loadpatents
name:-0.05876088142395
name:-0.040914058685303
name:-0.026319980621338
Ma; Shawming Patent Filings

Ma; Shawming

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ma; Shawming.The latest application filed is for "enhanced ignition in inductively coupled plasmas for workpiece processing".

Company Profile
22.34.55
  • Ma; Shawming - Sunnyvale CA
  • Ma; Shawming - Palo Alto CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Processing
App 20220310359 - Savas; Stephen E. ;   et al.
2022-09-29
Processing of Semiconductors Using Vaporized Solvents
App 20220223405 - Meng; Shuang ;   et al.
2022-07-14
Plasma processing apparatus having a focus ring adjustment assembly
Grant 11,348,767 - Zucker , et al. May 31, 2
2022-05-31
Enhanced ignition in inductively coupled plasmas for workpiece processing
Grant 11,348,784 - Savas , et al. May 31, 2
2022-05-31
Arc Lamp With Forming Gas For Thermal Processing Systems
App 20220165561 - Yang; Michael X. ;   et al.
2022-05-26
Processing of semiconductors using vaporized solvents
Grant 11,289,323 - Meng , et al. March 29, 2
2022-03-29
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
App 20220084792 - Savas; Stephen E. ;   et al.
2022-03-17
Carbon containing hardmask removal process using sulfur containing process gas
Grant 11,264,249 - Dai , et al. March 1, 2
2022-03-01
Plasma Strip Tool with Multiple Gas Injection
App 20210398775 - Ma; Shawming ;   et al.
2021-12-23
Plasma strip tool with uniformity control
Grant 11,201,036 - Ma , et al. December 14, 2
2021-12-14
Variable mode plasma chamber utilizing tunable plasma potential
Grant 11,189,464 - Savas , et al. November 30, 2
2021-11-30
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
App 20210343541 - Ma; Shawming
2021-11-04
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
App 20210307151 - Meng; Shuang ;   et al.
2021-09-30
Plasma Processing Apparatus and Methods
App 20210257196 - Ma; Shawming ;   et al.
2021-08-19
Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
Grant 11,062,912 - Ma July 13, 2
2021-07-13
Methods for tuning plasma potential using variable mode plasma chamber
Grant 11,049,692 - Savas , et al. June 29, 2
2021-06-29
Air leak detection in plasma processing apparatus with separation grid
Grant 11,039,527 - Meng , et al. June 15, 2
2021-06-15
Methods For The Treatment Of Workpieces
App 20210082724 - Xie; Ting ;   et al.
2021-03-18
Method for processing a workpiece
Grant 10,950,428 - Xie , et al. March 16, 2
2021-03-16
Method for Processing a Workpiece
App 20210066074 - Xie; Ting ;   et al.
2021-03-04
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Processing
App 20210050213 - Savas; Stephen E. ;   et al.
2021-02-18
Strip process for high aspect ratio structure
Grant 10,901,321 - Vaniapura , et al. January 26, 2
2021-01-26
Variable Mode Plasma Chamber Utilizing Tunable Plasma Potential
App 20210020411 - Savas; Stephen E. ;   et al.
2021-01-21
Methods For Tuning Plasma Potential Using Variable Mode Plasma Chamber
App 20210020404 - Savas; Stephen E. ;   et al.
2021-01-21
Plasma Processing Apparatus With Post Plasma Gas Injection
App 20210005431 - Ma; Shawming ;   et al.
2021-01-07
Focus Ring Adjustment Assembly Of A System For Processing Workpieces Under Vacuum
App 20200365405 - Zucker; Martin L. ;   et al.
2020-11-19
Plasma Processing Apparatus Having A Focus Ring Adjustment Assembly
App 20200365377 - Zucker; Martin L. ;   et al.
