U.S. patent application number 16/047044 was filed with the patent office on 2020-01-30 for work function metal patterning for n-p spaces between active nanostructures using unitary isolation pillar.
The applicant listed for this patent is GLOBALFOUNDRIES INC.. Invention is credited to Guillaume Bouche, Daniel Chanemougame, Chanro Park, Ruilong Xie.
Application Number | 20200035567 16/047044 |
Document ID | / |
Family ID | 69177483 |
Filed Date | 2020-01-30 |
View All Diagrams
United States Patent
Application |
20200035567 |
Kind Code |
A1 |
Chanemougame; Daniel ; et
al. |
January 30, 2020 |
WORK FUNCTION METAL PATTERNING FOR N-P SPACES BETWEEN ACTIVE
NANOSTRUCTURES USING UNITARY ISOLATION PILLAR
Abstract
A method includes forming an isolation pillar between first and
second active nanostructures for adjacent FETs. When a first WFM
surrounding the second active nanostructure is removed as part of a
WFM patterning process, creating a discontinuity in the first
metal. The pillar or the discontinuity in the first metal on the
part of the pillar prevent the etching from reaching and removing
the first WFM on the first active nanostructure. The isolation
pillar creates a gate cut isolation in a selected gate region, and
can be shortened in another gate region to allow for gate sharing
between adjacent FETs.
Inventors: |
Chanemougame; Daniel;
(Niskayuna, NY) ; Xie; Ruilong; (Schenectady,
NY) ; Park; Chanro; (Clifton Park, NY) ;
Bouche; Guillaume; (Albany, NY) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
GLOBALFOUNDRIES INC. |
Grand Cayman |
|
KY |
|
|
Family ID: |
69177483 |
Appl. No.: |
16/047044 |
Filed: |
July 27, 2018 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 21/823807 20130101;
H01L 29/4908 20130101; H01L 29/78696 20130101; H01L 21/823842
20130101; H01L 27/1203 20130101; H01L 21/823878 20130101; H01L
29/775 20130101; B82Y 10/00 20130101; H01L 21/823821 20130101; H01L
29/401 20130101; H01L 29/0673 20130101; H01L 21/84 20130101; H01L
27/092 20130101; H01L 27/0924 20130101; H01L 29/66439 20130101;
H01L 29/1079 20130101; H01L 29/66772 20130101; H01L 29/78654
20130101; H01L 29/42392 20130101; H01L 29/66545 20130101 |
International
Class: |
H01L 21/8238 20060101
H01L021/8238; H01L 27/092 20060101 H01L027/092 |
Claims
1-14. (canceled)
15. A field effect transistor (FET) structure, comprising: a first
type field effect transistor (FET) having: a first active
nanostructure on a substrate, a gate having a high dielectric
constant (high-K) layer and a first work function metal (WFM)
surrounding the first active nanostructure, and a source/drain
(S/D) region at each of opposing ends of the first active
nanostructure; a second type field effect transistor (FET) having:
a second active nanostructure on the substrate adjacent to the
first active nanostructure and separated by a space, the second FET
further including a gate having the first WFM and a second work
function metal (WFM) surrounding the second active nanostructure,
and a source/drain (S/D) region at each of opposing ends of the
second active nanostructure, the second WFM being different than
the first WFM; and an isolation pillar including a lower portion
positioned between the first and second active nanostructures in
the space and a unitary, wider, upper portion extending above an
upper surface of the first and second active nanostructures,
wherein one of the first and second WFMs extends along a sidewall
of the isolation pillar but not over a part of the isolation
pillar.
16. The FET structure of claim 15, further comprising a first gate
region in which the gates of the first and second FETs are
electrically isolated by the isolation pillar and a second gate
region in which the gates of the first and second FETs are
electrically connected by at least the other one of the first and
second WFMs, wherein the unitary, wider, upper portion of the
isolation pillar extends above the upper surface of the first and
second active nanostructures to a first height in the first gate
region, and to a second height that is lower than the first height
in the second gate region.
17. The FET structure of claim 16, wherein the isolation pillar in
the second gate region has a T-shape cross-section.
18. The FET structure of claim 16, wherein the other one of the
first and second WFMs extends over the isolation pillar including
an upper end thereof to electrically connect the gates of the first
FET and the second FET together in the second gate region.
19. The FET structure of claim 16, further comprising a gate metal
layer over the first and second WFMs to electrically connect the
gates of the first FET and the second FET together in the second
gate region.
20. The FET structure of claim 16, further comprising a gate metal
layer over an uppermost WFM over the first active nanostructure and
the second active nanostructure in the first gate region.
Description
[0001] This application is related to U.S. application Ser. No.
______, entitled WORK FUNCTION METAL PATTERNING FOR N-P SPACES
BETWEEN ACTIVE NANOSTRUCTURES, docket number JALB282-US-NP
(GFF-0195), filed concurrently, and currently pending.
BACKGROUND
Technical Field
[0002] The present disclosure relates to integrated circuits, and
more particularly to patterning work function metals for active
nanostructure transistor devices with relatively small spaces
between field effect transistors using a unitary isolation
pillar.
Related Art
[0003] Field-effect transistors (FET) include doped source/drain
regions that are formed in a semiconductor and separated by a
channel region. A gate insulation layer is positioned about the
channel region and a conductive gate electrode is positioned over
or about the gate insulation layer. The gate insulation layer and
the gate electrode together may be referred to as the gate stack
for the device. By applying an appropriate voltage to the gate
electrode, the channel region becomes conductive and current is
allowed to flow from the source region to the drain region.
[0004] To improve the operating speed of the FETs, and to increase
the density of FETs on an integrated circuit (IC), designs have
gradually become smaller in size. Reductions to the size and the
channel length in FETs can improve the switching speed of the FETs.
A number of challenges arise as feature sizes of FETs and ICs get
smaller. For example, significant downsizing of traditional FETs
may produce electrostatic issues and mobility degradation.
Scaled-down FETs may have shorter gate lengths that make it more
difficult to control the channel. New device architectures such as
"gate-all-around" active nanostructures allow further scaling of
ICs, in part, because the gate is structured to wrap around the
channel, creating more surface area and better control. This
structure can provide better control with lower leakage current,
faster operations, and lower output resistance. Active
nanostructures used to form the channel can include a semiconductor
nanowire, i.e., a vertically or horizontally oriented thin wire, or
a plurality of stacked nanosheets, i.e., a plurality of vertically
spaced semiconductor sheets.
[0005] In very small transistors such as nanostructure FETs, metal
gates are used to provide high performance. The threshold voltage
of a FET is the minimum voltage required to create the conducting
path between the source and drain. Metal gates include a gate metal
with a work function metal (WFM) and a layer having a high
dielectric constant (high-k) in a combination known as high-k metal
gate (HKMG). The work function metal is typically located between
the high-k layer and the metal gate, and is used to tune the
threshold voltage of the transistor. The work function is the
minimum energy (usually measured in electron volts) needed to
remove an electron from a solid to a point immediately outside the
solid surface (or energy needed to move an electron from the Fermi
energy level into vacuum), i.e., the final electron position is far
from the surface on the atomic scale but still close to the solid
on the macroscopic scale. Different transistors may require
different threshold voltages, and therefore different work function
metals. For example, a PFET (a FET with a channel that contains
holes) may require a different work function metal than an NFET (a
FET with a channel that contains electrons).
[0006] Some integrated circuits, known as bimetallic integrated
circuits, include both NFETs and PFETs. These bimetallic integrated
circuits may require at least two different work function metals,
one for PFETs and one for NFETs. In some cases, an integrated
circuit design may include a PFET directly adjacent to an NFET. In
such a scenario, it may be difficult to deposit and pattern the
different work function metals completely around the active
nanostructure of the adjacent FETs without causing other
problems.
SUMMARY
[0007] A first aspect of the disclosure provides a method
comprising: forming a first active nanostructure on a substrate and
a second active nanostructure on the substrate, the first and the
second active nanostructures being adjacent to each other and
separated by a first space; forming an isolation pillar between the
first and second active nanostructures, the isolation pillar having
a lower portion in a portion of the first space and an upper
portion extending above an upper surface of the first and second
active nanostructures, the upper portion and the lower portion
being unitary; depositing a high dielectric constant (high-K) layer
and a first metal over the first active nanostructure, the
isolation pillar and the second active nanostructure; removing the
first metal from a part of the isolation pillar, creating a
discontinuity in the first metal separating the first metal over
the first active nanostructure from the first metal over the second
active nanostructure; and etching to remove the first metal
surrounding the second active nanostructure, wherein the isolation
pillar or the discontinuity in the first metal on the part of the
isolation pillar prevent the etching from reaching and removing the
first metal on the first active nanostructure; and depositing a
second metal surrounding the second active nanostructure.
