P.O. Box 450-A
Santa Clara
CA
95035
US
|
Assignee: |
APPLIED MATERIALS, INC.
|
Family ID: |
29710179 |
Appl. No.: |
10/646460 |
Filed: |
August 22, 2003 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
10646460 |
Aug 22, 2003 |
|
|
|
10164327 |
Jun 5, 2002 |
|
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Current U.S.
Class: |
156/345.31 ;
156/345.32 |
Current CPC
Class: |
H01J 37/32412 20130101;
H01J 37/321 20130101; H01J 37/32082 20130101 |
Class at
Publication: |
156/345.31 ;
156/345.32 |
International
Class: |
C23F 001/00 |
Claims
1. A system for processing a workpiece, comprising: (A) a plasma
immersion ion implantation reactor, comprising: (1) an enclosure
comprising a side wall and a ceiling and defining a chamber; (2) a
workpiece support pedestal within the chamber having a workpiece
support surface facing said ceiling and defining a process region
extending generally across said wafer support pedestal; (3) gas
distribution apparatus for introducing a process gas containing a
first species to be ion implanted into a layer of said workpiece;
(4) an inductively coupled source power applicator; (5) an RF
plasma source power generator coupled to said inductively coupled
source power applicator for inductively coupling RF source power
into said process zone; (6) an RF bias generator having an RF bias
frequency and coupled to said workpiece support pedestal for
applying an RF bias to said workpiece; (B) a second wafer
processing apparatus; (C) wafer transfer apparatus for transferring
said workpiece between said plasma immersion ion implantation
reactor and said second wafer processing apparatus.
2. The system of claim 1 wherein said second wafer processing
apparatus comprises a cleaning species source plasma reactor
comprising: (1) a source of cleaning species precursor gases; (2) a
passage coupling said cleaning species source plasma reactor to
said plasma immersion ion implantation reactor.
3. The system of claim 2 wherein said cleaning species precursor
gases comprise a fluorine-containing species.
4. The system of claim 2 wherein said cleaning species precursor
gases comprise a hydrogen-containing species.
5. The system of claim 1 wherein said second wafer processing
apparatus comprises: an optical metrology chamber for obtaining a
measurement of ion implantation in a workpiece; a process
controller coupled to receive measurements from said optical
metrology chamber for controlling said plasma immersion ion
implantation reactor.
6. The system of claim 1 wherein said second wafer processing
apparatus comprises: an ion beam implantation apparatus for ion
implanting a second species into said layer of said workpiece.
7. The system of claim 6 wherein said layer is a semiconductor
material, and said first and second species are dopant impurities
of opposite conductivity types relative to said semiconductor
material.
8. The system of claim 1 wherein said second wafer processing
apparatus comprises: a second plasma immersion ion implantation
reactor for ion implanting a second species into said layer of said
workpiece.
9. The system of claim 8 wherein said layer is a semiconductor
material, and said first and second species are dopant impurities
of opposite conductivity types relative to said semiconductor
material.
10. The system of claim 1 wherein said second wafer processing
apparatus comprises an anneal chamber.
11. The system of claim 1 wherein said second wafer processing
apparatus comprises: a photoresist strip chamber.
12. The system of claim 1 wherein said second wafer processing
apparatus comprises a wet clean chamber.
13. The reactor of claim 1 wherein said RF bias frequency is
sufficiently low to enable ions traversing the plasma sheath to
attain an energy corresponding to a peak-to-peak voltage of said
bias power generator.
14. The reactor of claim 13 wherein said RF bias frequency is
sufficiently high to limit RF voltage drops across dielectric
layers on said workpiece support pedestal to less than a
predeterminded fraction of plasma sheath voltage near said
workpiece support.
15. The reactor of claim 14 wherein said predetermined fraction
corresponds to about 10%.
16. The apparatus of claim 1 wherein said RF bias generator has a
bias RF frequency that is sufficiently low for ions in a plasma
sheath near said workpiece to follow electric field oscillations
across said sheath at said bias frequency.
17. The apparatus of claim 16 wherein said bias RF frequency is
sufficiently high so that RF voltage drops across dielectric layers
on said workpiece do not exceed a predetermined fraction of the RF
bias voltage applied to said workpiece support.
18. The apparatus of claim 17 wherein said predetermined fraction
corresponds to about 10%.
19. The apparatus of claim 1 wherein said RF bias generator has a
bias frequency between 10 kHz and 10 MHz.
20. The apparatus of claim 1 wherein said RF bias generator has a
bias frequency between 50 kHz and 5 MHz.
21. The apparatus of claim 1 wherein said bias generator has a bias
frequency between 100 kHz and 3 MHz.
22. The apparatus of claim 1 wherein said bias generator has a bias
frequency of about 2 MHz to within about 5%.
23. A system for processing a workpiece, comprising a plurality of
plasma immersion ion implantation reactors, each of said plasma
immersion ion implantation reactors comprising: (1) an enclosure
comprising a side wall and a ceiling and defining a chamber; (2) a
workpiece support pedestal within the chamber having a workpiece
support surface facing said ceiling and defining a process region
extending generally across said wafer support pedestal; (3) gas
distribution apparatus for introducing a process gas containing a
first species to be ion implanted into a surface layer of said
workpiece; (4) an inductively coupled source power applicator; (5)
an RF plasma source power generator coupled to said inductively
coupled source power applicator for inductively coupling RF source
power into said process zone; (6) an RF bias generator having an RF
bias frequency and coupled to said workpiece support pedestal for
applying an RF bias to said workpiece.
24. The system of claim 23 further comprising a wafer handling
apparatus coupled to each of said plurality of plasma immersion ion
implantation reactors.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation-in-part of U.S. patent
application Ser. No. 10/164,327 filed Jun. 5, 2003 by Kenneth
Collins et al., entitled EXTERNALLY EXCITED TORROIDAL PLASMA SOURCE
WITH MAGNETIC CONTROL OF ION DISTRIBUTION and assigned to the
present assignee.
BACKGROUND OF THE INVENTION
[0002] The present invention is related to semiconductor
microelectronic circuit fabrication, and particularly to ion
implantation using plasma immersion.
[0003] The formation of semiconductor junctions on the surface of a
semiconductor crystal (such as silicon wafer) is generally carried
out by implantation of ions of either acceptor or donor impurity
species (e.g., Boron or Arsenic) into the surface. Currently, ion
implantation is efficiently carried out by ion beam accelerators.
An ion beam accelerator raster-scans a beam of donor or acceptor
ions across the semiconductor wafer surface. The implanted
semiconductor wafer surface is then annealed at elevated
temperatures in excess of 600.degree. C. in order to cause the
implanted species to be substituted for silicon atoms within the
crystal lattice. This process is defined as dopant activation. The
depth of the implanted species below the surface, in conjunction
with a subsequent anneal process, determines the junction depth,
which is determined by the kinetic energy of the ion beam and
subsequent annealing thermal budget. The conductance of the
implanted region of the semiconductor is determined by the junction
depth and the volume concentration of the thermally activated
implanted dopant species. The implanted dopant species
concentration is controlled by the rate at which the ion beam is
scanned across the semiconductor surface and the beam current. The
activated implanted dopant species concentration is controlled by
the above, and the subsequent anneal process (temperature and time
characteristics). For current semiconductor fabrication processes,
in which semiconductor circuit feature size is about 130 nm, ion
beam accelerators are suitable for ion implantation because the
junction depth is fairly deep (over 330 Angstroms) and the required
dopant dose is fairly modest (about 2.times.10.sup.14 to about
2.times.10.sup.15 ions/cm.sup.2). Such a modest dopant
concentration is fulfilled by an ion beam accelerator with an
implant operation lasting only minutes. Because of the deep
junction depth, the abruptness of the junction need be no smaller
than 6 nm/dec (i.e., nanometers per decade of concentration).
Therefore, ion energy distribution is not critical, and some ions
may have a kinetic energy that carries them somewhat beyond the
desired junction depth without degrading the abruptness beyond the
4.1 nm/dec level. Therefore, techniques for enhancing the ion beam
flux that compromise ion energy distribution can be used. These
techniques include using an ion beam that has a few times the
kinetic energy corresponding to the desired junction depth, or
about 2 keV, (and therefore several times the ion flux density),
and then electrically decelerating the ion beam down to the correct
kinetic energy (e.g., 500 eV) just before it impacts the
semiconductor wafer surface. The deceleration process is not
precise and leaves a fraction of implanted particles (neutrals)
above the correct energy level, which is sometimes referred to as a
high energy tail or energy contamination. The high energy tail
arises from the natural occurrence of neutrals in the ion beam and
the immunity of such neutrals from the electrostatic deceleration
process. Such neutrals therefore impact the wafer at the original
energy (e.g., 2 keV), so that they are implanted below the desired
junction depth, due to the high energy tail, causing a loss of
junction abruptness. But this is not harmful because of the
relatively relaxed requirement for junction abruptness (6 nm/dec).
Moreover, rapid thermal annealing by halogen lamps, for example,
tends to "wash out" the effect of the high energy tail due to
diffusion.
[0004] However, as semiconductor circuit feature size decreases
with progress in device speed, ion beam accelerators become less
efficient. For example, at a feature size of 65 nm, the junction
depth is only about 170 Angstroms and the abruptness is much
steeper, at 2.8 nm/dec. With such a shallow junction, the required
dopant dose is greater (to avoid an increased resistance), or about
10.sup.15 to about 2.times.10.sup.16 ions/cm.sup.2. In order to
activate such higher dopant concentrations in the silicon crystal,
and in order to avoid increasing junction depth during annealing,
dynamic surface annealing is advantageously employed, in which the
wafer surface (e.g., down to depth of order 1000 Angstroms) is
laser-heated to near melting (e.g., 1300 deg. C.) for a period of a
nanosecond to tens of milliseconds. Dynamic surface annealing
activates a higher concentration of dopant and increases junction
depth by less than 20 .ANG. compared with rapid thermal annealing.
(By comparison, rapid thermal annealing can add over 100 .ANG. to
the junction depth, which would double the junction depth in some
cases.) However, dynamic surface annealing does not reduce the high
energy tail. Therefore, in order to stay within the more stringent
junction abruptness requirement and in order to avoid a high energy
tail, the ion beam accelerator must be operated in drift mode, in
which the ions are accelerated up to but not beyond the kinetic
energy corresponding to the desired junction depth (e.g., only 500
eV), so that no ions will be implanted below the desired depth, and
no deceleration process is required. For example, a junction depth
of 10-20 nm may translate to an ion beam energy of only 500 eV.
Unfortunately, the lower ion energy in drift mode limits the ion
beam flux (and current), so that the time required to reach the
desired high dopant concentration can be as long as a half hour or
one hour. This problem arises particularly in shallow junction
implant of light species such as Boron, in which the beam voltage
must be reduced to avoid high velocity Boron ions being implanted
below the desired junction depth. The problem arises basically
because the space charge effects in the ion beam produce repulsive
forces between the ions in the beam in a radial direction,
generally, limiting the beam density and therefore the beam
current. Such effects become more important as the beam energy is
reduced (as it must be for implanting the lighter elements such as
Boron), resulting in lower beam currents and longer implant times.
Such long implant times greatly limit productivity and increase
production costs. For example, in order to avoid a decrease in
wafer through-put, the number of ion beam implant machines must be
increased. In the future, feature sizes will decrease further, down
to 45 nm, so that such problems will worsen in proportion as the
technology advances.
[0005] These problems pertain particularly to cases in which the
species to be implanted has a low atomic weight (such as Boron), so
that the acceleration voltage must be small, which translates into
a small ion beam flux and a long implant time. For higher atomic
weight species (such as Arsenic), the acceleration voltages are
much higher and the ion beam flux is therefore sufficiently high to
keep implantation times down to an acceptable level. One way of
permitting an increased beam acceleration voltage for lighter
implant species such as Boron, in order to improve ion flux and
reduce implant time, is to implant molecular ions consisting of one
Boron atom or more and another volatile species such as Fluorine,
Hydrogen, or other species. Examples of such molecular ions are
BF.sub.2, B.sub.10H.sub.14. Thus, implanting BF.sub.2 permits the
use of a much higher beam energy and therefore a higher and more
acceptable ion beam flux. However, while much of the implanted
fluorine tends to diffuse out of the silicon crystal during
annealing, a significant amount does not, leaving some crystal
lattice sites that contain neither a semiconductor atom (Si) nor a
dopant impurity atom (B), thus (for some applications) reducing the
overall quality of the semiconductor material. Therefore, this
technique is not desirable universally for all applications.
[0006] In summary, advances in technology dictate a more shallow
junction depth, a greater junction abruptness and a higher dopant
concentration in the semiconductor surface. Such advances in
technology (where features size decreases to 65 nm and ultimately
to 45 nm) render ion beam implantation of lighter dopants such as
Boron impractical. This is because the traditional ion beam
implanter provides too little ion beam flux in such
applications.
[0007] In order to find an ion source having much higher ion flux
for low atomic weight species such as Boron, the field has turned
to an ion source whose flux at a given implant depth is less
affected by the space charge effect or (indirectly) atomic weight,
namely a plasma ion source. Specifically, the semiconductor wafer
is immersed in a plasma consisting of dopant ions (such as Boron
ions). However, such plasma ion immersion implantation has been
plagued by various difficulties.
[0008] One type of plasma immersion ion implantation reactor
employs a pulsed D.C. voltage applied to a pedestal supporting the
semiconductor wafer in a vacuum chamber filled with a
dopant-containing gas such as BF3. The D.C. voltage creates a
plasma discharge in the chamber in which Boron ions and other ions
dissociated from the BF3 ions are accelerated into the wafer
surface. The D.C. voltage maintains the plasma by creation of
secondary electrons from collisions with the chamber surfaces or
wafer surface. The rate at which such collisions produce secondary
electrons depends upon the condition of the chamber surfaces.
Accordingly, such a reactor is unacceptably sensitive to changes in
the condition of the chamber surfaces due, for example, to
contamination of the chamber surfaces. As a result, such a plasma
ion immersion implantation reactor cannot maintain a target
junction depth or abruptness, for example, and is plagued by
contamination problems.
[0009] This type of reactor tends to produce a relatively low
density plasma and must be operated at relatively high chamber
pressure in order to maintain the plasma density. The high chamber
pressure and the lower plasma density dictate a thicker plasma
sheath with more collisions in the sheath that spread out ion
energy distribution. This spreading can result in a larger lateral
junction distribution and may reduce junction abruptness.
Furthermore, the reactor is sensitive to conditions on the wafer
backside because the plasma discharge depends upon ohmic contact
between the wafer backside and the wafer support pedestal.
[0010] One problem inherent with D.C. voltage applied to the wafer
support is that its pulse width must be such that the dopant ions
(e.g., Boron) are accelerated across the plasma sheath near the
wafer surface with sufficient energy to reach the desired junction
depth below the surface, while the pulse width must be limited to
avoid (discharge) any charge build-up on the wafer surface that
would cause device damage (charging damage). The limited pulse
width is problematic in that the periodic decrease in ion energy
can result in deposition on the semiconductor surface rather than
implantation, the deposition accumulating in a new layer that can
block implantation during the pulse on times. Another problem
arises because ions must impact the wafer surface with at least a
certain target energy in order to penetrate the surface up to a
desirable depth (the as-implanted junction depth) and become
substitutional below the surface and up to the desired annealed
junction depth during the annealing process. Below this energy,
they do not penetrate the surface up to the as-implanted junction
depth and do not become substitutional at the desired junction
depth upon annealing. Moreover, the ions below the target energy
may simply be deposited on the wafer surface, rather than being
implanted, to produce a film that can impede implantation.
Unfortunately, due to resistive and capacitive charging effects (RC
time constant) on dielectric films on the wafer that tend to
accompany a D.C. discharge, the ions reach the target energy during
only a fraction of each pulse period (e.g., during the first
microsecond), so that there is an inherent inefficiency. Moreover,
the resulting spread in ion energy reduces the abruptness of the
P-N junction. This problem cannot be solved by simply increasing
the bias voltage, since this would increase the junction depth
beyond the desired junction depth.
[0011] Another type of plasma immersion ion implantation reactor
employs inductive coupling to generate the plasma, in addition to
the pulsed D.C. voltage on the wafer. This type of reactor reduces
the problems associated with plasma maintenance from secondary
electrons, but still suffers from the problems associated with
pulsed D.C. voltages on the wafer discussed immediately above.
[0012] Another type of plasma ion immersion implantation reactor
employs an RF voltage applied to the wafer support pedestal that
both controls ion energy and maintains the plasma. As in the pulsed
D.C. voltage discussed above, the RF voltage on the wafer support
creates a plasma discharge in the chamber in which Boron ions and
other ions dissociated from the BF.sub.3 ions are accelerated into
the wafer surface. The RF voltage generates and maintains the
plasma mainly by capacitively coupling RF energy from the electrode
across the sheath to electrons in the plasma just above the sheath
(low pressure case) or electrons in the bulk plasma volume (high
pressure case). While such a reactor has reduced sensitivity to
chamber surface conditions as compared to reactors employing a
pulsed DC bias, it is still quite sensitive. Also, ion energy and
flux cannot be independently selected with a single RF power
source. Ion flux may still be unacceptably low for high throughput
applications with a single RF power source. Contamination due to
wall sputtering or etching may also be high due to elevated plasma
potential.
[0013] Another type of plasma ion immersion implantation reactor
employs a microwave power applicator for generating the plasma.
This reactor has a microwave waveguide pointed axially downward to
a magnetic field centered about the axis. Electron cyclotron
resonance (ECR) occurs in a particular surface of the field to
produce the plasma (for a microwave frequency of 2.45 GHz, this
surface is where the magnetic field is about 875 gauss). The
magnetic field is divergent, with a field gradient creating a drift
current towards the substrate being processed. This drift current
consists of both electrons (directly acted on by the interaction of
microwave induced electric field and divergent DC magnetic field)
and positively-charged ions (indirectly acted on by the deficit in
negative charge formed due to the out-flux of electrons) and
corresponding to a voltage of 10 to 100 eV. One problem is that the
magnetic field gradient is non-uniform, so that the radial
distribution of plasma ion energy is non-uniform, causing
non-uniform junction depths across the wafer. Another problem is
the relatively high ion energy directed at the wafer, limiting the
degree to which junction depths can be minimized. One way of
addressing the non-uniformity issue is to place the microwave ECR
source far above the wafer. The problem with such an approach is
that the ion density and flux is at least proportionately
decreased, thus reducing the productivity of the reactor. A related
problem is that, because the plasma ion density at the wafer
surface is reduced by the increased source-to-wafer distance, the
chamber pressure must be reduced in order to reduce recombination
losses. This rules out some applications that would be
advantageously carried out at high pressure (applications which
benefit from wide angular ion energy distribution) such as
conformal doping of polysilicon lines and three dimensional
devices. Another way of addressing the non-uniformity issue is to
place another magnet array between the source and the wafer, in an
effort to straighten the magnetic field. However, the additional
magnetic field would increase magnetic flux at the wafer surface,
increasing the risk of charge damage to semiconductor structures on
the wafer.
[0014] In summary, plasma immersion ion implantation reactors have
various limitations, depending upon the type of reactor: plasma
reactors in which a pulsed D.C. voltage is applied to the wafer
pedestal are too sensitive to chamber conditions and are
inefficient; and plasma reactors with microwave ECR sources tend to
produce non-uniform results. Thus, there is a need for a plasma
immersion ion implantation reactor that is free of the foregoing
limitations.
SUMMARY OF THE INVENTION
[0015] A system for processing a workpiece includes a plasma
immersion implantation reactor with an enclosure comprising a side
wall and a ceiling and defining a chamber, and a workpiece support
pedestal within the chamber having a workpiece support surface
facing the ceiling and defining a process region extending
generally across the wafer support pedestal. The reactor includes a
gas distribution apparatus for introducing a process gas containing
a first species to be ion implanted into a surface layer of the
workpiece, and inductively coupled source power applicator, and an
RF plasma source power generator coupled to the inductively coupled
source power applicator for inductively coupling RF source power
into the process zone. The reactor further includes an RF bias
generator having an RF bias frequency and coupled to the workpiece
support pedestal for applying an RF bias to the workpiece. The
system further includes a second wafer processing apparatus, and a
wafer transfer apparatus for transferring the workpiece between the
plasma immersion ion implantation reactor and the second wafer
processing apparatus.
BRIEF DESCRIPTION OF THE DRAWINGS
[0016] FIG. 1 illustrates a first case that maintains an overhead
torroidal plasma current path.
[0017] FIG. 2 is a side view of a case corresponding to the case of
FIG. 1.
[0018] FIG. 3 is a graph illustrating the behavior of free fluorine
concentration in the plasma with variations in wafer-to-ceiling gap
distance.
[0019] FIG. 4 is a graph illustrating the behavior of free fluorine
concentration in the plasma with variations in RF bias power
applied to the workpiece.
[0020] FIG. 5 is a graph illustrating the behavior of free fluorine
concentration in the plasma with variations in RF source power
applied to the coil antenna.
[0021] FIG. 6 is a graph illustrating the behavior of free fluorine
concentration in the plasma with variations in reactor chamber
pressure.
[0022] FIG. 7 is a graph illustrating the behavior of free fluorine
concentration in the plasma with variations in partial pressure of
an inert diluent gas such as Argon.
[0023] FIG. 8 is a graph illustrating the degree of dissociation of
process gas as a function of source power for an inductively
coupled reactor and for a reactor according to an embodiment of the
present invention.
[0024] FIG. 9 illustrates a variation of the case of FIG. 1.
[0025] FIGS. 10 and 11 illustrate a variation of the case of FIG. 1
in which a closed magnetic core is employed.
[0026] FIG. 12 illustrates another case of the invention in which a
torroidal plasma current path passes beneath the reactor
chamber.
[0027] FIG. 13 illustrates a variation of the case of FIG. 10 in
which plasma source power is applied to a coil wound around a
distal portion the closed magnetic core.
[0028] FIG. 14 illustrates a case that establishes two parallel
torroidal plasma currents.
[0029] FIG. 15 illustrates a case that establishes a plurality of
individually controlled parallel torroidal plasma currents.
[0030] FIG. 16 illustrates a variation of the case of FIG. 15 in
which the parallel torroidal plasma currents enter and exit the
plasma chamber through the vertical side wall rather than the
ceiling.
[0031] FIG. 17A illustrates a case that maintains a pair of
mutually orthogonal torroidal plasma currents across the surface of
the workpiece.
[0032] FIG. 17B illustrates the use of plural radial vanes in the
case of FIG. 17A.
[0033] FIGS. 18 and 19 illustrate an case of the invention in which
the torroidal plasma current is a broad belt that extends across a
wide path suitable for processing large wafers.
[0034] FIG. 20 illustrates a variation of the case of FIG. 18 in
which an external section of the torroidal plasma current path is
constricted.
[0035] FIG. 21 illustrates a variation of the case of FIG. 18
employing cylindrical magnetic cores whose axial positions may be
adjusted to adjust ion density distribution across the wafer
surface.
[0036] FIG. 22 illustrates a variation of FIG. 21 in which a pair
of windings are wound around a pair of groups of cylindrical
magnetic cores.
[0037] FIG. 23 illustrates a variation of FIG. 22 in which a single
common winding is wound around both groups of cores.
[0038] FIGS. 24 and 25 illustrate an case that maintains a pair of
mutually orthogonal torroidal plasma currents which are wide belts
suitable for processing large wafers.
[0039] FIG. 26 illustrates a variation of the case of FIG. 25 in
which magnetic cores are employed to enhance inductive
coupling.
[0040] FIG. 27 illustrates a modification of the case of FIG. 24 in
which the orthogonal plasma belts enter and exit the reactor
chamber through the vertical side wall rather than through the
horizontal ceiling.
[0041] FIG. 28A illustrates an implementation of the case of FIG.
24 which produces a rotating torroidal plasma current.
[0042] FIG. 28B illustrates a version of the case of FIG. 28A that
includes magnetic cores.
[0043] FIG. 29 illustrates a preferred case of the invention in
which a continuous circular plenum is provided to enclose the
torroidal plasma current.
[0044] FIG. 30 is a top sectional view corresponding to FIG.
29.
[0045] FIGS. 31A and 31B are front and side sectional views
corresponding to FIG. 30.
[0046] FIG. 32 illustrates a variation of the case 29 employing
three independently driven RF coils underneath the continuous
plenum facing at 120-degree intervals.
[0047] FIG. 33 illustrates a variation of the case of FIG. 32 in
which the three RF coils are driven at 120-degree phase to provide
an azimuthally rotating plasma.
[0048] FIG. 34 illustrates a variation of the case of FIG. 33 in
which RF drive coils are wound around vertical external ends of
respective magnetic cores whose opposite ends extend horizontally
under the plenum at symmetrically distributed angles.
[0049] FIG. 35 is a version of the case of FIG. 17 in which the
mutually transverse hollow conduits are narrowed as in the case of
FIG. 20.
[0050] FIG. 36 is a version of the case of FIG. 24 but employing a
pair of magnetic cores 3610, 3620 with respective windings 3630,
3640 therearound for connection to respective RF power sources.
[0051] FIG. 37 is a case corresponding to that of FIG. 35 but
having three instead of two reentrant conduits with a total of six
reentrant ports to the chamber.
[0052] FIG. 38 is a case corresponding to that of FIG. 38 but
having three instead of two reentrant conduits with a total of six
reentrant ports to the chamber.
[0053] FIG. 39 is a case corresponding to that of FIG. 35 in which
the external conduits join together in a common plenum 3910.
[0054] FIG. 40 is a case corresponding to that of FIG. 36 in which
the external conduits join together in a common plenum 4010.
[0055] FIG. 41 is a case corresponding to that of FIG. 37 in which
the external conduits join together in a common plenum 4110.
[0056] FIG. 42 is a case corresponding to that of FIG. 38 in which
the external conduits join together in a common plenum 4210.
[0057] FIG. 43 is a case corresponding to that of FIG. 17 in which
the external conduits join together in a common plenum 4310.
[0058] FIG. 44 illustrates cases a reactor similar to that of FIG.
1 and having a magnetic pole piece for controlling plasma ion
density uniformity.
[0059] FIG. 45 illustrates a reactor like that of FIG. 44 in which
the magnetic pole piece has a reduced diameter near the ceiling
surface, and the ceiling is a dual zone gas distribution plate.
