| Patent | Date |
|---|
Gas distribution plate with UV blocker at the center
Grant 11,448,977 - Ramaswamy , et al. September 20, 2 | 2022-09-20 |
Method for controlling a plasma process
Grant 11,447,868 - Nguyen , et al. September 20, 2 | 2022-09-20 |
Multiple sequential linear powder dispensers for additive manufacturing
Grant 11,446,740 - Rowland , et al. September 20, 2 | 2022-09-20 |
Substrate Edge Ring That Extends Process Environment Beyond Substrate Diameter
App 20220293397 - RICE; Michael R. ; et al. | 2022-09-15 |
Methods of optical device fabrication using an electron beam apparatus
Grant 11,430,634 - Godet , et al. August 30, 2 | 2022-08-30 |
Methods And Apparatus For Processing A Substrate
App 20220270856 - POULOSE; John ; et al. | 2022-08-25 |
Methods And Apparatus For Processing A Substrate
App 20220270857 - POULOSE; John ; et al. | 2022-08-25 |
Temperature controlled secondary electrode for ion control at substrate edge
Grant 11,424,096 - Noorbakhsh , et al. August 23, 2 | 2022-08-23 |
Plasma reactor with electrode filaments extending from ceiling
Grant 11,424,104 - Collins , et al. August 23, 2 | 2022-08-23 |
Symmetric Plasma Process Chamber
App 20220254606 - CARDUCCI; James D. ; et al. | 2022-08-11 |
Continuous Liner For Use In A Processing Chamber
App 20220186366 - Carducci; James D. ; et al. | 2022-06-16 |
Plasma reactor with electrode assembly for moving substrate
Grant 11,355,321 - Collins , et al. June 7, 2 | 2022-06-07 |
Methods And Apparatus For Processing A Substrate
App 20220130642 - KAWASAKI; Katsumasa ; et al. | 2022-04-28 |
Symmetric plasma process chamber
Grant 11,315,760 - Carducci , et al. April 26, 2 | 2022-04-26 |
Plasma Chamber With A Multiphase Rotating Modulated Cross-flow
App 20220084794 - Collins; Kenneth S. ; et al. | 2022-03-17 |
In-situ Semiconductor Processing Chamber Temperature Apparatus
App 20220076972 - NGUYEN; Andrew ; et al. | 2022-03-10 |
Plasma Processing Assembly Using Pulsed-voltage And Radio-frequency Power
App 20220037119 - DORF; Leonid ; et al. | 2022-02-03 |
Plasma Processing Using Pulsed-voltage And Radio-frequency Power
App 20220037121 - DORF; Leonid ; et al. | 2022-02-03 |
Pulsed-voltage Hardware Assembly For Use In A Plasma Processing System
App 20220037120 - DORF; Leonid ; et al. | 2022-02-03 |
Symmetric Vhf Source For A Plasma Reactor
App 20210313147 - Ramaswamy; Kartik ; et al. | 2021-10-07 |
Methods And Apparatus For Processing A Substrate
App 20210296131 - Ramaswamy; Kartik ; et al. | 2021-09-23 |
Workpiece carrier for high power with enhanced edge sealing
Grant 11,127,619 - Ramaswamy , et al. September 21, 2 | 2021-09-21 |
Methods And Apparatus For Processing A Substrate
App 20210287907 - Ramaswamy; Kartik ; et al. | 2021-09-16 |
Plasma reactor with electrode array in ceiling
Grant 11,114,284 - Collins , et al. September 7, 2 | 2021-09-07 |
Ion-ion plasma atomic layer etch process
Grant 11,101,113 - Collins , et al. August 24, 2 | 2021-08-24 |
Methods and apparatus for processing a substrate
Grant 11,043,387 - Ramaswamy , et al. June 22, 2 | 2021-06-22 |
Symmetric VHF source for a plasma reactor
Grant 11,043,361 - Ramaswamy , et al. June 22, 2 | 2021-06-22 |
Plasma deposition of carbon hardmask
Grant 11,043,375 - Yang , et al. June 22, 2 | 2021-06-22 |
Gas distribution plate assembly for high power plasma etch processes
Grant 11,043,360 - Carducci , et al. June 22, 2 | 2021-06-22 |
High-density low temperature carbon films for hardmask and other patterning applications
Grant 11,043,372 - Venkatasubramanian , et al. June 22, 2 | 2021-06-22 |
Process chamber for field guided exposure and method for implementing the process chamber
Grant 11,003,080 - Ramaswamy , et al. May 11, 2 | 2021-05-11 |
Methods And Apparatus For Processing A Substrate
App 20210134599 - Ramaswamy; Kartik ; et al. | 2021-05-06 |
Temperature Controlled Secondary Electrode For Ion Control At Substrate Edge
App 20210134554 - NOORBAKHSH; HAMID ; et al. | 2021-05-06 |
Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece
Grant 10,957,518 - Ramaswamy , et al. March 23, 2 | 2021-03-23 |
Methods Of Optical Device Fabrication Using An Electron Beam Apparatus
App 20210066036 - GODET; Ludovic ; et al. | 2021-03-04 |
Electrostatic chuck assembly having a dielectric filler
Grant 10,930,540 - Ramaswamy , et al. February 23, 2 | 2021-02-23 |
Wafer processing equipment having capacitive micro sensors
Grant 10,923,405 - Tedeschi , et al. February 16, 2 | 2021-02-16 |
Carbon Hard Masks For Patterning Applications And Methods Related Thereto
App 20210043449 - VENKATASUBRAMANIAN; Eswaranand ; et al. | 2021-02-11 |
Pulsed Plasma (dc/rf) Deposition Of High Quality C Films For Patterning
App 20210040618 - VENKATASUBRAMANIAN; Eswaranand ; et al. | 2021-02-11 |
Sheath And Temperature Control Of Process Kit
App 20210035844 - CHO; Jaeyong ; et al. | 2021-02-04 |
Process Monitor Device Having A Plurality Of Sensors Arranged In Concentric Circles
App 20210005518 - Tedeschi; Leonard ; et al. | 2021-01-07 |
Apparatus For Reduction Or Prevention Of Arcing In A Substrate Support
App 20200411355 - NOORBAKHSH; Hamid ; et al. | 2020-12-31 |
Methods And Apparatus For Reducing High Voltage Arcing In Semiconductor Process Chambers
App 20200381282 - HUSAIN; Anwar ; et al. | 2020-12-03 |
Feedforward temperature control for plasma processing apparatus
Grant 10,854,425 - Mahadeswaraswamy , et al. December 1, 2 | 2020-12-01 |
Radio frequency (RF) pulsing impedance tuning with multiplier mode
Grant 10,854,427 - Kawasaki , et al. December 1, 2 | 2020-12-01 |
Methods of optical device fabrication using an electron beam apparatus
Grant 10,818,472 - Godet , et al. October 27, 2 | 2020-10-27 |
