Ceiling heater for substrate processing apparatus
Sugiura , et al. August 2, 2
U.S. patent number D959,393 [Application Number D/773,979] was granted by the patent office on 2022-08-02 for ceiling heater for substrate processing apparatus. This patent grant is currently assigned to KOKUSAI ELECTRIC CORPORATION. The grantee listed for this patent is KOKUSAI ELECTRIC CORPORATION. Invention is credited to Tetsuya Kosugi, Takuto Shoji, Shinobu Sugiura, Yuya Yoshimura.
| United States Patent | D959,393 |
| Sugiura , et al. | August 2, 2022 |
Ceiling heater for substrate processing apparatus
Claims
CLAIM The ornamental design for a ceiling heater for substrate processing apparatus, as shown and described.
| Inventors: | Sugiura; Shinobu (Toyama, JP), Kosugi; Tetsuya (Toyama, JP), Yoshimura; Yuya (Toyama, JP), Shoji; Takuto (Toyama, JP) | ||||||||||
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| Applicant: |
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| Assignee: | KOKUSAI ELECTRIC CORPORATION
(Tokyo, JP) |
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| Appl. No.: | D/773,979 | ||||||||||
| Filed: | March 12, 2021 |
Foreign Application Priority Data
| Sep 24, 2020 [JP] | 2020020257 D | |||
| Current U.S. Class: | D13/182 |
| Current International Class: | 1303 |
| Field of Search: | ;D13/184,182 ;D15/144,144.1,144.2,146,140 ;D23/314,322,333,415,417,499 |
References Cited [Referenced By]
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Assistant Examiner: Blackwell, II; Harold E
Attorney, Agent or Firm: Fitch, Even, Tabin and Flannery
Description
FIG. 1 is a front, top and right side perspective view of a ceiling heater for substrate processing apparatus showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a left side elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof; and,
FIG. 7 is a rear elevational view.
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