2020-11-19
Plasma processing apparatus with post plasma gas injection
Grant 10,790,119 - Ma , et al. September 29, 2
2020-09-29
Gas Supply With Angled Injectors In Plasma Processing Apparatus
App 20200258718 - A1
2020-08-13
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
App 20200245444 - Kind Code
2020-07-30
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
App 20200234983 - Yang; Michael X. ;   et al.
2020-07-23
Electrostatic Shield for Inductive Plasma Sources
App 20200227239 - Savas; Stephen Edward ;   et al.
2020-07-16
Strip Process for High Aspect Ratio Structure
App 20200218158 - Vaniapura; Vijay M. ;   et al.
2020-07-09
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
App 20200203175 - Ma; Shawming
2020-06-25
Carbon Containing Hardmask Removal Process Using Sulfur Containing Process Gas
App 20200194277 - Dai; Fen ;   et al.
2020-06-18
Water Vapor Based Fluorine Containing Plasma For Removal Of Hardmask
App 20200135554 - Hou; Li ;   et al.
2020-04-30
Strip process for high aspect ratio structure
Grant 10,599,039 - Vaniapura , et al.
2020-03-24
Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
Grant 10,580,661 - Ma
2020-03-03
Method for processing a workpiece using a multi-cycle thermal treatment process
Grant 10,573,532 - Yang , et al. Feb
2020-02-25
Method for Processing a Workpiece Using a Multi-Cycle Thermal Treatment Process
App 20190385862 - Yang; Michael X. ;   et al.
2019-12-19
Plasma Processing Apparatus and Methods
App 20190198301 - Ma; Shawming ;   et al.
2019-06-27
Processing of Semiconductors Using Vaporized Solvents
App 20190189479 - Meng; Shuang ;   et al.
2019-06-20
Inductively Coupled Plasma Wafer Bevel Strip Apparatus
App 20190131112 - Ma; Shawming ;   et al.
2019-05-02
Plasma Strip Tool With Multiple Gas Injection Zones
App 20180358204 - Ma; Shawming ;   et al.
2018-12-13
Plasma Strip Tool With Uniformity Control
App 20180358210 - Ma; Shawming ;   et al.
2018-12-13
Plasma Processing Apparatus With Post Plasma Gas Injection
App 20180358208 - Ma; Shawming ;   et al.
2018-12-13
Plasma Processing Apparatus
App 20180358206 - Ma; Shawming ;   et al.
2018-12-13
Implanted photoresist stripping process
Grant 10,078,266 - Liou , et al. September 18, 2
2018-09-18
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid Thermal Activation Process
App 20180166296 - Ma; Shawming
2018-06-14
Strip Process for High Aspect Ratio Structure
App 20180074409 - Vaniapura; Vijay M. ;   et al.
2018-03-15
Separation Grid for Plasma Chamber
App 20180053628 - Vaniapura; Vijay M. ;   et al.
2018-02-22
Implanted Photoresist Stripping Process
App 20170248849 - Liou; Wei-Hua ;   et al.
2017-08-31
Variable Pattern Separation Grid for Plasma Chamber
App 20170207077 - Nagorny; Vladimir ;   et al.
2017-07-20
Plasma etching carbonaceous layers with sulfur-based etchants
Grant 8,133,819 - Wang , et al. March 13, 2
2012-03-13
Methods to avoid unstable plasma states during a process transition
Grant 8,048,806 - Kutney , et al. November 1, 2
2011-11-01
Etch process with controlled critical dimension shrink
Grant 7,838,432 - Wang , et al. November 23, 2
2010-11-23
Plasma Etching Carbonaceous Layers With Sulfur-based Etchants
App 20090212010 - Wang; Judy ;   et al.
2009-08-27
Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity
Grant 7,510,976 - Sung , et al. March 31, 2
2009-03-31
Method For Etching Using Advanced Patterning Film In Capacitive Coupling High Frequency Plasma Dielectric Etch Chamber
App 20090023294 - WANG; JUDY ;   et al.
2009-01-22
Process to open carbon based hardmask overlying a dielectric layer
App 20080286977 - Wang; Judy ;   et al.