Process monitor device having a plurality of sensors arranged in concentric circles
Grant 10,818,561 - Tedeschi , et al. October 27, 2 | 2020-10-27 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
Grant 10,811,226 - Carducci , et al. October 20, 2 | 2020-10-20 |
Method And Apparatus For Angled Etching
App 20200321186 - WHITE; John M. ; et al. | 2020-10-08 |
Chamber With Individually Controllable Plasma Generation Regions For A Reactor For Processing A Workpiece
App 20200312630 - Ramaswamy; Kartik ; et al. | 2020-10-01 |
Methods and apparatus for electron beam etching process
Grant 10,790,153 - Guo , et al. September 29, 2 | 2020-09-29 |
Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber
Grant 10,784,085 - Ramaswamy , et al. Sept | 2020-09-22 |
Method and apparatus for de-chucking a workpiece using a swing voltage sequence
Grant 10,784,132 - Wang , et al. Sept | 2020-09-22 |
Methods and apparatus for supplying RF power to plasma chambers
Grant 10,770,267 - Kartashyan , et al. Sep | 2020-09-08 |
High power electrostatic chuck with aperture-reducing plug in a gas hole
Grant 10,770,270 - Cho , et al. Sep | 2020-09-08 |
Showerhead with reduced backside plasma ignition
Grant 10,745,807 - Wang , et al. A | 2020-08-18 |
Particle monitoring device
Grant 10,718,719 - Tedeschi , et al. | 2020-07-21 |
Etching methods
Grant 10,707,086 - Yang , et al. | 2020-07-07 |
Methods Of Optical Device Fabrication Using An Electron Beam Apparatus
App 20200194218 - GODET; Ludovic ; et al. | 2020-06-18 |
Electron Beam Apparatus For Optical Device Fabrication
App 20200192027 - RAMASWAMY; Kartik ; et al. | 2020-06-18 |
Symmetric Plasma Process Chamber
App 20200185192 - CARDUCCI; James D. ; et al. | 2020-06-11 |
Apparatus for removing particles from a twin chamber processing system
Grant 10,672,591 - Nguyen , et al. | 2020-06-02 |
Real-time measurement of a surface charge profile of an electrostatic chuck
Grant 10,656,194 - Wang , et al. | 2020-05-19 |
Symmetric plasma process chamber
Grant 10,615,006 - Carducci , et al. | 2020-04-07 |
Distributed electrode array for plasma processing
Grant 10,615,004 - Collins , et al. | 2020-04-07 |
Radio Frequency (rf) Pulsing Impedance Tuning With Multiplier Mode
App 20200075290 - KAWASAKI; KATSUMASA ; et al. | 2020-03-05 |
Symmetric plasma process chamber
Grant 10,580,620 - Carducci , et al. | 2020-03-03 |
Methods And Apparatus For Plasma Liners With High Fluid Conductance
App 20200066493 - NOORBAKHSH; HAMID ; et al. | 2020-02-27 |
Electrostatic Chuck Assembly Having A Dielectric Filler
App 20200066566 - Ramaswamy; Kartik ; et al. | 2020-02-27 |
Ion-ion Plasma Atomic Layer Etch Process
App 20200035454 - Collins; Kenneth S. ; et al. | 2020-01-30 |
Method, apparatus and system for wafer dechucking using dynamic voltage sweeping
Grant 10,546,731 - Wang , et al. Ja | 2020-01-28 |
Deposition or treatment of diamond-like carbon in a plasma reactor
Grant 10,544,505 - Yang , et al. Ja | 2020-01-28 |
Symmetric plasma process chamber
Grant 10,546,728 - Carducci , et al. Ja | 2020-01-28 |
Symmetric plasma process chamber
Grant 10,535,502 - Carducci , et al. Ja | 2020-01-14 |
Methods And Apparatus For Electron Beam Etching Process
App 20200006036 - GUO; Yue ; et al. | 2020-01-02 |
Etching Apparatus
App 20190393053 - YANG; Yang ; et al. | 2019-12-26 |
Processing tool with electrically switched electrode assembly
Grant 10,510,515 - Collins , et al. Dec | 2019-12-17 |
Electrostatic chuck assembly having a dielectric filler
Grant 10,504,765 - Ramaswamy , et al. Dec | 2019-12-10 |
Method And Apparatus For Ion Energy Distribution Manipulation For Plasma Processing Chambers That Allows Ion Energy Boosting Thr
App 20190348260 - LEE; WONSEOK ; et al. | 2019-11-14 |
Ion-ion plasma atomic layer etch process and reactor
Grant 10,475,626 - Collins , et al. Nov | 2019-11-12 |
Gas distribution hub for plasma processing chamber
App 20190330748 - Nguyen; Andrew ; et al. | 2019-10-31 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion
Grant 10,453,655 - Kobayashi , et al. Oc | 2019-10-22 |
Symmetric plasma process chamber
Grant 10,453,656 - Carducci , et al. Oc | 2019-10-22 |
Distributed Electrode Array For Plasma Processing
App 20190287765 - COLLINS; Kenneth S. ; et al. | 2019-09-19 |
Distributed electrode array for plasma processing
Grant 10,418,225 - Collins , et al. Sept | 2019-09-17 |
Showerhead With Reduced Backside Plasma Ignition
App 20190271082 - WANG; Haitao ; et al. | 2019-09-05 |
Method and apparatus for ion energy distribution manipulation for plasma processing chambers that allows ion energy boosting through amplitude modulation
Grant 10,395,896 - Lee , et al. A | 2019-08-27 |
Method of real time in-situ chamber condition monitoring using sensors and RF communication
Grant 10,395,904 - Wong , et al. A | 2019-08-27 |
Showerhead with reduced backside plasma ignition
Grant 10,378,108 - Wang , et al. A | 2019-08-13 |
Distributed electrode array for plasma processing
Grant 10,373,807 - Collins , et al. | 2019-08-06 |
Diamond Like Carbon Layer Formed By An Electron Beam Plasma Process
App 20190228970 - YANG; Yang ; et al. | 2019-07-25 |
Etching Apparatus And Methods
App 20190221437 - YANG; Yang ; et al. | 2019-07-18 |
Two Channel Cosine-theta Coil Assembly
App 20190189330 - FOVELL; RICHARD C. ; et al. | 2019-06-20 |
Method And Apparatus For De-chucking A Workpiece Using A Swing Voltage Sequence
App 20190189481 - Wang; Haitao ; et al. | 2019-06-20 |
Distributed electrode array for plasma processing
Grant 10,312,056 - Collins , et al. | 2019-06-04 |
Methods And Apparatus For Shielding Substrate Supports
App 20190115246 - RAMASWAMY; Kartik ; et al. | 2019-04-18 |
