Polishing pad

Description

FIG. 1 is a top plan view of a polishing pad, showing our new design;

FIG. 2 is a front elevational view thereof, the rear, left, and right side elevational views being mirror images of the view shown;

FIG. 3 is a bottom plan view thereof;

FIG. 4 is an enlarged, partial top plan view thereof taken along the intersection of lines 4--4 in FIG. 1;

FIG. 5 is an enlarged, partial sectional view thereof taken along line 5--5 in FIG. 4;

FIG. 6 is a greatly enlarged, partial cross-sectional view thereof taken along line 6 in FIG. 5;

FIG. 7 is an enlarged, partial bottom plan view of taken along the intersection of lines 7--7 in FIG. 3;

FIG. 8 is a top plan view of a second embodiment of the polishing pad;

FIG. 9 is a front elevational view thereof, the rear, left, and right side elevational views being mirror images of the view shown;

FIG. 10 is a bottom plan view thereof;

FIG. 11 is an enlarged, partial top plan view thereof taken along the intersection of lines 11--11 in FIG. 8;

FIG. 12 is an enlarged, partial sectional view thereof taken along line 12--12 in FIG. 11;

FIG. 13 is a greatly enlarged, partial cross-sectional view thereof taken along line 13 in FIG. 12; and,

FIG. 14 is an enlarged, partial bottom plan view taken along the intersection of lines 14--14 in FIG. 10.

Claims

CLAIM The ornamental design for a polishing pad, as shown and described.

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Inventors:	Miyauchi; Hiroyuki (Chuo-ku, JP), Shiho; Hiroshi (Chuo-ku, JP)
Assignee:	JSR Corporation (Tokyo, JP)
Appl. No.:	D/225,833
Filed:	March 22, 2005

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Foreign Application Priority Data

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Oct 5, 2004 [JP]			2004-030293
Oct 5, 2004 [JP]			2004-030295

Current U.S. Class:	D8/70
Current International Class:	0805
Field of Search:	;D8/61,62,63,70 ;D15/124,126,138,139,140 ;15/230 ;83/835 ;451/6,60,287,288,359,526,527,533,541,548,446,550

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References Cited [Referenced By]

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Primary Examiner: Nelson; T. Chase
Attorney, Agent or Firm: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.