Lu; Xinliang

Patent Applications and Registrations

Patent applications and USPTO patent grants for Lu; Xinliang.The latest application filed is for "nucleation-free gap fill ald process".

Company Profile

27.64.80

Lu; Xinliang - Fremont CA
Lu; Xinliang - Sunnyvale CA US
Lu; Xinliang - Union City CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Processing of workpieces with reactive species generated using alkyl halide Grant 11,387,111 - Yang , et al. July 12, 2	2022-07-12
Nucleation-Free Gap Fill ALD Process App 20220172989 - Chen; Yihong ; et al.	2022-06-02
Nucleation-free gap fill ALD process Grant 11,289,374 - Chen , et al. March 29, 2	2022-03-29
Generation of Hydrogen Reactive Species For Processing of Workpieces App 20220059321 - Zhang; Qi ; et al.	2022-02-24
Methods for processing a workpiece using fluorine radicals Grant 11,257,680 - Zhang , et al. February 22, 2	2022-02-22
Silicon oxide selective dry etch process Grant 11,251,050 - Zhang , et al. February 15, 2	2022-02-15
Surface Smoothing of Workpieces App 20210391185 - Zhang; Qi ; et al.	2021-12-16
Generation of hydrogen reactive species for processing of workpieces Grant 11,164,725 - Zhang , et al. November 2, 2	2021-11-02
Selective deposition using methylation treatment Grant 11,164,742 - Yang , et al. November 2, 2	2021-11-02
Processing of workpieces using hydrogen radicals and ozone gas Grant 11,164,727 - Xie , et al. November 2, 2	2021-11-02
Air Leak Detection In Plasma Processing Apparatus With Separation Grid App 20210307151 - Meng; Shuang ; et al.	2021-09-30
Surface smoothing of workpieces Grant 11,107,695 - Zhang , et al. August 31, 2	2021-08-31
Surface treatment of silicon or silicon germanium surfaces using organic radicals Grant 11,062,910 - Yang , et al. July 13, 2	2021-07-13
Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry App 20210202214 - Zhang; Qi ; et al.	2021-07-01
Ozone treatment for selective silicon nitride etch over silicon Grant 11,043,393 - Wang , et al. June 22, 2	2021-06-22
Air leak detection in plasma processing apparatus with separation grid Grant 11,039,527 - Meng , et al. June 15, 2	2021-06-15
Integration of materials removal and surface treatment in semiconductor device fabrication Grant 10,964,528 - Yang , et al. March 30, 2	2021-03-30
Methods For The Treatment Of Workpieces App 20210082724 - Xie; Ting ; et al.	2021-03-18
Chamber seasoning to improve etch uniformity by reducing chemistry Grant 10,950,416 - Zhang , et al. March 16, 2	2021-03-16
Method for processing a workpiece Grant 10,950,428 - Xie , et al. March 16, 2	2021-03-16
Methods For Processing a Workpiece Using Fluorine Radicals App 20210066085 - Zhang; Qi ; et al.	2021-03-04
Silicon Oxide Selective Dry Etch Process App 20210066088 - Zhang; Qi ; et al.	2021-03-04
Method for Processing a Workpiece App 20210066074 - Xie; Ting ; et al.	2021-03-04
Surface treatment of carbon containing films using organic radicals Grant 10,910,228 - Yang , et al. February 2, 2	2021-02-02
Processing Of Workpieces Using Hydrogen Radicals And Ozone Gas App 20210020413 - Xie; Ting ; et al.	2021-01-21
Methods of lowering wordline resistance Grant 10,854,511 - Chen , et al. December 1, 2	2020-12-01
Surface Pretreatment Process To Improve Quality Of Oxide Films Produced By Remote Plasma App 20200373129 - Xie; Ting ; et al.	2020-11-26
Selective Deposition Using Methylation Treatment App 20200350161 - Yang; Michael X. ; et al.	2020-11-05
Surface treatment of silicon and carbon containing films by remote plasma with organic precursors Grant 10,804,109 - Yang , et al. October 13, 2	2020-10-13
Air Leak Detection In Plasma Processing Apparatus With Separation Grid App 20200245444 - Kind Code	2020-07-30
Ozone Treatment for Selective Silicon Nitride Etch Over Silicon App 20200234969 - Wang; Shanyu ; et al.	2020-07-23