[0060] FIGS. 46, 47 and 48 illustrate different shapes for the pole
piece.
[0061] FIG. 49 illustrates one implementation of the gas
distribution plate.
[0062] FIG. 50 is a detailed view of a gas injection orifice in
FIG. 49.
[0063] FIG. 51 is a graph depicting the magnetic field that the
magnetic pole piece can generate.
[0064] FIG. 52 is a graph of the magnetic field magnitude as a
function of radius.
[0065] FIGS. 53 and 54 illustrate different ways of controlling
process gas flow.
[0066] FIGS. 55A and 55B illustrate the use of a splitter in the
torroidal plasma path.
[0067] FIGS. 56A, 56B and 56C illustrate use of splitters where the
torroidal plasma current enters the chamber vertically.
[0068] FIGS. 57 and 58 illustrate different shapes for a
splitter.
[0069] FIGS. 59A and 59B illustrate use of splitters where the
torroidal plasma current enters the chamber radially.
[0070] FIGS. 60, 61, 62 and 63 illustrate the use of splitters
where the torroidal plasma current is introduced vertically at a
corner of the chamber.
[0071] FIG. 64 illustrates how a splitter may extend only part of
the process region height.
[0072] FIGS. 65A, 65B and 66 illustrate a splitter design adapted
to increase the effective radial path length of the torroidal
plasma current inside the chamber for a given chamber diameter.
[0073] FIG. 67 illustrates the use of MERIE magnets with the
torroidal plasma current source of FIG. 1.
[0074] FIGS. 68 and 69 illustrate the use of fins to better confine
the torroidal plasma current to the processing region.
[0075] FIGS. 70, 71 and 72 illustrate an RF power applicator having
distributed inductances.
[0076] FIG. 72 illustrates distributed inductances corresponding to
the FIGS. 70, 71A and 71B.
[0077] FIG. 73 illustrates a circular arrangement of the
distributed inductances of FIG. 72.
[0078] FIG. 74 illustrates distributed inductances and capacitances
in an arrangement corresponding to that of FIGS. 71A and 71B.
[0079] FIGS. 75 and 76 are schematic diagrams illustrating
different ways of inductively coupling RF power using the magnetic
core of FIGS. 71A and 71B.
[0080] FIG. 77 illustrates the use of an insulator layer to
electrically isolate the termination sections and torroidal tubes
of FIG. 44.
[0081] FIG. 78 illustrates how the uniformity control magnet or
magnetic pole may be placed under the wafer support pedestal.
[0082] FIG. 79 depicts an inductively coupled plasma immersion ion
implantation reactor having an RF bias power applicator.
[0083] FIGS. 80A, 80B and 80C illustrate, respectively, an applied
pulsed D.C. bias voltage, the corresponding sheath voltage behavior
and an applied RF bias voltage.
[0084] FIGS. 81A, 81B, 81C and 81D illustrate, respectively, an
energy distribution of ion flux, a cycle of applied RF bias
voltage, ion saturation current as a function of D.C. bias voltage,
and energy distribution of ion flux for different frequencies of RF
bias voltage.
[0085] FIGS. 82A and 82B illustrate the temporal relationship
between the power output waveforms of the source power generator
and the bias power generator in a push-pull mode.
[0086] FIGS. 82C and 82D illustrate the temporal relationship
between the power output waveforms of the source power generator
and the bias power generator in an in-synchronism mode.
[0087] FIGS. 82E and 82F illustrate the temporal relationship
between the power output waveforms of the source power generator
and the bias power generator in a symmetric mode.
[0088] FIGS. 82G and 82H illustrate the temporal relationship
between the power output waveforms of the source power generator
and the bias power generator in a non-symmetric mode.
[0089] FIGS. 83A and 83B illustrate different versions of a
capacitively coupled plasma immersion ion implantation reactor
having an RF bias power applicator.
[0090] FIG. 84 illustrates a plasma immersion ion implantation
reactor having a reentrant torroidal path plasma source.
[0091] FIG. 85 illustrates a plasma immersion ion implantation
reactor having a torroidal plasma source with two intersecting
reentrant plasma paths.
[0092] FIG. 86 illustrates an interior surface of the ceiling of
the reactor of FIG. 85.
[0093] FIG. 87 illustrates a gas distribution panel of the reactor
of FIG. 85.
[0094] FIG. 88 is a partial view of the reactor of FIG. 85 modified
to include a plasma control center electromagnet.
[0095] FIGS. 89A and 89B are side and top views, respectively, of a
version of the reactor of FIG. 88 having, in addition, a plasma
control outer electromagnet.
[0096] FIGS. 90A, 90B and 90C are cross-sectional side view of the
outer electromagnet of FIG. 89A with different gap distances of a
bottom plate for regulating magnetic flux.
[0097] FIG. 91 illustrates an RF bias power coupling circuit in the
reactor of FIG. 85.
[0098] FIG. 92 depicts an RF bias voltage waveform in accordance
with a bias voltage control feature.
[0099] FIG. 93 is a block diagram illustrating a control system for
controlling bias voltage in accordance with the feature illustrated
in FIG. 92.
[0100] FIG. 94 is a top view of a vacuum control valve employed in
the reactor of FIG. 85.
[0101] FIG. 95 is a cross-sectional side view of the valve of FIG.
94 in the closed position.
[0102] FIG. 96 is a side view of the interior surface of the
housing of the valve of FIG. 95 with an orientation at right angles
to that of FIG. 95.
[0103] FIG. 97 is a cross-sectional side view of a high voltage
wafer support pedestal useful in the reactor of FIG. 85.
[0104] FIG. 98 is an enlarged cross-sectional view of the wafer
support pedestal of FIG. 97 illustrating a fastener therein.
[0105] FIG. 99 is a block diagram illustrating an ion implantation
processing system including a plasma immersion ion implantation
reactor.
[0106] FIG. 100 is a graph illustrating electron density as a
function of applied plasma source power for the inductively coupled
plasma immersion ion implantation reactor of FIG. 79 and the
torroidal source plasma immersion ion implantation reactor of FIG.
85.
[0107] FIG. 101 is a graph illustrating free fluorine density as a
function of applied plasma source power for the inductively coupled
plasma immersion ion implantation reactor of FIG. 79 and the
torroidal source plasma immersion ion implantation reactor of FIG.
85.
[0108] FIG. 102 is a graph illustrating electron density as a
function of applied plasma source power for the capacitively
coupled plasma immersion ion implantation reactor of FIG. 83A and
the torroidal source plasma immersion ion implantation reactor of
FIG. 85.
[0109] FIG. 103 is a graph illustrating dopant concentration as a
function of junction depth for different ion energies in the
reactor of FIG. 85 and in a convention ion beam implant
machine.
[0110] FIG. 104 is a graph illustrating dopant concentration before
and after post-implant rapid thermal annealing.
[0111] FIG. 105 is a graph illustrating dopant concentration before
and after dynamic surface annealing in the torroidal source plasma
immersion ion implantation reactor of FIG. 85 and in a convention
ion beam implant machine.
[0112] FIG. 106 is a graph depicting wafer resistivity after ion
implantation and annealing as a function of junction depth obtained
with the reactor of FIG. 85 using dynamic surface annealing and
with a conventional ion beam implant machine using rapid thermal
annealing.
[0113] FIG. 107 is a graph depicting implanted dopant concentration
obtained with the reactor of FIG. 85 before and after dynamic
surface annealing.
[0114] FIG. 108 is a graph of RF bias voltage in the reactor of
FIG. 85 (left ordinate) and of beamline voltage in a beamline
implant machine (right ordinate) as a function of junction
depth.
[0115] FIG. 109 is a cross-sectional view of the surface of a wafer
during ion implantation of source and drain contacts and of the
polysilicon gate of a transistor.
[0116] FIG. 110 is a cross-sectional view of the surface of a wafer
during ion implantation of the source and drain extensions of a
transistor.
[0117] FIG. 111 is a flow diagram illustrating an ion implantation
process carried out using the reactor of FIG. 85.
[0118] FIG. 112 is a flow diagram illustrating a sequence of
possible pre-implant, ion implant and possible post implant
processes carried using the reactor of FIG. 85 in the system of
FIG. 99.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0119] Description of a Torroidal Source Reactor:
[0120] Referring to FIG. 1, a plasma reactor chamber 100 enclosed
by a cylindrical side wall 105 and a ceiling 110 houses a wafer
pedestal 115 for supporting a semiconductor wafer or workpiece 120.
A process gas supply 125 furnishes process gas into the chamber 100
through gas inlet nozzles 130a-130d extending through the side wall
105. A vacuum pump 135 controls the pressure within the chamber
100, typically holding the pressure below 0.5 milliTorr (mT). A
half-torroidal hollow tube enclosure or conduit 150 extends above
the ceiling 110 in a half circle. The conduit 150, although
extending externally outwardly from ceiling 110, is nevertheless
part of the reactor and forms a wall of the chamber. Internally it
shares the same evacuated atmosphere as exists elsewhere in the
reactor. In fact, the vacuum pump 135, instead of being coupled to
the bottom of the main part of the chamber as illustrated in FIG.
1, may instead be coupled to the conduit 150. The conduit 150 has
one open end 150a sealed around a first opening 155 in the reactor
ceiling 110 and its other end 150b sealed around a second opening
160 in the reactor ceiling 110. The two openings or ports 150, 160
are located on generally opposite sides of the wafer support
pedestal 115. The hollow conduit 150 is reentrant in that it
provides a flow path which exits the main portion of the chamber at
one opening and re-enters at the other opening. In this
specification, the conduit 150 may be described as being
half-torroidal, in that the conduit is hollow and provides a
portion of a closed path in which plasma may flow, the entire path
being completed by flowing across the entire process region
overlying the wafer support pedestal 115. Notwithstanding the use
of the term torroidal, the trajectory of the path as well as the
cross-sectional shape of the path or conduit 150 may be circular or
non-circular, and may be square, rectangular or any other shape
either a regular shape or irregular.
[0121] The external conduit 150 may be formed of a relatively thin
conductor such as sheet metal, but sufficiently strong to withstand
the vacuum within the chamber. In order to suppress eddy currents
in the sheet metal of the hollow conduit 150 (and thereby
facilitate coupling of an RF inductive field into the interior of
the conduit 150), an insulating gap 152 extends across and through
the hollow conduit 150 so as to separate it into two tubular
sections. The gap 152 is filled by a ring 154 of insulating
material such as a ceramic in lieu of the sheet metal skin, so that
the gap is vacuum tight. A second insulating gap 153 may be
provided, so that one section of the conduit 150 is electrically
floating. A bias RF generator 162 applies RF bias power to the
wafer pedestal 115 and wafer 120 through an impedance match element
164.
[0122] The hollow conduit 150 may be formed of a machined metal,
such as aluminum or aluminum alloy. Passages for liquid cooling or
heating may be incorporated in the walls of the hollow conduit.
[0123] Alternatively, the hollow conduit 150 may be formed of a
non-conductive material instead of the conductive sheet metal. The
non-conductive material may be a ceramic, for example. In such an
alternative case, neither gap 152 or 153 is required.
[0124] An antenna 170 such as a winding or coil 165 disposed on one
side of the hollow conduit 150 and wound around an axis parallel to
the axis of symmetry of the half-torroidal tube is connected
through an impedance match element 175 to an RF power source 180.
The antenna 170 may further include a second winding 185 disposed
on the opposite side of the hollow conduit 150 and wound in the
same direction as the first winding 165 so that the magnetic fields
from both windings add constructively.
[0125] Process gases from the chamber 100 fill the hollow conduit
150. In addition, a separate process gas supply 190 may supply
process gases directly in to the hollow conduit 150 through a gas
inlet 195. The RF field in the external hollow conduit 150 ionizes
the gases in the tube to produce a plasma. The RF field induced by
the circular coil antenna 170 is such that the plasma formed in the
tube 150 reaches through the region between the wafer 120 and the
ceiling 110 to complete a torroidal path that includes the
half-torroidal hollow conduit 150. As employed herein, the term
torroidal refers to the closed and solid nature of the path, but
does not refer or limit its cross-sectional shape or trajectory,
either of which may be circular or non-circular or square or
otherwise. Plasma circulates (oscillates) through the complete
torroidal path or region which may be thought of as a closed plasma
circuit. The torroidal region extends across the diameter of the
wafer 120 and, in certain cases, has a sufficient width in the
plane of the wafer so that it overlies the entire wafer
surface.
[0126] The RF inductive field from the coil antenna 170 includes a
magnetic field which itself is closed (as are all magnetic fields),
and therefore induces a plasma current along the closed torroidal
path described here. It is believed that power from the RF
inductive field is absorbed at generally every location along the
closed path, so that plasma ions are generated all along the path.
The RF power absorption and rate of plasma ion generation may vary
among different locations along the closed path depending upon a
number of factors. However, the current is generally uniform along
the closed path length, although the current density may vary. This
current alternates at the frequency of the RF signal applied to the
antenna 170. However, since the current induced by the RF magnetic
field is closed, the current must be conserved around the circuit
of the closed path, so that the amount of current flowing in any
portion of the closed path is generally the same as in any other
portion of the path. As will be described below, this fact is
exploited in the invention to great advantage.
[0127] The closed torroidal path through which the plasma current
flows is bounded by plasma sheaths formed at the various conductive
surfaces bounding the path. These conductive surfaces include the
sheet metal of the hollow conduit 150, the wafer (and/or the wafer
support pedestal) and the ceiling overlying the wafer. The plasma
sheaths formed on these conductive surfaces are charge-depleted
regions produced as the result of the charge imbalance due to the
greater mobility of the low-mass negative electrons and the lesser
mobility of the heavy-mass positive ions. Such a plasma sheath has
an electric field perpendicular to the local surface underlying the
sheath. Thus, the RF plasma current that passes through the process
region overlying the wafer is constricted by and passes between the
two electric fields perpendicular to the surface of the ceiling
facing the wafer and the surface of the wafer facing the gas
distribution plate. The thickness of the sheath (with RF bias
applied to the workpiece or other electrode) is greater where the
electric field is concentrated over a small area, such as the
wafer, and is less in other locations such as the sheath covering
the ceiling and the large adjoining chamber wall surfaces. Thus,
the plasma sheath overlying the wafer is much thicker. The electric
fields of the wafer and ceiling/gas distribution plate sheaths are
generally parallel to each other and perpendicular to the direction
of the RF plasma current flow in the process region.
[0128] When RF power is first applied to the coil antenna 170, a
discharge occurs across the gap 152 to ignite a capacitively
coupled plasma from gases within the hollow conduit 150. Above a
threshold power level, the discharge and plasma current become
spatially continuous through the length of the hollow conduit 150
and along the entire torroidal path. Thereafter, as the plasma
current through the hollow conduit 150 increases, the inductive
coupling of the RF field becomes more dominant so that the plasma
becomes an inductively coupled plasma. Alternatively, plasma may be
initiated by other means, such as by RF bias applied to the
workpiece support or other electrode or by a spark or ultraviolet
light source.
[0129] In order to avoid edge effects at the wafer periphery, the
ports 150, 160 are separated by a distance that exceeds the
diameter of the wafer. For example, for a 12 inch diameter wafer,
the ports 150, 160 are about 14 to 22 inches apart. For an 8 inch
diameter wafer, the ports 150, 160 are about 9 to 16 inches
apart.
[0130] Notwithstanding the use of the term "wafer", the workpiece
may be any shape, such as rectangular. The workpiece material may
be a semiconductor, insulator, or conductor, or a combination of
various materials. The workpiece may have 2-dimensional or
3-dimensional structure, as well.
[0131] Advantages:
[0132] A significant advantage is that power from the RF inductive
field is absorbed throughout the relatively long closed torroidal
path (i.e., long relative to the gap length between the wafer and
the reactor ceiling), so that RF power absorption is distributed
over a large area. As a result, the RF power density in the
vicinity of the wafer-to-ceiling gap (i.e., the process region 121
best shown in FIG. 2, not to be confused with the insulating gap
152) is relatively low, thus reducing the likelihood of device
damage from RF fields. In contrast, in prior inductively coupled
reactors, all of the RF power is absorbed within the narrow
wafer-to-ceiling gap, so that it is greatly concentrated in that
region. Moreover, this fact often limits the ability to narrow the
wafer-to-ceiling gap (in the quest of other advantages) or,
alternatively, requires greater concentration of RF power in the
region of the wafer. Thus, the invention overcomes a limitation of
long standing in the art. This aspect enhances process performance
for some applications by reducing residency time of the reactive
gases through a dramatic reduction in volume of the process region
or process zone overlying the wafer, as discussed previously
herein.
[0133] A related and even more important advantage is that the
plasma density at the wafer surface can be dramatically increased
without increasing the RF power applied to the coil antenna 170
(leading to greater efficiency). This is accomplished by reducing
the cross-sectional area of the torroidal path in the vicinity of
the pedestal surface and wafer 120 relative to the remainder of the
torroidal path. By so constricting the torroidal path of the plasma
current near the wafer only, the density of the plasma near the
wafer surface is increased proportionately. This is because the
torroidal path plasma current through the hollow conduit 150 must
be at least nearly the same as the plasma current through the
pedestal-to-ceiling (wafer-to-ceiling) gap.
[0134] A significant difference over the prior art is that not only
is the RF field remote from the workpiece, and not only can ion
density be increased at the wafer surface without increasing the
applied RF field, but the plasma ion density and/or the applied RF
field may be increased without increasing the minimum
wafer-to-ceiling gap length. Formerly, such an increase in plasma
density necessitated an increase in the wafer-to-ceiling gap to
avoid strong fields at the wafer surface. In contrast, in the
present invention the enhanced plasma density is realized without
requiring any increase in the wafer-to-ceiling gap to avoid a
concomitant increase in RF magnetic fields at the wafer surface.
This is because the RF field is applied remotely from the wafer and
moreover need not be increased to realize an increase in plasma
density at the wafer surface. As a result, the wafer-to-ceiling gap
can be reduced down to a fundamental limit to achieve numerous
advantages. For example, if the ceiling surface above the wafer is
conductive, then reducing the wafer-to-ceiling gap improves the
electrical or ground reference provided by the conductive ceiling
surface. A fundamental limit on the minimum wafer-to-ceiling gap
length is the sum of the thicknesses of the plasma sheaths on the
wafer surface and on the ceiling surface.
[0135] A further advantage of the invention is that because the RF
inductive field is applied along the entire torroidal path of the
RF plasma current (so that its absorption is distributed as
discussed above), the chamber ceiling 110, unlike with most other
inductively powered reactors, need not function as a window to an
inductive field and therefore may be formed of any desired
material, such as a highly conductive and thick metal, and
therefore may comprise a conductive gas distribution plate as will
be described below, for example. As a result, the ceiling 110
readily provides a reliable electric potential or ground reference
across the entire plane of the pedestal or wafer 120.
[0136] Increasing the Plasma Ion Density:
[0137] One way of realizing higher plasma density near the wafer
surface by reducing plasma path cross-sectional area over the wafer
is to reduce the wafer-to-ceiling gap length. This may be
accomplished by simply reducing the ceiling height or by
introducing a conductive gas distribution plate or showerhead over
the wafer, as illustrated in FIG. 2. The gas distribution
showerhead 210 of FIG. 2 consists of a gas distribution plenum 220
connected to the gas supply 125 and communicating with the process
region over the wafer 120 through plural gas nozzle openings 230.
The advantage of the conductive showerhead 210 is two-fold: First,
by virtue of its close location to the wafer, it constricts the
plasma path over the wafer surface and thereby increases the
density of the plasma current in that vicinity. Second, it provides
a uniform electrical potential reference or ground plane close to
and across the entire wafer surface.
[0138] In order to avoid arcing across the openings 230, each
opening 230 may be relatively small, on the order of a millimeter
(e.g., hole diameter is approximately 0.5 mm). The spacing between
adjacent openings may be on the order of a several millimeters.
[0139] The conductive showerhead 210 constricts the plasma current
path rather than providing a short circuit through itself because a
plasma sheath is formed around the portion of the showerhead
surface immersed in the plasma. The sheath has a greater impedance
to the plasma current than the space between the wafer 120 and the
showerhead 210, and therefore virtually all the plasma current goes
around the conductive showerhead 210.
[0140] It is not necessary to employ a showerhead (e.g., the
showerhead 210) in order to constrict the torroidal plasma current
or path in the vicinity of the process region overlying the wafer.
The path constriction and consequent increase in plasma ion density
in the process region may be achieved without the showerhead 210 by
similarly reducing the wafer-to-ceiling height. If the showerhead
210 is eliminated in this manner, then the process gases may be
supplied into the chamber interior by means of conventional gas
inlet nozzles, gas diffusers, or gas slots (not shown).
[0141] One advantage of the showerhead 210 is that different
mixtures of reactive and inert process gas ratios may be introduced
through different orifices 230 at different radii, in order to
finely adjust the uniformity of plasma effects on photoresist, for
example. Thus, for example, a greater proportion of inert gas to
reactive gas may be supplied to the orifices 230 lying outside a
median radius while a greater proportion of reactive gas to inert
gas may be supplied to the orifices 230 within that median
radius.
[0142] As will be described below, another way in which the
torroidal plasma current path may be constricted in the process
region overlying the wafer (in order to increase plasma ion density
over the wafer) is to increase the plasma sheath thickness on the
wafer by increasing the RF bias power applied to the wafer support
pedestal. Since as described previously the plasma current across
the process region is confined between the plasma sheath at the
wafer surface and the plasma sheath at the ceiling (or showerhead)
surface, increasing the plasma sheath thickness at the wafer
surface necessarily decreases the cross-section of the portion of
the torroidal plasma current within process region, thereby
increasing the plasma ion density in the process region. Thus, as
will be described more fully later in this specification, as RF
bias power on the wafer support pedestal is increased, plasma ion
density near the wafer surface is increased accordingly.
[0143] High Etch Selectivity at High Etch Rates:
[0144] The invention solves the problem of poor etch selectivity
which sometimes occurs with a high density plasma. The reactor of
FIGS. 1 and 2 has a silicon dioxide-to-photoresist etch selectivity
as high as that of a capacitively coupled plasma reactor (about
7:1) while providing high etch rates approaching that of a high
density inductively coupled plasma reactor. It is believed that the
reason for this success is that the reactor structure of FIGS. 1
and 2 reduces the degree of dissociation of the reactive process
gas, typically a fluorocarbon gas, so as to reduce the incidence of
free fluorine in the plasma region over the wafer 120. Thus, the
proportion of free fluorine in the plasma relative to other species
dissociated from the fluorocarbon gas is desirably reduced. Such
other species include the protective carbon-rich polymer precursor
species formed in the plasma from the fluorocarbon process gas and
deposited on the photoresist as a protective polymer coating. They
further include less reactive etchant species such as CF and
CF.sub.2 formed in the plasma from the fluorocarbon process gas.
Free fluorine tends to attack photoresist and the protective
polymer coating formed thereover as vigorously as it attacks
silicon dioxide, thus reducing oxide-to-photoresist etch
selectivity. On the other hand, the less reactive etch species such
as CF.sub.2 or CF tend to attack photoresist and the protective
polymer coating formed thereover more slowly and therefore provide
superior etch selectivity.
[0145] It is believed that the reduction in the dissociation of the
plasma species to free fluorine is accomplished in the invention by
reducing the residency time of the reactive gas in the plasma. This
is because the more complex species initially dissociated in the
plasma from the fluorocarbon process gas, such as CF.sub.2 and CF
are themselves ultimately dissociated into simpler species
including free fluorine, the extent of this final step of
dissociation depending upon the residency time of the gas in the
plasma. The term "residency time" or "residence time" as employed
in this specification corresponds generally to the average time
that a process gas molecule and the species dissociated from the
that molecule are present in the process region overlying the
workpiece or wafer. This time or duration extends from the initial
injection of the molecule into the process region until the
molecule and/or its dissociated progeny are pass out of the process
region along the closed torroidal path described above that extends
through the processing zone.
[0146] It is also believed that the reduction in the dissociation
of the plasma species to free fluorine is accomplished by reducing
the power density of the applied plasma source power as compared to
conventional inductively coupled plasma sources. As stated above,
power from the RF inductive field is absorbed throughout the
relatively long closed torroidal path (i.e., long relative to the
gap length between the wafer and the reactor ceiling), so that RF
power absorption is distributed over a large area. As a result, the
RF power density in the vicinity of the wafer-to-ceiling gap (i.e.,
the process region 121 best shown in FIG. 2, not to be confused
with the insulating gap 152) is relatively low, thus reducing the
dissociation of molecular gases.
[0147] As stated above, the invention enhances etch selectivity by
reducing the residency time in the process region of the
fluorocarbon process gas. The reduction in residency time is
achieved by constricting the plasma volume between the wafer 120
and the ceiling 110.
[0148] The reduction in the wafer-to-ceiling gap or volume has
certain beneficial effects. First, it increases plasma density over
the wafer, enhancing etch rate. Second, residency time falls as the
volume is decreased. As referred to above, the small volume is made
possible in the present invention because, unlike conventional
inductively coupled reactors, the RF source power is not deposited
within the confines of the process region overlying the wafer but
rather power deposition is distributed along the entire closed
torroidal path of the plasma current. Therefore, the
wafer-to-ceiling gap can be less than a skin depth of the RF
inductive field, and in fact can be so small as to significantly
reduce the residency time of the reactive gases introduced into the
process region, a significant advantage.
[0149] There are two ways of reducing the plasma path cross-section
and therefore the volume over the wafer 120. One is to reduce the
wafer-to-showerhead gap distance. The other is to increase the
plasma sheath thickness over the wafer by increasing the bias RF
power applied to the wafer pedestal 115 by the RF bias power
generator 162, as briefly mentioned above. Either method results in
a reduction in free fluorine content of the plasma in the vicinity
of the wafer 120 (and consequent increase in
dielectric-to-photoresist etch selectivity) as observed using
optical emission spectroscopy (OES) techniques.