[0008] A second aspect includes a method comprising: forming a
first active nanostructure on a substrate and a second active
nanostructure on the substrate, the first and the second active
nanostructures being adjacent to each other and separated by a
first space; forming an isolation pillar between the first and
second active nanostructures, the isolation pillar having a lower
portion in a portion of the first space and an upper portion
extending above an upper surface of the first and second active
nanostructures, wherein the upper portion and the lower portion are
unitary and the upper portion is wider than the lower portion, and
wherein the upper portion extends to a first height above the upper
surface of the first and second active nanostructures in a first
gate region; in a gate region in which the first and second active
nanostructures are to share a gate, etching the upper portion of
the isolation pillar above the upper surface of the first and
second active nanostructures to a second height that is less than
the first height; depositing a high dielectric constant (high-K)
layer and a first metal over the first active nanostructure, the
isolation pillar and the second active nanostructure; removing the
first metal from a part of the isolation pillar, creating a
discontinuity in the first metal separating the first metal over
the first active nano structure from the first metal over the
second active nanostructure; etching to remove the first metal
surrounding the second active nanostructure, wherein the isolation
pillar or the discontinuity in the first metal on a part of the
isolation pillar prevent the etching from reaching and removing the
first metal on the first active nanostructure; and depositing a
second metal surrounding the second active nanostructure.
[0009] A third aspect includes a field effect transistor (FET)
structure, comprising: a first type field effect transistor (FET)
having: a first active nanostructure on a substrate, a gate having
a high dielectric constant (high-K) layer and a first work function
metal (WFM) surrounding the first active nanostructure, and a
source/drain (S/D) region at each of opposing ends of the first
active nanostructure; a second type field effect transistor (FET)
having: a second active nanostructure on the substrate adjacent to
the first active nanostructure and separated by a space, the second
FET further including a gate having the first WFM and a second work
function metal (WFM) surrounding the second active nanostructure,
and a source/drain (S/D) region at each of opposing ends of the
second active nanostructure, the second WFM being different than
the first WFM; and an isolation pillar including a lower portion
positioned between the first and second active nanostructures in
the space and a unitary, wider, upper portion extending above an
upper surface of the first and second active nanostructures,
wherein one of the first and second WFMs extends along a sidewall
of the isolation pillar but not over a part of the isolation
pillar.
BRIEF DESCRIPTION OF THE DRAWINGS
[0010] The embodiments of this disclosure will be described in
detail, with reference to the following figures, wherein like
designations denote like elements, and wherein:
[0011] FIG. 1 shows a plan view of an IC layout according to
embodiments of the disclosure.
[0012] FIG. 2 shows a perspective cross-sectional view of active
nanostructure formation, according to embodiments of the
disclosure.
[0013] FIG. 3 shows a cross-sectional view of active nanostructure
formation, according to embodiments of the disclosure.
[0014] FIG. 4 shows a cross-sectional view of forming of a capping
layer over active nanostructures, according to embodiments of the
disclosure.
[0015] FIG. 5 shows a cross-sectional view of forming sacrificial
columns over the capping layer, according to embodiments of the
disclosure.
[0016] FIG. 6 shows a cross-sectional view of forming pillar
material, according to embodiments of the disclosure.
[0017] FIG. 7 shows a cross-sectional view of forming a mask for
forming an isolation pillar, according to embodiments of the
disclosure.
[0018] FIGS. 8A-B show cross-sectional views of forming an
isolation pillar in a first and second gate region along view lines
A-A and B-B in FIG. 1, respectively, according to embodiments of
the disclosure.
[0019] FIGS. 9A-B show cross-sectional views of removing
sacrificial columns in the first and second gate regions along view
lines A-A and B-B in FIG. 1, respectively, according to embodiments
of the disclosure.
[0020] FIGS. 10A-B show cross-sectional views of removing a capping
layer and a nanosheet release process in the first and second gate
regions along view lines A-A and B-B in FIG. 1, respectively,
according to embodiments of the disclosure.
[0021] FIG. 11 shows a cross-sectional view of source/drain region
formation in a source/drain area with no isolation pillar along
view line 11-11 in FIG. 1, according to embodiments of the
disclosure.
[0022] FIGS. 12A-B show cross-sectional views of a high dielectric
constant (high-K) layer and first work function metal (WFM)
formation in the first and second gate regions along view lines A-A
and B-B in FIG. 1, respectively, according to embodiments of the
disclosure.
[0023] FIGS. 13A-B show cross-sectional views of removing the first
WFM to expose at least a portion of the isolation pillar in the
first and second gate regions along view lines A-A and B-B in FIG.
1, respectively, according to embodiments of the disclosure.
[0024] FIGS. 14A-B show cross-sectional views of removal of the
high-K layer and first WFM from a part of the isolation pillar in
the first and second gate regions along view lines A-A and B-B in
FIG. 1, respectively, according to embodiments of the
disclosure.
[0025] FIGS. 15A-B show cross-sectional views of removal of the
protective layer for removing the first WFM from the part of the
isolation pillar in the first and second gate regions along view
lines A-A and B-B in FIG. 1, respectively, according to embodiments
of the disclosure.
[0026] FIGS. 16A-B show cross-sectional views prior to removing the
first WFM from an active nanostructure in the first and second gate
regions along view lines A-A and B-B in FIG. 1, respectively,
according to embodiments of the disclosure.
[0027] FIGS. 17A-B show cross-sectional views of removing the first
WFM from the active nanostructure in the first and second gate
regions along view lines A-A and B-B in FIG. 1, respectively,
according to embodiments of the disclosure.
[0028] FIGS. 18A-B show cross-sectional views of removal of the
mask for removing the first WFM in the first and second gate
regions along view lines A-A and B-B in FIG. 1, respectively,
according to embodiments of the disclosure.
[0029] FIGS. 19A-B show cross-sectional views of formation of a
second WFM and a gate metal layer in the first and second gate
regions along view lines A-A and B-B in FIG. 1, respectively,
according to embodiments of the disclosure. FIGS. 19A-B also show
an embodiment of a FET structure along view lines A-A and B-B in
FIG. 1, respectively, according to embodiments of the
disclosure.
[0030] FIGS. 20A-B show cross-sectional views of optional formation
of a metal gate layer in the first and second gate regions along
view lines A-A and B-B in FIG. 1, respectively, according to
embodiments of the disclosure. FIGS. 20A-B also show another
embodiment of a FET structure along view lines A-A and B-B in FIG.
1, respectively, according to embodiments of the disclosure.
[0031] It is noted that the drawings of the disclosure are not
necessarily to scale. The drawings are intended to depict only
typical aspects of the disclosure, and therefore should not be
considered as limiting the scope of the disclosure. In the
drawings, like numbering represents like elements between the
drawings.
DETAILED DESCRIPTION
[0032] Embodiments of the present disclosure provide methods for
work function metal (WFM) patterning for active nanostructure
transistor devices that may be used in integrated circuits (IC). In
some embodiments, an isolation pillar can reduce or eliminate an
overetch formed during removal of a WFM such that the overetch does
not expose the WFM on the adjacent active nanostructure. The
resulting IC may include different WFMs on adjacent active
nanostructures, creating different types of FETs. The isolation
pillar may have a lower section between active nanostructures of
adjacent FETs and a wider, unitary upper section above an upper
surface of the active nanostructures. The isolation pillar may have
a first height above the upper surface of active nanostructures in
a first gate region where the gates of adjacent FETs are to be
electrically isolated, and a second height that is less than the
first height in a second gate region where the gates of adjacent
FETs are to be electrically connected.
[0033] It will be understood that when an element such as a layer,
region, or substrate is referred to as being "on" or "over" another
element, it may be directly on the other element or intervening
elements may also be present. In contrast, when an element is
referred to as being "directly on" or "directly over" another
element, there may are no intervening elements present. It will
also be understood that when an element is referred to as being
"connected" or "coupled" to another element, it may be directly
connected or coupled to the other element or intervening elements
may be present. In contrast, when an element is referred to as
being "directly connected" or "directly coupled" to another
element, there are no intervening elements present.