Surface Smoothing of Workpieces App 20200203173 - Zhang; Qi ; et al.	2020-06-25
Silicon oxide selective dry etch process Grant 10,692,730 - Zhang , et al.	2020-06-23
Integration Of Materials Removal And Surface Treatment In Semiconductor Device Fabrication App 20200185216 - Yang; Michael X. ; et al.	2020-06-11
Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry App 20200161094 - Zhang; Qi ; et al.	2020-05-21
Ozone for Selective Hydrophilic Surface Treatment App 20200118813 - Xie; Ting ; et al.	2020-04-16
Generation of Hydrogen Reactive Species For Processing of Workpieces App 20190378692 - Zhang; Qi ; et al.	2019-12-12
Nucleation-Free Gap Fill ALD Process App 20190371662 - Chen; Yihong ; et al.	2019-12-05
Processing Of Workpieces With Reactive Species Generated Using Alkyl Halide App 20190318937 - Yang; Michael X. ; et al.	2019-10-17
Surface Treatment Of Silicon Or Silicon Germanium Surfaces Using Organic Radicals App 20190304793 - Yang; Michael X. ; et al.	2019-10-03
Integration of materials removal and surface treatment in semiconductor device fabrication Grant 10,403,492 - Yang , et al. Sep	2019-09-03
Surface treatment of silicon or silicon germanium surfaces using organic radicals Grant 10,354,883 - Yang , et al. July 16, 2	2019-07-16
Surface Treatment Of Carbon Containing Films Using Organic Radicals App 20190214262 - Yang; Michael X. ; et al.	2019-07-11
Surface treatment of carbon containing films using organic radicals Grant 10,269,574 - Yang , et al.	2019-04-23
Surface Treatment Of Silicon Or Silicon Germanium Surfaces Using Organic Radicals App 20190103279 - Yang; Michael X. ; et al.	2019-04-04
Surface Treatment Of Silicon And Carbon Containing Films By Remote Plasma With Organic Precursors App 20190103270 - Yang; Michael X. ; et al.	2019-04-04
Surface Treatment Of Carbon Containing Films Using Organic Radicals App 20190103280 - Yang; Michael X. ; et al.	2019-04-04
Methods Of Lowering Wordline Resistance App 20180350606 - Chen; Yihong ; et al.	2018-12-06
Deposition methods for uniform and conformal hybrid titanium oxide films Grant 9,881,787 - Kao , et al. January 30, 2	2018-01-30
Deposition of films comprising aluminum alloys with high aluminum content Grant 9,683,287 - Thompson , et al. June 20, 2	2017-06-20
High Temperature Thermal ALD Silicon Nitride Films App 20170053792 - Lu; Xinliang ; et al.	2017-02-23
Method for cleaning titanium alloy deposition Grant 9,530,627 - Gandikota , et al. December 27, 2	2016-12-27
Deposition Methods For Uniform And Conformal Hybrid Titanium Oxide Films App 20160372324 - Kao; Chien-Teh ; et al.	2016-12-22
N-metal film deposition with initiation layer Grant 9,269,584 - Ganguli , et al. February 23, 2	2016-02-23
Contact clean by remote plasma and repair of silicide surface Grant 9,147,578 - Lu , et al. September 29, 2	2015-09-29
Deposition of N-metal films comprising aluminum alloys Grant 9,145,612 - Gandikota , et al. September 29, 2	2015-09-29
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors Grant 9,048,183 - Ganguli , et al. June 2, 2	2015-06-02
Method For Cleaning Titanium Alloy Deposition App 20150086722 - GANDIKOTA; Srinivas ; et al.	2015-03-26
Methods for manufacturing metal gates Grant 8,987,080 - Lu , et al. March 24, 2	2015-03-24
Deposition of metal films using alane-based precursors Grant 8,927,059 - Lu , et al. January 6, 2	2015-01-06
N-metal film deposition with initiation layer Grant 8,895,443 - Ganguli , et al. November 25, 2	2014-11-25
Method for removing oxides Grant 8,846,163 - Kao , et al. September 30, 2	2014-09-30
Nmos Metal Gate Materials, Manufacturing Methods, And Equipment Using Cvd And Ald Processes With Metal Based Precursors App 20140120712 - GANGULI; Seshadri ; et al.	2014-05-01
Deposition Of Films Comprising Aluminum Alloys With High Aluminum Content App 20140112824 - Thompson; David ; et al.	2014-04-24
