Yokogawa; Kenetsu
Patent Applications and Registrations
Patent applications and USPTO patent grants for Yokogawa; Kenetsu.The latest application filed is for "plasma processing apparatus".
Company Profile
23.54.93
- Yokogawa; Kenetsu - Tokyo JP
- Yokogawa; Kenetsu - Tsurugashima JP
- YOKOGAWA; Kenetsu - SAITAMA-KEN JP
- YOKOGAWA; Kenetsu - Tsurugashima-shi JP
- Yokogawa; Kenetsu - Turugama JP
- Yokogawa; Kenetsu - Hachioji JP
Patent Activity
| Patent | Date |
|---|---|
| Plasma processing apparatus Grant 11,424,106 - Kondo , et al. August 23, 2 | 2022-08-23 |
| Plasma processing apparatus Grant 11,398,371 - Kofuji , et al. July 26, 2 | 2022-07-26 |
| Plasma processing apparatus and plasma processing method Grant 11,355,322 - Iwase , et al. June 7, 2 | 2022-06-07 |
| Plasma Processing Apparatus App 20220157576 - Iwase; Taku ; et al. | 2022-05-19 |
| Plasma processing apparatus Grant 11,094,509 - Satake , et al. August 17, 2 | 2021-08-17 |
| Plasma Processing Apparatus App 20210249233 - Kajifusa; Hiroyuki ; et al. | 2021-08-12 |
| Plasma Processing Device App 20210159055 - ARAMAKI; Tooru ; et al. | 2021-05-27 |
| Plasma Processing Apparatus App 20210111002 - KONDO; Yuki ; et al. | 2021-04-15 |
| Plasma processing device Grant 10,930,476 - Aramaki , et al. February 23, 2 | 2021-02-23 |
| Plasma Processing Apparatus And Plasma Processing Method App 20200411291 - ARAMAKI; Tooru ; et al. | 2020-12-31 |
| Plasma processing apparatus Grant 10,825,657 - Yokogawa , et al. November 3, 2 | 2020-11-03 |
| Wafer processing method and wafer processing apparatus Grant 10,825,664 - Watanabe , et al. November 3, 2 | 2020-11-03 |
| Plasma processing apparatus and plasma processing method Grant 10,811,231 - Aramaki , et al. October 20, 2 | 2020-10-20 |
| Plasma Processing Method App 20200328099 - KOBAYASHI; Hiroyuki ; et al. | 2020-10-15 |
| Plasma processing apparatus and plasma processing method Grant 10,804,080 - Aramaki , et al. October 13, 2 | 2020-10-13 |
| Plasma processing apparatus Grant 10,741,368 - Tandou , et al. A | 2020-08-11 |
| Ring for a plasma processing apparatus Grant D891,636 - Isozaki , et al. | 2020-07-28 |
| Plasma Processing Apparatus App 20200234924 - YOKOGAWA; Kenetsu ; et al. | 2020-07-23 |
| Plasma Processing Device App 20200083026 - ICHINO; Takamasa ; et al. | 2020-03-12 |
| Electrode plate peripheral ring for a plasma processing apparatus Grant D871,609 - Isozaki , et al. Dec | 2019-12-31 |
| Electrode cover for a plasma processing apparatus Grant D870,314 - Isozaki , et al. Dec | 2019-12-17 |
| Electrode plate for a plasma processing apparatus Grant D868,993 - Isozaki , et al. De | 2019-12-03 |
| Plasma Processing Apparatus App 20190295823 - KOFUJI; Naoyuki ; et al. | 2019-09-26 |
| Plasma Processing Apparatus App 20190287770 - IWASE; Taku ; et al. | 2019-09-19 |
| Plasma Processing Apparatus App 20190244795 - Tandou; Takumi ; et al. | 2019-08-08 |
| Plasma Processing Apparatus App 20190214235 - YOKOGAWA; Kenetsu ; et al. | 2019-07-11 |
| Wafer Processing Method And Wafer Processing Apparatus App 20190198299 - WATANABE; Tomoyuki ; et al. | 2019-06-27 |
| Plasma Processing Apparatus And Plasma Processing Method App 20190198297 - ARAMAKI; Tooru ; et al. | 2019-06-27 |
| Plasma Processing Apparatus App 20190189396 - IWASE; Taku ; et al. | 2019-06-20 |
| Plasma Processing Apparatus And Plasma Processing Method App 20190122864 - ARAMAKI; Tooru ; et al. | 2019-04-25 |
| Manufacturing method of magnetoresistive element and vacuum processing apparatus Grant 10,243,140 - Satake , et al. | 2019-03-26 |
| Plasma processing apparatus and plasma processing method Grant 10,217,611 - Aramaki , et al. Feb | 2019-02-26 |
