Polishing pad

Description

FIG. 1 is a perspective view of my design for a polishing pad;

FIG. 2 is a top plan view of my design shown in FIG. 1;

FIG. 3 is a bottom plan view of my design shown in FIG. 1;

FIG. 4 is a front view of my design shown in FIG. 1;

FIG. 5 is a back view of my design shown in FIG. 1;

FIG. 6 is a left side view of my design shown in FIG. 1; and,

FIG. 7 is a right side view of my design shown in FIG. 1.

The broken line showing of environmental structure is for illustrative purposes only and forms no part of the claimed design.

Claims

The ornamental design for a polishing pad, as shown and described.

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Inventors:	Boler, Jr.; Lewyn B. (Stockton, CA)
Assignee:	Production Chemical Mfg. Inc. (Stockton, CA)
Appl. No.:	D/172,952
Filed:	December 20, 2002

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Current U.S. Class:	D8/70
Current International Class:	0805
Field of Search:	;D8/70,20,61,62,63,90 ;D4/137 ;D15/124,126,138,139 ;D32/35,40,42 ;15/229.11,229.14,230,230.14,230.11,244.1,234.11,209.1,166 ;30/307,347,355,388,389,390 ;51/276 ;83/663,676,835 ;125/15,18 ;451/259,359,420,490,510,540,541,542,548,550

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References Cited [Referenced By]

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U.S. Patent Documents

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6422926	July 2002	McLain et al.
6446740	September 2002	Eyre
D475489	June 2003	McLelland
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2002/0092111	July 2002	Krause et al.

Primary Examiner: Watson; Gary D.
Assistant Examiner: Nelson; T. Chase
Attorney, Agent or Firm: O'Banion; John P.