Electrode plate for a plasma processing apparatus

Description

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/635,289, filed herewith and entitled "Gas Ring for a Plasma Processing Apparatus";

Application Ser. No. 29/635,292, filed herewith and entitled "Electrode Cover for a Plasma Processing Apparatus"; and

Application Ser. No. 29/635,296, filed herewith and entitled "Electrode Plate Peripheral Ring for a Plasma Processing Apparatus".

FIG. 1 is a front, bottom and right side perspective view of an electrode plate for a plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2;

FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8; and,

FIG. 10 is an enlarged view of the portion shown in box 10 in FIG. 2.

The broken lines show the boundaries of the enlarged portions illustrated in FIG. 9 and FIG. 10 and form no part of the claimed design.

Claims

CLAIM The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.

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Inventors:	Isozaki; Masakazu (Tokyo, JP), Mori; Masahito (Tokyo, JP), Yokogawa; Kenetsu (Tokyo, JP), Arase; Takao (Tokyo, JP), Hashimoto; Takahisa (Tokyo, JP)
Applicant:	Name City State Country Type Hitachi High-Technologies Corporation Minato-ku, Tokyo N/A JP
Assignee:	Hitachi High-Technologies Corporation (Tokyo, JP)
Appl. No.:	D/635,287
Filed:	January 30, 2018

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Foreign Application Priority Data

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Aug 31, 2017 [JP]			2017-018889

Current U.S. Class:	D24/224
Current International Class:	2402
Field of Search:	;D24/107,110.6,113,129,144,206,224,193,197,168,170,187,200 ;D23/200,213-215,222,223,229,283 ;D15/140 ;D13/182

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References Cited [Referenced By]

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U.S. Patent Documents

D411516	June 1999	Imafuku
D548705	August 2007	Hayashi
D553104	October 2007	Oohashi
D587339	February 2009	Schoenherr
D638550	May 2011	Bedingham
8206506	June 2012	Kadkhodayan
D667561	September 2012	Bedingham
D672050	December 2012	Lee
D787458	May 2017	Kim
D789888	June 2017	Jang
D790039	June 2017	Hawrylchak
D790489	June 2017	Toyomura
D793526	August 2017	Behdjat
D793572	August 2017	Kozuka
D794753	August 2017	Miller
2004/0179323	September 2004	Litman
2004/0218339	November 2004	Nakamura

Foreign Patent Documents

	D1117165		Aug 2001		JP
	D1142402		Jun 2002		JP
	D1438663		Apr 2012		JP
	D1545406		Mar 2016		JP

Other References

Silicon Part. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: http://www.daewonspic.com/english/si_en.jsp. cited by examiner . Bialetti Moka Express Espresso Gasket & Filter Replacements. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: https://www.surlatable.com/product/PRO-449611/Bialetti+Moka+Express+Espre- sso+Gasket+and+Filter+Replacements. cited by examiner . Okuda et al., Design U.S. Appl. No. 29/635,289, filed Jan. 30, 2018. cited by applicant . Isozaki et al., Design U.S. Appl. No. 29/635,292, filed Jan. 30, 2018. cited by applicant . Isozaki et al., Design U.S. Appl. No. 29/635,296, filed Jan. 30, 2018. cited by applicant.

Primary Examiner: Hattan; Susan Bennett
Assistant Examiner: Agilee; Omeed
Attorney, Agent or Firm: Crowell & Moring LLP

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