| Operation method of plasma processing apparatus Grant 10,141,207 - Kouzuma , et al. Nov | 2018-11-27 |
| Plasma processing apparatus Grant 10,037,909 - Aramaki , et al. July 31, 2 | 2018-07-31 |
| Plasma Processing Apparatus App 20180122665 - KOBAYASHI; Hiroyuki ; et al. | 2018-05-03 |
| Operation Method Of Plasma Processing Apparatus App 20180090345 - KOUZUMA; Yutaka ; et al. | 2018-03-29 |
| Plasma Processing Apparatus App 20180068835 - SATAKE; Makoto ; et al. | 2018-03-08 |
| Plasma Processing Apparatus And Plasma Processing Method App 20180040459 - IWASE; Taku ; et al. | 2018-02-08 |
| Plasma processing apparatus and plasma processing method Grant 9,887,070 - Arase , et al. February 6, 2 | 2018-02-06 |
| Plasma Processing Apparatus And Plasma Processing Method App 20170338086 - Arase; Takao ; et al. | 2017-11-23 |
| Plasma processing apparatus and plasma processing method Grant 9,779,919 - Arase , et al. October 3, 2 | 2017-10-03 |
| Plasma Processing Apparatus And Plasma Processing Method App 20170278730 - TANDOU; Takumi ; et al. | 2017-09-28 |
| Manufacturing Method Of Magnetoresistive Element And Vacuum Processing Apparatus App 20170194560 - SATAKE; Makoto ; et al. | 2017-07-06 |
| Plasma Processing Apparatus App 20170025254 - TANDOU; Takumi ; et al. | 2017-01-26 |
| Plasma Processing Apparatus App 20170025255 - TANDOU; Takumi ; et al. | 2017-01-26 |
| Plasma Processing Device App 20170011890 - ARAMAKI; Tooru ; et al. | 2017-01-12 |
| Plasma Processing Apparatus And Plasma Processing Method App 20160351404 - ARAMAKI; Tooru ; et al. | 2016-12-01 |
| Plasma Processing Apparatus And Plasma Processing Method App 20160203958 - Arase; Takao ; et al. | 2016-07-14 |
| Plasma processing apparatus Grant 9,368,377 - Tandou , et al. June 14, 2 | 2016-06-14 |
| Plasma Processing Apparatus App 20160079107 - ARAMAKI; Tooru ; et al. | 2016-03-17 |
| Plasma Processing Method App 20160079073 - MATSUI; Miyako ; et al. | 2016-03-17 |
| Vacuum processing apparatus Grant 9,150,964 - Kobayashi , et al. October 6, 2 | 2015-10-06 |
| Plasma Processing Apparatus App 20150243486 - Yokogawa; Kenetsu ; et al. | 2015-08-27 |
| Heat Treatment Apparatus App 20150156856 - MIYAKE; Masatoshi ; et al. | 2015-06-04 |
| Plasma processing apparatus Grant 9,038,567 - Kobayashi , et al. May 26, 2 | 2015-05-26 |
| Plasma processing apparatus and plasma processing method Grant 8,955,579 - Tandou , et al. February 17, 2 | 2015-02-17 |
| Plasma Processing Apparatus App 20140231015 - KOBAYASHI; Hiroyuki ; et al. | 2014-08-21 |
| Plasma processing apparatus Grant 8,733,282 - Kobayashi , et al. May 27, 2 | 2014-05-27 |
| Plasma Etching Method And Plasma Etching Apparatus App 20130200042 - SATAKE; Makoto ; et al. | 2013-08-08 |
| Plasma Processing Apparatus App 20130199728 - KOBAYASHI; Hiroyuki ; et al. | 2013-08-08 |
| Plasma processing apparatus Grant 8,496,781 - Yokogawa , et al. July 30, 2 | 2013-07-30 |
| Heat Treatment Apparatus App 20130112669 - UEMURA; Takashi ; et al. | 2013-05-09 |
| Plasma etching method and plasma etching apparatus Grant 8,425,786 - Satake , et al. April 23, 2 | 2013-04-23 |
| Plasma processing apparatus and plasma processing method Grant 8,426,764 - Tandou , et al. April 23, 2 | 2013-04-23 |
| Plasma processing apparatus Grant 8,397,668 - Kobayashi , et al. March 19, 2 | 2013-03-19 |
| Plasma processing apparatus Grant 8,197,634 - Yokogawa , et al. June 12, 2 | 2012-06-12 |
| Plasma processing method and plasma processing device Grant 8,163,652 - Maeda , et al. April 24, 2 | 2012-04-24 |
| Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination App 20120003837 - Kobayashi; Hiroyuki ; et al. | 2012-01-05 |
| Plasma processing apparatus Grant 8,083,888 - Usui , et al. December 27, 2 | 2011-12-27 |
| Plasma processing apparatus and method for venting the same to atmosphere Grant 8,029,874 - Kobayashi , et al. October 4, 2 | 2011-10-04 |
| Plasma Processing Apparatus And Plasma Processing Method App 20110207243 - TANDOU; Takumi ; et al. | 2011-08-25 |
| Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination App 20110100555 - Kobayashi; Hiroyuki ; et al. | 2011-05-05 |
| Plasma Etching Method And Plasma Etching Apparatus App 20110100954 - SATAKE; Makoto ; et al. | 2011-05-05 |
| Plasma Processing Apparatus Using Transmission Electrode App 20110030899 - SUZUKI; Keizo ; et al. | 2011-02-10 |
| Plasma Processing Apparatus And Plasma Processing Method App 20100326957 - Maeda; Kenji ; et al. | 2010-12-30 |
| Plasma Processing Apparatus App 20100319854 - YOKOGAWA; Kenetsu ; et al. | 2010-12-23 |
| Plasma processing method Grant 7,842,619 - Miyake , et al. November 30, 2 | 2010-11-30 |
| Plasma Processing Method App 20100203736 - ICHINO; Takamasa ; et al. | 2010-08-12 |
| Plasma Processing Apparatus App 20100193130 - KAWAKAMI; Masatoshi ; et al. | 2010-08-05 |
| Plasma processing apparatus Grant 7,767,054 - Kobayashi , et al. August 3, 2 | 2010-08-03 |
| Plasma Processing Apparatus App 20100163187 - Yokogawa; Kenetsu ; et al. | 2010-07-01 |
| Plasma Processing Apparatus App 20100126666 - TANDOU; Takumi ; et al. | 2010-05-27 |
| Plasma processing apparatus Grant 7,662,232 - Kobayashi , et al. February 16, 2 | 2010-02-16 |
| Plasma processing apparatus capable of controlling plasma emission intensity Grant 7,658,815 - Maeda , et al. February 9, 2 | 2010-02-09 |
| Plasma Processing Method App 20100029024 - Miyake; Masatoshi ; et al. | 2010-02-04 |
| Vacuum Processing Apparatus App 20090301392 - Kobayashi; Hiroyuki ; et al. | 2009-12-10 |
| Plasma Processing Apparatus App 20090301655 - Yokogawa; Kenetsu ; et al. | 2009-12-10 |
| Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination App 20090294060 - Kobayashi; Hiroyuki ; et al. | 2009-12-03 |
| Plasma Processing Apparatus And Plasma Processing Method App 20090277883 - Tandou; Takumi ; et al. | 2009-11-12 |
| Vacuum Processing Apparatus App 20090250000 - Kobayashi; Hiroyuki ; et al. | 2009-10-08 |
| Plasma Processing Apparatus App 20090194235 - Kobayashi; Hiroyuki ; et al. | 2009-08-06 |
| Plasma Processing Apparatus and Method for Venting the Same to Atmosphere App 20090183683 - Kobayashi; Hiroyuki ; et al. | 2009-07-23 |
| Plasma Processing Apparatus App 20090159211 - Usui; Tatehito ; et al. | 2009-06-25 |
| Plasma Processing Apparatus And Method Capable of Adjusting Temperature Within Sample Table App 20090078563 - Aramaki; Tooru ; et al. | 2009-03-26 |
| Plasma Processing Apparatus And Method Capable Of Adjusting Temperature Within Sample Table App 20090065145 - Aramaki; Tooru ; et al. | 2009-03-12 |
| Processing Method And Plasma Processing Device App 20090004871 - MAEDA; Kenji ; et al. | 2009-01-01 |
| Substrate Processing Apparatus App 20080308134 - Maeda; Kenji ; et al. | 2008-12-18 |
| Plasma Processing Apparatus App 20080289765 - YOKOGAWA; KENETSU ; et al. | 2008-11-27 |
| Plasma Processing Apparatus App 20080289767 - TANDOU; TAKUMI ; et al. | 2008-11-27 |
| Wafer Edge Cleaner App 20080277061 - Kobayashi; Hiroyuki ; et al. | 2008-11-13 |
| Plasma processing method and plasma processing device Grant 7,435,687 - Maeda , et al. October 14, 2 | 2008-10-14 |
| Plasma Processing Apparatus App 20080236748 - KOBAYASHI; HIROYUKI ; et al. | 2008-10-02 |