Plasma Reactor Having Digital Control Over Rotation Frequency Of A Microwave Field With Direct Up-conversion
App 20190108981 - Kobayashi; Satoru ; et al. | 2019-04-11 |
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding
Grant 10,249,470 - Kenney , et al. | 2019-04-02 |
Diamond like carbon layer formed by an electron beam plasma process
Grant 10,249,495 - Yang , et al. | 2019-04-02 |
Magnet configurations for radial uniformity tuning of ICP plasmas
Grant 10,249,479 - Aubuchon , et al. | 2019-04-02 |
Method of Real Time In-Situ Chamber Condition Monitoring Using Sensors and Rf Communication
App 20190096641 - Wong; Lawrence ; et al. | 2019-03-28 |
Method and apparatus for de-chucking a workpiece using a swing voltage sequence
Grant 10,242,893 - Wang , et al. | 2019-03-26 |
Plasma Reactor Having Radial Struts for Substrate Support
App 20190085467 - Nguyen; Andrew ; et al. | 2019-03-21 |
Plasma Deposition Of Carbon Hardmask
App 20190057862 - YANG; Yang ; et al. | 2019-02-21 |
Distributed Electrode Array For Plasma Processing
App 20190057840 - COLLINS; Kenneth S. ; et al. | 2019-02-21 |
Distributed Electrode Array For Plasma Processing
App 20190057841 - COLLINS; Kenneth S. ; et al. | 2019-02-21 |
Distributed Electrode Array For Plasma Processing
App 20190051496 - COLLINS; Kenneth S. ; et al. | 2019-02-14 |
Process Chamber For Field Guided Exposure And Method For Implementing The Process Chamber
App 20190018322 - RAMASWAMY; Kartik ; et al. | 2019-01-17 |
Inductively coupled plasma source
Grant 10,170,278 - Nguyen , et al. J | 2019-01-01 |
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
Grant 10,170,279 - Kenney , et al. J | 2019-01-01 |
Processing Tool With Electrically Switched Electrode Assembly
App 20180374684 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Plasma Reactor With Electrode Assembly For Moving Substrate
App 20180374686 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Plasma Reactor With Electrode Array In Ceiling
App 20180374685 - Collins; Kenneth S. ; et al. | 2018-12-27 |
Wafer Processing Equipment Having Capacitive Micro Sensors
App 20180374764 - Tedeschi; Leonard ; et al. | 2018-12-27 |
Method And Apparatus For De-chucking A Workpiece Using A Swing Voltage Sequence
App 20180366359 - Wang; Haitao ; et al. | 2018-12-20 |
Multiple Electrode Substrate Support Assembly And Phase Control System
App 20180366306 - YANG; Yang ; et al. | 2018-12-20 |
In-situ Semiconductor Processing Chamber Temperature Apparatus
App 20180366354 - NGUYEN; Andrew ; et al. | 2018-12-20 |
High-density Low Temperature Carbon Films For Hardmask And Other Patterning Applications
App 20180358222 - VENKATASUBRAMANIAN; Eswaranand ; et al. | 2018-12-13 |
Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion
Grant 10,153,133 - Kobayashi , et al. Dec | 2018-12-11 |
Multiple electrode substrate support assembly and phase control system
Grant 10,153,139 - Yang , et al. Dec | 2018-12-11 |
Apparatus And Method For Controlling A Plasma Process
App 20180342375 - NGUYEN; Andrew ; et al. | 2018-11-29 |
Method of real time in-situ chamber condition monitoring using sensors and RF communication
Grant 10,141,166 - Wong , et al. Nov | 2018-11-27 |
Particle Monitoring Device
App 20180335393 - TEDESCHI; Leonard ; et al. | 2018-11-22 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow
Grant 10,131,994 - Nguyen , et al. November 20, 2 | 2018-11-20 |
Method To Modulate The Wafer Edge Sheath In A Plasma Processing Chamber
App 20180323042 - WANG; Haitao ; et al. | 2018-11-08 |
Method and apparatus for controlling a magnetic field in a plasma chamber
Grant 10,115,566 - Lane , et al. October 30, 2 | 2018-10-30 |
Electrostatic Chuck Assembly Having A Dielectric Filler
App 20180308736 - Ramaswamy; Kartik ; et al. | 2018-10-25 |
Plasma Reactor With Groups Of Electrodes
App 20180308667 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Electrode Filaments Extending From Ceiling
App 20180308666 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Filaments And Rf Power Applied At Multiple Frequencies
App 20180308664 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Electrode Filaments
App 20180308661 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Plasma Reactor With Phase Shift Applied Across Electrode Array
App 20180308663 - Collins; Kenneth S. ; et al. | 2018-10-25 |
Process chamber for field guided exposure and method for implementing the process chamber
Grant 10,095,114 - Ramaswamy , et al. October 9, 2 | 2018-10-09 |
Alternating Between Deposition And Treatment Of Diamond-like Carbon
App 20180274100 - Yang; Yang ; et al. | 2018-09-27 |
Deposition Or Treatment Of Diamond-like Carbon In A Plasma Reactor
App 20180274089 - Yang; Yang ; et al. | 2018-09-27 |
Plasma Reactor With Electron Beam Of Secondary Electrons
App 20180277340 - Yang; Yang ; et al. | 2018-09-27 |
Wafer processing equipment having capacitive micro sensors
Grant 10,083,883 - Tedeschi , et al. September 25, 2 | 2018-09-25 |
Ion-ion Plasma Atomic Layer Etch Process And Reactor
App 20180261429 - Collins; Kenneth S. ; et al. | 2018-09-13 |
Method And Apparatus For Ion Energy Distribution Manipulation For Plasma Processing Chambers That Allows Ion Energy Boosting Through Amplitude Modulation
App 20180254171 - LEE; WONSEOK ; et al. | 2018-09-06 |
Particle monitoring device
Grant 10,067,070 - Tedeschi , et al. September 4, 2 | 2018-09-04 |
Multiple Sequential Linear Powder Dispensers For Additive Manufacturing
App 20180221948 - Rowland; Christopher A. ; et al. | 2018-08-09 |
Linear Powder Dispenser That Raster Scans For Additive Manufacturing
App 20180221949 - Rowland; Christopher A. ; et al. | 2018-08-09 |
Inductively Coupled Plasma Source With Symmetrical Rf Feed And Reactance Elements
