Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Meng; Shuang ;   et al.

Patent Application Summary

U.S. patent application number 17/346754 was filed with the patent office on 2021-09-30 for air leak detection in plasma processing apparatus with separation grid. The applicant listed for this patent is Beijing E-Town Semiconductor Technology Co., Ltd., Mattson Technology, Inc.. Invention is credited to Hua Chung, Xinliang Lu, Shawming Ma, Shuang Meng.

Application Number20210307151 17/346754
Document ID /
Family ID1000005652796
Filed Date2021-09-30

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