[0034] Reference in the specification to "one embodiment" or "an
embodiment" of the present disclosure, as well as other variations
thereof, means that a particular feature, structure,
characteristic, and so forth described in connection with the
embodiment is included in at least one embodiment of the present
disclosure. Thus, the phrases "in one embodiment" or "in an
embodiment," as well as any other variations appearing in various
places throughout the specification are not necessarily all
referring to the same embodiment. It is to be appreciated that the
use of any of the following "/," "and/or," and "at least one of,"
for example, in the cases of "A/B," "A and/or B" and "at least one
of A and B," is intended to encompass the selection of the first
listed option (a) only, or the selection of the second listed
option (B) only, or the selection of both options (A and B). As a
further example, in the cases of "A, B, and/or C" and "at least one
of A, B, and C," such phrasing is intended to encompass the first
listed option (A) only, or the selection of the second listed
option (B) only, or the selection of the third listed option (C)
only, or the selection of the first and the second listed options
(A and B), or the selection of the first and third listed options
(A and C) only, or the selection of the second and third listed
options (B and C) only, or the selection of all three options (A
and B and C). This may be extended, as readily apparent by one of
ordinary skill in the art, for as many items listed.
[0035] As noted, bimetallic ICs include both NFETs and PFETs. These
bimetallic ICs may use at least two different WFMs, one for PFETs
and one for NFETs. In cases where an IC includes a PFET directly
adjacent to an NFET, it may be difficult to deposit and pattern the
different WFMs completely around the active nanostructure of the
adjacent FETs without causing other problems. For example, within
an opening created by removal of a dummy gate, a first WFM is
applied to both FETs. However, the first WFM must be removed from
the active nanostructure that requires a second, different WFM.
Conventionally, a mask is formed in the dummy gate opening over a
first active nanostructure, but not over an exposed second active
nanostructure from which the first WFM must be removed. Isotropic
wet etching is used to remove the first WFM from between the active
nanostructure, e.g., nanosheets, fin or nanowire, of the exposed
second active nanostructure that requires the second WFM. However,
due to the small amount of space between the active nanostructures,
the wet etching will follow the layer of the first WFM to the
masked first active nanostructure. In particular, the wet etching
may create a path to, or at least toward, the adjacent masked first
active nanostructure, i.e., the etching overetches or sneaks around
the mask. The overetch path may include an undercut under the mask
layer, and/or a vertically extending path about the mask layer
where ends thereof meet the first WFM in the dummy gate
opening.
[0036] Conventionally, the spacing between adjacent nanostructures
is sufficient to prevent the overetching from reaching the masked,
first active nanostructure, and posing a problem. However, as the
distance between adjacent nanostructures has decreased (e.g., to
less than 45 nanometers (nm) not including work function metal
layer thickness), it has been discovered that the overetching may
extend far enough to expose the first WFM of the masked, first
active nanostructure. In some cases, the overetching can remove or
damage the first WFM about the masked, first active nanostructure
(removing it from at least a side portion of the nanowire, fin or
nanosheets thereof, and/or even from between nanosheets, where
provided). In any event, the overetching may render the device
inoperable.
[0037] The necessary duration of the wet etching can also impact
the extent of overetching. For example, the overetching issue may
be magnified relative to nanosheet stack applications because the
wet etch must be allowed to act for a sufficient amount of time to
remove the first WFM from not just around the active nanostructure,
but also between the nanosheets of the exposed, second active
nanostructure. The wet etch duration being longer in this setting,
compared to a nanowire application, allows more time for the wet
etch to work around the mask to remove the first WFM from the
masked, first active nanostructure. In some cases, the duration may
be sufficient for the wet etch to remove the first WFM from the
first nanosheet stack even though it is covered by the mask. In
another example, the width of nanostructures within a single IC may
vary over a large scale for different devices. For example, a
device for a static random access memory (SRAM) may have a
nanostructure having a width of about 5 to 40 nm, but those for
logic devices on the same IC may have a width of about 20 to 80 nm.
The wet etch must have a duration to address the highest width
active nanostructure (e.g., 80 nm) even though devices having a
smaller width nanostructure that do not require such a long
duration, are present. Consequently, the smaller width
nanostructure devices are highly likely to experience overetching.
As will be described, embodiments of the disclosure employ an
isolation pillar to prevent the overetch from reaching the masked
active nanostructure.
[0038] Another challenge with WFM patterning is addressing mask
edge placement error (EPE). More particularly, the edge of the mask
for WFM patterning is ideally placed between the adjacent active
nanostructures, leaving the first WFM over the masked, first active
nanostructure after the etching. Conventionally, such mask edge
placement is not an issue because the space provides sufficient
tolerance to statistically accommodate some misalignment. However,
as the distance between adjacent active nanostructures is
decreased, the ability to properly place an edge of the mask
between adjacent nanosheet stacks, fins or nanowires is
significantly impaired. For example, for the next generation of
devices (e.g., 7 nm), the space between active nanostructures is at
or less than 45 nm, considering the high-K layer and the first WFM
on both active nanostructures, the space left to land the mask edge
becomes too small to reliably ensure the mask edge lands properly.
Due to current mask edge alignment variations, the mask edge can be
either on top of or too close to one or the other nanostructure,
i.e., nanosheet stack, fin or nanowire. If the mask edge is on top
of the first active nanostructure, the wet etch may remove at least
part of the first WFM from an unmasked portion of the first active
nanostructure, rendering the first device inoperable. If the mask
edge is on top of the second active nanostructure, the wet etch
cannot properly remove the first WFM from the second active
nanostructure, possibly rendering the second device inoperable. If
the mask is too close to either nanostructure, it increases the
likelihood of mask undercut, and its resulting structural issues.
As will be described, the isolation pillar according to embodiments
of the disclosure addresses this challenge by relaxing the
precision required to land the mask edge.
[0039] Referring to the drawings, a method according to embodiments
of the disclosure will be described.
[0040] FIG. 1 shows a plan view of an IC layout 10 according to
embodiments of the disclosure. FIG. 1 shows IC layout 10 with a FET
structure completed, but FIG. 1 will also be referenced for
purposes of description of the steps of the method according to
embodiments of the disclosure. As shown in FIG. 1, IC layout 10
includes a plurality of p-type active nanostructures 120P for
p-type field effect transistors (PFETs) 222, i.e., where gates 246
extend over active nanostructures 120P. IC layout 10 also includes
a plurality of n-type active nanostructures 120N for n-type field
effect transistors (NFETs) 224, i.e., where gates 242 extend over
active nanostructures 120N. For purposes of description, FIG. 1
also shows a gate cut landing area 30 for an intended gate cut
isolation 31 (not actually built, shown in phantom) between
adjacent P and N type active nanostructures 120P and 120N. Gate cut
landing area 30 would conventionally be defined between adjacent
PFETs 222 and NFETs 224 in an N-P space 32 therebetween. (Gate cut
isolations 34NN and 36PP isolate adjacent NFETs (upper end of view)
and adjacent PFETs, respectively (lower end of view) (FETs not
shown)). As understood by one skilled in the art, a conventional
gate cut isolation is typically formed after forming a dummy gate
(not shown), e.g., by forming an opening in the dummy gate between
active nanostructures to a substrate therebelow, and filling the
opening with an insulator that remains in place after dummy gate
removal.
[0041] IC layout 10 has a first gate region 80 (one shown, in
center) in which gates of adjacent NFETs 224 and PFETs 222 are
electrically isolated, and a second gate region 82 (two shown) in
which gates of adjacent NFETs 224 and PFETs 222 are electrically
connected or shared. First gate region 80 would typically require a
gate cut isolation 31 (phantom box) in a gate cut landing area 30.
However, where a gate cut isolation 31 (phantom box) is desired
between certain parts of PFET 222C and NFET 224C, gate cut landing
area 30, i.e., space between PFET 222C and NFET 224C, may not
provide sufficient width to land a gate cut isolation using current
processes. In order to address this situation, as shown in the
middle of FIG. 1, current practice is to reduce the width of active
nanostructures 120P, 120N and the respective NFET 224C and PFET
222C, where necessary, to enlarge the spacing therebetween and
create a larger gate cut isolation landing area 30. Unfortunately,
as shown, this process requires formation of tapered NFET 224C and
PFET 222C devices (e.g., with jogs and corners) that are hard to
manufacture due to, e.g., nanostructure variability, proximity
issues, lithography and patterning limits, etc. Further, the
reduction in width of the active nanostructures is typically
accompanied by a reduction in performance of the FETs. Embodiments
of the disclosure provide processes for forming an isolation pillar
160 that includes an upper portion 164 that acts as a gate cut
isolation 212 (FIGS. 19A, 20A) in first gate region 80, without
having to re-shape active nanostructures. Further, embodiments of
the disclosure reduce at least part of upper portion 164 in second
gate region 82 (FIGS. 19B, 20B), allowing gates 242, 246 of
adjacent NFETs 224 and PFETs 222 to be electrically connected or
shared, where desired.