App 20180218873 - Kenney; Jason A. ; et al. | 2018-08-02 |
Plasma Source With Symmetrical Rf Feed
App 20180211811 - Kenney; Jason A. ; et al. | 2018-07-26 |
Method and apparatus for controlling plasma near the edge of a substrate
Grant 10,017,857 - Nguyen , et al. July 10, 2 | 2018-07-10 |
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Distribution Plates
App 20180138014 - Carducci; James D. ; et al. | 2018-05-17 |
Inductively coupled plasma source with symmetrical RF feed
Grant 9,928,987 - Kenney , et al. March 27, 2 | 2018-03-27 |
Independently Controllable Powder Delivery For Additive Manufacturing
App 20180065178 - Rowland; Christopher A. ; et al. | 2018-03-08 |
Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control
Grant 9,911,582 - Wu , et al. March 6, 2 | 2018-03-06 |
Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
App 20180053631 - Dorf; Leonid ; et al. | 2018-02-22 |
Symmetric VHF Source for a Plasma Reactor
App 20180053630 - Ramaswamy; Kartik ; et al. | 2018-02-22 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
Grant 9,896,769 - Nguyen , et al. February 20, 2 | 2018-02-20 |
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
Grant 9,870,897 - Carducci , et al. January 16, 2 | 2018-01-16 |
Diamond Like Carbon Layer Formed By An Electron Beam Plasma Process
App 20170372899 - YANG; Yang ; et al. | 2017-12-28 |
Gas Distribution Plate Assembly For High Power Plasma Etch Processes
App 20170365443 - CARDUCCI; James D. ; et al. | 2017-12-21 |
Wafer Processing Equipment Having Capacitive Micro Sensors
App 20170365531 - Tedeschi; Leonard ; et al. | 2017-12-21 |
High Power Electrostatic Chuck Design With Radio Frequency Coupling
App 20170352567 - Cho; Jaeyong ; et al. | 2017-12-07 |
Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure
App 20170350018 - Nguyen; Andrew ; et al. | 2017-12-07 |
Workpiece Carrier With Gas Pressure In Inner Cavities
App 20170352565 - Zhang; Chunlei ; et al. | 2017-12-07 |
High Power Electrostatic Chuck With Aperture-reducing Plug In A Gas Hole
App 20170352568 - Cho; Jaeyong ; et al. | 2017-12-07 |
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow Chamber
App 20170350017 - Nguyen; Andrew ; et al. | 2017-12-07 |
Workpiece Carrier For High Power With Enhanced Edge Sealing
App 20170352566 - Ramaswamy; Kartik ; et al. | 2017-12-07 |
Symmetric VHF source for a plasma reactor
Grant 9,824,862 - Ramaswamy , et al. November 21, 2 | 2017-11-21 |
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
Grant 9,799,491 - Dorf , et al. October 24, 2 | 2017-10-24 |
Symmetric Plasma Process Chamber
App 20170271129 - CARDUCCI; James D. ; et al. | 2017-09-21 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber
Grant 9,745,663 - Nguyen , et al. August 29, 2 | 2017-08-29 |
Symmetric plasma process chamber
Grant 9,741,546 - Carducci , et al. August 22, 2 | 2017-08-22 |
Real Time Process Characterization
App 20170221775 - Tedeschi; Leonard ; et al. | 2017-08-03 |
Self-aware Production Wafers
App 20170221783 - TEDESCHI; Leonard ; et al. | 2017-08-03 |
Electron beam plasma source with reduced metal contamination
Grant 9,721,760 - Dorf , et al. August 1, 2 | 2017-08-01 |
Additive Manufacturing With Laser And Plasma
App 20170203364 - Ramaswamy; Kartik ; et al. | 2017-07-20 |
Layerwise Heating, Linewise Heating, Plasma Heating And Multiple Feed Materials In Additive Manufacturing
App 20170203363 - Rowland; Christopher A. ; et al. | 2017-07-20 |
Additive Manufacturing With Laser And Gas Flow
App 20170182556 - Ramaswamy; Kartik ; et al. | 2017-06-29 |
Method And Apparatus For Controlling A Magnetic Field In A Plasma Chamber
App 20170162365 - LANE; STEVEN ; et al. | 2017-06-08 |
System and method for selective coil excitation in inductively coupled plasma processing reactors
Grant 9,659,751 - Ramaswamy , et al. May 23, 2 | 2017-05-23 |
Particle Monitoring Device
App 20170131217 - TEDESCHI; Leonard ; et al. | 2017-05-11 |
Low Electron Temperature Etch Chamber With Independent Control Over Plasma Density, Radical Composition And Ion Energy For Atomic Precision Etching
App 20170125217 - Dorf; Leonid ; et al. | 2017-05-04 |
Component temperature control by coolant flow control and heater duty cycle control
Grant 9,639,097 - Mahadeswaraswamy , et al. May 2, 2 | 2017-05-02 |
Showerhead With Reduced Backside Plasma Ignition
App 20170101713 - WANG; Haitao ; et al. | 2017-04-13 |
Method and apparatus for controlling a magnetic field in a plasma chamber
Grant 9,613,783 - Lane , et al. April 4, 2 | 2017-04-04 |
Plasma Reactor For Processing A Workpiece With An Array Of Plasma Point Sources
App 20170092470 - Ramaswamy; Kartik ; et al. | 2017-03-30 |
Electron beam plasma source with remote radical source
Grant 9,564,297 - Wu , et al. February 7, 2 | 2017-02-07 |
Multiple Electrode Substrate Support Assembly And Phase Control System
App 20160372307 - YANG; YANG ; et al. | 2016-12-22 |
Method And Apparatus For Controlling Plasma Near The Edge Of A Substrate
App 20160322242 - NGUYEN; Andrew ; et al. | 2016-11-03 |
Symmetric Plasma Process Chamber
App 20160314937 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314936 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314942 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314940 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Method of multiple zone symmetric gas injection for inductively coupled plasma
Grant 9,472,379 - Lane , et al. October 18, 2 | 2016-10-18 |
Plasma Reactor Having Digital Control Over Rotation Frequency Of A Microwave Field With Direct Up-conversion
App 20160284519 - Kobayashi; Satoru ; et al. | 2016-09-29 |
Ion-ion Plasma Atomic Layer Etch Process And Reactor
