Showerhead for a semiconductor processing chamber

Description

FIG. 1 is an isometric top view of a showerhead for a semiconductor processing chamber showing my new design.

FIG. 2 is an isometric bottom view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a side elevational view thereof, the other side elevational views being identical.

FIG. 6 is a cross-sectional view thereof taken along lines 6-6 of FIG. 3.

FIG. 7 is an enlarged view of a portion of FIG. 6; and,

FIG. 8 is an enlarged view of a portion of FIG. 1.

Claims

CLAIM The ornamental design for a showerhead for a semiconductor processing chamber, as shown and described.

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Inventors:	Miller; Aaron (Sunnyvale, CA)
Applicant:	Name City State Country Type Applied Materials, Inc. Santa Clara CA US
Assignee:	APPLIED MATERIALS, INC. (Santa Clara, CA)
Appl. No.:	D/560,672
Filed:	April 8, 2016

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Current U.S. Class:	D23/213
Current International Class:	2301
Field of Search:	;D23/213,223,226,229,230

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References Cited [Referenced By]

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U.S. Patent Documents

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D736348	August 2015	Tan
D751176	March 2016	Schoenherr
D752708	March 2016	Chung
D757893	May 2016	Walker
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2003/0140851	July 2003	Janakiraman et al.
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2009/0179085	July 2009	Carducci et al.

Primary Examiner: Webster; Robin V
Attorney, Agent or Firm: Patterson + Sheridan, LLP