2008-11-20
Etch Process With Controlled Critical Dimension Shrink
App 20080254638 - Wang; Judy ;   et al.
2008-10-16
Process to open carbon based hardmask
Grant 7,432,210 - Wang , et al. October 7, 2
2008-10-07
Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity
App 20070249171 - Sung; Shing-Li ;   et al.
2007-10-25
Process to open carbon based hardmask
App 20070077780 - Wang; Judy ;   et al.
2007-04-05
Methods to avoid unstable plasma states during a process transition
App 20070066064 - Kutney; Michael C. ;   et al.
2007-03-22
Method to reduce plasma-induced charging damage
App 20070048882 - Kutney; Michael C. ;   et al.
2007-03-01
Plasma Chamber Insert Ring
App 20060283553 - MA; Shawming ;   et al.
2006-12-21
Post-etch treatment to remove residues
App 20060102197 - Chiang; Kang-Lie ;   et al.
2006-05-18
Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures
Grant 6,812,145 - Ma November 2, 2
2004-11-02
Ferroelectric capacitor plasma charging monitor
Grant 6,806,101 - Ma , et al. October 19, 2
2004-10-19
Method of real-time plasma charging voltage measurement on powered electrode with electrostatic chuck in plasma process chambers
Grant 6,673,636 - Ma January 6, 2
2004-01-06
Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures
App 20030216036 - Ma, Shawming
2003-11-20
Ferroelectric capacitor plasma charging monitor
App 20030197167 - Ma, Shawming ;   et al.
2003-10-23
Method of reducing plasma charging damage during dielectric etch process for dual damascene interconnect structures
Grant 6,613,666 - Ma September 2, 2
2003-09-02
Device for monitoring substrate charging and method of fabricating same
Grant 6,614,051 - Ma September 2, 2
2003-09-02
Ferroelectric Capacitor Plasma Charging Monitor
App 20030116761 - Ma, Shawming ;   et al.
2003-06-26
Plasma chamber insert ring
App 20030106646 - Ma, Shawming ;   et al.
2003-06-12
Method Of Reducing Plasma Charging Damage During Dielectric Etch Process For Dual Damascene Interconnect Structures
App 20030109131 - Ma, Shawming
2003-06-12
Conductive collar surrounding semiconductor workpiece in plasma chamber
Grant 6,554,954 - Ma , et al. April 29, 2
2003-04-29
Method of fabricating a ferroelectric memory cell
Grant 6,548,343 - Summerfelt , et al. April 15, 2
2003-04-15
Hydrogen-free contact etch for ferroelectric capacitor formation
Grant 6,485,988 - Ma , et al. November 26, 2
2002-11-26
Method of real-time plasma charging voltage measurement on powered electrode with electrostatic chuck in plasma process chambers
App 20020173059 - Ma, Shawming
2002-11-21
Conductive collar surrounding semiconductor workpiece in plasma chamber
App 20020139478 - Ma, Shawming ;   et al.
2002-10-03
Conductive mesh bias connection for an array of elevated active pixel sensors
Grant 6,396,118 - Theil , et al. May 28, 2
2002-05-28
Hydrogen-free contact etch for ferroelectric capacitor formation
App 20020006674 - Ma, Shawming ;   et al.
2002-01-17
Three-dimensional ferroelectric capacitor structure for nonvolatile random access memory cell
Grant 6,281,535 - Ma , et al. August 28, 2
2001-08-28
Elevated image sensor array which includes isolation between uniquely shaped image sensors
Grant 6,215,164 - Cao , et al. April 10, 2
2001-04-10
Elevated pin diode active pixel sensor which includes a patterned doped semiconductor electrode
Grant 6,114,739 - Theil , et al. September 5, 2
2000-09-05
Elevated pin diode active pixel sensor including a unique interconnection structure
Grant 6,018,187 - Theil , et al. January 25, 2
2000-01-25

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