App 20160276134 - Collins; Kenneth S. ; et al. | 2016-09-22 |
Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
Grant 9,449,794 - Nguyen , et al. September 20, 2 | 2016-09-20 |
Electron beam plasma source with segmented suppression electrode for uniform plasma generation
Grant 9,443,700 - Dorf , et al. September 13, 2 | 2016-09-13 |
Magnet Configurations For Radial Uniformity Tuning Of Icp Plasmas
App 20160225590 - Aubuchon; Joseph F. ; et al. | 2016-08-04 |
Plasma Processing Reactor With A Magnetic Electron-blocking Filter External Of The Chamber And Uniform Field Within The Chamber
App 20160225466 - Ramaswamy; Kartik ; et al. | 2016-08-04 |
Semiconductor System Assemblies And Methods Of Operation
App 20160217981 - Nguyen; Andrew ; et al. | 2016-07-28 |
Fast atomic layer etch process using an electron beam
Grant 9,362,131 - Agarwal , et al. June 7, 2 | 2016-06-07 |
Feedforward Temperature Control For Plasma Processing Apparatus
App 20160155612 - MAHADESWARASWAMY; Chetan ; et al. | 2016-06-02 |
Process Chamber for Field Guided Exposure and method for Implementing the process chamber
App 20160139503 - RAMASWAMY; Kartik ; et al. | 2016-05-19 |
Feedforward temperature control for plasma processing apparatus
Grant 9,338,871 - Mahadeswaraswamy , et al. May 10, 2 | 2016-05-10 |
Real-time Measurement Of A Surface Charge Profile Of An Electrostatic Chuck
App 20160116518 - WANG; HAITAO ; et al. | 2016-04-28 |
Digital phase controller for two-phase operation of a plasma reactor
Grant 9,312,106 - Kobayashi , et al. April 12, 2 | 2016-04-12 |
Semiconductor system assemblies and methods of operation
Grant 9,287,095 - Nguyen , et al. March 15, 2 | 2016-03-15 |
Methods And Apparatus For Controlling Photoresist Line Width Roughness With Enhanced Electron Spin Control
App 20160064197 - WU; Banqiu ; et al. | 2016-03-03 |
Fast Atomic Layer Etch Process Using An Electron Beam
App 20160064231 - Agarwal; Ankur ; et al. | 2016-03-03 |
Method Of Real Time In-situ Chamber Condition Monitoring Using Sensors And Rf Communication
App 20160048111 - Wong; Lawrence ; et al. | 2016-02-18 |
Electron Beam Plasma Source With Rotating Cathode, Backside Heliumcooling And Liquid Cooled Pedestal For Uniform Plasma Generation
App 20160042961 - Dorf; Leonid ; et al. | 2016-02-11 |
Method And Apparatus For Controlling A Magnetic Field In A Plasma Chamber
App 20160027613 - LANE; STEVEN ; et al. | 2016-01-28 |
System And Method For Selective Coil Excitation In Inductively Coupled Plasma Processing Reactors
App 20160027616 - RAMASWAMY; KARTIK ; et al. | 2016-01-28 |
Feol Low-k Spacers
App 20160005833 - Collins; Kenneth S. ; et al. | 2016-01-07 |
Method Of Multiple Zone Symmetric Gas Injection For Inductively Coupled Plasma
App 20150371824 - LANE; Steven ; et al. | 2015-12-24 |
Photoresist treatment method by low bombardment plasma
Grant 9,177,824 - Wu , et al. November 3, 2 | 2015-11-03 |
Independent control of RF phases of separate coils of an inductively coupled plasma reactor
Grant 9,161,428 - Collins , et al. October 13, 2 | 2015-10-13 |
Electron beam plasma source with arrayed plasma sources for uniform plasma generation
Grant 9,129,777 - Dorf , et al. September 8, 2 | 2015-09-08 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
Grant 9,111,722 - Dorf , et al. August 18, 2 | 2015-08-18 |
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
Grant 9,082,590 - Carducci , et al. July 14, 2 | 2015-07-14 |
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
Grant 9,082,591 - Dorf , et al. July 14, 2 | 2015-07-14 |
Gas distribution plate with discrete protective elements
Grant 9,068,265 - Lubomirsky , et al. June 30, 2 | 2015-06-30 |
Semiconductor System Assemblies And Methods Of Operation
App 20150170879 - Nguyen; Andrew ; et al. | 2015-06-18 |
Semiconductor System Assemblies And Methods Of Operation
App 20150170943 - Nguyen; Andrew ; et al. | 2015-06-18 |
Semiconductor System Assemblies And Methods Of Operation
App 20150170924 - Nguyen; Andrew ; et al. | 2015-06-18 |
Component Temperature Control By Coolant Flow Control And Heater Duty Cycle Control
App 20150134128 - MAHADESWARASWAMY; Chetan ; et al. | 2015-05-14 |
Multizone Hollow Cathode Discharge System With Coaxial And Azimuthal Symmetry And With Consistent Central Trigger
App 20150097486 - NGUYEN; Andrew ; et al. | 2015-04-09 |
Spatially Discrete Multi-loop Rf-driven Plasma Source Having Plural Independent Zones
App 20150075716 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Inductively Coupled Spatially Discrete Multi-loop Rf-driven Plasma Source
App 20150075717 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
Symmetric Vhf Source For A Plasma Reactor
App 20150075719 - Ramaswamy; Kartik ; et al. | 2015-03-19 |
In-situ VHF current sensor for a plasma reactor
Grant 8,970,226 - Hanawa , et al. March 3, 2 | 2015-03-03 |
Synchronized radio frequency pulsing for plasma etching
Grant 8,962,488 - Liao , et al. February 24, 2 | 2015-02-24 |
Three-dimensional (3d) Processing And Printing With Plasma Sources
App 20150042017 - RAMASWAMY; Kartik ; et al. | 2015-02-12 |
Multizone Hollow Cathode Discharge System With Coaxial And Azimuthal Symmetry And With Consistent Central Trigger
App 20150040829 - RAMASWAMY; Kartik ; et al. | 2015-02-12 |
Electron beam plasma source with segmented beam dump for uniform plasma generation
Grant 8,951,384 - Dorf , et al. February 10, 2 | 2015-02-10 |
Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material
Grant 8,932,959 - Nemani , et al. January 13, 2 | 2015-01-13 |
Symmetric VHF source for a plasma reactor
Grant 8,920,597 - Ramaswamy , et al. December 30, 2 | 2014-12-30 |
Symmetric VHF source for a plasma reactor
Grant 08920597 - | 2014-12-30 |