[0150] There are three additional methods of the invention for
reducing free fluorine content to improve etch selectivity. One
method is to introduce a non-chemically reactive diluent gas such
as argon into the plasma. The argon gas may be introduced outside
and above the process region by injecting it directly into the
hollow conduit 150 from the second process gas supply 190, while
the chemically reactive process gases (fluorocarbon gases) enter
the chamber only through the showerhead 210. With this advantageous
arrangement, the argon ions, neutrals, and excited neutrals
propagate within the torroidal path plasma current and through the
process region across the wafer surface to dilute the newly
introduced reactive (e.g., fluorocarbon) gases and thereby
effectively reduce their residency time over the wafer. Another
method of reducing plasma free fluorine content is to reduce the
chamber pressure. A further method is to reduce the RF source power
applied to the coil antenna 170.
[0151] FIG. 3 is a graph illustrating a trend observed in the
invention in which the free fluorine content of the plasma
decreases as the wafer-to-showerhead gap distance is decreased.
FIG. 4 is a graph illustrating that the free fluorine content of
the plasma is decreased by decreasing the plasma bias power applied
to the wafer pedestal 115. FIG. 5 is a graph illustrating that
plasma free fluorine content is reduced by reducing the RF source
power applied to the coil antenna 170. FIG. 6 is a graph
illustrating that the free fluorine content is reduced by reducing
chamber pressure. FIG. 7 is a graph illustrating that plasma free
fluorine content is reduced by increasing the diluent (Argon gas)
flow rate into the tubular enclosure 150. The graphs of FIGS. 3-7
are merely illustrative of plasma behavioral trends inferred from
numerous OES observations and do not depict actual data.
[0152] Wide Process Window:
[0153] The chamber pressure is generally less than 0.5 T and can be
as low as 1 mT. The process gas may be C.sub.4F.sub.8 injected into
the chamber 100 through the gas distribution showerhead at a flow
rate of about 15 cc/m with 150 cc/m of Argon, with the chamber
pressure being maintained at about 20 mT. Alternatively, the Argon
gas flow rate may be increased to 650 cc/m and the chamber pressure
to 60 mT. The antenna 170 may be excited with about 500 Watts of RF
power at 13 MHz. The wafer-to-showerhead gap may be about 0.3
inches to 2 inches. The bias RF power applied to the wafer pedestal
may be 13 MHz at 2000 Watts. Other selections of frequency may be
made. The source power applied to the coil antenna 170 may be as
low as 50 kHz or as high as several times 13 MHz or higher. The
same is true of the bias power applied to the wafer pedestal.
[0154] The process window for the reactor of FIGS. 1 and 2 is far
wider than the process window for a conventional inductively
coupled reactor. This is illustrated in the graph of FIG. 8,
showing the specific neutral flux of free fluorine as a function of
RF source power for a conventional inductive reactor and for the
reactor of FIGS. 1 and 2. For the conventional inductively coupled
reactor, FIG. 8 shows that the free fluorine specific flux begins
to rapidly increase as the source power exceeds between 50 and 100
Watts. In contrast, the reactor of FIGS. 1 and 2 can accept source
power levels approaching 1000 Watts before the free fluorine
specific flux begins to increase rapidly. Therefore, the source
power process window in the invention is nearly an order of
magnitude wider than that of a conventional inductively coupled
reactor, a significant advantage.
[0155] Dual Advantages:
[0156] The constriction of the torroidal plasma current path in the
vicinity of the wafer or workpiece produces two independent
advantages without any significant tradeoffs of other performance
criteria: (1) the plasma density over the wafer is increased
without requiring any increase in plasma source power, and (2) the
etch selectivity to photoresist or other materials is increased, as
explained above. It is believed that in prior plasma reactors it
has been impractical if not impossible to increase the plasma ion
density by the same step that increases etch selectivity. Thus, the
dual advantages realized with the torroidal plasma source of the
present invention appear to be a revolutionary departure from the
prior art.
[0157] Other Embodiments:
[0158] FIG. 9 illustrates a modification of the case of FIG. 1 in
which the side antenna 170 is replaced by a smaller antenna 910
that fits inside the empty space between the ceiling 110 and the
hollow conduit 150. The antenna 910 is a single coil winding
centered with respect to the hollow conduit 150.
[0159] FIGS. 10 and 11 illustrate how the case of FIG. 1 may be
enhanced by the addition of a closed magnetically permeable core
1015 that extends through the space between the ceiling 110 and the
hollow conduit 150. The core 1015 improves the inductive coupling
from the antenna 170 to the plasma inside the hollow conduit
150.
[0160] Impedance match may be achieved without the impedance match
circuit 175 by using, instead, a secondary winding 1120 around the
core 1015 connected across a tuning capacitor 1130. The capacitance
of the tuning capacitor 1130 is selected to resonate the secondary
winding 1120 at the frequency of the RF power source 180. For a
fixed tuning capacitor 1130, dynamic impedance matching may be
provided by frequency tuning and/or by forward power servoing.
[0161] FIG. 12 illustrates a case of the invention in which a
hollow tube enclosure 1250 extends around the bottom of the reactor
and communicates with the interior of the chamber through a pair of
openings 1260, 1265 in the bottom floor of the chamber. A coil
antenna 1270 follows along side the torroidal path provided by the
hollow tube enclosure 1250 in the manner of the case of FIG. 1.
While FIG. 12 shows the vacuum pump 135 coupled to the bottom of
the main chamber, it may just as well be coupled instead to the
underlying conduit 1250.
[0162] FIG. 13 illustrates a variation of the case of FIGS. 10 and
11, in which the antenna 170 is replaced by an inductive winding
1320 surrounding an upper section of the core 1015. Conveniently,
the winding 1320 surrounds a section of the core 1015 that is above
the conduit 150 (rather than below it). However, the winding 1320
can surround any section of the core 1015.
[0163] FIG. 14 illustrates an extension of the concept of FIG. 13
in which a second hollow tube enclosure 1450 runs parallel to the
first hollow conduit 150 and provides a parallel torroidal path for
a second torroidal plasma current. The tube enclosure 1450
communicates with the chamber interior at each of its ends through
respective openings in the ceiling 110. A magnetic core 1470
extends under both tube enclosures 150, 1450 and through the coil
antenna 170.
[0164] FIG. 15 illustrates an extension of the concept of FIG. 14
in which an array of parallel hollow tube enclosures 1250a, 1250b,
1250c, 1250d provide plural torroidal plasma current paths through
the reactor chamber. In the case of FIG. 15, the plasma ion density
is controlled independently in each individual hollow conduit
1250a-d by an individual coil antenna 170a-d, respectively, driven
by an independent RF power source 180a-d, respectively. Individual
cylindrical open cores 1520a-1520d may be separately inserted
within the respective coil antennas 170a-d. In this case, the
relative center-to-edge ion density distribution may be adjusted by
separately adjusting the power levels of the individual RF power
sources 180a-d.
[0165] FIG. 16 illustrates a modification of the case of FIG. 15 in
which the array of tube enclosures 1250a-d extend through the side
wall of the reactor rather than through the ceiling 110. Another
modification illustrated in FIG. 16 is the use of a single common
magnetic core 1470 adjacent all of the tube enclosures 1250a-d and
having the antenna 170 wrapped around it so that a single RF source
excites the plasma in all of the tube enclosures 1250a-d.
[0166] FIG. 17A illustrates a pair of orthogonal tube enclosures
150-1 and 150-2 extending through respective ports in the ceiling
110 and excited by respective coil antennas 170-1 and 170-2.
Individual cores 1015-1 and 1015-2 are within the respective coil
antennas 170-1 and 170-2. This case creates two mutually orthogonal
torroidal plasma current paths over the wafer 120 for enhanced
uniformity. The two orthogonal torroidal or closed paths are
separate and independently powered as illustrated, but intersect in
the process region overlying the wafer, and otherwise do not
interact. In order to assure separate control of the plasma source
power applied to each one of the orthogonal paths, the frequency of
the respective RF generators 180a, 180b of FIG. 17 are different,
so that the operation of the impedance match circuits 175a, 175b is
decoupled. For example, the RF generator 180a may produce an RF
signal at 11 MHz while the RF generator 180b may produce an RF
signal at 12 MHz. Alternatively, independent operation may be
achieved by offsetting the phases of the two RF generators 180a,
180b.
[0167] FIG. 17B illustrates how radial vanes 181 may be employed to
guide the torroidal plasma currents of each of the two conduits
150-1, 150-2 through the processing region overlying the wafer
support. The radial vanes 181 extend between the openings of each
conduit near the sides of the chamber up to the edge of the wafer
support. The radial vanes 181 prevent diversion of plasma from one
torroidal path to the other torroidal path, so that the two plasma
currents only intersect within the processing region overlying the
wafer support.
[0168] Cases Suitable for Large Diameter Wafers:
[0169] In addition to the recent industry trends toward smaller
device sizes and higher device densities, another trend is toward
greater wafer diameters. For example, 12-inch diameter wafers are
currently entering production, and perhaps larger diameter wafers
will be in the future. The advantage is greater throughput because
of the large number of integrated circuit die per wafer. The
disadvantage is that in plasma processing it is more difficult to
maintain a uniform plasma across a large diameter wafer. The
following cases of the present invention are particularly adapted
for providing a uniform plasma ion density distribution across the
entire surface of a large diameter wafer, such as a 12-inch
diameter wafer.
[0170] FIGS. 18 and 19 illustrate a hollow tube enclosure 1810
which is a wide flattened rectangular version 1850 of the hollow
conduit 150 of FIG. 1 that includes an insulating gap 1852. This
version produces a wide "belt" of plasma that is better suited for
uniformly covering a large diameter wafer such as a 12-inch
diameter wafer or workpiece. The width W of the tube enclosure and
of the pair of openings 1860, 1862 in the ceiling 110 may exceed
the wafer by about 5% or more. For example, if the wafer diameter
is 10 inches, then the width W of the rectangular tube enclosure
1850 and of the openings 1860, 1862 is about 11 inches. FIG. 20
illustrates a modified version 1850' of the rectangular tube
enclosure 1850 of FIGS. 18 and 19 in which a portion 1864 of the
exterior tube enclosure 1850 is constricted.
[0171] FIG. 20 further illustrates the optional use of focusing
magnets 1870 at the transitions between the constricted and
unconstricted portions of the enclosure 1850. The focusing magnets
1870 promote a better movement of the plasma between the
constricted and unconstricted portions of the enclosure 1850, and
specifically promote a more uniform spreading out of the plasma as
it moves across the transition between the constricted portion 1864
and the unconstricted portion of the tube enclosure 1850.
[0172] FIG. 21 illustrates how plural cylindrical magnetic cores
2110 may be inserted through the exterior region 2120 circumscribed
by the tube enclosure 1850. The cylindrical cores 2110 are
generally parallel to the axis of symmetry of the tube enclosure
1850. FIG. 22 illustrates a modification of the case of FIG. 21 in
which the cores 2110 extend completely through the exterior region
2120 surrounded by the tube enclosure 1850 are replaced by pairs of
shortened cores 2210, 2220 in respective halves of the exterior
region 2120. The side coils 165, 185 are replaced by a pair of coil
windings 2230, 2240 surrounding the respective core pairs 2210,
2220. In this case, the displacement D between the core pairs 2210,
2220 may be changed to adjust the ion density near the wafer center
relative to the ion density at the wafer circumference. A wider
displacement D reduces the inductive coupling near the wafer center
and therefore reduces the plasma ion density at the wafer center.
Thus, an additional control element is provided for precisely
adjusting ion density spatial distribution across the wafer
surface. FIG. 23 illustrates a variation of the case of FIG. 22 in
which the separate windings 2230, 2240 are replaced by a single
center winding 2310 centered with respect to the core pairs 2210,
2220.
[0173] FIGS. 24 and 25 illustrate a case providing even greater
uniformity of plasma ion density distribution across the wafer
surface. In the case of FIGS. 24 and 25, two torroidal plasma
current paths are established that are transverse to one another
and are mutually orthogonal. This is accomplished by providing a
second wide rectangular hollow enclosure 2420 extending
transversely and orthogonally relative to the first tube enclosure
1850. The second tube enclosure 2420 communicates with the chamber
interior through a pair of openings 2430, 2440 through the ceiling
110 and includes an insulating gap 2452. A pair of side coil
windings 2450, 2460 along the sides of the second tube enclosure
2420 maintain a plasma therein and are driven by a second RF power
supply 2470 through an impedance match circuit 2480. As indicated
in FIG. 24, the two orthogonal plasma currents coincide over the
wafer surface and provide more uniform coverage of plasma over the
wafer surface. This case is expected to find particularly
advantageous use for processing large wafers of diameters of 10
inches and greater.
[0174] As in the case of FIG. 17, the case of FIG. 24 creates two
mutually orthogonal torroidal plasma current paths over the wafer
120 for enhanced uniformity. The two orthogonal torroidal or closed
paths are separate and independently powered as illustrated, but
intersect in the process region overlying the wafer, and otherwise
do not interact or otherwise divert or diffuse one another. In
order to assure separate control of the plasma source power applied
to each one of the orthogonal paths, the frequency of the
respective RF generators 180, 2470 of FIG. 24 are different, so
that the operation of the impedance match circuits 175, 2480 is
decoupled. For example, the RF generator 180 may produce an RF
signal at 11 MHz while the RF generator 2470 may produce an RF
signal at 12 MHz. Alternatively, independent operation may be
achieved by offsetting the phases of the two RF generators 180,
2470.
[0175] FIG. 26 illustrates a variation of the case of FIG. 18 in
which a modified rectangular enclosure 2650 that includes an
insulating gap 2658 communicates with the chamber interior through
the chamber side wall 105 rather than through the ceiling 110. For
this purpose, the rectangular enclosure 2650 has a horizontal top
section 2652, a pair of downwardly extending legs 2654 at
respective ends of the top section 2652 and a pair of horizontal
inwardly extending legs 2656 each extending from the bottom end of
a respective one of the downwardly extending legs 2654 to a
respective opening 2670, 2680 in the side wall 105.
[0176] FIG. 27 illustrates how a second rectangular tube enclosure
2710 including an insulating gap 2752 may be added to the case of
FIG. 26, the second tube enclosure 2710 being identical to the
rectangular tube enclosure 2650 of FIG. 26 except that the
rectangular tube enclosures 2650, 2710 are mutually orthogonal (or
at least transverse to one another). The second rectangular tube
enclosure communicates with the chamber interior through respective
openings through the side wall 105, including the opening 2720.
Like the case of FIG. 25, the tube enclosures 2650 and 2710 produce
mutually orthogonal torroidal plasma currents that coincide over
the wafer surface to provide superior uniformity over a broader
wafer diameter. Plasma source power is applied to the interior of
the tube enclosures through the respective pairs of side coil
windings 165, 185 and 2450, 2460.
[0177] FIG. 28A illustrates how the side coils 165, 185, 2450, 2460
may be replaced (or supplemented) by a pair of mutually orthogonal
interior coils 2820, 2840 lying within the external region 2860
surrounded by the two rectangular tube enclosures 2650, 2710. Each
one of the coils 2820, 2840 produces the torroidal plasma current
in a corresponding one of the rectangular tube enclosures 2650,
2710. The coils 2820, 2840 may be driven completely independently
at different frequencies or at the same frequency with the same or
a different phase. Or, they may be driven at the same frequency but
with a phase difference (i.e., 90 degrees) that causes the combined
torroidal plasma current to rotate at the source power frequency.
In this case the coils 2820, 2840 are driven with the sin and
cosine components, respectively, of a common signal generator 2880,
as indicated in FIG. 28A. The advantage is that the plasma current
path rotates azimuthally across the wafer surface at a rotational
frequency that exceeds the plasma ion frequency so that
non-uniformities are better suppressed than in prior art methods
such as MERIE reactors in which the rotation is at a much lower
frequency.
[0178] Referring now to FIG. 28B, radial adjustment of plasma ion
density may be generally provided by provision of a pair of
magnetic cylindrical cores 2892, 2894 that may be axially moved
toward or away from one another within the coil 2820 and a pair of
magnetic cylindrical cores 2896, 2898 that may be axially moved
toward or away from one another within the coil 2840. As each pair
of cores is moved toward one another, inductive coupling near the
center of each of the orthogonal plasma currents is enhanced
relative to the edge of the current, so that plasma density at the
wafer center is generally enhanced. Thus, the center-to-edge plasma
ion density may be controlled by moving the cores 2892, 2894, 2896,
2898.
[0179] FIG. 29 illustrates an alternative case of the invention in
which the two tube enclosures 2650, 2710 are merged together into a
single enclosure 2910 that extends 360 degrees around the center
axis of the reactor that constitutes a single plenum. In the case
of FIG. 29, the plenum 2910 has a half-dome lower wall 2920 and a
half-dome upper wall 2930 generally congruent with the lower wall
2920. The plenum 2910 is therefore the space between the upper and
lower half-dome walls 2920, 2930. An insulating gap 2921 may extend
around the upper dome wall 2920 and/or an insulating gap 2931 may
extend around the lower dome wall 2930. The plenum 2910
communicates with the chamber interior through an annular opening
2925 in the ceiling 110 that extends 360 degrees around the axis of
symmetry of the chamber.
[0180] The plenum 2910 completely encloses a region 2950 above the
ceiling 110. In the case of FIG. 29, plasma source power is coupled
into the interior of the plenum 2910 by a pair of mutually
orthogonal coils 2960, 2965. Access to the coils 2960, 2965 is
provided through a vertical conduit 2980 passing through the center
of the plenum 2910. Preferably, the coils 2960, 2965 are driven in
quadrature as in the case of FIG. 28 to achieve an azimuthally
circulating torroidal plasma current (i.e., a plasma current
circulating within the plane of the wafer. The rotation frequency
is the frequency of the applied RF power. Alternatively, the coils
2960, 2965 may be driven separately at different frequencies. FIG.
30 is a top sectional view of the case of FIG. 29. FIGS. 31A and
31B are front and side sectional views, respectively, corresponding
to FIG. 30.
[0181] The pair of mutually orthogonal coils 2960, 2965 may be
replaced by any number n of separately driven coils with their
winding axes disposed at 360/n degrees apart. For example, FIG. 32
illustrates the case where the two coils 2960, 2965 are replace by
three coils 3210, 3220, 3230 with winding axes placed at 120 degree
intervals and driven by three respective RF supplies 3240, 3250,
3260 through respective impedance match circuits 3241, 3251, 3261.
In order to produce a rotating torroidal plasma current, the three
windings 3210, 3220, 3230 are driven 120 degrees out of phase from
a common power source 3310 as illustrated in FIG. 33. The cases of
FIGS. 32 and 33 are preferred over the case of FIG. 29 having only
two coils, since it is felt much of the mutual coupling between
coils would be around rather than through the vertical conduit
2980.
[0182] FIG. 34 illustrates a case in which the three coils are
outside of the enclosed region 2950, while their inductances are
coupled into the enclosed region 2950 by respective vertical
magnetic cores 3410 extending through the conduit 2980. Each core
3410 has one end extending above the conduit 2980 around which a
respective one of the coils 3210, 3220, 3230 is wound. The bottom
of each core 3410 is inside the enclosed region 2950 and has a
horizontal leg. The horizontal legs of the three cores 3410 are
oriented at 120 degree intervals to provide inductive coupling to
the interior of the plenum 2910 similar to that provided by the
three coils inside the enclosed region as in FIG. 32.
[0183] The advantage of the flattened rectangular tube enclosures
of the cases of FIGS. 18-28 is that the broad width and relatively
low height of the tube enclosure forces the torroidal plasma
current to be a wide thin belt of plasma that more readily covers
the entire surface of a large diameter wafer. The entirety of the
tube enclosure need not be of the maximum width. Instead the outer
section of the tube enclosure farthest from the chamber interior
may be necked down, as discussed above with reference to the case
of FIG. 20. In this case, it is preferable to provide focusing
magnets 1870 at the transition corners between the wide portion
1851 and the narrow section 1852 to force the plasma current
exiting the narrow portion 1852 to spread entirely across the
entire width of the wide section 1851. If it is desired to maximize
plasma ion density at the wafer surface, then it is preferred that
the cross-sectional area of the narrow portion 1852 be at least
nearly as great as the cross-sectional area of the wide portion
1851. For example, the narrow portion 1852 may be a passageway
whose height and width are about the same while the wide portion
1851 may have a height that is less than its width.
[0184] The various cases described herein with air-core coils
(i.e., coils without a magnetic core) may instead employ
magnetic-cores, which can be the open-magnetic-path type or the
closed-magnetic-core type illustrated in the accompanying drawings.
Furthermore, the various cases described herein having two or more
torroidal paths driven with different RF frequencies may instead be
driven with same frequency, and with the same or different
phases.
[0185] FIG. 35 is a version of the case of FIG. 17 in which the
mutually transverse hollow conduits are narrowed as in the case of
FIG. 20.
[0186] FIG. 36 is a version of the case of FIG. 24 but employing a
pair of magnetic cores 3610, 3620 with respective windings 3630,
3640 therearound for connection to respective RF power sources.
[0187] FIG. 37 is a case corresponding to that of FIG. 35 but
having three instead of two reentrant conduits with a total of six
reentrant ports to the chamber. Having a number of symmetrically
disposed conduits and reentrant ports greater than two (as in the
case of FIG. 37) is believed to be particularly advantageous for
processing wafers of diameter of 300 mm and greater.
[0188] FIG. 38 is a case corresponding to that of FIG. 38 but
having three instead of two reentrant conduits with a total of six
reentrant ports to the chamber.
[0189] FIG. 39 is a case corresponding to that of FIG. 35 in which
the external conduits join together in a common plenum 3910.
[0190] FIG. 40 is a case corresponding to that of FIG. 36 in which
the external conduits join together in a common plenum 4010.
[0191] FIG. 41 is a case corresponding to that of FIG. 37 in which
the external conduits join together in a common plenum 4110.
[0192] FIG. 42 is a case corresponding to that of FIG. 38 in which
the external conduits join together in a common plenum 4210.
[0193] FIG. 43 is a case corresponding to that of FIG. 17 in which
the external conduits join together in a common plenum 4310.
[0194] Advantageous Features:
[0195] Constricting the torroidal plasma current in the vicinity of
the wafer not only improves etch selectivity but at the same time
increases the etch rate by increasing the plasma ion density. It is
believed no prior reactor has increased etch selectivity by the
same mechanism that increases etch rate or plasma ion density over
the workpiece.
[0196] Improving etch selectivity by constricting the torroidal
plasma current in the vicinity of the wafer or workpiece can be
achieved in the invention in any one of several ways. One way is to
reduce the pedestal-to-ceiling or wafer-to-ceiling height. Another
is to introduce a gas distribution plate or showerhead over the
wafer that constricts the path of the torroidal plasma ion current.
Another way is to increase the RF bias power applied to the wafer
or workpiece. Any one or any combination of the foregoing ways of
improving etch selectivity may be chosen by the skilled worker in
carrying out the invention.
[0197] Etch selectivity may be further improved in the invention by
injecting the reactive process gases locally (i.e., near the wafer
or workpiece) while injecting an inert diluent gas (e.g., Argon)
remotely (i.e., into the conduit or plenum). This may be
accomplished by providing a gas distribution plate or showerhead
directly over and facing the workpiece support and introducing the
reactive process gas exclusively (or at least predominantly)
through the showerhead. Concurrently, the diluent gas is injected
into the conduit well away from the process region overlying the
wafer or workpiece. The torroidal plasma current thus becomes not
only a source of plasma ions for reactive ion etching of materials
on the wafer but, in addition, becomes an agent for sweeping away
the reactive process gas species and their plasma-dissociated
progeny before the plasma-induced dissociation process is carried
out to the point of creating an undesirable amount of free
fluorine. This reduction in the residence time of the reactive
process gas species enhances the etch selectivity relative to
photoresist and other materials, a significant advantage.
[0198] Great flexibility is provided in the application of RF
plasma source power to the torroidal plasma current. As discussed
above, power is typically inductively coupled to the torroidal
plasma current by an antenna. In many cases, the antenna
predominantly is coupled to the external conduit or plenum by being
close or next to it. For example, a coil antenna may extend
alongside the conduit or plenum. However, in other cases the
antenna is confined to the region enclosed between the conduit or
plenum and the main reactor enclosure (e.g., the ceiling). In the
latter case, the antenna may be considered to be "under" the
conduit rather than alongside of it. Even greater flexibility is
afford by cases having a magnetic core (or cores) extending through
the enclosed region (between the conduit and the main chamber
enclosure) and having an extension beyond the enclosed region, the
antenna being wound around the core's extension. In this case the
antenna is inductively coupled via the magnetic core and therefore
need not be adjacent the torroidal plasma current in the conduit.
In one such case, a closed magnetic core is employed and the
antenna is wrapped around the section of the core that is furthest
away from the torroidal plasma current or the conduit. Therefore,
in effect, the antenna may be located almost anywhere, such as a
location entirely remote from the plasma chamber, by remotely
coupling it to the torroidal plasma current via a magnetic
core.
[0199] Finally, plasma distribution over the surface of a very
large diameter wafer or workpiece is uniform. This is accomplished
in one case by shaping the torroidal plasma current as a broad
plasma belt having a width preferably exceeding that of the wafer.
In another case, uniformity of plasma ion density across the wafer
surface is achieved by providing two or more mutually transverse or
orthogonal torroidal plasma currents that intersect in the process
region over the wafer. The torroidal plasma currents flow in
directions mutually offset from one another by 360/n. Each of the
torroidal plasma currents may be shaped as a broad belt of plasma
to cover a very large diameter wafer. Each one of the torroidal
plasma currents may be powered by a separate coil antenna aligned
along the direction of the one torroidal plasma current. In one
preferred case, uniformity is enhanced by applying RF signals of
different phases to the respective coil antennas so as to achieve a
rotating torroidal plasma current in the process region overlying
the wafer. In this preferred case, the optimum structure is one in
which the torroidal plasma current flows in a circularly continuous
plenum communicating with the main chamber portion through a
circularly continuous annular opening in the ceiling or side wall.
This latter feature allows the entire torroidal plasma current to
rotate azimuthally in a continuous manner.