[0042] As will be described, processing in each gate region 80, 82
may vary. For purposes of description, those figures labeled with
just a number show common structure and processing for both gate
regions 80, 82; those figures labeled with a number and an `A` show
cross-sectional views along view line A-A in FIG. 1 through first
gate region 80 (gates isolated); and those figures with a
corresponding number and a `B` show cross-sectional views along
view line B-B through second gate region 82 (gates
connected/shared).
[0043] FIG. 2 shows a perspective cross-sectional view of a
precursor structure 110. Precursor structure 110 may include a
substrate 112 which may include but is not limited to silicon,
germanium, silicon germanium, silicon carbide, and those consisting
essentially of one or more III-V compound semiconductors having a
composition defined by the formula
Al.sub.X1Ga.sub.X2In.sub.X3As.sub.Y1P.sub.Y2N.sub.Y3Sb.sub.Y4,
where X1, X2, X3, Y1, Y2, Y3, and Y4 represent relative
proportions, each greater than or equal to zero and
X1+X2+X3+Y1+Y2+Y3+Y4=1 (1 being the total relative mole quantity).
Other suitable substrates include II-VI compound semiconductors
having a composition Zn.sub.A1Cd.sub.A2Se.sub.B1Te.sub.B2, where
A1, A2, B1, and B2 are relative proportions each greater than or
equal to zero and A1+A2+B1+B2=1 (1 being a total mole quantity).
Furthermore, a portion or entire semiconductor substrate may be
strained. Substrate 112 may also take the form of a
semiconductor-on-insulator (SOI) substrate, including an SOI layer
over a buried insulator layer (not shown) over a bulk semiconductor
layer. The buried insulator layer may include, for example, silicon
oxide, and the semiconductor layers may include any semiconductor
material listed herein.
[0044] FIG. 2 also shows a plurality of shallow trench isolations
(STIs) 114 separating active nanostructures 120N and 120P. Each STI
114 may include a trench etched into substrate 112 filled with an
insulator, or an insulator deposited on top of substrate 112. STIs
114 isolate one region of the substrate from an adjacent region of
the substrate. As understood, one or more transistors of a given
polarity may be disposed within an area isolated by STI 114. Each
STI 114 may be formed of any currently-known or later developed
substance for providing electrical insulation, and as examples may
include: silicon nitride (Si.sub.3N.sub.4), silicon oxide
(SiO.sub.2), fluorinated SiO.sub.2 (FSG), hydrogenated silicon
oxycarbide (SiCOH), porous SiCOH, boro-phospho-silicate glass
(BPSG), silsesquioxanes, carbon (C) doped oxides (i.e.,
organosilicates) that include atoms of silicon (Si), carbon (C),
oxygen (0), and/or hydrogen (H), thermosetting polyarylene ethers,
a spin-on silicon-carbon containing polymer material, near
frictionless carbon (NFC), or layers thereof.
[0045] FIG. 2 also shows forming a first active nanostructure 120P
on substrate 112 and a second active nanostructure 120N on
substrate 112. This step may occur before or after STI 114
formation. Active nanostructures 120N, 120P may be formed using any
now known or later developed lithography process. In lithography
(or "photolithography"), a radiation sensitive "resist" coating is
formed over one or more layers which are to be treated, in some
manner, such as to be selectively doped and/or to have a pattern
transferred thereto. The resist, which is sometimes referred to as
a photoresist, is itself first patterned by exposing it to
radiation, where the radiation (selectively) passes through an
intervening mask or template containing the pattern. As a result,
the exposed or unexposed areas of the resist coating become more or
less soluble, depending on the type of photoresist used. A
photoresist developer is then used to remove the more soluble areas
of the resist leaving a patterned resist. The patterned resist can
then serve as a mask for the underlying layers which can then be
selectively treated, such as to receive dopants and/or to undergo
etching, for example. Here, the nanostructures are etched to form
their final shape. "Etching" generally refers to the removal of
material from a substrate (or structures formed on the substrate),
and is often performed with a mask in place so that material may
selectively be removed from certain areas of the substrate, while
leaving the material unaffected, in other areas of the substrate.
There are generally two categories of etching, (i) wet etch and
(ii) dry etch. Wet etch is performed with a solvent (such as an
acid) which may be chosen for its ability to selectively dissolve a
given material (such as oxide), while, leaving another material
(such as polysilicon) relatively intact. This ability to
selectively etch given materials is fundamental to many
semiconductor fabrication processes. A wet etch will generally etch
a homogeneous material (e.g., oxide) isotropically, but a wet etch
may also etch single-crystal materials (e.g. silicon wafers)
anisotropically. Dry etch may be performed using a plasma. Plasma
systems can operate in several modes by adjusting the parameters of
the plasma. Ordinary plasma etching produces energetic free
radicals, neutrally charged, that react at the surface of the
wafer. Since neutral particles attack the wafer from all angles,
this process is isotropic. Ion milling, or sputter etching,
bombards the wafer with energetic ions of noble gases which
approach the wafer approximately from one direction, and therefore
this process is highly anisotropic. Reactive-ion etching (RIE)
operates under conditions intermediate between sputter and plasma
etching and may be used to produce deep, narrow features, such as
STI trenches.
[0046] "Depositing" may include any now known or later developed
techniques appropriate for the material to be deposited including
but are not limited to, for example: chemical vapor deposition
(CVD), low-pressure CVD (LPCVD), plasma-enhanced CVD (PECVD),
semi-atmosphere CVD (SACVD) and high density plasma CVD (HDPCVD),
rapid thermal CVD (RTCVD), ultra-high vacuum CVD (UHVCVD), limited
reaction processing CVD (LRPCVD), metalorganic CVD (MOCVD),
sputtering deposition, ion beam deposition, electron beam
deposition, laser assisted deposition, thermal oxidation, thermal
nitridation, spin-on methods, physical vapor deposition (PVD),
atomic layer deposition (ALD), chemical oxidation, molecular beam
epitaxy (MBE), plating, evaporation.
[0047] After forming, first and the second active nanostructures
120P, 120N are adjacent to each other on substrate 112 and
separated by a first space 116. First space 116 may be less than 45
nanometers (nm). As used herein, "active nanostructure" may include
any form of vertically oriented semiconductor structure for
providing a channel of a transistor device, e.g., one capable of a
gate all around arrangement. As illustrated, active nanostructures
120N, 120P may include nanosheet stacks 122. Here, forming first
and second active nanostructures 120P, 120N may include forming
respective first and second nanosheet stacks 122. Each nanosheet
stack 122 may include nanosheets 126 separated (alternatingly) by
sacrificial layers 124. Nanosheets 126 may include a semiconductor,
e.g., silicon, and sacrificial layers 124 may include any of a
variety of sacrificial materials, such as silicon germanium. Other
materials for nanosheets and/or sacrificial layers are possible.
Nanosheet stacks 122 may include at least one nanosheet 126. In one
embodiment, each nanosheet stack 122 includes three nanosheets 126,
as shown in FIG. 2. Nanosheet stacks 122 may be formed by
alternating deposition of sacrificial layers 124 and nanosheet 126
layers, followed by photolithographic patterning using a mask 128
including a hard mask 130, e.g., of silicon nitride, and a pad
oxide 132.
[0048] Continuing with FIG. 2, mask 128 may be shaped to form a
first space 116 between active nanostructures 120N, 120P. First
space 116 may have a different width between pairs of adjacent
NFETs and PFETs (N-P spacing), adjacent NFETs and/or adjacent
PFETs. For example, the N-P spacing may be smaller than the others
such that, as will be described, only one isolation pillar is
formed in an N-P space, but two are formed in N-N or P-P space--one
on each active nanostructure. Active nanostructures 120N, 120P may
be etched to their shapes shown using any appropriate etching
process. Once active nanostructures 120N, 120P are shaped, mask 128
may be removed, e.g., using any appropriate ashing process to
remove mask 128.
[0049] FIG. 3 shows a cross-sectional view of first and second
active nanostructures 120N, 120P with first space 116 therebetween
after removal of mask 128 and other structures, such as amorphous
silicon dummy gate (not shown) and dummy gate oxide (not shown). It
is understood that FIG. 3 shows a cross-section in a gate cavity
opening for gate regions 80, 82 (FIG. 1).