Multi Chamber Processing System App 20140076234 - KAO; Chien-Teh ; et al.	2014-03-20
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors Grant 8,642,468 - Ganguli , et al. February 4, 2	2014-02-04
Method for metal deposition using hydrogen plasma Grant 8,637,410 - Subramani , et al. January 28, 2	2014-01-28
Deposition Of N-Metal Films Comprising Aluminum Alloys App 20140017408 - Gandikota; Srinivas ; et al.	2014-01-16
Doping aluminum in tantalum silicide Grant 8,592,305 - Lu , et al. November 26, 2	2013-11-26
Methods For Manufacturing Metal Gates App 20130295759 - Lu; Xinliang ; et al.	2013-11-07
Doping aluminum in tantalum silicide App 20130122697 - Lu; Xinliang ; et al.	2013-05-16
Deposition Of Metal Films Using Alane-based Precursors App 20130115383 - Lu; Xinliang ; et al.	2013-05-09
N-Metal Film Deposition With Initiation Layer App 20120322250 - Ganguli; Seshadri ; et al.	2012-12-20
N-Metal Film Deposition With Initiation Layer App 20120322262 - Ganguli; Seshadri ; et al.	2012-12-20
Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Grant 8,318,605 - Kao , et al. November 27, 2	2012-11-27
Method for Metal Deposition Using Hydrogen Plasma App 20120258602 - Subramani; Anantha K. ; et al.	2012-10-11
Method For Removing Oxides App 20120244704 - KAO; Chien-Teh ; et al.	2012-09-27
Method and apparatus for trench and via profile modification Grant 8,268,684 - Chang , et al. September 18, 2	2012-09-18
Selective etching of silicon nitride Grant 8,252,696 - Lu , et al. August 28, 2	2012-08-28
Method And Apparatus For Trench And Via Profile Modification App 20110294258 - CHANG; MEI ; et al.	2011-12-01
Nmos Metal Gate Materials, Manufacturing Methods, And Equipment Using Cvd And Ald Processes With Metal Based Precursors App 20110263115 - Ganguli; Seshadri ; et al.	2011-10-27
Integration sequences with top surface profile modification Grant 8,043,933 - Kao , et al. October 25, 2	2011-10-25
Method For Removing Oxides App 20110223755 - KAO; CHIEN-TEH ; et al.	2011-09-15
Method and apparatus for trench and via profile modification Grant 7,994,002 - Chang , et al. August 9, 2	2011-08-09
Thermal annealing method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Grant 7,977,246 - Yang , et al. July 12, 2	2011-07-12
Methods Of Thin Film Process App 20110151676 - Ingle; Nitin K. ; et al.	2011-06-23
Oxide etch with NH4-NF3 chemistry Grant 7,955,510 - Arghavani , et al. June 7, 2	2011-06-07
Methods of thin film process Grant 7,939,422 - Ingle , et al. May 10, 2	2011-05-10
Contact Clean By Remote Plasma And Repair Of Silicide Surface App 20110104897 - LU; XINLIANG ; et al.	2011-05-05
Methods and systems for forming at least one dielectric layer Grant 7,871,926 - Xia , et al. January 18, 2	2011-01-18
Contact clean by remote plasma and repair of silicide surface Grant 7,867,789 - Lu , et al. January 11, 2	2011-01-11
Passivation layer formation by plasma clean process to reduce native oxide growth Grant 7,780,793 - Yang , et al. August 24, 2	2010-08-24
Method for front end of line fabrication Grant 7,767,024 - Kao , et al. August 3, 2	2010-08-03
Integration Sequences With Top Surface Profile Modification App 20100129982 - Kao; Chien-Teh ; et al.	2010-05-27
Method And Apparatus For Trench And Via Profile Modification App 20100129958 - Chang; Mei ; et al.	2010-05-27
Method for depositing tungsten-containing layers by vapor deposition techniques Grant 7,709,385 - Xi , et al. May 4, 2	2010-05-04
Nf3/h2 Remote Plasma Process With High Etch Selectivity Of Psg/bpsg Over Thermal Oxide And Low Density Surface Defects App 20100099263 - Kao; Chien-Teh ; et al.	2010-04-22
Oxide Etch With Nh4-nf3 Chemistry App 20100093151 - Arghavani; Reza ; et al.	2010-04-15
Pulsed deposition process for tungsten nucleation Grant 7,695,563 - Lu , et al. April 13, 2	2010-04-13