[0200] Controlling Radial Distribution of Plasma Ion Density:
[0201] FIG. 44 illustrates a plasma reactor similar to that
illustrated in FIG. 17A having a pair of orthogonal external
reentrant tubes 150-1, 150B2. RF power is coupled into the tubes by
respective annular magnetic cores 1015-1, 1015-2 excited by
respective RF-driven coils 170-1, 170-2, as described above with
reference to FIG. 17A. However, in FIG. 44 the external tubes
150-1, 150-2 are rectangular as in FIG. 24 rather than being round
in cross-sectional shape. Moreover, the horizontal section of the
lower tube 150-1 is not flat but rather has a dip 4410 at its
middle. The dip 4410 permits the upper external tube 150-2 to nest
closer to the reactor ceiling 110. This feature shortens the path
length in the upper tube 150-2, thereby reducing plasma losses in
the upper tube 150-2. In fact, the shape of the dip 4410 may be
selected to at least nearly equalize the path length through the
upper and lower external tubes 150-1, 150-2. The reactor of FIG.
44, like the reactors of FIGS. 2 and 26, has a gas distribution
plate 210 on the ceiling 110 (or forming the ceiling 110 itself)
and overlying the wafer 120.
[0202] The dip 4410 is limited in that a vertical space remains
between the top surface of the ceiling 110 and a bottom corner 4422
formed on the lower tube 150-1 at the apex of the dip 4410. The
vertical space accommodates an electromagnet assembly 4430 that
enhances plasma ion density over the center of the wafer 120. The
electromagnet assembly 4430 includes a narrow elongate cylindrical
pole piece 4440 formed of a magnetizable metal such as iron or
steel (for example) and a coil 4450 of insulated conductive wire
(e.g., copper wire) wrapped around the pole piece 4440. The
cylindrical axis of the pole piece 4440 coincides with the axis of
symmetry of the cylindrical chamber 100, so that the axis of the
pole piece 4440 intersects the center of the wafer 120. The coil
4450 may be wrapped directly on the pole piece 4440 or, as
illustrated in FIG. 45, may be wrapped around a mandril 4460
encircling the pole piece 4440. FIG. 45 shows that the coil 4450
may be wrapped around a section 4440-1 of the pole piece 4440 that
extends above the ceiling 110. The lower section 4440-2 of the pole
piece 4440 that is inside the ceiling 110 terminates within the gas
manifold 220 of the gas distribution plate 210.
[0203] For efficiency, it is desirable to place the source of the
plasma-confining magnetic field as close to the plasma as practical
without disturbing gas flow within the gas distribution plate 210.
For this purpose, the portion of the lower pole piece section
4440-2 that is inside the gas manifold 220 is a very narrow
cylindrical end piece 4470 that terminates the pole piece 4440. The
end piece 4470 extends the magnetic field lines of the pole piece
4440 near the bottom of the gas distribution plate to enhance the
effect of the magnetic field on the plasma. The diameter of the end
piece 4470 is sufficiently reduced so that it does not appreciably
interfere with gas flow within the gas manifold 210. Moreover, such
a reduced diameter brings the peak of the radial component of the
magnetic field nearer the center axis.
[0204] FIG. 46 illustrates one case of the end piece 4470 having a
tapered bottom 4475 terminated in a nipple 4477. FIG. 47
illustrates a case of the end piece 4470 in which the bottom 4476
is flat. FIG. 48 illustrates a case of the end piece 4470 in which
the bottom 4478 is round.
[0205] In one implementation, pole piece 4440 has a diameter of
about 3.5 cm (such that the diameter of the approximately 60 turn
coil 4450 is about 6 cm) and is about 12 cm long. The pole piece
4440 is extended about 2 cm (to a total of about 14 cm) with a
smaller diameter extension of about 1 cm diameter. The bottom of
the extension region of the pole piece 4440 is about 1.5 cm from
the top of the plasma region. The material composition of pole
piece 4440 is selected to have sufficiently high permeability
(e.g., .mu.r >or =100) and high saturation flux density (e.g.
Bsat >1000 gauss) to maximize the magnetic flux density in the
region below the pole piece 4440 with minimum magnetizing force and
current. Note that because the magnetic path is "open" with pole
piece 4440 (not closed within the pole piece), the effective
permeability is reduced relative to the material permeability.
Depending on the length/diameter ratio of the pole piece 4440, the
.mu.r "effective" is typically reduced to on the order of 10.
[0206] An optional shield 4479 of magnetic material such as iron
shields plasma in the pair of tubes 150-1, 150-2 from the D.C.
magnetic field of the electromagnet assembly 4430. The shield 4479
includes an overhead plate 4479a and a cylindrical skirt 4479b.
[0207] In the case of the gas distribution plate 210 illustrated in
FIG. 45, a top plate 4480 is divided into radially inner and outer
sections 4480a, 4480b, each having many small gas flow holes 4481
extending through it, the inner and outer sections having annular
flanges 4482-1, 4482-2, 4482-3, 4482-4, forming vertical walls
supporting the bottom surface of the ceiling 210 and forming
therewith inner and outer gas manifolds 4483a, 4483b separated by a
wall formed by the annular flanges 4482-2, 4482-3. In one case,
there is no wall between the inner and outer gas manifolds, so as
to avoid any discontinuity in gas distribution within the chamber
that such a wall may cause. A gas mixing layer 4484 below the top
plate 4480 diverts gas flow from a purely vertical flow direction
and thereby induces multi-directional (or turbulent) gas flow that
improves uniform mixing of gases of different molecular weights.
Such diverting of the gas flow from a purely downward flow
direction has the added benefit of suppressing high velocity gas
flow effects, in which high velocity gas flow through gas
distribution plate orifices directly over the wafer would form
localized concentrations of process gas on the wafer surface that
disrupt process uniformity. Suppression of high velocity gas flow
effects enhances uniformity.
[0208] The gas mixing layer 4484 may consist of metal or ceramic
foam of the type well-known in the art. Or, as shown in FIG. 49,
the gas mixture layer 4484 may consist of plural perforation plates
4484-1, 4484-2 each having many small gas orifices drilled through
it, the holes in one perforation plate being offset from the holes
in the other perforation plate. A bottom plate 4485 of the gas
distribution plate 210 has many sub-millimeter gas injection holes
4486 drilled through it with large counterbored holes 4487 at the
top of the bottom plate 4485. In one example, the sub-millimeter
holes were between 10 and 30 mils in diameter, the counterbored
holes were about 0.06 inch in diameter and the bottom plate 4485
had a thickness of about 0.4 inch. Inner and outer gas feed lines
4490, 4492 through the ceiling 110 furnish gas to the inner and
outer top plates 4480a, 4480b, so that gas flow in radially inner
and outer zones of the chamber may be controlled independently as a
way of adjusting process uniformity.
[0209] It is believed that the radial component of the D.C.
magnetic field produced by the electromagnet assembly 4430 affects
the radial distribution of plasma ion density, and that it is this
radial component of the magnetic field that can be exploited to
enhance plasma ion density near the center of the chamber. It is
believed that such enhancement of plasma ion density over the wafer
center arises from the interaction of the D.C. magnetic field
radial component with the plasma sheath electric field at the wafer
surface producing azimuthal plasma currents tending to confine
plasma near the wafer center. In absence of the D.C. magnetic
field, the phenomenon of a reduced plasma ion density at the center
of the chamber extends over a very small circular zone confined
closely to the center of the wafer 120, because in general the
reactor of FIG. 44 tends to have an exceptionally uniform plasma
ion density even in absence of a correcting magnetic field.
Therefore, correction of the center-low plasma ion density
distribution requires a D.C. magnetic field having a relatively
large radial component very near the center of the chamber or wafer
120. The small diameter of the magnetic pole piece 4440 produces a
magnetic field having a large radial component very close to the
center of the wafer 120 (or center of the chamber). In accordance
with conventional practice, the center is the axis of symmetry of
the cylindrical chamber at which the radius is zero. FIG. 51
illustrates the distribution of the magnetic field in an
elevational view of the processing region over the wafer 120
between the wafer 120 and the gas distribution plate 210. The
vectors in FIG. 51 are normalized vectors representing the
direction of the magnetic field at various locations. FIG. 52
illustrates the magnetic flux density of the radial component of
the magnetic field as a function of radial location, one curve
representing the radial field flux density near the bottom surface
of the gas distribution plate 210 and the other curve representing
the radial field flux density near the surface of the wafer 120.
The peak of the flux density of the radial magnetic field component
is very close to the center, namely at about a radius of only one
inch both at the ceiling and at the wafer. Thus, the radial
component of the magnetic field is tightly concentrated near the
very small diameter region within which the plasma ion density
tends to be lowest. Thus, the distribution of the radial component
of the D.C. magnetic field produced by the electromagnet assembly
4430 generally coincides with the region of low plasma ion density
near the center of the chamber.
[0210] As mentioned above, it is felt that the radial component of
the D.C. magnetic field interacts with the vertically oriented
electric field of the plasma sheath near the wafer center to
produce an azimuthally directed force that generally opposes radial
travel of plasma. As a result, plasma near the center of the wafer
is confined to enhance processing within that region.
[0211] A basic approach of using the electromagnet assembly 4430 in
an etch reactor is to find a D.C. current flow in the coil that
produces the most uniform etch rate radial distribution across the
wafer surface, typically by enhancing plasma ion density at the
center. This is the likeliest approach in cases in which the
wafer-to-ceiling gap is relatively small (e.g., one inch), since
such a small gap typically results in a center-low etch rate
distribution on the wafer. For reactors having a larger gap (e.g.,
two inches or more), the etch rate distribution may not be center
low, so that a different D.C. current may be needed. Of course, the
electromagnet assembly 4430 is not confined to applications
requiring improved uniformity of plasma ion density across the
wafer surface. Some applications of the electromagnet assembly may
require an electromagnet coil current that renders the plasma ion
density less uniform. Such applications may involve, for example,
cases in which a field oxide thin film layer to be etched has a
non-uniform thickness distribution, so that uniform results can be
obtained only by providing nonuniform plasma ion density
distribution that compensates for the nonuniform field oxide
thickness distribution. In such a case, the D.C. current in the
electromagnet assembly can be selected to provide the requisite
nonuniform plasma ion distribution.
[0212] As shown in FIG. 45, the plasma reactor may include a set of
integrated rate monitors 4111 that can observe the etch rate
distribution across the wafer 120 during the etch process. Each
monitor 4111 observes the interference fringes in light reflected
from the bottom of contact holes while the holes are being etched.
The light can be from a laser or may be the luminescence of the
plasma. Such real time observation can make it possible to
determine changes in etch rate distribution across the wafer that
can be instantly compensated by changing the D.C. current applied
to the electromagnet assembly 4430.
[0213] FIG. 53 shows one way of independently controlling process
gas flow to the inner and outer gas feed lines 4490, 4492. In FIG.
53, one set of gas flow controllers 5310, 5320, 5330 connected to
the inner gas feed line 4490 furnish, respectively, argon, oxygen
and a fluoro-carbon gas, such as C4F6, to the inner gas feed line
4490. Another set of gas flow controllers 5340, 5350, 5360 furnish,
respectively, argon, oxygen and a fluoro-carbon gas, such as C4F6,
to the outer gas feed line 4492. FIG. 54 shows another way of
independently controlling process gas flow to the inner and outer
gas feed lines 4490, 4492. In FIG. 54, a single set of gas flow
controllers 5410, 5420, 5430 furnishes process gases (e.g., argon,
oxygen and a fluoro-carbon gas) to a gas splitter 5440. The gas
splitter 5440 has a pair of gas or mass flow controllers (MFC's)
5442, 5444 connected, respectively, to the inner and outer gas feed
lines 4490, 4492. In addition, optionally another gas flow
controller 5446 supplies purge gas such as Argon or Neon to the
outer gas feed line 4492.
[0214] One problem in processing a large diameter wafer is that the
torroidal or reentrant plasma current must spread out evenly over
the wide surface of the wafer. The tubes 150 typically are less
wide than the process area. The need then is to broaden the plasma
current to better cover a wide process area as it exits a port 155
or 160. As related problem is that the reactor of FIG. 44 (or any
of the reactors of FIGS. 1-43) can experience a problem of
non-uniform plasma ion density and consequent "hot spot" or small
region 5505 of very high plasma ion density near a port 155 or 160
of the reentrant tube 150, as shown in FIG. 55A. Referring to FIGS.
55A-56B, these problems are addressed by the introduction of a
plasma current flow splitter 5510 at the mouth of each port (e.g.,
the port 155 as shown in FIG. 55A). The splitter 5510 tends to
force the plasma current to widen while at the same time reducing
plasma ion density in the vicinity of the region 5505 where a hot
spot might otherwise form. The tube 150 can have a widened
termination section 5520 at the port 155, the termination section
5520 having a diameter nearly twice as great as that of the
remaining portion of the tube 150. The plasma current flow splitter
5510 of FIG. 55A is triangular in shape, with one apex facing the
interior of the tube 150 so as to force the plasma current flowing
into the chamber 100 from the tube 150 to spread out so as to
better fill the larger diameter of the termination section 5520.
This current-spreading result produced by the triangular splitter
5510 tends to widen the plasma current and reduces or eliminates
the "hot spot" in the region 5505.
[0215] The optimum shape of the splitter 5510 depends at least in
part upon the separation distance S between the centers of opposing
ports 155, 160. If the splitter is too long in the direction of
plasma flow (i.e., the vertical direction in FIG. 55A), then
current flow along the divided path tends to be unbalanced, with
all current flowing along one side of the splitter 5510. On the
other hand, if the splitter 5510 is too short, the two paths
recombine before the plasma current appreciably widens.
[0216] For example, in a chamber for processing a 12-inch diameter
wafer, the separation distance S can be about 20.5 inches, with a
tube width w of 5 inches, a tube draft d of 1.75 inches and an
expanded termination section width W of 8 inches. In this case, the
juxtaposition of the port 155 relative to the 12 inch wafer would
be as shown in the plan view of FIG. 56C. In this particular
example, the height h of the splitter 5510 should be about 2.5
inches, with the angle of the splitter's apex 5510a being about 75
degrees, as shown in FIG. 57. In addition, the length L of the
termination section 5520 should equal the height h of the splitter
5510.
[0217] On the other hand, for a separation distance S of 16.5
inches, an optimum splitter 5510' is illustrated in FIG. 58. The
angle of the splitter apex in this case is preferably about 45
degrees, the triangular portion being terminated in a rectangular
portion having a width of 1.2 inches and a length such that the
splitter 5510' has a height h of 2.5 inches. The height and apex
angle of the splitter 5510 or 5510' must be sufficient to reduce
plasma density in the region 5505 to prevent formation of a hot
spot there. However, the height h must be limited in order to avoid
depleting plasma ion density at the wafer center.
[0218] FIGS. 59A and 59B illustrate splitters for solving the
problem of plasma ion density non-uniformity near the entrance
ports of a reentrant tube 2654 in which plasma current flow through
each port is in a horizontal direction through the chamber side
wall 105, as in the reactor of FIG. 26. Each splitter 5910 has its
apex 5910a facing the port 2680.
[0219] FIGS. 60, 61 and 62 illustrate an implementation like that
of FIG. 17A, except that the chamber side wall 105 is rectangular
or square and the vertically facing ports 140-1, 140-2, 140-3 and
140-4 through the ceiling 110 are located over respective corners
105a, 105b, etc. of the rectangular or square side wall 105. A
floor 6020 in the plane of the wafer 120 faces each port and,
together with the corner-forming sections of the rectangular side
wall 105, forces incoming plasma current to turn toward the
processing region overlying the wafer 120. In order to reduce or
eliminate a hot spot in plasma ion density in the region 6030, a
triangular plasma current flow splitter 6010 is placed near each
respective corner 105a, 105b, etc., with its apex 6010a facing that
corner. In the implementation of FIG. 61, the splitter apex 6010a
is rounded, but in other implementations it may be less rounded or
actually may be a sharp edge. FIG. 63 illustrates a portion of the
same arrangement but in which the edge 6010b of the splitter 6010
facing the wafer 120 is located very close to the wafer 120 and is
arcuately shaped to be congruent with the circular edge of the
wafer 120. While the splitter 6010 of FIG. 60 extends from the
floor 6020 to the ceiling 110, FIG. 64 illustrates that the height
of the splitter 6010 may be less, so as to allow some plasma
current to pass over the splitter 6010.
[0220] As will be discussed in greater detail below with respect to
certain working examples, the total path length traversed by the
reentrant plasma current affects plasma ion density at the wafer
surface. This is because shorter path length places a higher
proportion of the plasma within the processing region overlying the
wafer, reduces path length-dependent losses of plasma ions and
reduces surface area losses due to plasma interaction with the
reentrant tube surface. Therefore, the shorter length tubes
(corresponding to a shorter port separation distance S) are more
efficient. On the other hand, a shorter separation distance S
affords less opportunity for plasma current flow separated at its
center by the triangular splitter 5510 to reenter the center region
after passing the splitter 5510 and avoid a low plasma ion density
at the wafer center. Thus, there would appear to be a tradeoff
between the higher efficiency of a smaller port separation distance
S and the risk of depressing plasma ion density at the wafer center
in the effort to avoid a plasma hot spot near each reentrant tube
port.
[0221] This tradeoff is ameliorated or eliminated in the case of
FIGS. 65A, 65B and 66, by using a triangular splitter 6510 that
extends at least nearly across the entire width W of the
termination section 5520 of the port and is shaped to force plasma
current flow away from the inner edge 6610 of the port and toward
the outer edge 6620 of the port. This feature leaves the port
separation distance S unchanged (so that it may be as short as
desired), but in effect lengthens the plasma current path from the
apex 6510a of the splitter to the center of the wafer 120. This
affords a greater opportunity for the plasma current flow split by
the splitter 6510 to rejoin at its center before reaching the wafer
or center of the wafer. This feature better avoids depressing
plasma ion density at the wafer center while suppressing formation
of plasma hot spots at the reentrant tube ports.
[0222] As illustrated in FIGS. 65A, 65B and 66, each splitter 6510
presents an isoceles triangular shape in elevation (FIG. 65B) and a
rectangular shape from the top (FIG. 65A). The side view of FIG. 66
reveals the sloping back surface 6610c that extends downwardly
toward the outer edge 6620 of the port. It is the sloping back
surface 6610c that forces the plasma current toward the back edge
6620 thereby effectively lengthening the path from the top of the
apex 6510a to the wafer center, which is the desired feature as set
forth above. The rectangular opening of the port 150 is narrowed in
the radial direction (the short dimension) by the sloped wall or
sloping back surface 6610b from about 2" at top to about 3/4" at
the bottom. This pushes the inner port edge about 1-1/4" radially
farther from the wafer (thus achieving the desired increase in
effective port separation distance). In addition, the port 150 has
the full triangular splitter 6510 in the azimuthal direction (the
long or 8" wide dimension of the opening 150).
[0223] The plasma current splitter 5510 or 6510 may have coolant
passages extending within it with coolant ports coupled to similar
ports in the reactor body to regulate the temperature of the
splitter. For this purpose, the plasma current splitter 5510 or
6510 is formed of metal, since it easily cooled and is readily
machined to form internal coolant passages. However, the splitter
5510 or 6510 may instead be formed of another material such as
quartz, for example.
[0224] FIG. 67 illustrates another way of improving plasma
uniformity in the torroidal source reactor of FIG. 24 by
introducing a set of four annular electromagnets 6710, 6720, 6730,
6740 along the periphery of the reactor, the windings of each
electromagnet being controlled by a magnet current controller 6750.
The electric currents in the four electromagnets may be driven in
any one of three modes: (1) in a first mode, a sinusoidal mode, the
coils are driven at the same low frequency current in phase
quadrature to produce a magnetic field that rotates about the axis
of symmetry of the reactor at the low frequency of the source; (2)
in a second mode, a configurable magnetic field mode, the four
electromagnets 6710, 6720, 6730, 6740 are grouped into opposing
pairs of adjacent electromagnets, and each pair is driven with a
different D.C. current to produce a magnetic field gradient
extending diagonally between the opposing pairs of adjacent
electromagnets, and this grouping is rotated so that the magnetic
field gradient is rotated to isotropically distribute its effects
over the wafer; (3) in a third mode, the four electromagnets are
all driven with the same D.C. current to produce a cusp-shaped
magnetic field having an axis of symmetry coinciding generally with
the axis of symmetry of the reactor chamber.
[0225] As shown in FIG. 1, a pumping annulus is formed between the
cylindrical wafer support pedestal 115 and the cylindrical side
wall 105, gases being evacuated via the pumping annulus by the
vacuum pump 135. Plasma current flow between the opposing ports of
each reentrant tube 150 can flow through this pumping annulus and
thereby avoid flowing through the processing region between the
wafer 120 and the gas distribution plate 210. Such diversion of
plasma current flow around the process region can occur if the
chamber pressure is relatively high and the wafer-to-ceiling gap is
relatively small and/or the conductivity of the plasma is
relatively low. To the extent this occurs, plasma ion density in
the process region is reduced. This problem is solved as shown in
FIGS. 68 and 69 by the introduction of radial vanes 6910, 6920,
6930, 6940 blocking azimuthal plasma current flow through the
pumping annulus. In one implementation, the vanes 6910, 6920, 6930,
6940 extend up to but not above the plane of the wafer 120, to
allow insertion and removal of the wafer 120. However, in another
implementation the vanes may retractably extend above the plane of
the wafer to better confine the plasma current flow within the
processing region overlying the wafer 120. This may be accomplished
by enabling the wafer support pedestal 115 to move up and down
relative to the vanes, for example. In either case, the vanes 6910,
6920, 6930, 6940 prevent plasma current flow through the pumping
annulus, and, if the vanes can be moved above the plane of the
wafer 120, they also reduce plasma current flow through the upper
region overlying the pumping annulus. By thus preventing diversion
of plasma current flow away from the processing region overlying
the wafer, not only is plasma ion density improved in that region
but process stability is also improved.
[0226] As mentioned previously herein, the magnetic core used to
couple RF power to each reentrant tube 150 tends to crack or
shatter at high RF power levels. It is believed this problem arises
because magnetic flux is not distributed uniformly around the core.
Generally, one winding around the core has a high current at high
RF power levels. This winding can be, for example, a secondary
winding that resonates the primary winding connected to the RF
generator. The secondary winding is generally confined to a narrow
band around the core, magnetic flux and heating being very high
within this band and much lower elsewhere in the core. The magnetic
core must have a suitable permeability (e.g., a permeability
between about 10 and 200) to avoid self-resonance at high
frequencies. A good magnetic core tends to be a poor heat conductor
(low thermal conductivity) and be readily heated (high specific
heat), and is therefore susceptible to localized heating. Since the
heating is localized near the high current secondary winding and
since the core tends to be brittle, it cracks or shatters at high
RF power levels (e.g., 5 kiloWatts of continuous power).
[0227] This problem is solved in the manner illustrated in FIGS. 70
through 74 by more uniformly distributing RF magnetic flux density
around the annular core. FIG. 70 illustrates a typical one of the
magnetic cores 1015 of FIG. 17A. The core 1015 is formed of a high
magnetic permeability material such as ferrite. The primary winding
170 consists of about two turns of a thin copper band optionally
connected through an impedance match device 175 to the RF generator
180. High current flow required for high magnetic flux in the core
1015 occurs in a resonant secondary winding 7010 around the core
1015. Current flow in the secondary winding 7010 is about an order
of magnitude greater than current flow in the primary winding. In
order to uniformly distribute magnetic flux around the core 1015,
the secondary winding 7010 is divided into plural sections 7010a,
7010b, 7010c, etc., that are evenly distributed around the annular
core 1015. The secondary winding sections 7010a, etc., are
connected in parallel. Such parallel connection is facilitated as
illustrated in FIGS. 71A and 71B by a pair of circular copper buses
7110, 7120 extending around opposite sides of the magnetic core
1015. Opposing ends of each of the secondary windings 7010a, 7010b,
etc., are connected to opposite ones of the two copper buses 7110,
7120. The copper buses 7110, 7120 are sufficiently thick to provide
an extremely high conductance and low inductance, so that the
azimuthal location of any particular one of the secondary winding
sections 7010a, 7010b, etc. makes little or no difference, so that
all secondary winding sections function as if they were equidistant
from the primary winding. In this way, magnetic coupling is
uniformly distributed around the entire core 1015.
[0228] Because of the uniform distribution of magnetic flux
achieved by the foregoing features, the primary winding may be
placed at any suitable location, typically near a selected one of
the plural distributed secondary winding sections 7110a, 7110b,
7110c, etc. However, in one implementation, the primary winding is
wrapped around or on a selected one of the plural distributed
secondary winding sections 7110a, 7110b, 7110c, etc.
[0229] FIG. 72 is a representation of the distributed parallel
inductances formed by the parallel secondary winding sections
7010a, 7010b, etc., and FIG. 73 shows the circular topology of
these distributed inductances. In order to provide resonance at the
frequency of the RF generator 180, plural distributed capacitors
7130 are connected in parallel across the two copper buses 7110,
7120. The plural capacitors 7030 are distributed azimuthally around
the magnetic core 1015. Each capacitor 7030 in one implementation
was about 100 picoFarads. The equivalent circuit of the distributed
inductances and capacitances associated with the secondary winding
7010 is illustrated in FIG. 24.
[0230] Referring to FIG. 71B, the secondary winding sections 7010a,
7010b, etc., can have the same number of turns. In the case of FIG.
71B, there are six secondary winding sections 7010a-7010f, each
section having three windings. The skilled worker can readily
select the number of secondary winding sections, the number of
windings in each section and the capacitance of the distributed
capacitors 7030 to achieve resonance at the frequency of the RF
generator 180. The copper band stock used to form the primary and
secondary windings around the core 1015 can be, for example, 0.5
inch wide and 0.020 inch thick copper stripping. The two copper
buses 7110, 7120 are very thick (e.g., from 0.125 inch to 0.25 inch
thick) and wide (e.g., 0.5 inch wide) so that they form extremely
low resistance, low inductance current paths. The core 1015 may
consist of a pair of stacked 1 inch thick ferrite cores with a 10
inch outer diameter and an 8 inch inner diameter. Preferably, the
ferrite core 1015 has a magnetic permeability .mu.=40. The
foregoing details are provided by way of example only, and any or
all of the foregoing values may require modification for different
applications (e.g., where, for example, the frequency of the RF
generator is modified).
[0231] We have found that the feature of distributed inductances
illustrated in FIGS. 71A and 71B solves the problem of breakage of
the magnetic core experienced at sustained high RF power levels
(e.g., 5 kiloWatts).