Apparatus For Removing Particles From A Twin Chamber Processing System
App 20140374024 - NGUYEN; ANDREW ; et al. | 2014-12-25 |
Photoresist Treatment Method By Low Bombardment Plasma
App 20140370708 - WU; BANQIU ; et al. | 2014-12-18 |
Charged Beam Plasma Apparatus For Photomask Manufacture Applications
App 20140356768 - WU; Banqiu ; et al. | 2014-12-04 |
Plasma immersion ion implantation reactor with extended cathode process ring
Grant 8,900,405 - Porshnev , et al. December 2, 2 | 2014-12-02 |
Etch Process Having Adaptive Control With Etch Depth Of Pressure And Power
App 20140342570 - Doan; Kenny Linh ; et al. | 2014-11-20 |
Electron Beam Plasma Source With Remote Radical Source
App 20140339980 - Wu; Ming-Feng ; et al. | 2014-11-20 |
Electron Beam Plasma Source With Reduced Metal Contamination
App 20140338835 - Dorf; Leonid ; et al. | 2014-11-20 |
Component temperature control by coolant flow control and heater duty cycle control
Grant 8,880,227 - Mahadeswaraswamy , et al. November 4, 2 | 2014-11-04 |
Apparatus and method for analyzing thermal properties of composite structures
Grant 8,878,926 - Ye , et al. November 4, 2 | 2014-11-04 |
Symmetrical Plural-coil Plasma Source With Side Rf Feeds And Rf Distribution Plates
App 20140312766 - Carducci; James D. ; et al. | 2014-10-23 |
Electron Beam Plasma Source With Segmented Suppression Electrode For Uniform Plasma Generation
App 20140265855 - Dorf; Leonid ; et al. | 2014-09-18 |
Method And Apparatus For Generating A Variable Clock Used To Control A Component Of A Substrate Processing System
App 20140262032 - COLLINS; KENNETH S. ; et al. | 2014-09-18 |
Multi-mode Etch Chamber Source Assembly
App 20140262031 - BELOSTOTSKIY; Sergey G. ; et al. | 2014-09-18 |
Multiple Coil Inductively Coupled Plasma Source With Offset Frequencies And Double-walled Shielding
App 20140265832 - Kenney; Jason A. ; et al. | 2014-09-18 |
Digital Phase Controller For Two-phase Operation Of A Plasma Reactor
App 20140265910 - Kobayashi; Satoru ; et al. | 2014-09-18 |
Symmetrical Inductively Coupled Plasma Source With Side Rf Feeds And Spiral Coil Antenna
App 20140232263 - Nguyen; Andrew ; et al. | 2014-08-21 |
Radial Transmission Line Based Plasma Source
App 20140202634 - Ramaswamy; Kartik ; et al. | 2014-07-24 |
Inductively Coupled Plasma Source
App 20140196849 - NGUYEN; ANDREW ; et al. | 2014-07-17 |
Method And System For Etching Plural Layers On A Workpiece Including A Lower Layer Containing An Advanced Memory Material
App 20140170856 - Nemani; Srinivas D. ; et al. | 2014-06-19 |
Method of differential counter electrode tuning in an RF plasma reactor
Grant 8,734,664 - Yang , et al. May 27, 2 | 2014-05-27 |
Methods and apparatus for performing multiple photoresist layer development and etching processes
Grant 8,709,706 - Wu , et al. April 29, 2 | 2014-04-29 |
Differential Counter Electrode Tuning In A Plasma Reactor With An Rf-driven Ceiling Electrode
App 20140069584 - Yang; Yang ; et al. | 2014-03-13 |
Symmetric VHF plasma power coupler with active uniformity steering
Grant 8,652,297 - Collins , et al. February 18, 2 | 2014-02-18 |
Method Of Differential Counter Electrode Tuning In An Rf Plasma Reactor
App 20140034612 - Yang; Yang ; et al. | 2014-02-06 |
Differential Counter Electrode Tuning In A Plasma Reactor With An Rf-driven Workpiece Support Electrode
App 20140034239 - Yang; Yang ; et al. | 2014-02-06 |
Inductively Coupled Plasma Source With Plural Top Coils Over A Ceiling And An Independent Side Coil
App 20140020836 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
Symmetrical Inductively Coupled Plasma Source With Side Rf Feeds And Rf Distribution Plates
App 20140021861 - Carducci; James D. ; et al. | 2014-01-23 |
Symmetrical Inductively Coupled Plasma Source With Coaxial Rf Feed And Coaxial Shielding
App 20140020838 - Kenney; Jason A. ; et al. | 2014-01-23 |
Symmetrical Inductively Coupled Plasma Source With Symmetrical Flow Chamber
App 20140020835 - Nguyen; Andrew ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Symmetrical Rf Feed
App 20140020839 - Kenney; Jason A. ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Multiple Dielectric Windows And Window-supporting Structure
App 20140020837 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
In-situ Vhf Current Sensor For A Plasma Reactor
App 20130320998 - HANAWA; HIROJI ; et al. | 2013-12-05 |
Apparatus for VHF impedance match tuning
Grant 8,578,879 - Ramaswamy , et al. November 12, 2 | 2013-11-12 |
Capacitively Coupled Plasma Source With Rf Coupled Grounded Electrode
App 20130292057 - Ramaswamy; Kartik ; et al. | 2013-11-07 |
Independent Control Of Rf Phases Of Separate Coils Of An Inductively Coupled Plasma Reactor
App 20130284370 - Collins; Kenneth S. ; et al. | 2013-10-31 |
Two-phase Operation Of Plasma Chamber By Phase Locked Loop
App 20130284369 - Kobayashi; Satoru ; et al. | 2013-10-31 |
Three-coil Inductively Coupled Plasma Source With Individually Controlled Coil Currents From A Single Rf Power Generator
App 20130278141 - Dorf; Leonid ; et al. | 2013-10-24 |
Three-coil Inductively Coupled Plasma Source With Individually Controlled Coil Currents From A Single Rf Power Generator
App 20130278142 - Dorf; Leonid ; et al. | 2013-10-24 |
Plasma Processing Using Rf Return Path Variable Impedance Controller With Two-dimensional Tuning Space
App 20130277333 - Misra; Nipun ; et al. | 2013-10-24 |
Fast Response Fluid Temperature Control System
App 20130240144 - Buchberger; Douglas A. ; et al. | 2013-09-19 |
Synchronized Radio Frequency Pulsing For Plasma Etching
App 20130213935 - LIAO; BRYAN ; et al. | 2013-08-22 |
In-situ VHF voltage sensor for a plasma reactor
Grant 8,513,939 - Hanawa , et al. August 20, 2 | 2013-08-20 |