| Plasma Processing Apparatus App 20080223522 - Kobayashi; Hiroyuki ; et al. | 2008-09-18 |
| Plasma Processing Apparatus App 20080216959 - KOBAYASHI; HIROYUKI ; et al. | 2008-09-11 |
| Plasma Processing Apparatus Capable Of Controlling Plasma Emission Intensity App 20080210376 - Maeda; Kenji ; et al. | 2008-09-04 |
| Plasma Processing Apparatus And Plasma Processing Method App 20080178608 - Tandou; Takumi ; et al. | 2008-07-31 |
| Method for fabrication semiconductor device Grant 7,372,582 - Negishi , et al. May 13, 2 | 2008-05-13 |
| Dry etching method and apparatus Grant 7,371,690 - Negishi , et al. May 13, 2 | 2008-05-13 |
| Plasma processing apparatus App 20080023147 - Yokogawa; Kenetsu ; et al. | 2008-01-31 |
| Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle Contamination App 20080017318 - Kobayashi; Hiroyuki ; et al. | 2008-01-24 |
| Plasma processing apparatus App 20070186972 - Kobayashi; Hiroyuki ; et al. | 2007-08-16 |
| Plasma processing apparatus App 20070131354 - Yokogawa; Kenetsu ; et al. | 2007-06-14 |
| Plasma processing method and plasma processing device App 20070056928 - Maeda; Kenji ; et al. | 2007-03-15 |
| Plasma processing apparatus App 20070023398 - Kobayashi; Hiroyuki ; et al. | 2007-02-01 |
| Plasma processing apparatus and method capable of adjusting temperature within sample table App 20060283549 - Aramaki; Tooru ; et al. | 2006-12-21 |
| Plasma processing apparatus App 20060254717 - Kobayashi; Hiroyuki ; et al. | 2006-11-16 |
| Plasma processing apparatus App 20060236932 - Yokogawa; Kenetsu ; et al. | 2006-10-26 |
| Semiconductor manufacturing apparatus capable of preventing adhesion of particles App 20060169207 - Kobayashi; Hiroyuki ; et al. | 2006-08-03 |
| Plasma processing apparatus capable of controlling plasma emission intensity App 20060169410 - Maeda; Kenji ; et al. | 2006-08-03 |
| Method for fabrication semiconductor device App 20060141795 - Negishi; Nobuyuki ; et al. | 2006-06-29 |
| Plasma processing apparatus App 20060016559 - Kobayashi; Hiroyuki ; et al. | 2006-01-26 |
| Plasma processing apparatus App 20060016560 - Yokogawa; Kenetsu ; et al. | 2006-01-26 |
| Manufacturing method for semiconductor devices Grant 6,977,229 - Yokogawa , et al. December 20, 2 | 2005-12-20 |
| Plasma processing method Grant 6,927,173 - Mori , et al. August 9, 2 | 2005-08-09 |
| Plasma processing apparatus App 20050051273 - Maeda, Kenji ; et al. | 2005-03-10 |
| Dry etching method and apparatus App 20050048787 - Negishi, Nobuyuki ; et al. | 2005-03-03 |
| Method for manufacturing semiconductor device Grant 6,713,401 - Yokogawa , et al. March 30, 2 | 2004-03-30 |
| Manufacturing method for semiconductor devices App 20040018727 - Yokogawa, Kenetsu ; et al. | 2004-01-29 |
| Apparatus for cleaning semiconductor wafers in a vacuum environment Grant 6,643,893 - Momonoi , et al. November 11, 2 | 2003-11-11 |
| Method for cleaning semiconductor wafers in a vacuum environment Grant 6,629,538 - Yokogawa , et al. October 7, 2 | 2003-10-07 |
| Plasma processing method App 20030098288 - Mori, Masahito ; et al. | 2003-05-29 |
| Plasma treatment apparatus and plasma treatment method Grant 6,475,918 - Izawa , et al. November 5, 2 | 2002-11-05 |
| Dry cleaning apparatus App 20020092121 - Momonoi, Yoshinori ; et al. | 2002-07-18 |
| Dry cleaning method App 20020092541 - Yokogawa, Kenetsu ; et al. | 2002-07-18 |
| Method for manufacturing semiconductor device App 20020094691 - Yokogawa, Kenetsu ; et al. | 2002-07-18 |
| Dry chemical-mechanical polishing method App 20020037684 - Yamamoto, Seiji ; et al. | 2002-03-28 |
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