[0232] FIG. 75 illustrates the equivalent circuit formed by the
core and windings of FIGS. 71A and 71B. In addition to the primary
and secondary windings 170 and 7010 around the core 1015, FIG. 75
illustrates the equivalent inductive and capacitive load presented
by the plasma inductively coupled to the core 1015. The case of
FIGS. 70-75 is a transformer coupled circuit. The purpose of the
secondary winding 7010 is to provide high electric current flow
around the magnetic core 1015 for enhanced power coupling via the
core. The secondary winding 7010 achieves this by resonating at the
frequency of the RF generator. Thus, the high current flow and
power coupling via the magnetic core 1015 occurs in the secondary
winding 7010, so that virtually all the heating of the core 1015
occurs at the secondary winding 7010. By thus distributing the
secondary winding 7010 around the entire circumference of the core
1015, this heating is similarly distributed around the core to
avoid localized heating and thereby prevent shattering the core at
high RF power levels.
[0233] The distributed winding feature of FIGS. 71A and 71B can be
used to implement other circuit topologies, such as the auto
transformer circuit of FIG. 76. In the auto transformer circuit of
FIG. 76, the winding 7010 around the core 1015 is distributed (in
the manner discussed above with reference to FIGS. 70-74) and has a
tap 7610 connected through the impedance match circuit 175 to the
RF generator 180. The distributed capacitors 7030 provide resonance
(in the manner discussed above). As in FIG. 70, the core 7010 is
wrapped around the reentrant tube 150 so that power is inductively
coupled into the interior of the tube 150. The circuit topologies
of FIGS. 75 and 76 are only two examples of the various topologies
that can employ distributed windings around the magnetic core
1015.
[0234] In one implementation, the impedance match circuits 175a,
175b employed frequency tuning in which the frequency of each RF
generator 180a, 180b is controlled in a feedback circuit in such a
way as to minimize reflected power and maximize forward or
delivered power. In such an implementation, the frequency tuning
ranges of each of the generators 180a, 180b are exclusive, so that
their frequencies always differ, typically on the order of a 0.2 to
2 MHz difference. Moreover, their phase relationship is random.
This frequency difference can improve stability. For example,
instabilities can arise if the same frequency is used to excite
plasma in both of the orthogonal tubes 150-1, 150-2. Such
instabilities can cause the plasma current to flow through only
three of the four ports 155, 160, for example. This instability may
be related to the phase difference between the torroidal plasma
currents in the tubes. One factor facilitating plasma stability is
isolation between the two plasma currents of the pair of orthogonal
tubes 150-1, 150-2. This isolation is provided mainly by the plasma
sheaths of the two plasma currents. The D.C. break or gap 152 of
each of the reentrant tubes 150-1, 150-2 also enhances plasma
stability.
[0235] While the D.C. break or gap 152 in each of the orthogonal
tubes is illustrated in FIG. 44 as being well-above the chamber
ceiling 110, it may in fact be very close to or adjacent the
ceiling. Such an arrangement is employed in the implementation of
FIG. 77, in which the case of FIG. 55A is modified so that the
termination section 5520 electrically floats so that its potential
follows oscillations of the plasma potential. This solves a problem
that can be referred to as a "hollow cathode" effect near each of
the ports 155, 160 that creates non-uniform plasma distribution.
This effect may be referred to as an electron multiplication cavity
effect. By permitting all of the conductive material near a port to
follow the plasma potential oscillations, the hollow cathode
effects are reduced or substantially eliminated. This is achieved
by electrically isolating the termination section 5520 from the
grounded chamber body by locating a D.C. break or gap 152' at the
juncture between the reentrant tube termination section 5520 and
the top or external surface of the ceiling 110. (The gap 152' may
be in addition to or in lieu of the gap 152 of FIG. 44.) The gap
152' is filled with an insulative annular ring 7710, and the
termination section 5520 of FIG. 77 has a shoulder 7720 resting on
the top of the insulative ring 7710. Moreover, there is an annular
vacuum gap 7730 of about 0.3 to 3 mm width between the ceiling 110
and the termination section 5520. In one implementation, the tube
150 and the termination section 5520 are integrally formed together
as a single piece. The termination section 5520 is preferably
formed of metal so that internal coolant passages may be formed
therein.
[0236] FIGS. 44-77 illustrate cases in which the uniformity control
magnet is above the processing region. FIG. 78 illustrates that the
magnet pole 4440 may be placed below the processing region, or
under the wafer support pedestal 115.
[0237] Working Examples:
[0238] An etch process was conducted on blanket oxide wafers at a
chamber pressure of 40 mT, 4800 watts of 13.56 MHz RF bias power on
the wafer pedestal and 1800 Watts of RF source power applied to
each reentrant tube 150 at 11.5 MHz and 12.5 MHz, respectively. The
magnetic field produced by the electromagnet assembly 4430 was set
at the following levels in successive steps: (a) zero, (b) 6 Gauss
and (c) 18 Gauss (where the more easily measured axial magnetic
field component at the wafer center was observed rather than the
more relevant radial component). The observed etch rate
distribution on the wafer surface was measured, respectively, as
(a) center low with a standard deviation of about 2% at zero Gauss,
(b) slightly center fast with a standard deviation of about 1.2% at
6 Gauss, and (c) center fast with a standard deviation of 1.4%.
These examples demonstrate the ability to provide nearly ideal
compensation (step b) and the power to overcompensate (step c).
[0239] To test the effective pressure range, the chamber pressure
was increased to 160 mT and the electromagnet's field was increased
in three steps from (a) zero Gauss, to (b) 28 Gauss and finally to
(c) 35 Gauss (where the more easily measured axial magnetic field
component at the wafer center was observed rather than the more
relevant radial component). The observed etch rate was,
respectively, (a) center slow with a standard deviation of about
2.4%, center fast with a standard deviation of about 2.9% and
center fast with a standard deviation of about 3.3%. Obviously, the
step from zero to 28 Gauss resulted in overcompensation, so that a
somewhat smaller magnetic field would have been ideal, while the
entire exercise demonstrated the ability of the electromagnet
assembly 4430 to easily handle very high chamber pressure ranges.
This test was severe because at higher chamber pressures the etch
rate distribution tends to be more severely center low while, at
the same time, the decreased collision distance or mean free path
length of the higher chamber pressure makes it more difficult for a
given magnetic field to effect plasma electrons or ions. This is
because the magnetic field can have no effect at all unless the
corresponding Larmour radius of the plasma electrons or ions
(determined by the strength of the magnetic field and the mass of
the electron or ion) does not exceed the plasma collision distance.
As the collision distance decreases with increasing pressure, the
magnetic field strength must be increased to reduce the Larmour
radius proportionately. The foregoing examples demonstrate the
power of the electromagnet assembly to generate a sufficiently
strong magnetic field to meet the requirement of a small Larmour
radius.
[0240] Another set of etch processes were carried out on oxide
wafers patterned with photoresist at 35 mT under similar
conditions, and the current applied to the electromagnet assembly
4430 was increased in five steps from (a) 0 amperes, (b) 5 amperes,
(c) 6 amperes, (d) 7 amperes and (e) 8 amperes. (In this test, a
current of 5 amperes produces about 6 gauss measured axial magnetic
field component at the wafer center.) At each step, the etch depths
of high aspect ratio contact openings were measured at both the
wafer center and the wafer periphery to test center-to-edge etch
rate uniformity control. The measured center-to-edge etch rate
differences were, respectively, (a) 13.9% center low, (b) 3.3%
center low, (c) 0.3% center low, (d) 2.6% center high and (e) 16.3%
center high. From the foregoing, it is seen that the ideal
electromagnet current for best center-to-edge uniformity is readily
ascertained and in this case was about 6 amperes.
[0241] A set of etch processes were carried out on blanket oxide
wafers to test the efficacy of the dual zone gas distribution plate
210 of FIG. 44. In a first step, the gas flow rates through the two
zones were equal, in a second step the inner zone had a gas flow
rate four times that of the outer zone and in a third step the
outer zone had a gas flow rate four times that of the inner zone.
In each of these steps, no current was applied to the electromagnet
assembly 4430 so that the measurements taken would reflect only the
effect of the dual zone gas distribution plate 210. With gas flow
rates of the two zones equal in the first step, the etch rate
distribution was slightly center high with a standard deviation of
about 2.3%. With the inner zone gas flow rate at four times that of
the outer zone, the etch rate distribution was center fast with a
standard deviation of about 4%. With the outer zone gas flow rate
at four times that of the inner zone, the etch rate distribution
was center slow with a standard deviation of about 3.4%. This
showed that the dual zone differential gas flow rate feature of the
gas distribution plate 210 can be used to make some correction to
the etch rate distribution. However, the gas flow rate control
directly affects neutral species distribution only, since none of
the incoming gas is (or should be) ionized. On the other hand, etch
rate is directly affected by plasma ion distribution and is not as
strongly affected by neutral distribution, at least not directly.
Therefore, the etch rate distribution control afforded by the dual
zone gas distribution plate, while exhibiting some effect, is
necessarily less effective than the magnetic confinement of the
electromagnet assembly 4430 which directly affects plasma electrons
and thus ions.
[0242] The dependency of the electromagnet assembly 4430 upon the
reentrant torroidal plasma current was explored. First a series of
etch processes was carried out on blanket oxide wafers with no
power applied to the torroidal plasma source, the only power being
3 kiloWatts of RF bias power applied to the wafer pedestal. The
electromagnet coil current was increased in four steps of (a) zero
amperes, (b) 4 amperes, (c) 6 amperes and (d) 10 amperes. The etch
rate distribution was observed in the foregoing steps as (a) center
high with a standard deviation of 2.87%, (b) center high with a
standard deviation of 3.27%, (c) center high with a standard
deviation of 2.93% and (d) center high with a standard deviation of
about 4%. Thus, only a small improvement in uniformity was realized
for a relatively high D.C. current applied to the electromagnet
assembly 4430. Next, a series of etch processes was carried out
under similar conditions, except that 1800 Watts was applied to
each of the orthogonal tubes 150-1, 150-2. The electromagnet coil
current was increased in six steps of (a) zero amperes, (b) 2
amperes, (c) 3 amperes, (d) 4 amperes, (e) 5 amperes and (f) 6
amperes. The etch rate distribution was, respectively, (a) center
low with a standard deviation of 1.2%, (b) center low with a
standard deviation of 1.56%, (c) center high with a standard
deviation of 1.73%, (d) center high with a standard deviation of
2.2%, (e) center high with a standard deviation of 2.85% and (f)
center high with a standard deviation of 4.25%. Obviously the most
uniform distribution lies somewhere between 2 and 3 amperes where
the transition from center low to center high was made. Far greater
changes in plasma distribution were made using much smaller coil
current with much smaller changes in coil current. Thus, the
presence of the reentrant torroidal plasma currents appears to
enhance the effects of the magnetic field of the electromagnet
assembly 4430. Such enhancement may extend from the increase in
bias power that is possible when the torroidal plasma source is
activated. In its absence, the plasma is less conductive and the
plasma sheath is much thicker, so that the bias RF power applied to
the wafer pedestal must necessarily be limited. When the torroidal
plasma source is activated (e.g., at 1800 Watts for each of the two
orthogonal tubes 150-1, 150-2) the plasma is more conductive, the
plasma sheath is thinner and more bias power can be applied. As
stated before herein, the effect of the D.C. magnetic field may be
dependent upon the interaction between the D.C. magnetic field and
the electric field of the plasma sheath, which in turn depends upon
the RF bias power applied to the pedestal. Furthermore, the
reentrant torroidal plasma currents may be attracted to the central
plasma region due to the aforementioned postulated interaction
between D.C. magnetic field and the electric field of the plasma
sheath, further enhancing the plasma ion density in that
region.
[0243] The effects of the port-to-port separation distance S of
FIG. 55A were explored in another series of etch processes on
blanket oxide wafers. The same etch process was carried out in
reactors having separation distances S of 16.5 inches and 20.5
inches respectively. The etch rate in the one with smaller
separation distance was 31% greater than in the one with the
greater separation distance (i.e., 6993 vs 5332 Angstroms/minute)
with 1800 Watts applied to each one of the orthogonal tubes 150-1,
150-2 with zero current applied to the electromagnet assembly 4300
in each reactor.
[0244] The effects of the port-to-port separation distance S of
FIGS. 55-56 were also explored in another series of etch processes
on oxide wafers patterned with photoresist. With 3.7 amperes
applied to the electromagnet assembly 4300 having the smaller
source (16.5 inch) separation distance S, the etch rate was 10450
Angstroms/minute vs 7858 Angstroms/minute using the larger source
(20.5 inch) separation distance S. The effect of increasing power
in the reactor having the greater (20.5 inches) separation distance
S was explored. Specifically, the same etch process was carried out
in that reactor with source power applied to each of the orthogonal
tubes 150-1, 150-2 being 1800 Watts and then at 2700 Watts. The
etch rate increased proportionately very little, i.e., from 7858
Angstroms/minute to 8520 Angstroms/minute. Thus, the effect of the
port-to-port separation distance S on plasma ion density and etch
rate cannot readily be compensated by changing plasma source power.
This illustrates the importance of cases such as the case of FIGS.
65A, 65B and 66 in which a relatively short port-to-port separation
distance S is accommodated while in effect lengthening the distance
over which the plasma current is permitted to equilibrate after
being split by the triangular splitters 5440.
[0245] The pole piece 4440 has been disclosed a being either a
permanent magnet or the core of an electromagnet surrounded by a
coil 4450. However, the pole piece 4440 may be eliminated, leaving
only the coil 4450 as an air coil inductor that produces a magnetic
field having a similar orientation to that produced by the pole
piece 4440. The air coil inductor 4450 may thus replace the pole
piece 4440. Therefore, in more general terms, what is required to
produce the requisite radial magnetic field is an elongate
pole-defining member which may be either the pole piece 4440 or an
air coil inductor 4450 without the pole piece 4440 or the
combination of the two. The diameter of the pole-defining member is
relatively narrow to appropriately confine the peak of the radial
magnetic field.
[0246] Plasma Immersion Ion Implantation:
[0247] Referring to FIG. 79, a plasma immersion ion implantation
reactor in accordance with one aspect of the invention includes a
vacuum chamber 8010 having a ceiling 8015 supported on an annular
side wall 8020. A wafer support pedestal 8025 supports a
semiconductor (e.g., silicon) wafer or workpiece 8030. A vacuum
pump 8035 is coupled to a pumping annulus 8040 defined between the
pedestal 8025 and the side wall 8020. A butterfly valve 8037
regulates gas flow into the intake of the pump 8035 and controls
the chamber pressure. A gas supply 8045 furnishes process gas
containing a dopant impurity into the chamber 8010 via a system of
gas injection ports that includes the injection port 8048 shown in
the drawing. For example, if the wafer 8030 is a crystalline
silicon wafer a portion of which is to be implanted with a p-type
conductivity dopant impurity, then the gas supply 8045 may furnish
BF.sub.3 and/or B.sub.2H.sub.6 gas into the chamber 8010, where
Boron is the dopant impurity species. Generally, the
dopant-containing gas is a chemical consisting of the dopant
impurity, such as boron (a p-type conductivity impurity in silicon)
or phosphorus (an n-type conductivity impurity in silicon) and a
volatile species such as fluorine and/or hydrogen. Thus, fluorides
and/or hydrides of boron, phosphorous or other dopant species such
as arsenic, antimony, etc., can be dopant gases. In a plasma
containing a fluoride and/or hydride of a dopant gas such as
BF.sub.3, there is a distribution of various ion species, such as
BF.sub.2+, BF+, B+, F+, F- and others (such as inert additives).
All types of species may be accelerated across the sheath and may
implant into the wafer surface. The dopant atoms (e.g., boron or
phosphorous atoms) typically dissociate from the volatile species
atoms (e.g., fluorine or hydrogen atoms) upon impact with the wafer
at sufficiently high energy. Although both the dopant ions and
volatile species ions are accelerated into the wafer surface, some
portion of the volatile species atoms tend to leave the wafer
during the annealing process that follows the ion implantation
step, leaving the dopant atoms implanted in the wafer.
[0248] A plasma is generated from the dopant-containing gas within
the chamber 8010 by an inductive RF power applicator including an
overhead coil antenna 8050 coupled to an RF plasma source power
generator 8055 through an impedance match circuit 8060. An RF bias
voltage is applied to the wafer 8030 by an RF plasma bias power
generator 8065 coupled to the wafer support pedestal 8025 through
an impedance match circuit 8070. A radially outer coil antenna 8052
may be driven independently by a second RF plasma source power
generator 8057 through an impedance match circuit 8062.
[0249] The RF bias voltage on the wafer 8030 accelerates ions from
the plasma across the plasma sheath and into the wafer surface,
where they are lodged in generally interstitial sites in the wafer
crystal structure. The ion energy, ion mass, ion flux density and
total dose may be sufficient to amorphize (damage) the structure of
the wafer. The mass and kinetic energy of the dopant (e.g., boron)
ions at the wafer surface and the structure of the surface itself
determine the depth of the dopant ions below the wafer surface.
This is controlled by the magnitude of the RF bias voltage applied
to the wafer support pedestal 8025. After the ion implantation
process is carried out, the wafer is subjected to an anneal process
that causes the implanted dopant atoms to move into substitutional
atomic sites in the wafer crystal. The substrate surface may not be
crystalline if it has been pre-amorphized prior to the plasma
immersion ion implant process, or if the ion energy, ion mass, ion
flux density and total dose of plasma immersion ion implant process
itself is sufficient to amorphize the structure of the wafer. In
such a case, the anneal process causes the amorphous (damaged)
layer to recrystallize with the incorporation and activation of
implanted dopant. The conductance of the implanted region of the
semiconductor is determined by the junction depth and the volume
concentration of the activated implanted dopant species after the
subsequent anneal process. If, for example, a p-type conductivity
dopant such as boron is implanted into a silicon crystal which has
been previously doped with an n-type dopant impurity, then a p-n
junction is formed along the boundaries of the newly implanted
p-type conductivity region, the depth of the p-n junction being the
activated implanted depth of the p-type dopant impurities after
anneal. The junction depth is determined by the bias voltage on the
wafer (and by the anneal process), which is controlled by the power
level of the RF plasma bias power generator 8065. The dopant
concentration in the implanted region is determined by the dopant
ion flux ("dose") at the wafer surface during implantation and the
duration of the ion flux. The dopant ion flux is determined by the
magnitude of the RF power radiated by the inductive RF power
applicator 8050, which is controlled by the RF plasma source power
generator 8055. This arrangement enables independent control of the
time of implant, the conductivity of the implanted region and the
junction depth. Generally, the control parameters such as the power
output levels of the bias power RF generator 8065 and the source
power RF generator 8055 are chosen to minimize the implant time
while meeting the target values for conductivity and junction
depth. For more direct control of ion energy, the bias generator
may have "voltage" rather than "power" as its output control
variable.
[0250] An advantage of the inductive RF plasma source power
applicator 8050 is that the ion flux (the dopant dose rate) can be
increased by increasing the power level of the RF source power
generator 8055 without a concomitant increase in plasma potential.
The bias voltage level is controlled by the RF bias power generator
at a preselected value (selected for the desired implant depth)
while the inductive RF source power is increased to increase the
ion flux (the dopant dose rate) without significantly increasing
the plasma potential. This feature minimizes contamination due to
sputtering or etching of chamber surfaces. It further reduces the
consumption of consumable components within the chamber that wear
out over time due to plasma sputtering. Since the plasma potential
is not necessarily increased with ion flux, the minimum implant
energy is not limited (increased), thereby allowing the user to
select a shallower junction depth than would otherwise have been
possible. In contrast, it will be recalled that the microwave ECR
plasma source was characterized by a relatively high minimum plasma
potential, which therefore limited the minimum implant energy and
therefore limited the minimum junction depth.
[0251] An advantage of applying an RF bias voltage to the wafer
(instead of a D.C. bias voltage) is that it is far more efficient
(and therefore more productive) for ion implantation, provided the
RF bias frequency is suitably chosen. This is illustrated in FIGS.
80A, 80B and 80C. FIG. 80A illustrates a one-millisecond D.C. pulse
applied to the wafer in conventional practice, while FIG. 80B
illustrates the resulting ion energy at the wafer surface. The D.C.
pulse voltage of FIG. 80A is near the target bias voltage at which
ions become substitutional upon annealing at the desired implant
junction depth. FIG. 80B shows how the ion energy decays from the
initial value corresponding to the voltage of the pulse of FIG.
80A, due to resistive-capacitive effects at the wafer surface. As a
result, only about the first micro-second (or less) of the
one-millisecond D.C. pulse of FIG. 80A is actually useful, because
it is only this micro-second portion of the pulse that produces ion
energies capable of implanting ions that become substitutional
(during annealing) at the desired junction depth. The initial (one
microsecond) period of the D.C. pulse may be referred to as the RC
time. During the remaining portion of the D.C. pulse, ions fail to
attain sufficient energy to reach the desired depth or to become
substitutional upon annealing, and may fail to penetrate the wafer
surface so as to accumulate in a deposited film that resists
further implantation. This problem cannot be solved by increasing
the pulse voltage, since this would produce a large number of ions
that would be implanted deeper than the desired junction depth.
Thus, ions are implanted down to the desired junction depth during
only about a tenth of a percent of the time. This increases the
time required to reach the target implant density at the desired
junction depth. The resulting spread in energy also reduces the
abruptness of the junction. In contrast, each RF cycle in a 1
millisecond burst of a 1 MHz RF bias voltage illustrated in FIG.
80C has an RF cycle time not exceeding the so-called RC time of
FIG. 80B. As a result, resistive-capacitive effects encountered
with a pulsed D.C. bias voltage are generally avoided with an RF
bias voltage of a sufficient frequency. Therefore, ions are
implanted down to the desired junction depth during a far greater
percentage of the time of the 1 MHz RF bias voltage of FIG. 80C.
This reduces the amount of time required to reach a target implant
density at the desired junction depth. Thus, the use of an RF bias
voltage on the wafer results in far greater efficiency and
productivity than a D.C. pulse voltage, depending upon the choice
of RF frequency.
[0252] The frequency of the RF bias is chosen to satisfy the
following criteria: The RF bias frequency must be sufficiently high
to have a negligible voltage drop across the pedestal (cathode)
dielectric layers) and minimize sensitivity to dielectric films on
the backside or front side of the wafer and minimize sensitivity to
chamber wall surface conditions or deposition of plasma
by-products. Moreover, the frequency must be sufficiently high to
have a cycle time not significantly exceeding the initial period
(e.g., one micro-second) before resistive-capacitive (RC) effects
reduce ion energy more than 2% below the target energy, as
discussed immediately above. Furthermore, the RF bias frequency
must be sufficiently high to couple across insulating capacitances
such as films on the wafer surface, dielectric layers on the wafer
support pedestal, coatings on the chamber walls, or deposited films
on the chamber walls. (An advantage of RF coupling of the bias
voltage to the wafer is that such coupling does not rely upon ohmic
contact and is less affected by changes or variations in the
surface conditions existing between the wafer and the support
pedestal.) However, the RF bias frequency should be sufficiently
low so as to not generate significant plasma sheath oscillations
(leaving that task to the plasma source power applicator). More
importantly, the RF bias frequency should be sufficiently low for
the ions to respond to the oscillations of the electric field in
the plasma sheath overlying the wafer surface. The considerations
underlying this last requirement are now discussed with reference
to FIGS. 81A through 81D.
[0253] FIG. 81A illustrates the plasma ion saturation current at
the wafer surface as a function of D.C. bias voltage applied to the
wafer, the current being greatest (skewed toward) the higher
voltage region. FIG. 81B illustrates the oscillation of the RF
voltage of FIG. 80C. The asymmetry of the ion saturation current
illustrated in FIG. 80A causes the ion energy distribution created
by the RF bias voltage of FIG. 80B to be skewed in like manner
toward the higher energy region, as illustrated in FIG. 80C. The
ion energy distribution is concentrated most around an energy
corresponding to the peak-to-peak voltage of the RF bias on the
wafer. But this is true only if the RF bias frequency is
sufficiently low for ions to follow the oscillations of the
electric field in the plasma sheath. This frequency is generally a
low frequency around 100 kHz to 3 MHz, but depends on sheath
thickness and charge-to-mass ratio of the ion. Sheath thickness is
a function of plasma electron density at the sheath edge and sheath
voltage. Referring to FIG. 81D, as this frequency is increased from
the low frequency (denoted F1 in FIG. 81D) to a medium frequency
(denoted F2 in FIG. 81D) and finally to a high frequency such as 13
MHz (denoted F3 in FIG. 81D), the ability of the ions to follow the
plasma sheath electric field oscillation is diminished, so that the
energy distribution is narrower. At the HF frequency (F3) of FIG.
81D, the ions do not follow the sheath electric field oscillations,
and instead achieve an energy corresponding to the average voltage
of the RF bias voltage, i.e., about half the RF bias peak-to-peak
voltage. As a result, the ion energy is cut in half as the RF bias
frequency increases to an HF frequency (for a constant RF bias
voltage). Furthermore, at the medium frequency, we have found that
the plasma behavior is unstable in that it changes sporadically
between the low frequency behavior (at which the ions have an
energy corresponding to the peak-to-peak RF bias voltage) and the
high frequency behavior (at which the ions have an energy
corresponding to about half the peak-to-peak RF bias voltage).
Therefore, by maintaining the RF bias frequency at a frequency that
is sufficiently low (corresponding to the frequency F1 of FIG. 81D)
for the ions to follow the plasma sheath electric field
oscillations, the RF bias peak-to-peak voltage required to meet a
particular ion implant depth requirement is reduced by a factor of
nearly two, relative to behavior at a medium frequency (F2) or a
high frequency (F3). This is a significant advantage because such a
reduction in the required RF bias voltage (e.g., by a factor of
two) greatly reduces the risk of high voltage arcing in the wafer
support pedestal and the risk of damaging thin film structures on
the wafer. This is particularly important because in at least a
particular plasma immersion ion implantation source described later
in this specification, ion energies match those obtained in a
conventional ion beam implanter, provided the plasma RF bias
voltage is twice the acceleration voltage of the conventional ion
beam implanter. Thus, at a high frequency plasma RF bias voltage,
where ion energies tend to be half those obtained at low frequency,
the required plasma RF bias voltage is four times the acceleration
voltage of the conventional ion beam implanter for a given ion
energy level. Therefore, it is important in a plasma immersion ion
implantation reactor to exploit the advantages of a low frequency
RF bias voltage, to avoid the necessity of excessive RF bias
voltages.
