Polishing pad

Description

FIG. 1 is a top plan view of the polishing pad;

FIG. 2 is a bottom plan view thereof;

FIG. 3 is a front elevational view thereof, the left side elevational view, the right side elevational view, and the rear elevational view being a mirror image of the front view shown;

FIG. 4 is an enlarged, partial view thereof taken at coordinates 4--4 in FIG. 1;

FIG. 5 is a greatly enlarged, partial view thereof taken at coordinates 5--5 in FIG. 1;

FIG. 6 is a cross-sectional view thereof taken along line 6--6 in FIG. 5;

FIG. 7 is a further enlargement of the cross-sectional view of part 7 shown in FIG. 6;

FIG. 8 is a greatly enlarged, partial view taken at coordinates 8 5 in FIG. 1;

FIG. 9 is a cross-sectional view taken along line 9--9 in FIG. 8;

FIG. 10 is a further enlargement of the cross-sectional view of part 10 of FIG. 9;

FIG. 11 is a further enlargement of the cross-sectional view of part 11 in FIG. 10; and,

FIG. 12 is a further enlargement of the cross-sectional view of part 12 in FIG. 11.

Claims

CLAIM The ornamental design for a polishing pad, as shown and described.

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Inventors:	Okamoto; Takahiro (Tokyo, JP), Shiho; Hiroshi (Tokyo, JP)
Assignee:	JSR Corporation (Tokyo, JP)
Appl. No.:	D/213,405
Filed:	September 17, 2004

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Foreign Application Priority Data

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Mar 17, 2004 [JP]			2004-008159
Mar 17, 2004 [JP]			2004-008160

Current U.S. Class:	D8/70
Current International Class:	0805
Field of Search:	;D8/61,62,63,70 ;D15/124,126,138,139,140 ;15/230 ;83/835 ;451/6,60,287,288,359,526,527,533,541,548,446,550

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References Cited [Referenced By]

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	1155897		Aug 2002		JP
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Primary Examiner: Nelson; T. Chase
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.