Polishing pad

Description

FIG. 1 is a top plan view of a polishing pad showing our new design;

FIG. 2 is a front elevational view thereof, the rear elevation view, left and right side elevational views being a mirror image of the side shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is a partial, enlarged view of portion 4--4 in FIG. 1;

FIG. 5 is a partial, enlarged sectional view taken along line 5--5 in FIG. 4

FIG. 6 is a partial, enlarged sectional view taken along line 6--6 in FIG. 4;

FIG. 7 is a partial, greatly enlarged sectional view of portion 7 in FIG. 5; and,

FIG. 8 is a partial, enlarged view of portion 8--8 in FIG. 1.

Claims

CLAIM The ornamental design for a polishing pad, as shown and described.

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Inventors:	Tano; Hiroyuki (Chuo-ku, JP), Shiho; Hiroshi (Chuo-ku, JP)
Assignee:	JSR Corporation (Tokyo, JP)
Appl. No.:	D/295,290
Filed:	September 25, 2007

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Related U.S. Patent Documents

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	Application Number	Filing Date	Patent Number	Issue Date
	29228555	Apr 26, 2005	D559066

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Foreign Application Priority Data

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Oct 26, 2004 [JP]			2004-32513
Oct 26, 2004 [JP]			2004-32514
Oct 26, 2004 [JP]			2004-32515
Oct 26, 2004 [JP]			2004-32516
Oct 26, 2007 [JP]			2004-32512

Current U.S. Class:	D8/70
Current International Class:	0805
Field of Search:	;D8/61,62,63,70 ;D15/124,126,138,139,140 ;15/230 ;83/835 ;451/6,60,287,288,359,446,526,527,533,541,548,550

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References Cited [Referenced By]

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Foreign Patent Documents

	115633		Sep 2002		JP
	1156872		Sep 2002		JP

Primary Examiner: Nelson; T. Chase
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.