[0254] Good results are therefore attained by restricting the RF
bias power frequency to a low frequency range between 10 kHz and 10
MHz. Better results are obtained by limiting the RF bias power
frequency to a narrower range of 50 kHz to 5 MHz. The best results
are obtained in the even narrower bias power frequency range of 100
kHz to 3 MHz. We have found optimum results at about 2 MHz plus or
minus 5%.
[0255] Both the RF source power generator 8055 and the RF bias
power generator 8065 may apply continuous RF power to the inductive
power applicator 8050 and the wafer pedestal 8025 respectively.
However, either or both of the generators 8055, 8065 may be
operated in burst modes controlled by a controller 8075. The
controller 8075 may also control the generator 8057 in a burst mode
as well if the outer coil antenna 8052 is present. Operation in an
implementation not including the outer coil antenna 8057 will now
be described. The RF signals produced by each of the generators
8055, 8065 may be pulse modulated to produce continuous wave (CW)
RF power in bursts lasting, for example, one millisecond with a
repetition rate on the order of 0.5 kHz, for example. Either one or
both of the RF power generators 8055, 8065 may be operated in this
manner. If both are operated in such a burst mode simultaneously,
then they may be operated in a push-pull mode, or in an
in-synchronism mode, or in a symmetrical mode or in a
non-symmetrical mode, as will now be described.
[0256] A push-pull mode is illustrated in the contemporaneous time
domain waveforms of FIGS. 82A and 82B, illustrating the RF power
waveforms of the respective RF generators 8055 and 8065, in which
the bursts of RF energy from the two generators 8055, 8065 occur
during alternate time windows. FIGS. 82A and 82B illustrate the RF
power waveforms of the generators 8055 and 8065, respectively, or
vice versa.
[0257] An in-synchronism mode is illustrated in the contemporaneous
time domain waveforms of FIGS. 82C and 82D, in which the bursts of
RF energy from the two generators 8055, 8065 are simultaneous. They
may not be necessarily in phase, however, particularly where the
two generators 8055, 8065 produce different RF frequencies. For
example, the RF plasma source power generator 8055 may have a
frequency of about 13 MHz while the RF plasma bias power generator
8065 may have a frequency of about 2 MHz. FIGS. 82C and 82D
illustrate the RF power waveforms of the generators 8055 and 8065,
respectively, or vice versa.
[0258] In the foregoing examples, the pulse widths and pulse
repetition rates of the two RF generators 8055, 8065 may be at
least nearly the same. However, if they are different, then the
temporal relationship between the bursts of the two generators
8055, 8065 must be selected. In the example of the contemporaneous
time domain waveforms of FIGS. 82E and 82F, one of the generators
8055, 8065 produces shorter RF bursts illustrated in FIG. 82F while
the other produces longer RF bursts illustrated in FIG. 82E. In
this example, the bursts of the two generators 8055, 8065 are
symmetrically arranged, with the shorter bursts of FIG. 82F
centered with respect to the corresponding longer bursts of FIG.
82E. FIGS. 82E and 82F illustrate the RF power waveforms of the
generators 8055 and 8065, respectively, or vice versa.
[0259] In another example, illustrated in the contemporaneous time
domain waveforms of FIGS. 82G and 82H, the shorter bursts (FIG.
82H) are not centered relative to the corresponding longer bursts
(FIG. 82G), so that they are asymmetrically arranged. Specifically,
in this example the shorter RF bursts of FIG. 82H coincide with the
later portions of corresponding ones of the long bursts of FIG.
82G. Alternatively, as indicated in dashed line in FIG. 82H, the
short RF bursts of FIG. 82H may instead coincide with the earlier
portions of corresponding ones of the long RF bursts of FIG. 82G.
FIGS. 82G and 82H illustrate the RF power waveforms of the
generators 8055 and 8065, respectively, or vice versa.
[0260] The inductive RF source power applicator 8050 of FIG. 79
tends to exhibit a rapid increase in dissociation of
fluorine-containing species in the plasma as plasma source power
(and ion flux) is increased, causing undue etching of semiconductor
films on the wafer during the implantation process. Such etching is
undesirable. A plasma immersion ion implantation reactor that tends
to avoid this problem is illustrated in FIG. 83A. The plasma
immersion ion implantation reactor of FIG. 83A has a capacitive
source power applicator constituting a conductive (metal) or
semiconducting ceiling 8015' electrically insulated from the
grounded side wall 8020 by an insulating ring 8017. Alternatively,
the ceiling may be metal, conductive, or semiconducting and be
coating by an insulating, conducting or semiconducting layer. The
RF plasma source power generator 8055 drives the ceiling 8015'
through the impedance match circuit 8060 in the manner of a
capacitive plate. Plasma is generated by oscillations in the plasma
sheath produced by the RF power capacitively coupled from the
ceiling 8015'. In order to enhance such plasma generation, the
frequency of the plasma RF source power generator 8055 is
relatively high, for example within the very high frequency (VHF)
range or 30 MHz and above. The wafer pedestal 8025 may serve as a
counter electrode to the ceiling 8015'. The ceiling 8015' may serve
as a counter electrode to the RF bias voltage applied to the wafer
pedestal 8025. Alternatively, the chamber wall may serve as a
counter electrode to either or both wafer bias and ceiling bias
voltages. In one implementation, the dopant-containing gas is fed
through the ceiling 8015' through plural gas injection orifices
8048'.
[0261] The capacitively coupled plasma ion immersion implantation
reactor of FIG. 83A enjoys the advantages of the inductively
coupled reactor of FIG. 79 in that both types of reactors permit
the independent adjustment of ion flux (by adjusting power level of
the plasma source power generator 8055) and of the ion energy or
implant depth (by adjusting the power level of the plasma bias
power generator 8065). In addition, when plasma source power or ion
flux is increased, the capacitively coupled plasma ion immersion
reactor of FIG. 83A exhibits a smaller increase in dissociation of
fluorine-containing species in the gas fed from the dopant gas
supply 8045 and a smaller increase in reaction by-products which
would otherwise lead to excessive etch or deposition problems. The
advantage is that ion flux may be increased more freely without
causing an unacceptable level of etching or deposition during ion
implantation.
[0262] The higher frequency RF power of the plasma source power
generator 8055 controls plasma density and therefore ion flux at
the wafer surface, but does not greatly affect sheath voltage or
ion energy. The lower frequency RF power of the bias power
generator 8065 controls the sheath voltage and therefore the ion
implantation energy and (junction) depth and does not contribute
greatly to ion generation or ion flux. The higher the frequency of
the plasma source power generator, the less source power is wasted
in heating ions in the plasma sheath, so that more of the power is
used to generate plasma ions through oscillations of the plasma
sheath or by heating electrons in the bulk plasma. The lower
frequency of the RF bias power generator 8065 is less than 10 MHz
while the higher frequency of the RF plasma source power generator
8055 is greater than 10 MHz. More preferably, the lower frequency
is less than 5 MHz while the higher frequency is greater than 15
MHz. Even better results are obtained with the lower frequency
being less than 3 MHz and the higher frequency exceeding 30 MHz or
even 50 MHz. In some cases the source power frequency may be as
high as 160 MHz or over 200 MHz. The greater the separation in
frequency between the higher and lower frequencies of the source
and bias power generators 8055, 8065, respectively, the more the
plasma ion implant flux and the plasma ion implant energy can be
separately controlled by the two generators 8055, 8065.
[0263] In the variation illustrated in FIG. 83B, the RF plasma
source power generator 8055 is coupled to the wafer pedestal rather
than being coupled to the ceiling 8015'. An advantage of this
feature is that the ceiling 8015' is consumed (by plasma sputtering
or etching) at a much lower rate than in the reactor of FIG. 83A,
resulting in less wear and less metallic contamination of the
plasma. A disadvantage is that isolation between the two RF
generators 8055, 8065 from each other is inferior compared to the
reactor of FIG. 83A, as they are both connected to the same
electrode, so that control of ion flux and ion energy is not as
independent as in the reactor of FIG. 83A.
[0264] In either of the reactors of FIGS. 83A or 83B, the
controller 8075 can operate in the manner described above with
reference to FIGS. 82A through 82H, in which the respective RF
power waveforms applied to the ceiling 8015' and the pedestal 8025
are in a push-pull mode (FIGS. 82A and B), or an in-synchronism
mode (FIGS. 82C and D), or a symmetric mode (FIGS. 802E and F) or a
non-symmetric mode (FIGS. 82G and H).
[0265] FIGS. 83A and 83B show that the RF source power generator
8055 can drive the ceiling 8015' (FIG. 83A) with the side wall 8020
and/or the wafer support pedestal 8025 connected to the RF return
terminal of the generator 8055, or, in the alternative, the RF
source power generator 8055 can drive the wafer support pedestal
8025 with the ceiling 8015' and/or the sidewall 8020 connected to
the RF return terminal of the generator 8055. Thus, the RF source
power generator is connected across the wafer support pedestal 8025
and the sidewall 8020 or the ceiling 8015' (or both). The polarity
of the connections to the source power generator 8055 may be
reversed, so that it drives the side wall 8020 and/or ceiling 8015'
with the pedestal 8025 being connected to the RF return terminal of
the generator 8055.
[0266] As set forth above, the plasma immersion ion implantation
inductively coupled reactor of FIG. 79 has distinct advantages,
including (a) the capability of a large ion flux/high plasma ion
density, (b) independently controlled ion energy, and (c) low
minimum ion energy (plasma potential). The plasma immersion ion
implantation capacitively coupled reactor of FIG. 83A has the
additional advantage of having more controllable dissociation of
process gases and reactive byproducts as ion flux is increased,
than the inductively coupled reactor of FIG. 79. However, the
capacitively coupled reactor of FIG. 83A has a higher minimum ion
energy/plasma potential than the inductively coupled reactor of
FIG. 79. Thus, these two types of reactors provide distinct
advantages, but neither provides all of the advantages.
[0267] A plasma immersion ion implantation reactor that provides
all of the foregoing advantages, including low minimum ion energy
and low process gas dissociation, is illustrated in FIG. 84. In
FIG. 84, the inductively or capacitively coupled plasma sources of
FIG. 79 or 83A are replaced by a torroidal plasma source of the
type disclosed above in FIGS. 1-78. In the basic configuration of
FIG. 84, the torroidal plasma source includes a reentrant hollow
conduit 8150 over the ceiling 8015, corresponding to the conduit
150 of FIG. 1. The conduit 8150 of FIG. 84 has one open end 8150a
sealed around a first opening 8155 in the ceiling 8015 and an
opposite open end 8150b sealed around a second opening 8160 in the
ceiling 8015. The two openings or ports 8155, 8160 are located in
the ceiling over opposite sides of the wafer support pedestal 8025.
While FIG. 84 illustrates the openings 8155, 8160 being in the
ceiling, the openings could instead be in the base or floor of the
chamber, as in FIG. 12, or in the side wall of the chamber, as in
FIG. 26, so that the conduit 8150 may pass over or under the
chamber. RF plasma source power is coupled from the RF generator
8055 through the optional impedance match circuit 8060 to the
reentrant conduit by an RF plasma source power applicator 8110.
Various types of source power applicators for a reentrant hollow
conduit are disclosed in FIGS. 1-78, any one of which may be
employed in the plasma immersion ion implantation reactor of FIG.
84. In the implementation illustrated in FIG. 84, the RF plasma
source power applicator 8110 is similar to that illustrated in FIG.
13, in which a magnetically permeable core 8115 having a torus
shape surrounds an annular portion of the conduit 8150. The RF
generator 8055 is coupled through the optional impedance match
circuit to a conductive winding 8120 around the magnetic core 8115.
An optional tuning capacitor 8122 may be connected across the
winding 8120. The RF generator 8055 may be frequency-tuned to
maintain an impedance match, so that the impedance match circuit
8060 may not be necessary.
[0268] The reactor chamber includes the process region 8140 between
the wafer support pedestal 8025 and the ceiling 8015. The gas
supply 8045 furnishes dopant gases into the reactor chamber 8140
through gas injection orifices 8048 in the ceiling 8015. Plasma
circulates (oscillates) through the reentrant conduit 8150 and
across the process region 8140 in response to the RF source power
coupled by the source power applicator 8110. As in the reactor of
FIG. 13, the reentrant conduit 8150 is formed of a conductive
material and has a narrow gap or annular break 8152 filled with an
insulator 8154. The dopant gases furnished by the gas supply 8045
contain a species that is either a donor (N-type) or acceptor
(P-type) impurity when substituted into the semiconductor crystal
structure of the wafer 8030. For example, if the wafer is a silicon
crystal, then an N-type dopant impurity may be arsenic or
phosphorous, for example, while a P-type dopant impurity may be
boron, for example. The dopant gas furnished by the gas supply 8045
is a chemical combination of the dopant impurity with an at least
partially volatile species, such as fluorine for example. For
example, if a P-type conductivity region is to be formed by ion
implantation, then the dopant gas may be a combination of boron and
fluorine, such as BF.sub.3, for example. Or, for example, the
dopant gas be a hydride, such as B.sub.2H.sub.6. Phosphorous doping
may be accomplished using a fluoride such as PF.sub.3 or PF.sub.5
or a hydride such as PH.sub.3. Arsenic doping may be accomplished
using a fluoride such as AsF.sub.5 or a hydride such as
AsH.sub.3.
[0269] The RF bias power generator provides an RF bias voltage,
with the RF bias frequency selected as described above with
reference to FIG. 81D. Good results are attained by restricting the
RF bias power frequency to a low frequency range between 10 kHz and
10 MHz. Better results are obtained by limiting the RF bias power
frequency to a narrower range of 50 kHz to 5 MHz. The best results
are obtained in the even narrower bias power frequency range of 100
kHz to 3 MHz. We have found optimum results at about 2 MHz plus or
minus 5%.
[0270] In the reactor of FIG. 84, both the RF source power
generator 8055 and the RF bias power generator 8065 may apply
continuous RF power to the inductive power applicator 8110 and the
wafer pedestal 8025 respectively. However, either or both of the
generators 8055, 8065 may be operated in burst modes controlled by
a controller 8075. The RF signals produced by each of the
generators 8055, 8065 may be pulse modulated to produce continuous
wave (CW) RF power in bursts lasting, for example, one millisecond
with a repetition rate on the order of 0.5 kHz, for example. Either
one or both of the RF power generators 8055, 8065 may be operated
in this manner. If both are operated in such a burst mode
simultaneously, then they may be operated in a push-pull mode, or
in an in-synchronism mode, or in a symmetrical mode or in a
non-symmetrical mode, as will now be described for the reactor of
FIG. 84.
[0271] A push-pull mode is illustrated in the contemporaneous time
domain waveforms of FIGS. 82A and 82B, illustrating the RF power
waveforms of the respective RF generators 8055 and 8065, in which
the bursts of RF energy from the two generators 8055, 8065 occur
during alternate time windows. FIGS. 82A and 82B illustrate the RF
power waveforms of the generators 8055 and 8065, respectively, or
vice versa.
[0272] An in-synchronism mode is illustrated in the contemporaneous
time domain waveforms of FIGS. 82C and 82D, in which the bursts of
RF energy from the two generators 8055, 8065 are simultaneous. They
may not be necessarily in phase, however, particularly where the
two generators 8055, 8065 produce different RF frequencies. For
example, the RF plasma source power generator 8055 may have a
frequency of about 13 MHz while the RF plasma bias power generator
8065 may have a frequency of about 2 MHz. FIGS. 82C and 82D
illustrate the RF power waveforms of the generators 8055 and 8065,
respectively, or vice versa.
[0273] In the foregoing examples, the pulse widths and pulse
repetition rates of the two RF generators 8055, 8065 may be at
least nearly the same. However, if they are different, then the
temporal relationship between the bursts of the two generators
8055, 8065 must be selected. In the example of the contemporaneous
time domain waveforms of FIGS. 82E and 82F, one of the generators
8055, 8065 produces shorter RF bursts illustrated in FIG. 82F while
the other produces longer RF bursts illustrated in FIG. 82E. In
this example, the bursts of the two generators 8055, 8065 are
symmetrically arranged, with the shorter bursts of FIG. 82F
centered with respect to the corresponding longer bursts of FIG.
82E. FIGS. 82E and 82F illustrate the RF power waveforms of the
generators 8055 and 8065, respectively, or vice versa.
[0274] In another example, illustrated in the contemporaneous time
domain waveforms of FIGS. 82G and 82H, the shorter bursts (FIG.
82H) are not centered relative to the corresponding longer bursts
(FIG. 82G), so that they are asymmetrically arranged. Specifically,
in this example the shorter RF bursts of FIG. 82H coincide with the
later portions of corresponding ones of the long bursts of FIG.
82G. Alternatively, as indicated in dashed line in FIG. 82H, the
short RF bursts of FIG. 82H may instead coincide with the earlier
portions of corresponding ones of the long RF bursts of FIG. 82G.
FIGS. 82G and 82H illustrate the RF power waveforms of the
generators 8055 and 8065, respectively, or vice versa.
[0275] The torroidal plasma immersion ion implantation reactor of
FIG. 84 can be operated with a pulsed D.C. bias voltage instead of
an RF bias voltage. In this case, the bias power generator 8065
would be D.C. source rather than an RF source. Thus, in the
different operational modes of FIGS. 82A through 82H discussed
above, the pulsed RF bias voltage may be replaced by a pulsed D.C.
bias voltage of the same pulse width, with only the source power
generator 8055 producing an RF power burst.
[0276] FIG. 85 illustrates a modification of the plasma immersion
ion implantation reactor of FIG. 84 having a second reentrant
conduit 8151 crossing the first reentrant conduit 8150, in a manner
similar to the reactor of FIG. 44. Plasma power is coupled to the
second conduit 8151 from a second RF plasma source power generator
8056 through a second optional match circuit 8061 to a second
source power applicator 8111 that includes a second magnetically
permeable core 8116 and a second core winding 8121 driven by the
second RF source power generator 8056. Process gas from the gas
supply 8045 may be introduced into the chamber by a gas
distribution plate or showerhead incorporated in the ceiling 8015
(as in the gas distribution plate 210 of FIG. 44). However, the
plasma immersion ion implantation reactor of FIG. 85 is greatly
simplified by using a small number of process gas injectors 8048 in
the ceiling 8015 or in the side wall 8020 or elsewhere, such as in
the base of the chamber (not shown) coupled to the dopant gas
supply, rather than a showerhead. Moreover, the gap between the
ceiling 8015 and the wafer pedestal 8025 may be relatively large
(e.g., two to six inches) and a gas distribution plate eliminated
in favor of discrete gas injectors or diffuser 8048 in the ceiling
8015 or gas injectors or diffusers 8049 in the side wall 8020
because there is no need to generate plasma close to the wafer
surface. The gas injectors or diffusers 8049 may be joined in a
ring 8049 on the side wall 8020. Generally, the higher the maximum
implant depth and ion energy requirement, the greater the gap
between ceiling and wafer that is required. For example, for a
peak-to-peak RF bias voltage of 10 kV, a gap of 4 inches is
preferable over a 2 inch gap for best plasma uniformity across a
wide range of gas species and plasma electron densities. The term
diffuser is employed in the conventional sense as referring to a
type of gas distribution device having a wide angle of gas flow
distribution emanating from the device.
[0277] FIG. 86 is a plan view of the interior surface of the
ceiling 8015, showing one arrangement of the gas injection orifices
8048, in which there is one central orifice 8048-1 in the center of
the ceiling 8015 and four radially outer orifices 8048-2 through
8048-5 uniformly spaced at an outer radius. FIG. 87 illustrates how
the dopant gas supply 8045 may be implemented as a gas distribution
panel. The gas distribution panel or supply 8045 of FIG. 87 has
separate gas reservoirs 8210-1 through 8210-11 containing different
dopant-containing gases including fluorides of boron, hydrides of
boron, fluorides of phosphorous and hydrides of phosphorous. In
addition, there are gas reservoirs for other gases used in
co-implantation (hydrogen and helium), material enhancement
(nitrogen), surface passivation or co-implantation (fluorides of
silicon or germanium or carbon). In addition, the center orifice
8048-1 may be coupled to a reservoir oxygen gas, for use in
photoresist removal and/or chamber cleaning. A control panel 8220
includes valves 8222 controlling gas flow from the respective
reservoirs 8210 to the gas injection orifices. Preferably, the
gases are mixed at or near the orifices, although a gas manifold
8230 may be provided to distribute the selected gases among the
outer gas injection orifices 8048-2 through 8048-5. Alternatively,
process gas may be injected at one or more locations in the
sidewall 8020, using the nozzles 8049 of FIG. 85 or diffusers. FIG.
85 shows gas injectors 8049 located around the chamber sidewalls
8020 which inject gas radially inward. Gas may be injected parallel
to the ceiling and/or wafer, or may be injected with some component
toward ceiling and/or wafer. For some applications, it is
advantageous to utilize multiple separate gas plenums, each with
its own nozzle array. This can permit the use of chemistries which
should not be combined except under vacuum, or may permit having
several gas zones for neutral uniformity tuning. For this purpose,
referring again to FIG. 85, a first ring 8049a joining a first set
of side wall injectors 8049c serves as a first plenum, while a
second ring 8049b joining a second separate set of side wall
injectors 8049d serves as a second plenum. The two rings or plenums
8049a, 8049b are supplied by separate respective sets of valves
8222 of the gas panel of FIG. 87 FIG. 88 illustrates a modification
of the plasma immersion ion implantation reactor of FIG. 85 in
which a central electromagnet assembly 8430 is mounted over the
center of the ceiling 8015. Like the electromagnet assembly 4430 of
FIG. 44, the electromagnet assembly 8430 of FIG. 88 controls plasma
ion density uniformity and includes a narrow elongate cylindrical
pole piece 8440 formed of a magnetizable material such as iron or
steel and a coil 8450 of insulated conductive wire wrapped around
the pole piece 8440. A magnetic current controller 8442 supplies an
electrical current to the coil 8450. The controller 8442 controls
the current through the coil 8450 so as to optimize uniformity of
plasma ion density (ion flux) across the wafer surface.
[0278] FIGS. 89A and 89B are side and top views, respectively,
illustrating a further modification incorporating a radially outer
electromagnet assembly 8460. The outer electromagnet assembly 8460
is in the shape of a torus and overlies an annular outer region of
the ceiling 8015 near the circumferential edge of the ceiling 8015
and adjacent the ports pairs 150, 160 of the conduits 8150, 8151.
Referring to the cross-sectional view of FIG. 90A, the outer
electromagnet assembly 8460 includes a coil 8462 consisting of
plural windings of a single conductor connected to the current
controller 8442. In order to concentrate the magnetic field of the
outer electromagnet assembly 8460 within the process region 8140,
an overlying magnetic cover 8464 surrounding the sides and top of
the coil 8462 but not the bottom of the coil 8462. The magnetic
cover 8464 permits the magnetic field of the coil 8462 to extend
downwardly below the ceiling into the process region 8140.
Uniformity of the ion density and radial plasma flux distribution
at the wafer surface is optimized by independently adjusting the
currents in the inner and outer electromagnet assemblies 8430,
8460.
[0279] In order to avoid forming regions of very high plasma ion
concentration near the ports 150, 160 of the two conduits 8150,
8151, individual plates 8466 of magnetically permeable material
(e.g., iron or steel) are placed under the outer electromagnet
assembly 8460 adjacent respective ones of the ports 150, 160. The
circumferential extent of each plate 8466 is approximately equal to
the width of each individual port 150, 160. FIGS. 90A, 90B and 90C
are cross-sectional views taken along lines 90-90 of FIG. 89B. The
distance between the plate 8466 and the bottom edge of the magnetic
cover 8464 may be adjusted to control the amount of magnetic field
coupled into portion of the process region near each individual one
of the ports 150, 160. In FIG. 90A, the plate 8466 is in contact
with the bottom edges of the cover 8464, so that the magnetic field
near the corresponding port (150, 160) is almost completely
confined within the enclosure defined by the cover 8464 and the
plate 8466. In FIG. 90B, the plate 8466 is slightly displaced from
the bottom edge of the cover 8464, creating a small gap
therebetween that allows a small magnetic field to enter the
process region 8140 near the corresponding port (150, 160). In FIG.
90C, there is a large gap between the plate 8466 and the cover
8464, permitting a larger magnetic field to exist in the process
region near the corresponding port (150, 160).
[0280] FIG. 91 illustrates how the RF plasma bias power generator
8065 may be coupled to the wafer support pedestal 8025. An inductor
8510 and a variable capacitor 8520 are connected in parallel
between one side of a series capacitor 8530 and ground, the other
side of the series capacitor 8530 being connected to the wafer
support pedestal 8025. The output of the bias power generator 8065
is connected to a tap 8560 of the inductor 8510. The position of
the tap 8560 and the capacitance of the variable capacitor 8520 are
selected to provide an impedance match between the bias power
generator 8065 and the plasma load at the wafer pedestal 8065. The
variable capacitor 8520 may be controlled by a system controller
8525 to optimize matching. In this case, the circuit including the
parallel inductor and capacitor 8510, 8520 serves as an impedance
match circuit. In order to follow variations in the plasma load
impedance during processing, frequency tuning of the bias power
generator 8065 may be employed, although this may not be necessary.
The position of the tap 8560 may be selectable either manually or
by the system controller 8525 to optimize matching. Alternatively,
a capacitor (not shown) may be connected between the tap position
and ground or between RF bias generator and tap point as an
alternative matching circuit topology. This optional capacitor may
be controlled by the system controller 8525 to optimize
matching.
[0281] One problem in selecting the bias voltage level is that
large ion energy can be reached only with a high bias voltage
level, which typically requires high power. High power contributes
to the plasma flux (ion density or dose rate), and can cause too
high a dose rate, making it difficult to control the conductivity
of the implanted region. One way of controlling the dose rate at
such a high power is to pulse the RF bias power. However,
controlling the pulse rate and pulse width of repetitive pulses so
as to achieve the required dose rate and conductivity is difficult.