Methods and apparatus for tuning matching networks
Grant 8,513,889 - Zhang , et al. August 20, 2 | 2013-08-20 |
Overhead Electron Beam Source For Plasma Ion Generation In A Workpiece Processing Region
App 20130098873 - Ramaswamy; Kartik ; et al. | 2013-04-25 |
Switched Electron Beam Plasma Source Array For Uniform Plasma Production
App 20130098872 - Dorf; Leonid ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Segmented Beam Dump For Uniform Plasma Generation
App 20130098882 - Dorf; Leonid ; et al. | 2013-04-25 |
Electron Beam Plasma Source With Arrayed Plasma Sources For Uniform Plasma Generation
App 20130098551 - Dorf; Leonid ; et al. | 2013-04-25 |
E-beam Plasma Source With Profiled E-beam Extraction Grid For Uniform Plasma Generation
App 20130098552 - Dorf; Leonid ; et al. | 2013-04-25 |
Symmetric Plasma Process Chamber
App 20130087286 - Carducci; James D. ; et al. | 2013-04-11 |
Synchronized radio frequency pulsing for plasma etching
Grant 8,404,598 - Liao , et al. March 26, 2 | 2013-03-26 |
Pulsed plasma high aspect ratio dielectric process
Grant 8,382,999 - Agarwal , et al. February 26, 2 | 2013-02-26 |
Plasma reactor with uniform process rate distribution by improved RF ground return path
Grant 8,360,003 - Nguyen , et al. January 29, 2 | 2013-01-29 |
Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
Grant 8,357,264 - Shannon , et al. January 22, 2 | 2013-01-22 |
Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
Grant 8,337,661 - Shannon , et al. December 25, 2 | 2012-12-25 |
Methods And Apparatus For Controlling Photoresist Line Width Roughness With Enhanced Electron Spin Control
App 20120318773 - Wu; Banqiu ; et al. | 2012-12-20 |
Methods And Apparatus For Performing Multiple Photoresist Layer Development And Etching Processes
App 20120322011 - Wu; Banqiu ; et al. | 2012-12-20 |
Method of plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
Grant 8,324,525 - Shannon , et al. December 4, 2 | 2012-12-04 |
Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber
Grant 8,313,664 - Chen , et al. November 20, 2 | 2012-11-20 |
Field enhanced inductively coupled plasma (Fe-ICP) reactor
Grant 8,299,391 - Todorow , et al. October 30, 2 | 2012-10-30 |
Substrate support having fluid channel
Grant 8,279,577 - Nguyen , et al. October 2, 2 | 2012-10-02 |
Rf Power Delivery System In A Semiconductor Apparatus
App 20120241091 - Chen; Zhigang ; et al. | 2012-09-27 |
Method and apparatus for pulsed plasma processing using a time resolved tuning scheme for RF power delivery
Grant 8,264,154 - Banner , et al. September 11, 2 | 2012-09-11 |
Plasma Immersion Chamber
App 20120199071 - COLLINS; KENNETH S. ; et al. | 2012-08-09 |
Apparatus for multiple frequency power application
Grant 8,237,517 - Shannon , et al. August 7, 2 | 2012-08-07 |
Gas Distribution Plate With Discrete Protective Elements
App 20120193456 - Lubomirsky; Dmitry ; et al. | 2012-08-02 |
RF power delivery system in a semiconductor apparatus
Grant 8,206,552 - Chen , et al. June 26, 2 | 2012-06-26 |
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces
Grant 8,168,519 - Li , et al. May 1, 2 | 2012-05-01 |
In-situ Vhf Voltage/current Sensors For A Plasma Reactor
App 20120086464 - Hanawa; Hiroji ; et al. | 2012-04-12 |
Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system
Grant 8,148,977 - Ramaswamy , et al. April 3, 2 | 2012-04-03 |
Apparatus And Method For Analyzing Thermal Properties Of Composite Structures
App 20120069174 - Ye; Zheng John ; et al. | 2012-03-22 |
Component Temperature Control By Coolant Flow Control And Heater Duty Cycle Control
App 20120048467 - Mahadeswaraswamy; Chetan ; et al. | 2012-03-01 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
Grant 8,080,479 - Collins , et al. December 20, 2 | 2011-12-20 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
Grant 8,076,247 - Collins , et al. December 13, 2 | 2011-12-13 |
Plasma immersion ion implantation reactor having multiple ion shower grids
Grant 8,058,156 - Hanawa , et al. November 15, 2 | 2011-11-15 |
Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources
Grant 8,018,164 - Shannon , et al. September 13, 2 | 2011-09-13 |
Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator
Grant 8,002,945 - Shannon , et al. August 23, 2 | 2011-08-23 |
Apparatus for multiple frequency power application
Grant 7,994,872 - Shannon , et al. August 9, 2 | 2011-08-09 |
Removal of surface dopants from a substrate
Grant 7,989,329 - Ramaswamy , et al. August 2, 2 | 2011-08-02 |
Plasma reactor with reduced electrical skew using electrical bypass elements
Grant 7,988,815 - Rauf , et al. August 2, 2 | 2011-08-02 |
Method of plasma load impedance tuning by modulation of an unmatched low power RF generator
Grant 7,967,944 - Shannon , et al. June 28, 2 | 2011-06-28 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
Grant 7,968,469 - Collins , et al. June 28, 2 | 2011-06-28 |
Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces
Grant 7,968,439 - Li , et al. June 28, 2 | 2011-06-28 |
Process for wafer backside polymer removal and wafer front side photoresist removal
Grant 7,967,996 - Collins , et al. June 28, 2 | 2011-06-28 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
Grant 7,884,025 - Collins , et al. February 8, 2 | 2011-02-08 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
Grant 7,879,731 - Collins , et al. February 1, 2 | 2011-02-01 |
Multi-diagnostic Apparatus For Substrate-level Measurements
App 20100327873A1 - | 2010-12-30 |
Methods and apparatus for controlling characteristics of a plasma
Grant 7,777,599 - Shannon , et al. August 17, 2 | 2010-08-17 |
Plasma immersion ion implantation reactor having an ion shower grid