[0050] While active nanostructures 120N, 120P will be described
herein as nanosheet stacks 122, it is understood that they can take
a variety of alternative forms including but not limited to:
semiconductor fins, semiconductor nanowires, etc. As will be
apparent to those skilled in the art, the teachings of the
disclosure are applicable to any variety of nanostructure. It is
understood that active nanostructures 120N, 120P will generally be
surrounded by an interlayer dielectric (ILD) later in the process
sequence, after a dummy gate and source and drain regions are
formed. The ILD may include but is not limited to: carbon-doped
silicon dioxide materials; fluorinated silicate glass (FSG);
organic polymeric thermoset materials; silicon oxycarbide; SiCOH
dielectrics; fluorine doped silicon oxide; spin-on glasses;
silsesquioxanes, including hydrogen silsesquioxane (HSQ), methyl
silsesquioxane (MSQ) and mixtures or copolymers of HSQ and MSQ;
benzocyclobutene (BCB)-based polymer dielectrics, and any
silicon-containing low-k dielectric. Examples of spin-on low-k
films with SiCOH-type composition using silsesquioxane chemistry
include HOSP.TM. (available from Honeywell), JSR 5109 and 5108
(available from Japan Synthetic Rubber), Zirkon.TM. (available from
Shipley Microelectronics, a division of Rohm and Haas), and porous
low-k (ELk) materials (available from Applied Materials). Examples
of carbon-doped silicon dioxide materials, or organosilanes,
include Black Diamond.TM. (available from Applied Materials) and
Coral.TM. (available from Lam Research). An example of an HSQ
material is FOx.TM. (available from Dow Corning).
[0051] FIGS. 4-10B show cross-sectional views of a process of
forming an isolation pillar 160 (FIGS. 10A-B) between first and
second active nanostructures 120P, 120N. As shown in FIGS. 10A-B,
and as will be described, isolation pillar 160 has a lower portion
162 in a portion 144 of first space 116 and an upper portion 164
extending above an upper surface 166 of first and second active
nanostructures 120P, 120N. Upper portion 164 and lower portion 162
are unitary, i.e., there is no seam between the portions and they
are formed as one, integral structure. The teachings of the
disclosure will be described relative to isolation pillar 160
between first and second nanostructures 120N, 120P for an NFET and
PFET, i.e., for N-P space, but one or more isolation pillars 160
may be formed in spaces between same types of FETs. That is,
isolation pillar(s) 160 may be formed between all adjacent active
nanostructures on the substrate, e.g., as shown in FIGS. 1, 3 and
4, in N-N space 147 and P-P space 149 (adjacent active
nanostructures removed for clarity).
[0052] As shown in the cross-sectional view of FIG. 4, the process
may include forming a capping layer 142 over first and second
active nanostructure 120P, 120N such that a portion 144 of first
space 116 remains open thereafter. This step may include
epitaxially growing capping layer 142 from sacrificial layers 124
of nanosheet stacks 122. Capping layer 142 may include, for
example, silicon germanium, but could include other selectively
grown material over the nanosheet stacks, e.g., metal, dielectric,
etc. As will be described, a thickness of capping layer 142 above
active nanostructures 120N, 120P determines a height of lower
portion 164 of isolation pillar 160 above the active nano
structures. The terms "epitaxial growth" and "epitaxially formed
and/or grown" mean the growth of a semiconductor material on a
deposition surface of a semiconductor material, in which the
semiconductor material being grown may have the same crystalline
characteristics as the semiconductor material of the deposition
surface. In an epitaxial growth process, the chemical reactants
provided by the source gases are controlled and the system
parameters are set so that the depositing atoms arrive at the
deposition surface of the semiconductor substrate with sufficient
energy to move around on the surface and orient themselves to the
crystal arrangement of the atoms of the deposition surface.
[0053] FIG. 5 shows a cross-sectional view of forming a sacrificial
column 150 above each of first and second active nanostructures
120P, 120N, creating a second space 152 between sacrificial columns
150. Second space 152 is contiguous with portion 144 of first space
116. For purposes that will be described herein, second space 152
is wider than portion 144 of first space 116. Sacrificial columns
150 may be formed using any now known or later developed technique.
In one example, sacrificial material such as an organic
planarization layer (OPL) may be deposited and etched using a mask
154 to form sacrificial columns 150. Mask 154 may be a negative
tone mask, i.e., a mask typically used to form gate cut openings in
gate cut landing area 30 (FIG. 1). Mask 154 may include any
appropriate hard mask material, e.g., silicon nitride. The etch
used may be any appropriate etching chemistry for the OPL used,
e.g., a RIE. Sacrificial columns 150 land on top of capping layer
142 over first and second active nanostructures 120P, 120N.
Sacrificial column 150 alignment with capping layer 142 and first
and second active nanostructures 120P, 120N does not need to be
exact, i.e., sacrificial column 150 edge placement over capping
layer 142 and first and second active nanostructures 120P, 120N is
not critical (e.g., it only has to expose N-P, N-N and P-P spaces).
Once sacrificial columns 150 are formed, mask 154 may be removed,
e.g., using an ashing process appropriate for the mask
material.
[0054] FIG. 6 shows a cross-sectional view of forming a pillar
material 158 in portion 144 of first space 116 and in second space
152. This process may include depositing pillar material 158, e.g.,
using CVD. Pillar material 158 may include but is not limited to:
silicon oxycarbide (SiOC), silicon oxide, silicon oxy-carbide
nitride (SiOCN), silicon nitride (SiN) or silicon boron carbon
nitride (SiBCN). Pillar material 158 fills portion 144 of first
space 116 that has less width than second space 152 such that
pillar material 158 in second space 152 extends over and above
upper surface 166 of first and active nanostructure 120N, 120P.
Note also, pillar material 158 is between active nanostructures
120N, 120P (in middle of drawing) but also extends around each
nanosheet stack 122.
[0055] FIGS. 7, 8A, 8B, 9A, 9B, 10A and 10B, show cross-sectional
views of removing sacrificial columns 150 and capping layer 142,
creating lower portion 162 of isolation pillar 160 from pillar
material 158 (FIG. 7) in portion 144 of first space 116 between
first and second active nanostructures 120P, 120N, and creating
upper portion 164 of isolation pillar 160 extending above upper
surface 166 of first and second active nanostructures 120P, 120N.
Once complete, as shown in FIGS. 9A and 9B, upper portion 164
extends over upper surface 166 and upper portion 164 extends
upwardly above first and second active nanostructures 120P, 120N. A
thickness of capping layer 142 (FIG. 6) above active nanostructures
120N, 120P determines a height of lower portion 164 of isolation
pillar 160 above the active nanostructures 120P, 120N. Since
capping layer 142 (FIG. 6) is relatively thin, lower portion 164 is
relatively close to active nanostructures 120P, 120N. Since second
space 152 is wider than portion 144 of first space 116, upper
portion 164 is wider than lower portion 162. Since pillar material
158 is deposited all at once, upper portion 164 and lower portion
162 are unitary, i.e., there is no seam between the portions and
they are formed as one, integral structure.
[0056] FIG. 7 shows forming a mask 170 for reducing a height of
isolation pillar 160 (FIGS. 8A-B) in second gate region 82. Mask
170 may be an inverse mask for that used for gate cut isolations 31
(shown in phantom in gate cut landing area 30 (FIG. 1)). The
inverse mask can be formed using a negative tone photoresist (i.e.,
a photoresist in which portions exposed to light become insoluble
to the photoresist developer, and the unexposed portion is
dissolved in the photoresist developer) on the material with the
same intervening mask or template containing the pattern for the
gate cut isolations. Hence, mask 170 creates openings for etching
in areas in the pattern that would be protected (not etched) areas
on a positive tone mask, i.e., it is the inversion of the typically
employed positive tone mask for gate cut isolations. Thus, mask 170
creates openings for etching everywhere except where a gate cut
isolation opening 31 (in phantom in FIG. 1) would normally be
created. In this fashion, over second gate region 82, where a gate
cut isolation would normally not be present and where isolation
pillar 160 separation of gates is not desired, an opening 172 is
formed in mask 170. Opening 172 allows for reduction in height of
pillar 160 to allow for later gate connection.
