Al-Bayati; Amir

Patent Applications and Registrations

Patent applications and USPTO patent grants for Al-Bayati; Amir.The latest application filed is for "process and apparatus for measuring the crystal fraction of crystalline silicon casted mono wafers".

Company Profile

0.57.74

Al-Bayati; Amir - San Jose CA US
Al-Bayati; Amir - US
Al-Bayati; Amir - Gilroy CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus and method for substrate clamping in a plasma chamber Grant 9,337,072 - Balasubramanian , et al. May 10, 2	2016-05-10
Plasma immersion ion implantation reactor with extended cathode process ring Grant 8,900,405 - Porshnev , et al. December 2, 2	2014-12-02
Process and apparatus for measuring the crystal fraction of crystalline silicon casted mono wafers Grant 8,902,428 - Schlezinger , et al. December 2, 2	2014-12-02
High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells Grant 8,895,842 - Sheng , et al. November 25, 2	2014-11-25
Thermal flux annealing influence of buried species Grant 8,796,769 - Jennings , et al. August 5, 2	2014-08-05
Process and Apparatus for Measuring the Crystal Fraction of Crystalline Silicon Casted Mono Wafers App 20130242287 - Schlezinger; Asaf ; et al.	2013-09-19
Method of forming flash memory with ultraviolet treatment Grant 8,501,568 - Balseanu , et al. August 6, 2	2013-08-06
Method to minimize wet etch undercuts and provide pore sealing of extreme low k (k<2.5) dielectrics Grant 8,445,075 - Xu , et al. May 21, 2	2013-05-21
Thermal Flux Annealing Influence Of Buried Species App 20130008878 - Jennings; Dean C. ; et al.	2013-01-10
Thermal flux annealing influence of buried species Grant 8,288,239 - Jennings , et al. October 16, 2	2012-10-16
Method of forming a non-volatile memory having a silicon nitride charge trap layer Grant 8,252,653 - Balseanu , et al. August 28, 2	2012-08-28
Systems For Plasma Enhanced Chemical Vapor Deposition And Bevel Edge Etching App 20120211164 - Shah; Ashish ; et al.	2012-08-23
Plasma Immersion Chamber App 20120199071 - COLLINS; KENNETH S. ; et al.	2012-08-09
Systems for plasma enhanced chemical vapor deposition and bevel edge etching Grant 8,197,636 - Shah , et al. June 12, 2	2012-06-12
Plasma immersion ion implantation reactor having multiple ion shower grids Grant 8,058,156 - Hanawa , et al. November 15, 2	2011-11-15
Apparatus And Methods For Reducing Light Induced Damage In Thin Film Solar Cells App 20110263074 - Al-Bayati; Amir ; et al.	2011-10-27
Methods And Apparatus Of Creating Airgap In Dielectric Layers For The Reduction Of Rc Delay App 20110104891 - AL-BAYATI; AMIR ; et al.	2011-05-05
METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF EXTREME LOW K (K<2.5) DIELECTRICS App 20110092077 - XU; HUIWEN ; et al.	2011-04-21
Apparatus And Method For Substrate Clamping In A Plasma Chamber App 20110090613 - Balasubramanian; Ganesh ; et al.	2011-04-21
Methods and apparatus of creating airgap in dielectric layers for the reduction of RC delay Grant 7,879,683 - Al-Bayati , et al. February 1, 2	2011-02-01
Method of forming non-volatile memory having charge trap layer with compositional gradient Grant 7,816,205 - Balseanu , et al. October 19, 2	2010-10-19
Vacuum reaction chamber with x-lamp heater Grant 7,777,197 - Al-Bayati , et al. August 17, 2	2010-08-17
Plasma immersion ion implantation reactor having an ion shower grid Grant 7,767,561 - Hanawa , et al. August 3, 2	2010-08-03
Flash Memory With Treated Charge Trap Layer App 20100099247 - Balseanu; Mihaela ; et al.	2010-04-22
Non-volatile Memory Having Silicon Nitride Charge Trap Layer App 20100096687 - BALSEANU; Mihaela ; et al.	2010-04-22
Non-volatile Memory Having Charge Trap Layer With Compositional Gradient App 20100096688 - Balseanu; Mihaela ; et al.	2010-04-22
Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage Grant 7,700,465 - Collins , et al. April 20, 2	2010-04-20