Part of the problem is that ion implantation at the desired
junction depth is achieved only after the bias voltage has risen
sufficiently (at the beginning of a pulse or RF burst) to reach a
threshold voltage corresponding to the desired junction depth and
ion energy. The solution to this problem is to avoid repetitive
pulsing of the bias power, and instead use a single pulse of
sufficient duration to complete ion implantation at the desired
junction depth and conductivity in the implanted region. This is
illustrated in the time domain waveform of FIG. 92. A timer can be
employed to guarantee that the RF burst or pulse lasts the required
duration (Ttimer). However, the timer must not begin until the
sheath voltage has reached the threshold voltage (Vthreshold) at
which ion implantation occurs at the required depth. Thus, FIG. 92
shows that the sheath voltage grows at the beginning of bias power
RF burst (Ton) until it reaches Vthreshold after several cycles. At
that point, the timer begins, and ends the RF burst at the
expiration of Ttimer, i.e., at Toff. The problem, therefore, is how
to ascertain the time at which the sheath voltage reaches
Vthreshold, i.e., when to begin Ttimer.
[0282] Another problem is how to ascertain the requisite power
level of the bias power generator 8065 at which Vthreshold is
produced across the sheath.
[0283] FIG. 93 illustrates a control circuit for determining the
bias generator power level that produces the desired sheath voltage
and for determining when the target sheath voltage has been reached
for beginning the RF burst timer. In the following description, the
target bias voltage corresponding to a desired junction depth, has
already been determined. In addition, the threshold voltage for
implantation has also been determined, and the threshold voltage
may be synonymous with the target bias voltage. Finally, the
duration time for applying RF bias power at the target bias voltage
has already been determined. The RF bias power generator 8065 is
controlled by a timer 8670 that begins counting sometime after the
beginning of an RF burst and times out after a predetermined
duration. A threshold comparator 8672 compares the peak-to-peak
voltage as detected at the wafer pedestal 8025 by a peak detector
8674 with the desired threshold voltage 8676. The timer 8670 is
enabled only when it receives an affirmative signal from an optical
detector 8678 indicating that plasma is ignited within the reactor
chamber. If the optical detector 8678 sends an affirmative signal,
then the timer 8670 begins counting as soon as the comparator 8672
determines that the peak-to-peak bias voltage has reached the
desired threshold. When the timer 8670 times out (after the
predetermined duration), it turns off the output of the bias power
generator, thus terminating the current burst of RF bias power. The
timer 8670 and the threshold comparator 8672 constitute a timer
control loop 8680.
[0284] The power level of the bias power generator 8065 is
controlled by a voltage control loop 8682. A process controller
8684 (or the process designer) determines the desired or "target"
bias peak-to-peak voltage. This may be synonymous with the
threshold voltage of 8676. A subtractor 8686 computes an error
value as the difference between the actual peak bias voltage
measured by the detector 8674 and the target bias voltage. A
proportional integral conditioner 8688 multiplies this error value
by a constant of proportionality, k, and integrates the error value
with prior samples. The result is an estimated correction to the
power level of the bias power generator 8065 that will bring the
measured bias voltage closer to the target bias voltage. This
estimate is superimposed on the current power level, and the result
is an estimated power level command that is applied to the power
set input of the bias power generator 8065. This estimate is only
valid while plasma is ignited (i.e., during an RF burst). For times
between RF bursts, the bias power level is controlled in accordance
with a look-up table 8690 that correlates target peak-to-peak bias
voltages with estimated bias power levels. The look-up table
receives the target bias voltage from the process controller 8684
and in response outputs an estimated bias power level. A pair of
switches 8694, 8696 are enabled in complementary fashion by the
output of the plasma ignition optical detector 8678. Thus, the
switch 8694 receives the output of the sensor 8678 while the switch
8696 receives the inverted output of the sensor 8678. Thus, during
an RF burst, when plasma is ignited in the chamber, the output of
the proportional integral conditioner 8688 is applied to the power
set input of the bias generator 8065 via the switch 8694. Between
RF bursts, or when no plasma is ignited in the chamber, the output
of the look-up table 8690 is applied via the switch 8696 to the
power set input of the bias power generator 8065. The output of the
look up table 8690 may be considered as a gross estimate that
serves to initialize the RF bias power level at the beginning of
each RF burst, while the output of the integral proportional
conditioner is a more accurate estimate based upon actual
measurement that serves to correct the bias power level during the
RF burst.
[0285] One problem in the plasma immersion ion implantation reactor
of FIG. 89A is that most ion implantation processes must be carried
out with precise fine control over chamber pressure. This requires
a relatively gradual change in chamber pressure over a given
rotation of the control valve 8037 from its closed position. On the
other hand, some processes, including chamber cleaning, require a
very high gas flow rate (e.g., of cleaning gases) and a
concomitantly high evacuation rate by the pump 8035. This requires
that the vacuum control valve 8037 have a large area. The problem
is that with such a large area, a vacuum control valve does not
provide the gradual change in pressure for a given rotation from
its closed position that is necessary for fine control of chamber
pressure during ion implantation. In fact, with a large area
opening and flap, the change in chamber pressure is very rapid as
the flap is rotated from its closed position, so that fine control
of pressure within a very low pressure range, where the flap must
be nearly closed, is very difficult. This problem is solved with
the vacuum control valve of FIGS. 94, 95 and 96. The valve includes
a flat housing 9410 having a circular opening 9412 through it. A
rotatable flap 9420 having a disk shape is supported within the
circular opening 9412 by a hinge 9422 attached to the housing 9410.
In its closed position, the flap 9420 is co-planar with the flat
housing 9410. In order to prevent leakage of plasma through the
valve, the gap G between the rotatable flap 9420 and the housing
9410 is narrow while the thickness T of the flap 9420 and housing
9410 is large, much greater than the gap G. For example, the ratio
of the thickness T to the gap G is about 10:1. This feature
provides the advantage of frictionless operation. In order to
provide gradual control of chamber pressure at a very low pressure
range (i.e., when the flap 9420 is near its closed position),
conically-shaped openings 9430 are provided in the interior surface
9440 of the housing 9410 defining the edge of the opening 9412.
Some of the openings 9430 have different axial locations (along the
axis of the opening 9412) than others of the openings 9430. In its
closed position, the flap 9420 permits virtually zero gas leakage,
because the openings 9430 are not exposed. As the flap 9420 begins
to rotate from its closed position (i.e., in which the flap 9420 is
co-planar with the housing 9410), small portions of at least some
of the openings 9430 begin to be exposed, and therefore allow a
small amount of gas flow through the valve. As the flap 9420
continues to rotate, it exposes larger portions of the openings
9430. Moreover, it begins to expose others of the openings 9430 not
exposed during the earlier phase of its rotation due to the
different axial locations of different sets of the openings 9430,
so that the gas flows through more of the openings 9430 in
proportion to the rotation of the flap 9420. Thus, rotation of the
flap 9430 from its fully closed (co-planar) position causes a
continuous but relatively gradual increase in gas flow through the
openings 9430 until the bottom edge 9420a of the flap 9420 reaches
the top surface 9410a of the housing 9410. At this point, all of
the openings 9430 are completely exposed so that gas flow through
the openings 9430 is maximum and cannot increase further. Thus, a
continuous gradual increase in gas flow is achieved (and therefore
one that is readily controlled with a great deal of accuracy) as
the flap 9420 rotates from its fully closed position to the point
at which the flap bottom edge 9420a is aligned with the housing top
surface 9410a. Within this range of flap rotational position, fine
gradual adjustment of a small total chamber pressure is provided.
Further rotation of the flap 9420 creates an annular gap between
the periphery of the flap 9420 and the periphery of the large
circular opening 9412, through which gas flow increases as the flap
9420 continues to rotate.
[0286] The plural openings 9430 in the opening interior surface
9440 are semi-circular openings that are tapered so as to increase
in diameter toward the top housing surface 9410a. The tapered
semi-circular openings 9430 thus define semi-conical shapes.
However, other suitable shapes may be employed, such as
semi-cylindrical, for example. However, one advantage of the
semi-conical shape is that the rate of increase of gas flow with
rotational flap position may be enhanced as the rotation progresses
so that the rate continues to increase in a fairly smooth manner
after the transition point at which the flap bottom edge 9420a
passes the housing top surface 9410a.
[0287] Depending upon the desired junction depth, the RF bias
voltage applied to the wafer support pedestal 8025 may be
relatively small (e.g., 500 volts) for a shallow junction or
relatively large (e.g., 5,000 volts) for a deep junction. Some
applications may require an RF bias voltage of over 10,000 volts.
Such large voltages can cause arcing within the wafer support
pedestal 8025. Such arcing distorts process conditions in the
reactor. In order to enable the wafer support pedestal 8025 to
withstand bias voltages as high a 10,000 volts, for example,
without arcing, voids within the wafer support pedestal 8025 are
filled with a dielectric filler material having a high breakdown
voltage, such as Rexolite.RTM., a product manufactured by C-Lec
Plastics, Inc. As illustrated in FIG. 97, the wafer support
pedestal 8025 consists of a grounded aluminum base plate 9710, an
aluminum electrostatic chuck plate 9720 and a cylindrical side wall
9730. Dielectric filler material 9735 fills voids between the side
wall 9730 and the electrostatic chuck plate 9720. Dielectric filler
material 9737 fills voids between the electrostatic chuck plate
9720 and the base plate 9710. A coaxial RF conductor 9739 carrying
the RF bias power from the RF generator 8065 (not shown in FIG. 97)
is terminated in a narrow cylindrical conductive center plug 9740
that fits tightly within a matching conductive receptacle 9742 of
the electrostatic chuck plate 9720. A wafer lift pin 9744 (one of
three) extends through the pedestal 8025. The lift pin 9744 is
tightly held within the electrostatic chuck plate 9720 by a
surrounding blanket 9746 of the dielectric filler material. A void
9748 that accommodates a guide 9750 of the lift pin 9744 is located
entirely within the base plate 9710 so as to minimize the risk of
arcing within the void 9748. Referring to FIG. 98, bolt 9754 (one
of several) holding the base plate 9710 and the electrostatic chuck
plate 9720 together is completely encapsulated to eliminate any
voids around the bolt 9754, with dielectric layers 9756, 9758
surrounding exposed portions of the bolt 9754. The foregoing
features have been found to enable the wafer support pedestal to
withstand an RF bias voltage of over 10,000 volts without
experiencing arcing.
[0288] FIG. 99 illustrates an ion implantation system including a
plasma immersion ion implantation reactor 9910 of the type
illustrated in FIG. 79, 83A, 83B, 84, 85, 88, 89A or 93. An
independent source 9920 of chamber-cleaning radicals or gases (such
as fluorine-containing gases or fluorine-containing radicals like
NF.sub.3 and/or other cleaning gases such as hydrogen-containing
gases (e.g., H.sub.2 or compounds of hydrogen) to produce
hydrogen-containing radicals or oxygen-containing gases (e.g.,
O.sub.2) is coupled to the implant reactor 9910 for use during
chamber cleaning operations. A post-implant anneal chamber 9930 and
an ion beam implanter 9940 are also included in the system of FIG.
99. In addition, an optical metrology chamber 9950 may also be
included. Furthermore, a photoresist pyrolization chamber 9952 may
be included in the system for removal of the photoresist mask
subsequently after implant and prior to anneal. Alternatively, this
may be accomplished within the plasma immersion implantation
reactor 9910 using the RF plasma source power and optional bias
power with oxygen gas, and/or by using the independent
self-cleaning source with oxygen gas.
[0289] The system of FIG. 99 may also include a wet clean chamber
9956 for carrying out wafer cleaning. The wet clean chamber 9956
may employ such well known wet cleaning species as HF, for example.
The wet clean chamber 9956 may be employed for pre-implantation or
post-implantation cleaning of the wafer. The pre-implantation
cleaning use of the wet clean chamber 9956 may be for removing a
thin native oxide that can accumulate on the wafer between
processing operations. The post-implantation cleaning use of the
wet clean chamber 9956 may be for removing photoresist from the
wafer in lieu of the photoresist strip chamber 9952. The system of
FIG. 99 may further include a second, (third, fourth or more)
plasma immersion ion implantation reactor 9958 of the type
illustrated in FIG. 79, 83A, 83B, 84, 85, 88, 89A or 93. In one
example, the first PIII reactor 9910 may be configured to ion
implant a first species while the second PIII reactor 9958 may be
configured to implant a second species, so that a single PIII
reactor need not be re-configured to implant the two species in
each wafer. Furthermore, the first and second species may be dopant
impurities for opposite semiconductor conductivity types (e.g.,
boron and phosphorus), in which case the second PIII reactor 9958
may be employed in lieu of the beam implantation tool 9940. Or, two
N-type dopants (phosphorous and arsenic) may be implanted in
addition to a P-type dopant (boron), in which case boron
implantation is carried out by the first PIII reactor 9910, arsenic
implantation is carried out in the ion beam tool 9940 and
phosphorus implantation is carried out in the second PIII reactor
9958, for example. In another example, the 2 (or more) PIII
reactors may be configured to implant the same species so as to
increase the throughput of the system.
[0290] A wafer transfer robotic handler 9945 transfers wafers
between the plasma ion implant reactor 9910, the anneal chamber
9930, the ion beam implanter 9940, the photoresist pyrolization
chamber 9952, the optical metrology chamber 9950, the wet clean
chamber 9956 and the second PIII reactor 9958. If the entire system
of FIG. 99 is provided on a single tool or frame, the handler 9945
is a part of that tool and is supported on the same frame. However,
if some of the components of the system of FIG. 99 are on separate
tools located in separate places in a factory, then the handler
9945 is comprised of individual handlers within each tool or frame
and a factory interface that transports wafers between tools within
the factory, in the well-known manner. Thus, some or all of the
components of the system of FIG. 99 may be provided on a single
tool with its own wafer handler 9945. Alternatively, some or all of
the components of the system of FIG. 99 may be provided on
respective tools, in which case the wafer handler 9945 includes the
factory interface.
[0291] The process controller 8075 can receive measurements of a
previously implanted wafer from the optical metrology chamber 9950,
and adjust the implant process in the plasma implant reactor 9910
for later wafers. The process controller 8075 can use established
data mining techniques for process correction and control. The
inclusion of the ion beam implanter 9940 permits the system to
perform all of the ion implantation steps required in semiconductor
fabrication, including implantation of light elements (such as
boron or phosphorous) by the plasma ion implant reactor 9910 and
implantation of heavier elements (such as arsenic) by the ion beam
implanter 9940. The system of FIG. 99 may be simplified. For
example, a first version consists of only the chamber cleaning
radical source 9920, the PIII reactor 9910 and the process
controller 8075. A second version includes the foregoing elements
of the first version and, in addition, the optical metrology tool
9950. A third version includes the foregoing elements of the second
version and, in addition, the ion beam implanter 9940 and/or the
second PIII reactor 9958. A fourth version includes the foregoing
elements of the third version and, in addition, the anneal chamber
9930.
[0292] Ion Implantation Performance Of The Torroidal Source:
[0293] The plasma immersion ion implantation (PIII) reactor of FIG.
85 realizes many advantages not found heretofore in a single
reactor. Specifically, the PIII reactor of FIG. 85 has low minimum
ion implant energy (because it has a low plasma potential), low
contamination (because the recirculating plasma generally does not
need to interact with chamber surfaces to provide a ground return),
very good control over unwanted etching (because it exhibits low
fluorine dissociation), and excellent control over ion implant flux
(because it exhibits a nearly linear response of plasma electron
density to source power).
[0294] The advantage of excellent control over ion implant flux is
illustrated in the graph of FIG. 100, in which electron density is
plotted as a function of source power level for the torroidal
source PIII reactor of FIG. 85 and for an inductively coupled PIII
reactor of the type illustrated in FIG. 79. Electron density is an
indicator of plasma ion density and therefore of the ion implant
flux or implant dose to the wafer. The inductively coupled source
of the PIII reactor of FIG. 79 tends to have a highly non-linear
response of electron density to applied source power, exhibiting a
sudden increase in electron density at a threshold power level,
PICP, below which the slope (response) is negligible and above
which the slope (response) is so steep that electron density (and
therefore ion implant flux or dose) is nearly impossible to control
to any fine degree. In contrast the torroidal source PIII reactor
of FIG. 85 has a generally linear and gradual response of electron
density to source power level above a threshold power level PTH, so
that ion implant flux (dose) is readily controlled to within a very
fine accuracy even at very high source power level. It should be
noted here that the plasma source power level of the torroidal
source PIII reactor of FIG. 85 is a function of the two different
source power generators 8055, 8056 coupled to the respective
reentrant conduits 8150, 8151. The source power frequency may be
about 13.56 MHz, although the frequency of each of the two source
power generators 8055, 8056 are offset from this frequency (13.56
MHz) by +100 kHz and -100 kHz, respectively, so that the two
torroidal plasma current paths established by the sources 8110 and
8111 are decoupled from one another by being de-tuned from one
another by about 200 kHz. However, their power levels may be
generally about the same. Operating frequencies are not limited to
the regime described here, and another RF frequency and frequency
offset may be selected for the pair of RF source power generators
8055, 5056.
[0295] The advantage of low fluorine dissociation of the PIII
reactor of FIG. 85 is important in preventing unwanted etching that
can occur when a fluorine-containing dopant gas, such as BF3, is
employed. The problem is that if the BF3 plasma by-products are
dissociated into the simpler fluorine compounds, including free
fluorine, the etch rate increases uncontrollably. This problem is
solved in the PIII reactor of FIG. 85 by limiting the fluorine
dissociation even at high power levels and high plasma density.
This advantage is illustrated in the graph of FIG. 101, in which
free fluorine density (an indicator of fluorine dissociation) is
plotted as a function of source power for the PIII reactor of FIG.
85 and for the inductively coupled reactor of FIG. 79 for the sake
of comparison. The inductively coupled reactor of FIG. 79 exhibits
an extremely sudden increase in free fluorine density above a
particular source power level, PDIS, above which the dissociation
increases at a very high rate of change, and is therefore difficult
to control. In contrast, the PIII reactor of FIG. 85 exhibits
generally linear and nearly negligible (very gradual) increase in
free fluorine density above a threshold source power PTH. As a
result, there is very little unwanted etching during ion
implantation with fluorine-containing dopant gases in the torroidal
source PIII reactor of FIG. 85. The etching is further minimized if
the temperature of the wafer is held to a low temperature, such as
below 100 degrees C., or more preferably below 60 degrees C., or
most preferably below 20 degrees C. For this purpose, the wafer
pedestal 8025 may be an electrostatic chuck that holds and releases
the wafer electrostatically with thermal control cooling apparatus
8025a and/or heating apparatus 8025b that control the temperature
of a semiconductor wafer or workpiece held on the top surface of
the wafer support pedestal 8025. Some small residual etching (such
as may be realized with the torroidal source PIII reactor of FIG.
85) is acceptable and may actually prevent the deposition of
unwanted films on the wafer during ion implantation. During ion
implantation, some plasma by-products may deposit as films on the
wafer surface during ion implantation. This is particularly true in
cases where the implantation process is carried out at a very low
ion energy (low bias voltage) and particularly with a dopant gas
consisting of a hydride of the dopant species (e.g., a hydride of
boron or a hydride of phosphorous). In order to further reduce
unwanted depositions that normally occur with hydride dopants
(e.g., B.sub.2H.sub.6, PH.sub.3), one aspect of the process is to
add hydrogen and/or helium to the dopant gas to eliminate the
deposition on the surface of the wafer. However, the requisite etch
rate to compete with such an unwanted deposition is very low, such
as that exhibited by the torroidal source PIII reactor of FIG.
85.
[0296] The advantage of a low minimum ion implant energy increases
the range of junction depths of which the PIII reactor of FIG. 85
is capable (by reducing the lower limit of that range). This
advantage is illustrated in the graph of FIG. 102, in which plasma
potential is plotted as a function of plasma source power for the
torroidal source PIII reactor of FIG. 85 and for the capacitively
coupled PIII reactor of FIG. 83A, for the sake of comparison. The
plasma potential is the potential on ions at the wafer surface due
to the plasma electric field in the absence of any bias voltage on
the wafer, and therefore is an indicator of the minimum energy at
which ions can be implanted. FIG. 102 shows that the plasma
potential increases indefinitely as the source power is increased
in the capacitively coupled PIII reactor of FIG. 83A, so that in
this reactor the minimum implant energy is greatly increased (the
implant energy/depth range is reduced) at high plasma density or
ion implant flux levels. In contrast, above a threshold power PTH,
the torroidal source PIII reactor of FIG. 85 exhibits a very
gradual (nearly imperceptible) increase in plasma potential as
source power is increased, so that the plasma potential is very low
even at high plasma source power or ion density (high ion implant
flux). Therefore, the range of plasma ion energy (ion implant
depth) is much larger in the PIII reactor of FIG. 85 because the
minimum energy remains very low even at high ion flux levels.
[0297] The plasma potential in the capacitively coupled PIII
reactor of FIG. 83A can be reduced by increasing the source power
frequency. However, this becomes more difficult as the junction
depth and corresponding ion energy is reduced. For example, to
reach a plasma potential that is less than 500 eV (for a 0.5 kV
Boron implant energy), the source power frequency would need to be
increased well into the VHF range and possibly above the VHF range.
In contrast, the source power frequency of the torroidal source
PIII reactor of FIG. 85 can be in the HF range (e.g., 13 MHz) while
providing a low plasma potential.
[0298] A further advantage of the torroidal source PIII reactor of
FIG. 85 over the capacitively coupled source PIII reactor of FIG.
83A is that the torroidal source PIII reactor has a thinner plasma
sheath in which proportionately fewer inelastic collisions of ions
occur that tend to skew the ion implant energy distribution. This
thinner sheath may be nearly collisionless. In contrast, the
capacitively coupled source PIII reactor of FIG. 83A generates
plasma ions in the sheath by an HF or VHF RF source that tends to
produce a much thicker sheath. The thicker sheath produces far more
collisions that significantly skew ion energy distribution. The
result is that the ion implanted junction profile is far less
abrupt. This problem is more acute at lower ion energies (shallower
implanted junctions) where the skew in energy produced by the
collisions in the thicker sheath represent a far greater fraction
of the total ion energy. The torroidal source PIII reactor of FIG.
85 therefore has more precise control over ion implant energy and
is capable of producing implanted junctions with greater
abruptness, particularly for the more shallow junctions that are
needed for the more advanced (smaller feature size)
technologies.
[0299] A related advantage of the torroidal source PIII reactor of
FIG. 85 is that it can be operated at much lower chamber pressures
than the capacitively coupled PIII reactor of FIG. 83A. The
capacitively coupled PIII reactor of FIG. 83A requires a thicker
sheath to generate plasma ions in the sheath, which in turn
requires higher chamber pressures (e.g., 10-100 mT). The torroidal
source PIII reactor of FIG. 85 does not need to generate plasma
near the sheath with bias power and for many applications therefore
is best operated with a thinner (nearly collisionless) sheath, so
that chamber pressures can be very low (e.g., 1-3 mT). This has the
advantage of a wider ion implantation process window in the
torroidal source PIII reactor. However, as will be discussed with
reference to doping of a three dimensional structure such as a
polysilicon gate having both a top surface and vertical side walls,
velocity scattering of dopant ions in the sheath enables ions to
implant not only the top surface of the polysilicon gate but also
implant its side walls. Such a process may be referred to as
conformal ion implanting. Conformal ion implanting has the
advantage of doping the gate more isotropically and reducing
carrier depletion at the gate-to-thin oxide interface, as will be
discussed below. Therefore, some sheath thickness is desirable in
order to scatter a fraction of the dopant ions away from a purely
vertical trajectory so that the scattered fraction implants into
the side walls of the polysilicon gate. (In contrast, in an ion
beam implanter, such scattering is not a feature, so that only the
gate top surface is implanted.) Another advantage of a plasma
sheath of finite thickness (and therefore finite collisional
cross-section) is that some very slight scattering of all the ions
from a purely vertical trajectory (i.e., a deflection of only a few
degrees) may be desirable in some cases to avoid implanting along
an axis of the wafer crystal, which could lead to channeling or an
implant that is too deep or a less abrupt junction profile. Also,
scattering of the ions leads to placement of dopants under the
polysilicon gate. This can be very useful in optimizing CMOS device
performance by controlling the dopant overlap under the poly Si
gate and Source drain extension areas, as will be discussed later
in this specification in more detail.
[0300] The low contamination exhibited by the torroidal source PIII
reactor of FIG. 85 is due primarily to the tendency of the plasma
to not interact with chamber surfaces and instead oscillate or
circulate in the torroidal paths that are generally parallel to the
chamber surfaces rather than being towards those surfaces.
Specifically, the pair torroidal paths followed by the plasma
current are parallel to the surfaces of the respect reentrant
conduits 8150, 8151 of FIG. 85 and parallel to the interior surface
of the ceiling 8015 and of the wafer support pedestal 8025. In
contrast, the plasma source power generates electric fields within
the capacitively coupled PIII reactor of FIG. 83A that are oriented
directly toward the ceiling and toward the chamber walls.
[0301] In the torroidal source PIII reactor of FIG. 85, the only
significant electric field oriented directly toward a chamber
surface is produced by the bias voltage applied to the wafer
support pedestal 8025, but this electric field does not
significantly generate plasma in the embodiment of FIG. 85. While
the bias voltage can be a D.C. (or pulsed D.C.) bias voltage, in
the embodiment of FIG. 85 the bias voltage is an RF voltage. The
frequency of the RF bias voltage can be sufficiently low so that
the plasma sheath at the wafer surface does not participate
significantly in plasma generation. Thus, plasma generation in the
torroidal source PIII reactor of FIG. 85 produces only plasma
currents that are generally parallel to the interior chamber
surfaces, and thus less likely to interact with chamber surfaces
and produce contamination.
[0302] Further reduction of metal contamination of ion implantation
processes is achieved by first depositing a passivation layer on
all chamber surfaces prior to performing the ion implantation
process. The passivation layer may be a silicon-containing layer
such as silicon dioxide, silicon nitride, silicon, silicon carbide,
silicon hydride, silicon fluoride, boron or phosphorous or arsenic
doped silicon, boron or phosphorous or arsenic doped silicon
carbide, boron or phosphorous or arsenic doped silicon oxide.