[0057] In contrast, mask 170 covers first gate region 80 where gate
isolation is desired, allowing pillar 160 to provide for later gate
isolation. As understood by one skilled in the art, a conventional
gate cut isolation is typically created by forming an opening to
the substrate in a dummy gate between active nanostructures, and
filling the opening with an insulator that remains in place after
dummy gate removal. Where a gate cut isolation is desired between
certain parts of the PFET and NFET, a gate cut landing area, i.e.,
space between the PFET and NFET like first space 116, may not
provide sufficient width to land a gate cut isolation using current
processes. In order to address this situation, current practice is
to reduce the width of active nanostructures and the respective
NFET and PFET, where necessary, to enlarge the space (like first
space 116), therebetween and create a larger gate cut isolation
landing area. Unfortunately, this process requires formation of
tapered NFET and PFET devices (e.g., with jogs and corners) that
are hard to manufacture due to, e.g., nanostructure variability,
proximity issues, lithography and patterning limits, etc. Further,
the reduction in size of the FETs is typically accompanied by a
reduction in performance of the FETs. Formation of isolation pillar
160 in gate region 80, as described, eliminates the need to create
a larger gate cut isolation landing area.
[0058] FIGS. 8A and 8B show cross-sectional views of etching pillar
material 158 in first gate region 80 (FIG. 8A) in which gate
isolation is desired, and second gate region 82 (FIG. 8B) in which
gate connection is desired. The etching may include any appropriate
etching chemistry for pillar material 158, e.g., a RIE. In FIG. 8B,
opening 172 in mask 170 allows pillar material 158 of upper portion
164 in second gate region 82 to be etched. In contrast, as shown in
FIG. 8A, mask 170 prevents pillar material 158 of upper portion 164
in first gate region 80 to be etched. As a result, upper portion
164 in first gate region 80 (FIG. 8A) has a first height H1, and
upper portion 164 in second gate region 82 (FIG. 8B) has a second
height H2 that is less than first height H1. Pillar material 158 is
etched away in both regions selectively to an upper surface 174 of
sacrificial columns 150. FIGS. 9A and 9B show the structure after
removal of sacrificial columns 150 (FIGS. 8A-B) and mask 170 (FIGS.
8A-B), e.g., by a conventional resist strip for mask 170 and an
ashing process appropriate for sacrificial column 150 material. As
shown in FIG. 9B, isolation pillar 160 in second gate region 82 has
a T-shape cross-section, i.e., it is generally T-shape with some
exceptions for rounded artifacts in some locations like a top of
the `T.`
[0059] FIGS. 10A and 10B show cross-sectional views of removing
sacrificial layers 124 (FIG. 4) from first and second nanosheet
stacks 120, i.e., after removing sacrificial columns 150 (FIGS.
8A-B) and capping layer 142 (FIGS. 8A-B). This process is sometimes
referred to as "channel release" as it is forming the channel for
the FETs. The process may include any now known or later developed
etching process to remove capping layer 142 (FIGS. 9A-B) and
sacrificial layers 124 (FIGS. 9A-B), selective to nanosheets 126.
Any trimming process required to create the final size and shape of
nanosheets 126 may be provided also at this stage. It is understood
that where nanosheet stacks 122 are not employed, e.g., where fins
or nanowires are used, this step may be skipped.
[0060] As shown in FIG. 10A, in first gate region 80 in which first
and second active nanostructures 120P, 120N are to have separate
gates, sacrificial columns 150 (FIGS. 8A-B) and capping layer 142
(FIGS. 8A-B) are removed such that upper portion 164 of isolation
pillar 160 extends above upper surface 166 of first and second
active nanostructures 120P, 120N to a first height H1. Further, as
shown in FIG. 10B, in second gate region 82 in which first and
second active nanostructures 120P, 120N are to share a gate,
sacrificial columns 150 (FIGS. 8A-B) and capping layer 142 (FIGS.
8A-B) are removed such that upper portion 164 extends above upper
surface 166 of first and second active nanostructures 120P, 120N to
a second height H2 that is less than first height H1.
[0061] FIG. 11 shows a cross-sectional view through view line 11-11
in FIG. 1 of a source/drain (S/D) area 152, i.e., with active
nanostructures 120N, 120P not visible because they are in another
cross-sectional plane in the page of the drawings. As illustrated,
isolation pillar 160 (FIGS. 10A-B) is not present between
source/drain regions 154N, 154P. S/D regions 154, shown in FIG. 11,
may be formed using any now known or later developed process
including, for example, epitaxial growth of doped semiconductor at
respective S/D region locations, i.e., having exposed semiconductor
material. An annealing process may be carried out to drive in
dopants into semiconductor material (not labeled) underlying S/D
regions 154. As understood, where a dummy gate (not shown) is used,
it protects other parts of the structure, e.g., active
nanostructures 120N, 120P, during formation of S/D regions 154 and
other processes (not all relevant to current disclosure) that occur
at about the same time, e.g., anneals and other processes damaging
to active nanostructures.
[0062] FIGS. 12A-B show cross-sectional views of depositing a high
dielectric constant (high-K) layer 182 and a first metal 180 over
first active nanostructure 120P, isolation pillar 160 and second
active nanostructure 120N. Note, isolation pillar 160 is between
active nanostructures 120N, 120P (in middle of drawing) but also at
each end, i.e., isolation pillar 160 is formed around each
nanosheet stack 122. High-K layer 182 acts as a gate dielectric for
high-K metal gates (HKMG) of the FETs. High-K layer 182 is formed
on substrate 112 and first and second active nanostructures 120P,
120N before the depositing of first metal 180. Examples of high-K
material (having K higher than silicon oxide) include but are not
limited to: metal oxides such as Ta.sub.2O.sub.5, BaTiO.sub.3,
HfO.sub.2, ZrO.sub.2, Al.sub.2O.sub.3, or metal silicates such as
HfSixOy or HfSixOyNz, where x, y, and z represent relative
proportions, each greater than or equal to zero and x+y+z=1 (1
being the total relative mole quantity). As understood in the art,
first metal 180 may include a work function metal (WFM) for a
particular type of FET, i.e., n-type or p-type. That is, first
metal 180 may include a PFET work function metal or an NFET work
function metal, depending on what type of FET is being built from
first active nanostructure 120P. In the example shown, active
nanostructure 120P will eventually become a PFET, hence first metal
180 will be a PFET WFM such as but not limited to: aluminum (Al),
zinc (Zn), indium (In), copper (Cu), indium copper (InCu), tin
(Sn), tantalum (Ta), tantalum nitride (TaN), tantalum carbide
(TaC), titanium (Ti), titanium nitride (TiN), titanium carbide
(TiC), TiAlC, TiAl, tungsten (W), tungsten nitride (WN), tungsten
carbide (WC), polycrystalline silicon (poly-Si), and/or
combinations thereof. Where active nanostructures 120P, 120N
include nanosheets 126, the depositing of first metal 180 includes
depositing the first metal such that the first metal surrounds each
of nanosheets 126 of first active nanostructure 120P, and such that
the first metal surrounds each of nanosheets 126 of second active
nanostructure 120N. The depositing steps may include, for example,
CVD, ALD, PECVD, etc.
[0063] FIGS. 13A-B and 14A-B show cross-sectional views of removing
first high-K layer 182 and first metal 180 from a part of isolation
pillar 160. This process may include covering the first and second
active nanostructures 120N, 120P with a protective layer 186, e.g.,
a soft mask material like silicon oxide or an organic planarization
layer (OPL), and etching back protective layer 186 such that an
upper surface 190 thereof is between top of upper end 184 of
isolation pillar 160 and upper surface 166 of nanostructures 120N,
120P. As shown in FIGS. 13B and 14B, in second gate region 82,
isolation pillar 160 has upper end 184 thereof sufficiently above
upper surfaces 166 of active nanostructures 120N, 120P to allow the
removal of first metal 180 and high-K layer 182 from part of
isolation pillar 160. The part of isolation pillar 160 from which
removal occurs may include any section that segregates or creates a
gap in first metal 180 and segregates or creates a gap in high-K
layer 182, i.e., it can be on an upper surface of upper end 184 of
isolation pillar 160, on part of one or more sidewalls 188L, 188R
(shown as both in FIG. 14B) of the T-shape top of upper portion
164, and/or perhaps on part of a sidewall 188L, 188R on lower
portion 162 (if the latter is exposed by protective layer 186).
This removal does not extend to active nanostructures 120N, 120P.