Chemical vapor deposition plasma reactor having plural ion shower grids Grant 7,695,590 - Hanawa , et al. April 13, 2	2010-04-13
High Quality Tco-silicon Interface Contact Structure For High Efficiency Thin Film Silicon Solar Cells App 20100051098 - Sheng; Shuran ; et al.	2010-03-04
RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor Grant 7,666,464 - Collins , et al. February 23, 2	2010-02-23
Semiconductor on insulator vertical transistor fabrication and doping process Grant 7,642,180 - Al-Bayati , et al. January 5, 2	2010-01-05
Integration process for fabricating stressed transistor structure Grant 7,566,655 - Balseanu , et al. July 28, 2	2009-07-28
Plasma immersion ion implantation reactor with extended cathode process ring App 20090120367 - Porshnev; Peter I. ; et al.	2009-05-14
Methods For High Temperature Deposition Of An Amorphous Carbon Layer App 20090093128 - SEAMONS; MARTIN JAY ; et al.	2009-04-09
Methods And Apparatus Of Creating Airgap In Dielectric Layers For The Reduction Of Rc Delay App 20090093112 - AL-BAYATI; AMIR ; et al.	2009-04-09
Method of ion implantation to reduce transient enhanced diffusion Grant 7,482,255 - Graoui , et al. January 27, 2	2009-01-27
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck Grant 7,479,456 - Buchberger, Jr. , et al. January 20, 2	2009-01-20
Apparatus And Method For Processing A Substrate Edge Region App 20090017635 - Shah; Ashish ; et al.	2009-01-15
Systems For Plasma Enhanced Chemical Vapor Deposition And Bevel Edge Etching App 20090014127 - Shah; Ashish ; et al.	2009-01-15
Plasma immersion ion implantation process Grant 7,465,478 - Collins , et al. December 16, 2	2008-12-16
Plasma-induced Charge Damage Control For Plasma Enhanced Chemical Vapor Deposition Processes App 20080254233 - LEE; KWANGDUK DOUGLAS ; et al.	2008-10-16
O-ringless tandem throttle valve for a plasma reactor chamber Grant 7,428,915 - Nguyen , et al. September 30, 2	2008-09-30
Semiconductor substrate process using an optically writable carbon-containing mask Grant 7,429,532 - Ramaswamy , et al. September 30, 2	2008-09-30
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing Grant 7,422,775 - Ramaswamy , et al. September 9, 2	2008-09-09
Plasma Immersion Chamber App 20080173237 - Collins; Kenneth S. ; et al.	2008-07-24
Low temperature CVD process with selected stress of the CVD layer on CMOS devices Grant 7,393,765 - Hanawa , et al. July 1, 2	2008-07-01
Apparatus And Method For Substrate Clamping In A Plasma Chamber App 20080084650 - Balasubramanian; Ganesh ; et al.	2008-04-10
Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer Grant 7,335,611 - Ramaswamy , et al. February 26, 2	2008-02-26
Semiconductor on insulator vertical transistor fabrication and doping process App 20080044960 - Al-Bayati; Amir ; et al.	2008-02-21
Semiconductor substrate process using a low temperature deposited carbon-containing hard mask Grant 7,323,401 - Ramaswamy , et al. January 29, 2	2008-01-29
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage Grant 7,320,734 - Collins , et al. January 22, 2	2008-01-22
Method for plasma processing App 20080008842 - Soo; Jyr Hong ; et al.	2008-01-10
Copper barrier reflow process employing high speed optical annealing Grant 7,312,148 - Ramaswamy , et al. December 25, 2	2007-12-25
Low temperature plasma deposition process for carbon layer deposition Grant 7,312,162 - Ramaswamy , et al. December 25, 2	2007-12-25
METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF EXTREME LOW K (K<2.5) DIELECTRICS App 20070287301 - Xu; Huiwen ; et al.	2007-12-13
Method, System And Medium For Controlling Semiconductor Wafer Processes Using Critical Dimension Measurements App 20070288116 - Al-Bayati; Amir ; et al.	2007-12-13
Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage Grant 7,303,982 - Collins , et al. December 4, 2	2007-12-04
Semiconductor on insulator vertical transistor fabrication and doping process Grant 7,294,563 - Al-Bayati , et al. November 13, 2	2007-11-13
Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage Grant 7,291,545 - Collins , et al. November 6, 2	2007-11-06
Chemical vapor deposition plasma process using plural ion shower grids Grant 7,291,360 - Hanawa , et al. November 6, 2	2007-11-06
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor Grant 7,292,428 - Hanawa , et al. November 6, 2	2007-11-06
Plasma immersion ion implantation process Grant 7,288,491 - Collins , et al. October 30, 2	2007-10-30
Low temperature CVD process with selected stress of the CVD layer on CMOS devices App 20070212811 - Hanawa; Hiroji ; et al.	2007-09-13
Low-k spacer integration into CMOS transistors App 20070202640 - Al-Bayati; Amir ; et al.	2007-08-30
Chemical vapor deposition plasma process using an ion shower grid Grant 7,244,474 - Hanawa , et al. July 17, 2	2007-07-17
Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20070119546 - Collins; Kenneth S. ; et al.	2007-05-31
Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer Grant 7,223,676 - Hanawa , et al. May 29, 2	2007-05-29
Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements Grant 7,225,047 - Al-Bayati , et al. May 29, 2	2007-05-29
Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement Grant 7,183,177 - Al-Bayati , et al. February 27, 2	2007-02-27
Ion Implanted Insulator Material With Reduced Dielectric Constant App 20070042580 - Al-Bayati; Amir ; et al.	2007-02-22
Semiconductor substrate process using a low temperature deposited carbon-containing hard mask App 20070032054 - Ramaswamy; Kartik ; et al.	2007-02-08
Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer App 20070032095 - Ramaswamy; Kartik ; et al.	2007-02-08
Copper barrier reflow process employing high speed optical annealing App 20070032004 - Ramaswamy; Kartik ; et al.	2007-02-08
Semiconductor substrate process using an optically writable carbon-containing mask App 20070032082 - Ramaswamy; Kartik ; et al.	2007-02-08
Method for ion implanting insulator material to reduce dielectric constant Grant 7,166,524 - Al-Bayati , et al. January 23, 2	2007-01-23
Vacuum Reaction Chamber With X-lamp Heater App 20060289795 - Dubois; Dale R. ; et al.	2006-12-28
Vacuum Reaction Chamber With X-lamp Heater App 20060272772 - Al-Bayati; Amir ; et al.	2006-12-07
Integration process for fabricating stressed transistor structure App 20060270217 - Balseanu; Mihaela ; et al.	2006-11-30
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing App 20060263540 - Ramaswamy; Kartik ; et al.	2006-11-23
Low temperature plasma deposition process for carbon layer deposition App 20060264060 - Ramaswamy; Kartik ; et al.	2006-11-23
Low temperature absorption layer deposition and high speed optical annealing system App 20060260545 - Ramaswamy; Kartik ; et al.	2006-11-23
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage Grant 7,137,354 - Collins , et al. November 21, 2	2006-11-21
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor App 20060238953 - Hanawa; Hiroji ; et al.	2006-10-26
O-ringless tandem throttle valve for a plasma reactor chamber App 20060237136 - Nguyen; Andrew ; et al.	2006-10-26
Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing Grant 7,109,098 - Ramaswamy , et al. September 19, 2	2006-09-19
Plasma immersion ion implantation process Grant 7,094,670 - Collins , et al. August 22, 2	2006-08-22
Method of ion implantation to reduce transient enhanced diffusion App 20060160338 - Graoui; Houda ; et al.	2006-07-20
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage Grant 7,037,813 - Collins , et al. May 2, 2	2006-05-02
RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor App 20060088655 - Collins; Kenneth S. ; et al.	2006-04-27
Plasma immersion ion implantation process App 20060081558 - Collins; Kenneth S. ; et al.	2006-04-20
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20060073683 - Collins; Kenneth S. ; et al.	2006-04-06
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck App 20060043065 - Buchberger; Douglas A. JR. ; et al.	2006-03-02