Grant 7,767,561 - Hanawa , et al. August 3, 2 | 2010-08-03 |
Substrate support having heat transfer system
Grant 7,768,765 - Nguyen , et al. August 3, 2 | 2010-08-03 |
Plasma immersed ion implantation process
Grant 7,732,309 - Li , et al. June 8, 2 | 2010-06-08 |
Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage
Grant 7,700,465 - Collins , et al. April 20, 2 | 2010-04-20 |
Chemical vapor deposition plasma reactor having plural ion shower grids
Grant 7,695,590 - Hanawa , et al. April 13, 2 | 2010-04-13 |
RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor
Grant 7,666,464 - Collins , et al. February 23, 2 | 2010-02-23 |
Semiconductor on insulator vertical transistor fabrication and doping process
Grant 7,642,180 - Al-Bayati , et al. January 5, 2 | 2010-01-05 |
Process for wafer backside polymer removal with a ring of plasma under the wafer
Grant 7,552,736 - Collins , et al. June 30, 2 | 2009-06-30 |
Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current
Grant 7,531,469 - Ramaswamy , et al. May 12, 2 | 2009-05-12 |
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck
Grant 7,479,456 - Buchberger, Jr. , et al. January 20, 2 | 2009-01-20 |
Plasma immersion ion implantation process
Grant 7,465,478 - Collins , et al. December 16, 2 | 2008-12-16 |
Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements
Grant 7,430,984 - Hanawa , et al. October 7, 2 | 2008-10-07 |
O-ringless tandem throttle valve for a plasma reactor chamber
Grant 7,428,915 - Nguyen , et al. September 30, 2 | 2008-09-30 |
Semiconductor substrate process using an optically writable carbon-containing mask
Grant 7,429,532 - Ramaswamy , et al. September 30, 2 | 2008-09-30 |
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing
Grant 7,422,775 - Ramaswamy , et al. September 9, 2 | 2008-09-09 |
Low temperature CVD process with selected stress of the CVD layer on CMOS devices
Grant 7,393,765 - Hanawa , et al. July 1, 2 | 2008-07-01 |
Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer
Grant 7,335,611 - Ramaswamy , et al. February 26, 2 | 2008-02-26 |
Semiconductor substrate process using a low temperature deposited carbon-containing hard mask
Grant 7,323,401 - Ramaswamy , et al. January 29, 2 | 2008-01-29 |
Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage
Grant 7,320,734 - Collins , et al. January 22, 2 | 2008-01-22 |
Low temperature plasma deposition process for carbon layer deposition
Grant 7,312,162 - Ramaswamy , et al. December 25, 2 | 2007-12-25 |
Copper barrier reflow process employing high speed optical annealing
Grant 7,312,148 - Ramaswamy , et al. December 25, 2 | 2007-12-25 |
Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage
Grant 7,303,982 - Collins , et al. December 4, 2 | 2007-12-04 |
Semiconductor on insulator vertical transistor fabrication and doping process
Grant 7,294,563 - Al-Bayati , et al. November 13, 2 | 2007-11-13 |
Electrostatic chuck with smart lift-pin mechanism for a plasma reactor
Grant 7,292,428 - Hanawa , et al. November 6, 2 | 2007-11-06 |
Chemical vapor deposition plasma process using plural ion shower grids
Grant 7,291,360 - Hanawa , et al. November 6, 2 | 2007-11-06 |
Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage
Grant 7,291,545 - Collins , et al. November 6, 2 | 2007-11-06 |
Plasma immersion ion implantation process
Grant 7,288,491 - Collins , et al. October 30, 2 | 2007-10-30 |
Chemical vapor deposition plasma process using an ion shower grid
Grant 7,244,474 - Hanawa , et al. July 17, 2 | 2007-07-17 |
Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer
Grant 7,223,676 - Hanawa , et al. May 29, 2 | 2007-05-29 |
Substrate support having heat transfer system
Grant 7,221,553 - Nguyen , et al. May 22, 2 | 2007-05-22 |
Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement
Grant 7,183,177 - Al-Bayati , et al. February 27, 2 | 2007-02-27 |
Method for ion implanting insulator material to reduce dielectric constant
Grant 7,166,524 - Al-Bayati , et al. January 23, 2 | 2007-01-23 |
Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage
Grant 7,137,354 - Collins , et al. November 21, 2 | 2006-11-21 |
Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing
Grant 7,109,098 - Ramaswamy , et al. September 19, 2 | 2006-09-19 |
Externally excited torroidal plasma source
Grant 7,094,316 - Hanawa , et al. August 22, 2 | 2006-08-22 |
Plasma immersion ion implantation process
Grant 7,094,670 - Collins , et al. August 22, 2 | 2006-08-22 |
Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage
Grant 7,037,813 - Collins , et al. May 2, 2 | 2006-05-02 |
Externally excited torroidal plasma source with magnetic control of ion distribution
Grant 6,939,434 - Collins , et al. September 6, 2 | 2005-09-06 |
Fabrication of silicon-on-insulator structure using plasma immersion ion implantation
Grant 6,893,907 - Maydan , et al. May 17, 2 | 2005-05-17 |
RF power delivery for plasma processing using modulated power signal
Grant 6,726,804 - Wang , et al. April 27, 2 | 2004-04-27 |
Method and apparatus for improving exhaust gas consumption in an exhaust conduit
Grant 6,642,489 - Ramaswamy , et al. November 4, 2 | 2003-11-04 |
Externally excited torroidal plasma source with a gas distribution plate
Grant 6,551,446 - Hanawa , et al. April 22, 2 | 2003-04-22 |
Externally excited multiple torroidal plasma source
Grant 6,494,986 - Hanawa , et al. December 17, 2 | 2002-12-17 |
Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate
Grant 6,468,388 - Hanawa , et al. October 22, 2 | 2002-10-22 |
Externally excited torroidal plasma source using a gas distribution plate
Grant 6,453,842 - Hanawa , et al. September 24, 2 | 2002-09-24 |
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