Here, protective layer 186 covers active nanostructures 120N, 120P
such that isolation pillar 160, where it is covered by high-K layer
182 and first metal 180, extends above upper surface 190 of
protective layer 186. Similarly, as shown in FIGS. 13A and 14A, in
first gate region 80, isolation pillar 160 also has upper end 184
thereof sufficiently above upper surfaces 166 of active
nanostructures 120N, 120P to allow the removal of first metal 180
and high-K layer 182 from parts thereof such as sidewalls 188L,
188R in upper portion 164 thereof and perhaps sidewalls 188L, 188R
of lower portion 162 (if exposed by protective layer 186), without
removal from active nanostructures 120N, 120P.
[0064] As shown in FIGS. 14A-B, an etching may then be performed to
remove at least first metal 180 from a part of isolation pillar
160, and from a top portion of the gate cavity, as recognized by
one skilled in the art. Optionally, the etching may also remove
high-K layer 182. This process is sometimes referred to as
chamfering. The etching may include any appropriate etching process
such as a RIE for high-K layer 182 (optionally) and first metal
180. As shown in FIGS. 14A-B, first metal 180 (and optionally
high-K layer 182) includes a discontinuity separating first metal
180 over first active nanostructure 120P from first metal 180 (and
optionally high-K layer 182) over second active nanostructure 120N.
However, high-K layer 182 and first metal 180 may remain on
opposing sidewalls 188L, 188R of isolation pillar 160, i.e., in
lower portions 162 in each of first and second gate regions 80
(FIG. 14A), 82 (FIG. 14B), respectively. That is, in each gate
region 80, 82, first metal 180 and high-K layer 182 may optionally
be removed from some part of sidewalls 188L, 188R of lower portion
162 of isolation pillar 160, if exposed. Once completed, protective
layer 186 may be removed, e.g., by an ashing process, as shown in
FIGS. 15A-B.
[0065] FIGS. 16A-B and 17A-B shows cross-sectional views of
removing first metal 180 surrounding second active nanostructure
120N. Here, as shown in FIGS. 16A-B, a mask 200 may be positioned
to cover first active nanostructure 120P and can land on or even
cover isolation pillar 160. In contrast to conventional processes,
an edge 202 of mask 200 can land in a less precise manner so long
as first active nanostructure 120P is covered because isolation
pillar 160 (in first gate region 80) or discontinuity in first
metal 180 on upper end 184 of isolation pillar 160 (in second gate
region 82) prevent (wet) etching from reaching and removing first
metal 180 on first active nanostructure 120P. In particular, in
second gate region 82 (FIG. 17B) first metal 180 on at least
sidewall 188L (left side in example shown) of isolation pillar 160
provides a controlled, directed and limited path through which wet
etching may attempt to reach first active nanostructure 120P along
sidewall 188L of lower portion 162. However, because first metal
180 is removed from at least sidewall 188L or 188R, i.e., below
and/or over upper end 184, the wet etching cannot reach first metal
180 on first active nanostructure 120P. Even if the wet etching
extends to an upper extent of sidewall 188L of isolation pillar 160
in lower portion 162, mask 200 interaction with the discontinuity
in first metal 180 on sidewall 188L of isolation pillar 160
prevents the wet etching from reaching first metal 180 over first
active nanostructure 120P. Consequently, as shown in FIGS. 17A-B,
the wet etching can be aggressive and thorough. Further, the time
required to remove first metal 180 from differently sized second
active nanostructures 120N on an IC is irrelevant because,
regardless of the length of time to remove them from the widest of
second active nanostructures 120N, all of the other first active
nanostructures 120P are protected. The wet etching may include any
appropriate etching process(es) to remove first metal 180, e.g.,
RIEs. As shown in FIGS. 17A-B, where nanosheets 126 are used,
high-K layer 182 (optional) and first metal 180 is removed by
etching from between nanosheets 126 of second active nanostructure
120N.
[0066] FIGS. 18A-B and 19A-B show cross-sectional views of
depositing a second metal 210 surrounding second active
nanostructure 120N. As also shown in FIGS. 19A-B, second metal 210
may be deposited over each of first nanostructure 120P and second
active nanostructure 120P (and isolation pillar 160). FIGS. 18A-B
show removal of mask 200 (FIGS. 16A-17B), and FIGS. 19A-B shows
depositing of second metal 210, e.g., by CVD or other appropriate
deposition technique. Second metal 210 includes the other of the
PFET work function metal and the NFET work function metal. In this
example, second metal 210 may include an NFET work function metal
such as but not limited to: aluminum (Al), zinc (Zn), indium (In),
copper (Cu), indium copper (InCu), tin (Sn), tantalum (Ta),
tantalum nitride (TaN), tantalum carbide (TaC), titanium (Ti),
titanium nitride (TiN), titanium carbide (TiC), TiAlC, TiAl,
tungsten (W), tungsten nitride (WN), tungsten carbide (WC),
polycrystalline silicon (poly-Si), and/or combinations thereof.
Where nanosheets 126 are employed, as shown in FIGS. 19A-B, second
metal 210 may be deposited such that it surrounds each of
nanosheets 126 of second active nanostructure 120N and, if desired,
first active nanostructure 120N. With regard to first active
nanostructure 120P, second metal 210 may fill any voids between
first metal 180 on nanosheets 126 and first metal 180 on adjacent
sidewall 188R of isolation pillar(s) 160 in lower portion 162, and
it may also cover first metal 180. First active nanostructure 120P
now forms part, i.e., channel with a gate 246 (FIGS. 19A-B), of a
PFET 222, and second active nanostructure 120N now forms part,
i.e., channel within a gate 242 (FIGS. 19A-B), of an NFET 224. As
shown in FIG. 19B, in second gate region 82, the depositing of
second metal 210 includes depositing the second metal such that the
second metal extends over upper end 184 of upper portion 164 of
isolation pillar 160. (This is not the case in first gate region 80
(e.g., FIG. 19A) in which intermediate planarization steps remove
second metal 210 from upper end 184 of upper portion 164.) That is,
in second gate region 82, second metal 210 extends over isolation
pillar 160 and active nanostructures 120N, 120P to electrically
connect gate 246 for PFET 222 and gate 242 for NFET 224 together.
That is, NFET 224 and PFET 222 share an electrically connected gate
242, 246. Hence, an additional metal deposition and patterning may
not be mandatory to reconnect N and P gates together, which is
advantageous because, due to the small spacing, gate metal such as
tungsten (W) or cobalt (Co), may not be able to fit in the space.
This arrangement also advantageously may reduce gate end
capacitance.
[0067] FIG. 20B shows an optional embodiment in which a gate metal
layer 230 is formed over second metal 210, i.e., to further
electrically connect NFET 224 and PFET 222 in second gate region
82. FIG. 20A shows an optional embodiment in which gate metal layer
230 is formed over second metal 210 to provide further conductivity
and contact landing area to each respective electrically isolated
gate of NFET 224 and PFET 222, i.e., in first gate region 80. Gate
metal layer 230 may include any now known or later developed gate
metal such as but not limited to tungsten (W) or cobalt (Co). Gate
metal layer 230 may be formed using any appropriate deposition
process for the metal, perhaps followed by a planarization step. As
noted, in second gate region 82 (FIG. 20B), even where gate metal
layer 230 cannot or is not used, NFET 224 and PFET 222 are
electrically connected by second metal 210.
[0068] Referring to FIGS. 19A-B and 20A-B, a field effect
transistor (FET) structure 240 according to embodiments of the
disclosure may include: a first type FET, e.g., NFET 224, having
active nanostructure 120N on substrate 112, a gate 242 having
high-K layer 182 and second metal (WFM) 210 surrounding active
nanostructure 120N and a source/drain (S/D) region 154N (FIG. 11)
at each of opposing ends of active nanostructure 120N. FET
structure 240 may also include a second type FET, e.g., PFET 222,
having active nanostructure 120P on substrate 112 adjacent to
active nanostructure 120N and separated by space 244. PFET 222 may
include a gate 246 having high-K layer 182, first metal 180 and
second metal 210 surrounding active nanostructure 120P, and a
source/drain (S/D) region 154P (FIG. 11) at each of opposing ends
of active nanostructure 120P. Second metal (WFM) 210 is different
than first metal 180 to provide the desired WFM for each FET. In
FET structure 240, isolation pillar 160 is positioned between
active nanostructures 120N, 120P in space 244.
[0069] Isolation pillar 160 includes lower portion 162 positioned
between first and second active nanostructures 120P, 120N in space
244 and a unitary, wider, upper portion 164 extending above upper
surface 166 of first and second active nanostructures 120P, 120N.