Alternatively, the passivation may be a fluorocarbon or hydrocarbon
or hydrofluorocarbon film. Compounds of germanium may also be used
for passivation. Alternatively, the passivation layer may be a
dopant-containing layer such as boron, phosphorous, arsenic or
antimony formed by decomposition of a compound of the dopant
precursor gas, such as BF.sub.3, B.sub.2H.sub.6, PF.sub.3,
PF.sub.5, PH.sub.3, AsF.sub.3, of AsH.sub.3. It may be advantageous
to form a passivation layer with a source gas or source gas mixture
using gas(es)similar to that or those that are to be used in the
subsequent plasma immersion implantation process step. (This may
reduce unwanted etching of the passivation layer by the subsequent
implant process step.) Alternatively, it may be advantageous to
combine the fluoride and the hydride of a particular gas to
minimize the fluorine and/or hydrogen incorporated in the
passivation layer, for example, BF.sub.3+B.sub.2H.sub.6,
PH.sub.3+PF.sub.3, AsF.sub.3+AsH.sub.3, SiF.sub.4+SiH.sub.4, or
GeF.sub.4+GeH.sub.4.
[0303] While the RF bias frequency of the torroidal source PIII
reactor of FIG. 85 is sufficiently low to not affect plasma
generation by the plasma source power applicators 8110, 8111, it is
also sufficiently low to permit the ions in the plasma sheath to
follow the sheath oscillations and thereby acquire a kinetic energy
of up to the equivalent to the full peak-to-peak voltage of the RF
bias power applied to the sheath, depending upon pressure and
sheath thickness. This reduces the amount of RF bias power required
to produce a particular ion energy or implant depth. On the other
hand, the RF bias frequency is sufficiently high to avoid
significant voltage drops across dielectric layers on the wafer
support pedestal 8025, on chamber interior walls and on the wafer
itself. This is particularly important in ion implantation of very
shallow junctions, in which the RF bias voltage is correspondingly
small, such as about 150 volts for a 100 Angstrom junction depth
(for example). An RF voltage drop of 50 volts out of a total of 150
volts across the sheath (for example) would be unacceptable, as
this would be a third of the total sheath voltage. The RF bias
frequency is therefore sufficiently high to reduce the capacitive
reactance across dielectric layers so as to limit the voltage drop
across such a layer to less than on the order of 10% of the total
RF bias voltage. A frequency sufficiently high meet this latter
requirement while being sufficiently low for the ions to follow the
sheath oscillations is in the range of 100 kHz to 10 MHz, and more
optimally in the range of 500 kHz to 5 MHz, and most optimally
about 2 MHz. One advantage of reducing capacitive voltage drops
across the wafer pedestal is that the sheath voltage can be more
accurately estimated from the voltage applied to the pedestal. Such
capacitive voltage drops can be across dielectric layers on the
front or back of the wafer, on the top of the wafer pedestal and
(in the case of an electrostatic chuck) the dielectric layer at the
top of the chuck.
[0304] Ion implantation results produced by the torroidal source
PIII reactor of FIG. 85 compare favorably with those obtained with
a conventional beam implanter operated in drift mode, which is much
slower than the PIII reactor. Referring to FIG. 103, the curves "A"
and "a" are plots of dopant (boron) volume concentration in the
wafer crystal as a function of depth for boron equivalent energies
of 0.5 keV. (As will be discussed below, to achieve the same ion
energy as the beam implanter, the bias voltage in the PIII reactor
must be twice the acceleration voltage of the beam implanter.) Even
though the PIII reactor (curve "A") is four times faster than the
beam implanter (curve "B"), the implant profile is nearly the same,
with the same junction abruptness of about 3 nanometers (change in
junction depth) per decade (of dopant volume concentration) and
junction depth (about 100 Angstroms). Curves "B" and "b" compare
the PIII reactor results ("B") with those of a conventional beam
implanter ("b") at boron equivalent energies of 2 keV, showing that
the junction abruptness and the junction depth (about 300
Angstroms) is the same in both cases. Curves "C" and "c" compare
the PIII reactor results ("C") with those of a conventional beam
implanter ("c") at boron equivalent energies of 3.5 keV, showing
that the junction depth (about 500 Angstroms) is the same in both
cases.
[0305] FIG. 103 compares the PIII reactor performance with the
conventional beam implanter operated in drift mode (in which the
beam voltage corresponds to the desired junction depth). Drift mode
is very slow because the beam flux is low at such low beam
energies. This can be addressed by using a much higher beam voltage
and then decelerating the beam down to the correct energy before it
impacts the wafer. The deceleration process is not complete, and
therefore leaves an energy "contamination" tail (curve "A" of FIG.
, 104) which can be reduced by rapid thermal annealing to a better
implant profile with greater abruptness (curve "B" of FIG. 104).
Greater activated implanted dopant concentration, however, can be
achieved using a dynamic surface annealing process employing
localized melting or nearly melting temperatures for very short
durations. The dynamic surface annealing process does not reduce
energy contamination tails, such as the energy contamination tail
of curve "C" of FIG. 105. In comparison, the torroidal source PIII
reactor of FIG. 85 needs no deceleration process since the bias
voltage corresponds to the desired implant depth, and therefore has
no energy contamination tail (curve "D" of FIG. 105). Therefore,
the PIII reactor can be used with the dynamic surface anneal
process to form very abrupt ultra shallow junction profile, while
the conventional beam implanter operating in deceleration mode
cannot. The dynamic surface annealing process consists of locally
heating regions of the wafer surface to nearly (e.g., within 100 to
50 degrees of) its melting temperature for very short durations
(e.g., nano-seconds to tens of milliseconds) by scanning a laser
beam or a group of laser beams across the wafer surface.
[0306] FIG. 106 illustrates how much greater a dopant concentration
can be attained with the dynamic surface annealing process. Curve
"A" of FIG. 106 illustrates the wafer resistivity in Ohms per
square as a function of junction depth using a beam implanter and a
rapid thermal anneal of the wafer at 1050 degrees C. The
concentration of dopant reached 10E20 per cubic centimeter. Curve
"B" of FIG. 106 illustrates the wafer resistivity in Ohms per
square as a function of junction depth using the torroidal source
PIII reactor of FIG. 85 and a dynamic surface anneal process after
implanting at a temperature of 1300 degrees C. The concentration of
the dopant reached 5.times.10.sup.20 following the dynamic surface
annealing, or about five times that achieved with rapid thermal
annealing. FIG. 107 illustrates how little the implanted dopant
profile changes during dynamic surface annealing. Curve "A" of FIG.
107 is the dopant distribution prior to annealing while curve "B"
of FIG. 107 is the dopant distribution after annealing. The dynamic
surface annealing process causes the dopant to diffuse less than 10
.ANG., while it does not adversely affect the junction abruptness,
which is less than 3.5 nm/decade. This tendency of the dynamic
surface annealing process to minimize dopant diffusion facilitates
the formation of extremely shallow junctions. More shallow
junctions are required (as source-to-drain channel lengths are
decreased in higher speed devices) in order to avoid
source-to-drain leakage currents. On the other hand, the shallower
junction require much higher active dopant concentrations (to avoid
increased resistance) that can best be realized with dynamic
surface annealing. As discussed elsewhere in this specification,
junction depth can be reduced by carrying out a wafer amorphization
step in which the wafer is bombarded with ions (such as silicon or
germanium ions) to create lattice defects in the semiconductor
crystal of the wafer. We have implanted and annealed junctions
having a high dopant concentration corresponding to a low
resistivity (500 Ohms per square), an extremely shallow junction
depth (185 .ANG.) and a very steep abruptness (less than 4
nm/decade). In some cases, the depth of the amorphizing or ion
bombardment process may extend below the dopant implant junction
depth. For example, amorphization using SiF4 gas and a 10 kV
peak-to-peak bias voltage in the PIII reactor of FIG. 85 forms an
amorphized layer to a depth of about 150 Angstroms, while dopant
(boron) ions accelerated across a 1000 peak-to-peak volt sheath
(bias) voltage implant to a depth of only about 100 Angstroms.
[0307] FIG. 108 illustrates the bias voltage for the torroidal
source PIII reactor (left hand ordinate) and the beam voltage for
the ion beam implanter (right hand ordinate) as a function of
junction depth. The PIII reactor and the beam implanter produce
virtually identical results provided the PIII reactor bias voltage
is twice the beam voltage.
[0308] Working Examples:
[0309] A principal application of a PIII reactor is the formation
of PN junctions in semiconductor crystals. FIGS. 109 and 110
illustrate different stages in the deposition of dopant impurities
in the fabrication of a P-channel metal oxide semiconductor field
effect transistor (MOSFET). Referring first to FIG. 109, a region
9960 of a semiconductor (e.g., silicon) wafer may be doped with an
N-type conductivity impurity, such as arsenic or phosphorus, the
region 9960 being labeled "n" in the drawing of FIG. 109 to denote
its conductivity type. A very thin silicon dioxide layer 9962 is
deposited on the surface of the wafer including over n-type region
9960. A polycrystalline silicon gate 9964 is formed over the thin
oxide layer 9962 from a blanket polysilicon layer that has been
doped with boron in the PIII reactor. After formation of the gate
9964, p-type dopant is implanted in the PIII reactor to form source
and drain extensions 9972 and 9973. Spacer layers 9966 of a
dielectric material such as silicon dioxide and/or silicon nitride
(for example) are formed along two opposite vertical sides 9964a,
9964b of the gate 9964. Using the PIII reactor of FIG. 85 with a
process gas consisting of BF3 or B2H6 (for example), boron is
implanted over the entire N-type region 9960. The spacer layers
mask their underlying regions from the boron, so that P-type
conductivity source and drain contact regions 9968, 9969 are formed
on either side of the gate 9964, as shown in FIG. 110. This step is
carried out with a boron-containing species energy in the range of
2 to 10 kVpp on the RF bias voltage (controlled by the RF bias
power generator 8065 of FIG. 85). In accordance with the example of
FIG. 108, the RF bias voltage on the wafer pedestal 8025 in the
PIII reactor of FIG. 85 is twice the desired boron energy. The
implantation is carried out for a sufficient time and at a
sufficient ion flux or ion density (controlled by the RF source
power generators 8055, 8056 of FIG. 85) to achieve a surface
concentration of boron exceeding 5.times.10.sup.15 atoms per square
centimeter. The concentration of boron in the gate 9964 is then
increased to 1.times.10.sup.16 atoms per square centimeter by
masking the source and drain contacts 9968, 9969 (by depositing a
layer of photoresist thereover, for example) and carrying out a
further (supplementary) implantation step of boron until the
concentration of boron in the gate 9964 reaches the desired level
(1.times.10.sup.16 atoms/cubic centimeter). The source and drain
contacts 9968, 9969 are not raised to the higher dopant
concentration (as is the gate 9964) because the higher dopant
concentration may be incompatible with formation of a metal
silicide layer (during a later step) over each contact 9968, 9969.
However, the gate 9964 must be raised to this higher dopant
concentration level in order to reduce carrier depletion in the
gate 9964 near the interface between the gate 9964 and the thin
silicon dioxide layer 9962. Such carrier depletion in the gate
would impede the switching speed of the transistor. The dopant
profile in the gate must be highly abrupt in order attain a high
dopant concentration in the gate 9964 near the thin oxide layer
9962 without implanting dopant into the underlying thin oxide layer
9962 or into the source-to-drain channel underlying the thin oxide
layer 9962. Another measure that can be taken to further enhance
gate performance and device speed is to raise the dielectric
constant of the thin silicon dioxide layer 9962 by implanting
nitrogen in the thin silicon dioxide layer 9962 so that (upon
annealing) nitrogen atoms replace oxygen atoms in the layer 9962,
as will be described later in this specification. A further measure
for enhancing gate performance is conformal implanting in which
dopant ions that have been deflected from their vertical trajectory
by collisions in the plasma sheath over the wafer surface are able
to implant into the vertical side walls of the gate 9964. This
further increases the dopant concentration in the gate 9964 near
the interface with the thin oxide layer 9962, and provide a more
uniform and isotropic dopant distribution within the gate. A yet
further measure for enhancing gate performance for gates of
N-channel devices implanted with arsenic is to implant phosphorus
during the supplementary implant step using the PIII reactor. The
phosphorus is lighter than arsenic and so diffuses more readily
throughout the semiconductor crystal, to provide less abrupt
junction profile in the source drain contact areas.
[0310] The depth of the ion implantation of the source and drain
contacts 9968, 9969 may be in the range of 400 to 800 .ANG.. If the
gate 9964 is thinner than that, then the gate 9964 must be
implanted in a separate implantation step to a lesser depth to
avoid implanting any dopant in the thin oxide layer 9962 below the
gate 9964. In order to avoid depletion in the region of the gate
9964 adjacent the thin oxide layer 9962, the implantation of the
gate must extend as close to the gate/oxide interface as possible
without entering the thin oxide layer 9962. Therefore, the implant
profile of the gate must have the highest possible abruptness
(e.g., 3 nm/decade or less) and a higher dopant dose (i.e.,
1.times.10.sup.16 atoms/cm.sup.2 ).
[0311] Referring now to FIG. 110, source and drain extensions 9972,
9973 are typically formed before depositing and forming the spacer
layers 9966 of FIG. 109. The extensions layers are formed by
carrying out a more shallow and light implant of boron over the
entire region 9960. Typically, the junction depth of the source and
drain extensions is only about 100 to 300 Angstroms and the implant
dose is less than 5.times.10.sup.15 atoms/square centimeter. This
implant step, therefore, has little effect on the dopant profiles
in the gate 9964 or in the source and drain contacts 9968, 9969, so
that these areas need not be masked during the implantation of the
source and drain extensions 9972, 9973. However, if masking is
desired, then it may be carried out with photoresist. The source
and drain extensions are implanted at an equivalent boron energy of
0.5 kV, requiring a 1.0 kVpp RF bias voltage on the wafer pedestal
8025 of FIG. 85.
[0312] The same structures illustrated in FIGS. 109 and 110 are
formed in the fabrication of an N-channel MOSFET. However, the
region 9960 is initially doped with a P-type conductivity such as
boron and is therefore a P-type conductivity region. And, the
implantation of the gate 9964 and of the source and drain contacts
9968, 9969 (illustrated in FIG. 109) is carried out in a beam
implanter (rather than in a PIll reactor) with an N-type
conductivity impurity dopant such as arsenic. Furthermore, the
supplementary implantation of the gate 9964 that raises its dopant
dose concentration to 1.times.10.sup.16 atoms/cm.sup.2 is carried
out in the PIII reactor with phosphorus (rather than arsenic) using
a phosphorus-containing process gas. Phosphorus is preferred for
this latter implantation step because it diffuses more uniformly
than arsenic, and therefore enhances the quality of the N-type
dopant profile in the gates 9964 of the N-channel devices. The ion
beam voltage is in the range of 15-30 kV for the arsenic implant
step (simultaneous implanting of the N-channel source and drain
contacts 9968, 9969 and of the N-channel gates 9964), and is
applied for a sufficient time to reach a dopant surface
concentration exceeding 5.times.10.sup.15 atoms per cubic
centimeter. The supplementary gate implant of phosphorus is carried
out at an ion beam voltage in the range of only 2-5 kV for a
sufficient time to raise the dopant surface concentration in the
N-channel gates to 1.times.10.sup.16 atoms/cubic cm.
[0313] The implantation steps involving phosphorus and boron are
advantageously carried out in the PIII reactor rather than an ion
beam implanter because the ion energies of these light elements are
so low that ion flux in a beam implanter would be very low and the
implant times would be inordinately high (e.g., half and hour per
wafer). In the PIII reactor, the source power can be 800 Watts at
13.56 MHz (with the 200 kHz offset between the two torroidal plasma
currents as described above), the implant step being carried out
for only 5 to 40 seconds per wafer.
[0314] The sequence of ion implantation steps depicted in FIGS. 109
and 110 may be modified, in that the light shallow source and drain
extension implant step of FIG. 110 may be carried out before or
after formation of the, spacer layer 9966 and subsequent heavy
implantation of the contacts 9968, 9969 and gate 9964. When
extension implants are done after the spacer layer 9966 is formed,
the spacer layer 9966 must be removed before the extension implants
are performed.
[0315] One example of a process for fabricating complementary
MOSFETS (CMOS FETs) is illustrated in FIG. 111. In the first step
(block 9980), the P-well and N-well regions of the CMOS device are
implanted in separate steps. Then, a blanket thin gate oxide layer
and an overlying blanket polysilicon gate layer are formed over the
entire wafer (block 9981 of FIG. 111). The P-well regions are
masked and the N-well regions are left exposed (block 9982). The
portions of the polysilicon gate layer lying in the N-well regions
are then implanted with boron in a PIII reactor (block 9983). The
P-channel gates (9964 in FIG. 109) are then photolithographically
defined and etched, to expose portions of the silicon wafer (block
9984). Source and drain extensions 9972, 9973 of FIG. 109
self-aligned with the gate 9964 are then formed by ion implantation
of boron using the PIII reactor (block 9985). A so-called "halo"
implant step is then performed to implant an N-type dopant under
the edges of each P-channel gate 9964 (block 9986). This is done by
implanting arsenic using an ion beam tilted at about 30 degrees
from a vertical direction relative to the wafer surface and
rotating the wafer. Alternatively, this step may be accomplished by
implanting phosphorus in the PIII reactor using a chamber pressure
and bias voltage conducive to a large sheath thickness to promote
collisions in the sheath that divert the boron ions from a vertical
trajectory. Then, the spacer layers 9986 are formed over the source
drain extensions 9972, 9973 (block 9987) and boron is then
implanted at a higher energy to form the deep source drain contacts
9969 (block 9988), resulting in the structure of FIG. 110. The
reverse of step 9982 is then performed by masking the N-well
regions (i.e., the P-channel devices) and exposing the P-well
regions (block 9992). Thereafter steps 9993 through 9998 are
performed that correspond to steps 9983 through 9988 that have
already been described, except that they are carried out in the
P-well regions rather than in the N-well regions, the dopant is
Arsenic rather than Boron, and a beam line ion implanter is
employed rather than a PIII reactor. And, for the N-channel device
halo implant of block 9996 (corresponding to the P-channel device
halo implant of block 9986 described above), the dopant is a P-type
dopant such as boron. In the case of the N-channel devices
implanted in steps 9993 through 9998, a further implant step is
performed, namely a supplemental implant step (block 9999) to
increase the dose in the polysilicon gate as discussed above in
this specification. In the supplemental implantation step of block
9999, phosphorus is the N-type dopant impurity and is implanted
using a PIII reactor rather than a beam implanter (although a beam
implanter could be employed instead).
[0316] As noted above, the process may be reversed so that the gate
9964 and source and drain contacts 9968, 9969 are implanted before
the source and drain extensions 9972, 9973.
[0317] After all ion implantations have been carried out, the wafer
is subjected to an annealing process such as spike annealing using
rapid thermal processing (RTP) and/or the dynamic surface annealing
(DSA) process discussed earlier in this specification. Such an
annealing process causes the implanted dopant ions, most of which
came to rest in interstitial locations in the crystal lattice, to
move to atomic sites, i.e., be substituted for silicon atoms
originally occupying those sites. More than one annealing step can
be used to form the pmos and nmos devices and these steps can be
inserted in the process flow as appropriate from activation and
diffusion point of view.
[0318] The foregoing ion implantation processes involving the
lighter atomic elements (e.g., boron and phosphorus) are carried
out using a PIII reactor in the modes described previously. For
example, the bias power frequency is selected to maximize ion
energy while simultaneously providing low impedance coupling across
dielectric layers. How this is accomplished is described above in
this specification.
[0319] The ion implantation processes described above are enhanced
by other processes. Specifically, in order to prevent channeling
and in order to enhance the fraction of implanted ions that become
substitutional upon annealing, the semiconductor wafer crystal may
be subjected to an ion bombardment process that partially
amorphizes the crystal by creating crystal defects. The ions
employed should be compatible with the wafer material, and may be
formed in the PIII reactor in a plasma generated from one or more
of the following gases: silicon fluoride, silicon hydride,
germanium fluoride, germanium hydride, Xenon, Argon, or carbon
fluoride (ie. tetrafluoromethane, octafluorocyclobutane, etc) or
carbon hydride (ie. methane, acetylene, etc) or carbon
hydride/fluoride (ie. tetrafluoroethane, difluoroethylene, etc)
gases. One advantage of the PIII reactor is that its implant
processes are not mass selective (unlike an ion beam implanter).
Therefore, during ion implantation of a dopant impurity such boron,
any other element may also be implanted simultaneously, regardless
of ion mass in the PIII reactor. Therefore, unlike an ion beam
implanter, the PIII reactor is capable of simultaneously implanting
a dopant impurity while carrying out an amorphizing process. This
may be accomplished using a BF3 gas (to provide the dopant ions)
mixed with an SiF4 gas (to provided the amorphizing bombardment ion
species). Such a simultaneous ion implantation process is referred
to as a co-implant process. The amorphization process may also be
carried out sequentially with the doping process. In addition to
amorphization, simultaneous implants of dopant and non-dopant atoms
such as Fluorine, Germanium, Carbon or other elements are done to
change the chemistry of the Silicon wafer. This change in chemistry
can help in increasing dopant activation and reducing dopant
diffusion.
[0320] Another process that can be carried out in the PIII reactor
is a surface enhancement process in which certain ions are
implanted in order to replace other elements in the crystal. One
example of such a surface enhancement process is nitrodization. In
this process, the dielectric constant of the thin silicon dioxide
layer 9962 is increased (in order to increase device speed) by
replacing a significant fraction of the oxygen atoms in the silicon
dioxide film with nitrogen atoms. This is accomplished in the PIII
reactor by generating a plasma from a nitrogen-containing gas, such
as ammonia, and implanting the nitrogen atoms into the silicon
dioxide layer 9962. This step may be performed at any time,
including before, during and/or after the implantation of the
dopant impurity species. If the nitrodization process is performed
at least partially simultaneously with the dopant ion implant step,
then the nitrodization process is a co-implant process. Since the
ion implantation process of the PIII reactor is not mass selective,
the co-implant process may be carried out with any suitable species
without requiring that it atomic weight be the same as or related
to the atomic weight of the dopant implant species. Thus, for
example, the dopant species, boron, and the surface enhancement
species, nitrogen, have quite different atomic weights, and yet
they are implanted simultaneously in the PIII reactor. Typically
nitrodization is performed without implanting dopant atoms.
[0321] A further process related to ion implantation is surface
passivation. In this process, the interior surfaces of the reactor
chamber, including the walls and ceiling, are coated with a
silicon-containing passivation material (such as silicon dioxide or
silicon nitride or silicon hydride) prior to the introduction of a
production wafer. The passivation layer prevents the plasma from
interacting with or sputtering any metal surfaces within the plasma
reactor. The deposition the passivation layer is carried out by
igniting a plasma within the reactor from a silicon containing gas
such as silane mixed with oxygen, for example. This passivation
step, combined with the low-contamination torroidal source PIII
reactor of FIG. 85, has yielded extremely low metal contamination
of a silicon wafer during ion implantation, about 100 times lower
than that typically obtained in a conventional beam implanter.
[0322] Upon completion of the ion implantation process, the
passivation layer is removed, using a suitable etchant gas such as
NF3 which may be combined with a suitable ion bombardment gas
source such as argon oxygen, or hydrogen. During this cleaning
step, the chamber surfaces may be heated to 60 degrees C. or higher
to enhance the cleaning process. A new passivation layer is
deposited before the next ion implantation step.
[0323] Alternatively, a new passivation layer may be deposited
before implanting a sequence of wafers, and following the
processing of the sequence, the passivation layer and other
depositions may be removed using a cleaning gas.
[0324] FIG. 112 is a flow diagram showing the different options of
combining the foregoing ion implantation-related processes with the
dopant implantation processes of FIG. 111. A first step is cleaning
the chamber to remove contamination or to remove a previously
deposited passivation layer (block 9001 of FIG. 112). Next, a
passivation layer of silicon dioxide, for example, is deposited
over the interior surfaces of the chamber (block 9002) prior to the
introduction of the wafer to be processed. Next, the wafer is
introduced into the PIII reactor chamber and may be subjected to a
cleaning or etching process to remove thin oxidation layers that
may have accumulated on the exposed semiconductor surfaces in the
brief interim since the wafer was last processed (block 9003). A
pre-implant wafer amorphizing process may be carried out (block
9004) by ion-bombarding exposed surfaces of the wafer with silicon
ions, for example. A pre-implant surface enhancement process may
also be carried out (block 9005) by implanting a species such as
nitrogen into silicon dioxide films. The dopant implantation
process may then be carried out (block 9006). This step is an
individual one of the boron or phosphorus implant steps illustrated
in the general process flow diagram of FIG. 111. During the dopant
implant process of block 9006, other ions in addition to the dopant
ions may be implanted simultaneously in a co-implant process (block
9007). Such a co-implant process (9007) may be an amorphizing
process, a light etch process that prevents accumulation of plasma
by-products on the wafer surface, enhancing dopant activation and
reducing dopant diffusion, or surface enhancement process. After
completion of the dopant ion implant process (9006) and any
co-implant process (9007), various post implant processes may be
carried out. Such post implant processes may include a surface
enhancement process (block 9008). Upon completion of all implant
steps (including the step of block 9008), an implant anneal process
is carried out (block 9012) after removing any photo-resist mask
layers on the wafer in the preceding wafer clean step of block
9009. This anneal process can be a dynamic surface anneal in which
a laser beam (or several laser beams) are scanned across the wafer
surface to locally heat the surface to nearly melting temperature
(about 1300 degrees C.) or to melting temperature, each local area
being heated for an extremely short period of time (e.g., on the
order of nanoseconds to tens of milliseconds ). Other post implant
processes carried out after the anneal step of block 9112 may
include a wafer cleaning process (block 9009) to remove layers of
plasma by-products deposited during the ion implantation process,
deposition of a temporary passivation coating on the wafer to
stabilize the wafer surface (block 9010) and a chamber cleaning
process (block 9011), carried out after removal of the wafer from
the PIII reactor chamber, for removing a previously deposited
passivation layer from the chamber interior surfaces.
[0325] While the invention has been described in detail by specific
reference to preferred embodiments, it is understood that
variations and modifications thereof may be made without departing
from the true spirit and scope of the invention.
* * * * *