U.S. patent number D420,022 [Application Number D/081,238] was granted by the patent office on 2000-02-01 for electrostatic chuck with improved spacing and charge migration reduction mask.
This patent grant is currently assigned to Applied Materials, Inc.. Invention is credited to Vincent E. Burkhart, Allen Flanigan, Steven Sansoni.
United States Patent |
D420,022 |
Burkhart , et al. |
February 1, 2000 |
Electrostatic chuck with improved spacing and charge migration
reduction mask
Claims
The ornamental design for an electrostatic chuck with improved
spacing and charge migration reduction mask, as shown and
described.
Inventors: |
Burkhart; Vincent E. (San Jose,
CA), Flanigan; Allen (San Jose, CA), Sansoni; Steven
(San Jose, CA) |
Assignee: |
Applied Materials, Inc. (Santa
Clara, CA)
|
Appl.
No.: |
D/081,238 |
Filed: |
December 24, 1997 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
Issue Date |
|
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639841 |
May 8, 1996 |
5764471 |
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Current U.S.
Class: |
D15/140 |
Current International
Class: |
1509 |
Field of
Search: |
;D15/140 ;361/234,235
;279/128 ;269/8,903 |
References Cited
[Referenced By]
U.S. Patent Documents
Primary Examiner: Davis; Antoine Duval
Attorney, Agent or Firm: Thomason & Moser
Description
FIG. 1 is a top view of the electrostatic chuck having the improved
spacing and charge migration reduction mask;
FIG. 2 is an elevation view when looking to the right along the
x-axis in FIG. 1 , the view when looking to the left along the
x-axis in FIG. 1 being identical to that of FIG. 2 thereof;
FIG. 3 is a detailed view of part of the surface seen in FIG. 2
thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is an elevation view when looking down along the y-axis in
FIG. 1 thereof; and,
FIG.6 is an elevation view when looking up along the y-axis in FIG.
1 thereof.
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