As shown in FIGS. 19A-B, in one embodiment, one of WFMs 180, 210,
i.e., the WFM for the first formed FET, extends along a sidewall
(e.g., first metal (WFM) 180 on sidewall 188R as illustrated) of
isolation pillar 160 but not over upper end 184 thereof. This
situation exists in both first and second gate regions 80, 82. In
the example described, first metal 180 (and high-K layer 182) for
PFET 222 extends only along a sidewall 188R of isolation pillar 160
and not over upper end 184 (of upper portion 164) thereof, i.e.,
because PFET 222 is formed first. It is appreciated that if NFET
224 was formed first, WFM 210 would extend along sidewall 188L and
not over upper end 184 (of upper portion 164) of isolation pillar
160.
[0070] FET structure 240 includes second gate region 82 (FIGS. 19B,
20B) in which gates 242, 246 of FETs 222, 224 are electrically
connected by at least the other one of the first and second WFMs,
e.g., at least second metal (WFM) 210 (FIG. 19B) and optionally
metal gate layer 230 (FIG. 20A). More particularly, in second gate
region 82 in which gates are to be shared, the other one of WFMs
(second WFM 210), extends over isolation pillar 160 including upper
end 184 thereof to electrically connect gates 242, 246 of NFET 224
and PFET 222 together. Here in second gate region 82, the unitary,
wider, upper portion 164 of isolation pillar 160 extends above
upper surface 166 of first and second active nanostructures 120P,
120N to a height H2 (FIGS. 19B, 20B) that is less than a height H1
thereof in first gate region 80 (FIGS. 19A, 20A). As noted,
isolation pillar 160 in second gate region 82 has a T-shape
cross-section, i.e., it is generally T-shape with some exceptions
for rounded artifacts in some locations like a top of the `T.`
[0071] In addition, as shown in FIGS. 19A and 20A, FET structure
240 includes first gate region 80 in which gates 242, 246 of FETs
222, 224 are electrically isolated by isolation pillar 160, i.e.,
they are not electrically connected. More specifically, in first
gate region 80, isolation pillar 160 creates a gate cut isolation
212 between NFET 224 and PFET 222 without the need to enlarge the
spacing therebetween, eliminating the complexity and performance
impact due to the tapered NFET and PFET (FIG. 1). That is,
isolation pillar 160 creates gate cut isolation 212 by way of its
height H1. Because isolation pillar 160/gate cut isolation 212 is
built in-place, a larger gate cut landing area 30 (FIG. 1) is not
required, and active nanostructures 120N, 120P do not need to be
adjusted to form gate cut landing area 30 (FIG. 1)--N-P space 32
(FIG. 1) can be the same narrower width along the entire length of
active nanostructures 120P, 120N. Further, upper portion 164 being
wider than lower portion 162 of isolation pillar 160, allows use of
conventional or even relaxed gate cut isolation masks, etc., to be
employed. Upper portion 164 of isolation pillar 160 can also extend
over NFET 224 and/or PFET 222 because upper portion 164 only needs
to extend to lower portion 162 of isolation pillar 160, not between
the FETs. Hence, the precision at which upper region 164 must be
formed is relaxed because lower portion 162 is present, i.e.,
again, gate cut landing space 30 (FIG. 1) does not have to be
enlarged to allow lower portion 162 of isolation pillar 160 to land
between NFET 224 and PFET 222. It is noted that the teachings of
the disclosure relative to isolation pillar 160 are applicable to
form gate cut isolation 212 between any two FETs, not just an NFET
and a PFET.
[0072] As shown in FIGS. 20A-B, FET structures 240 may also
optionally include gate metal layer 230, e.g., W or Co, over WFM(s)
180, 210. As shown in FIG. 20A, gate metal layer 230 extends over
an uppermost WFM, e.g., WFM 210, over first active nanostructure
122P and second active nanostructure 120N in first gate region 80,
but isolation pillar 160 keeps gates 242, 246 electrically
isolated. In first gate region 80 (FIG. 20A), gate metal layer 230
provides, among other things, a larger contact landing area for
gates 242, 246. In contrast, as shown in FIG. 20B, in second gate
region 82, gate metal layer 230 extends over WFMs 180, 210 to
further electrically connect gates 242, 246 of NFET 224 and PFET
222 together.
[0073] As noted, in one embodiment, each of active nanostructures
120N, 120P may include a nanosheet stack 122 such that each WFM
180, 210 surrounds respective nanosheets 126. As will be
appreciated by those with skill in the art, the teachings of the
disclosure are equally applicable to other forms of active
nanostructures, e.g., fins, nanowires, etc. Further, while the
teachings of the disclosure are described relative to an isolation
pillar 160 between an NFET and PFET, i.e., for N-P space, isolation
pillar 160 may also be formed in spaces between same types of FETS,
i.e., in N-N space and P-P space.
[0074] Embodiments of the disclosure enable robust first gate,
e.g., PFET gate 246, formation for gate-all-around active
nanostructures at scaled N-to-P spaces, e.g., at 7 nm technology
node, required for the later formed second gate, e.g., NFET gate
242. The teachings of the disclosure also improves integration
robustness by relaxing requirements on selected lithographic steps
(e.g., from extreme ultraviolet (EUV) techniques to non-EUV
techniques) such as: edge placement of removal mask 200 (FIGS.
17A-B) for first metal 180. With regard to gate cut isolation 212
formation, the disclosure enables gate cut isolation formation
(with gates or using replacement metal gate (RMG) processing) with
the above-noted relaxed lithographic requirements, and eliminates
the need to form tapered devices, e.g., with jogs or corners in the
devices. Embodiments of the method also provide for self-aligned
structures, reducing the impact of edge placement errors. Further,
the wider topped, T-shaped pillar everywhere between N and P gates,
even where they connect together, provides lower N to P gate
parasitic capacitance. Advantageously, embodiments of the
disclosure also do not require additional materials.
[0075] The method as described above is used in the fabrication of
integrated circuit chips. The resulting integrated circuit chips
can be distributed by the fabricator in raw wafer form (that is, as
a single wafer that has multiple unpackaged chips), as a bare die,
or in a packaged form. In the latter case the chip is mounted in a
single chip package (such as a plastic carrier, with leads that are
affixed to a motherboard or other higher level carrier) or in a
multichip package (such as a ceramic carrier that has either or
both surface interconnections or buried interconnections). In any
case the chip is then integrated with other chips, discrete circuit
elements, and/or other signal processing devices as part of either
(a) an intermediate product, such as a motherboard, or (b) an end
product. The end product can be any product that includes
integrated circuit chips, ranging from toys and other low-end
applications to advanced computer products having a display, a
keyboard or other input device, and a central processor.
[0076] The terminology used herein is for the purpose of describing
particular embodiments only and is not intended to be limiting of
the disclosure. As used herein, the singular forms "a", "an" and
"the" are intended to include the plural forms as well, unless the
context clearly indicates otherwise. It will be further understood
that the terms "comprises" and/or "comprising," when used in this
specification, specify the presence of stated features, integers,
steps, operations, elements, and/or components, but do not preclude
the presence or addition of one or more other features, integers,
steps, operations, elements, components, and/or groups thereof.
"Optional" or "optionally" means that the subsequently described
event or circumstance may or may not occur, and that the
description includes instances where the event occurs and instances
where it does not.
[0077] Approximating language, as used herein throughout the
specification and claims, may be applied to modify any quantitative
representation that could permissibly vary without resulting in a
change in the basic function to which it is related. Accordingly, a
value modified by a term or terms, such as "about", "approximately"
and "substantially", are not to be limited to the precise value
specified. In at least some instances, the approximating language
may correspond to the precision of an instrument for measuring the
value. Here and throughout the specification and claims, range
limitations may be combined and/or interchanged, such ranges are
identified and include all the sub-ranges contained therein unless
context or language indicates otherwise. "Approximately" as applied
to a particular value of a range applies to both values, and unless
otherwise dependent on the precision of the instrument measuring
the value, may indicate +/-10% of the stated value(s).
[0078] The corresponding structures, materials, acts, and
equivalents of all means or step plus function elements in the
claims below are intended to include any structure, material, or
act for performing the function in combination with other claimed
elements as specifically claimed. The description of the present
disclosure has been presented for purposes of illustration and
description, but is not intended to be exhaustive or limited to the
disclosure in the form disclosed. Many modifications and variations
will be apparent to those of ordinary skill in the art without
departing from the scope and spirit of the disclosure. The
embodiment was chosen and described in order to best explain the
principles of the disclosure and the practical application, and to
enable others of ordinary skill in the art to understand the
disclosure for various embodiments with various modifications as
are suited to the particular use contemplated.
* * * * *