Plasma immersion ion implantation reactor having multiple ion shower grids App 20060019039 - Hanawa; Hiroji ; et al.	2006-01-26
Plasma immersion ion implantation reactor having an ion shower grid App 20060019477 - Hanawa; Hiroji ; et al.	2006-01-26
Plasma immersion ion implantation apparatus App 20050230047 - Collins, Kenneth S. ; et al.	2005-10-20
Reactive sputter deposition plasma process using an ion shower grid App 20050211546 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma reactor having an ion shower grid App 20050211171 - Hanawa, Hiroji ; et al.	2005-09-29
Reactive sputter deposition plasma reactor and process using plural ion shower grids App 20050211547 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma process using plural ion shower grids App 20050214478 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma process using an ion shower grid App 20050214477 - Hanawa, Hiroji ; et al.	2005-09-29
Chemical vapor deposition plasma reactor having plural ion shower grids App 20050211170 - Hanawa, Hiroji ; et al.	2005-09-29
Plasma immersion ion implantation process App 20050191830 - Collins, Kenneth S. ; et al.	2005-09-01
Plasma immersion ion implantation process App 20050191827 - Collins, Kenneth S. ; et al.	2005-09-01
Method for ion implanting insulator material to reduce dielectric constant App 20050191828 - Al-Bayati, Amir ; et al.	2005-09-01
Semiconductor on insulator vertical transistor fabrication and doping process App 20050136604 - Al-Bayati, Amir ; et al.	2005-06-23
Advances in spike anneal processes for ultra shallow junctions Grant 6,897,131 - Ramachandran , et al. May 24, 2	2005-05-24
Fabrication of silicon-on-insulator structure using plasma immersion ion implantation Grant 6,893,907 - Maydan , et al. May 17, 2	2005-05-17
Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement App 20050070073 - Al-Bayati, Amir ; et al.	2005-03-31
Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage App 20050051272 - Collins, Kenneth S. ; et al.	2005-03-10
Plasma immersion ion implantation system including an inductively coupled plasma source having low dissociation and low minimum plasma voltage App 20050051271 - Collins, Kenneth S. ; et al.	2005-03-10
Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer App 20040200417 - Hanawa, Hiroji ; et al.	2004-10-14
Fabrication of silicon-on-insulator structure using plasma immersion ion implantation App 20040166612 - Maydan, Dan ; et al.	2004-08-26
Plasma immersion ion implantation system including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20040149217 - Collins, Kenneth S. ; et al.	2004-08-05
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20040149218 - Collins, Kenneth S. ; et al.	2004-08-05
Advances in spike anneal processes for ultra shallow junctions App 20040126999 - Ramachandran, Balasubramanian ; et al.	2004-07-01
Plasma immersion ion implantation apparatus including a capacitively coupled plasma source having low dissociation and low minimum plasma voltage App 20040112542 - Collins, Kenneth S. ; et al.	2004-06-17
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage App 20040107906 - Collins, Kenneth S. ; et al.	2004-06-10
Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage App 20040107909 - Collins, Kenneth S. ; et al.	2004-06-10
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage App 20040107907 - Collins, Kenneth S. ; et al.	2004-06-10
Plasma immersion ion implantation apparatus including an inductively coupled plasma source having low dissociation and low minimum plasma voltage App 20040107908 - Collins, Kenneth S. ; et al.	2004-06-10
Thermal flux annealing influence of buried species App 20040063290 - Jennings, Dean C. ; et al.	2004-04-01
Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements App 20030180972 - Al-Bayati, Amir ; et al.	2003-09-25
Ion beam generation apparatus Grant 6,559,454 - Murrell , et al. May 6, 2	2003-05-06