Contact Clean by Remote Plasma and Repair of Silicide Surface App 20090305500 - Lu; Xinliang ; et al.	2009-12-10
Plasma Treatment Method For Preventing Defects In Doped Silicon Oxide Surfaces During Exposure To Atmosphere App 20090269934 - Kao; Chien-Teh ; et al.	2009-10-29
Thermal Annealing Method For Preventing Defects In Doped Silicon Oxide Surfaces During Exposure To Atmosphere App 20090269930 - Yang; Haichun ; et al.	2009-10-29
Process With Saturation At Low Etch Amount For High Contact Bottom Cleaning Efficiency For Chemical Dry Clean Process App 20090191703 - Lu; Xinliang ; et al.	2009-07-30
Contact clean by remote plasma and repair of silicide surface Grant 7,550,381 - Lu , et al. June 23, 2	2009-06-23
Method For Depositing Tungsten-containing Layers By Vapor Deposition Techniques App 20090156003 - XI; MING ; et al.	2009-06-18
Method For Removing Oxides App 20090111280 - Kao; Chien-Teh ; et al.	2009-04-30
Methods and Systems for Forming at Least One Dielectric Layer App 20090104764 - Xia; Li-Qun ; et al.	2009-04-23
Lid assembly for front end of line fabrication Grant 7,520,957 - Kao , et al. April 21, 2	2009-04-21
Epitaxial deposition process and apparatus Grant 7,494,545 - Lam , et al. February 24, 2	2009-02-24
Pulsed Deposition Process For Tungsten Nucleation App 20080317954 - LU; XINLIANG ; et al.	2008-12-25
Method for depositing tungsten-containing layers by vapor deposition techniques Grant 7,465,665 - Xi , et al. December 16, 2	2008-12-16
Method For Front End Of Line Fabrication App 20080268645 - KAO; CHIEN-TEH ; et al.	2008-10-30
Methods Of Thin Film Process App 20080182382 - Ingle; Nitin K. ; et al.	2008-07-31
Method for front end of line fabrication Grant 7,396,480 - Kao , et al. July 8, 2	2008-07-08
Passivation Layer Formation By Plasma Clean Process To Reduce Native Oxide Growth App 20080160210 - Yang; Haichun ; et al.	2008-07-03
Method For Depositing Tungsten-containing Layers By Vapor Deposition Techniques App 20070218688 - Xi; Ming ; et al.	2007-09-20
Epitaxial deposition process and apparatus App 20070181057 - Lam; Andrew ; et al.	2007-08-09
Oxide Etch With Nh4-nf3 Chemistry App 20070123051 - Arghavani; Reza ; et al.	2007-05-31
Method for depositing tungsten-containing layers by vapor deposition techniques Grant 7,220,673 - Xi , et al. May 22, 2	2007-05-22
Pulsed nucleation deposition of tungsten layers Grant 7,211,144 - Lu , et al. May 1, 2	2007-05-01
Contact clean by remote plasma and repair of silicide surface App 20070015360 - Lu; Xinliang ; et al.	2007-01-18
Pulse nucleation enhanced nucleation technique for improved step coverage and better gap fill for WCVD process App 20070009658 - Yoo; Jong Hyun ; et al.	2007-01-11
Method For Depositing Tungsten-containing Layers By Vapor Deposition Techniques App 20060264031 - Xi; Ming ; et al.	2006-11-23
Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer Grant 7,101,795 - Xi , et al. September 5, 2	2006-09-05
In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber App 20060051966 - Or; David T. ; et al.	2006-03-09
In-situ dry clean chamber for front end of line fabrication App 20050230350 - Kao, Chien-Teh ; et al.	2005-10-20
Lid assembly for front end of line fabrication App 20050218507 - Kao, Chien-Teh ; et al.	2005-10-06
Substrate support for in-situ dry clean chamber for front end of line fabrication App 20050221552 - Kao, Chien-Teh ; et al.	2005-10-06
Method for front end of line fabrication App 20050205110 - Kao, Chien-Teh ; et al.	2005-09-22
Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer App 20040209465 - Xi, Ming ; et al.	2004-10-21
Formation of titanium nitride films using a cyclical deposition process App 20040013803 - Chung, Hua ; et al.	2004-01-22
Pulsed nucleation deposition of tungsten layers App 20030127043 - Lu, Xinliang ; et al.	2003-07-10

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