U.S. patent application number 16/778546 was filed with the patent office on 2021-08-05 for backside contact of a semiconductor device.
The applicant listed for this patent is QUALCOMM Incorporated. Invention is credited to Sinan GOKTEPELI, George Pete IMTHURN, Sivakumar KUMARASAMY, Qingqing LIANG.
Application Number | 20210242322 16/778546 |
Document ID | / |
Family ID | 1000005720889 |
Filed Date | 2021-08-05 |
United States Patent
Application |
20210242322 |
Kind Code |
A1 |
LIANG; Qingqing ; et
al. |
August 5, 2021 |
BACKSIDE CONTACT OF A SEMICONDUCTOR DEVICE
Abstract
Certain aspects of the present disclosure generally relate to a
semiconductor device having a backside gate contact. An example
semiconductor device generally includes a transistor disposed above
a substrate, wherein the transistor comprises a gate region, a
channel region, a source region, and a drain region and wherein the
gate region is disposed adjacent to the channel region. The
semiconductor device further includes a backside gate contact that
is electrically coupled to a bottom surface of the gate region and
that extends below a bottom surface of the substrate.
Inventors: |
LIANG; Qingqing; (San Diego,
CA) ; KUMARASAMY; Sivakumar; (San Diego, CA) ;
IMTHURN; George Pete; (San Diego, CA) ; GOKTEPELI;
Sinan; (San Diego, CA) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
QUALCOMM Incorporated |
San Diego |
CA |
US |
|
|
Family ID: |
1000005720889 |
Appl. No.: |
16/778546 |
Filed: |
January 31, 2020 |
Current U.S.
Class: |
1/1 |
Current CPC
Class: |
H01L 29/0665 20130101;
H01L 29/42356 20130101; H01L 29/4916 20130101; H01L 29/401
20130101; H01L 29/66795 20130101; H01L 29/785 20130101; H01L
2029/7858 20130101 |
International
Class: |
H01L 29/423 20060101
H01L029/423; H01L 29/78 20060101 H01L029/78; H01L 29/06 20060101
H01L029/06; H01L 29/66 20060101 H01L029/66; H01L 29/49 20060101
H01L029/49; H01L 29/40 20060101 H01L029/40 |
Claims
1. A semiconductor device comprising: a transistor disposed above a
substrate, wherein the transistor comprises a gate region, a
channel region, a source region, and a drain region, wherein the
gate region is disposed adjacent to the channel region, and wherein
the gate region comprises: a first portion disposed above a portion
of an upper surface of the channel region; and a second portion
extending orthogonally from the first portion and disposed adjacent
to a portion of a first lateral surface of the channel region; and
a backside gate contact that is electrically coupled to a bottom
surface of the second portion of the gate region and that extends
below a bottom surface of the substrate.
2. The semiconductor device of claim 1, wherein the gate region
wraps around the portion of the upper surface, the portion of the
first lateral surface, and a portion of a second lateral surface of
the channel region.
3. The semiconductor device of claim 2, wherein: the gate region
further comprises a third portion extending orthogonally from the
first portion and disposed adjacent to the portion of the second
lateral surface of the channel region; and the backside gate
contact is electrically coupled to a bottom surface of the third
portion of the gate region.
4. The semiconductor device of claim 1, wherein the gate region
comprises polycrystalline silicon.
5. The semiconductor device of claim 1, wherein the transistor is a
fin field-effect transistor (finFET).
6. The semiconductor device of claim 1, wherein the channel region
includes one or more semiconductor fin structures.
7. The semiconductor device of claim 1, wherein the transistor is a
gate-all-around transistor.
8. The semiconductor device of claim 7, wherein the channel region
includes one or more nanosheets that intersect the gate region.
9. The semiconductor device of claim 1, further comprising another
backside contact electrically coupled to the source region or the
drain region, wherein the other backside contact intersects a
portion of the substrate and extends below the bottom surface of
the substrate.
10. The semiconductor device of claim 1, further comprising a
frontside gate contact electrically coupled to the gate region and
disposed above the gate region.
11. A method of fabricating a semiconductor device, comprising:
forming a transistor above a substrate, wherein the transistor
comprises a gate region, a channel region, a source region, and a
drain region, wherein the gate region is adjacent to the channel
region, and wherein the gate region comprises: a first portion
disposed above a portion of an upper surface of the channel region;
and a second portion extending orthogonally from the first portion
and disposed adjacent to a portion of a first lateral surface of
the channel region; and forming a backside gate contact that is
electrically coupled to a bottom surface of the second portion of
the gate region and that extends below a bottom surface of the
substrate.
12. The method of claim 11, wherein forming the transistor
comprises: forming the channel region from a semiconductor region
disposed above the substrate; and forming the gate region that
wraps around the portion of the upper surface, the portion of the
first lateral surface, and a portion of a second lateral surface of
the channel region.
13. The method of claim 11, wherein forming the backside gate
contact comprises forming the backside gate contact below the gate
region of the transistor.
14. The method of claim 13, wherein forming the backside gate
contact comprises: forming dielectric layers above another
substrate; forming the backside gate contact in the dielectric
layers; and coupling the dielectric layers and the backside gate
contact to the bottom surface of the substrate.
15. The method of claim 11, wherein forming the transistor
comprises forming the gate region using polycrystalline
silicon.
16. The method of claim 11, wherein forming the transistor
comprises forming a fin field-effect transistor (finFET).
17. The method of claim 11, wherein forming the transistor
comprises forming the channel region as a fin structure disposed
above the substrate.
18. The method of claim 11, wherein forming the transistor
comprises forming a gate-all-around transistor.
19. The method of claim 11, wherein forming the transistor
comprises forming the channel region as one or more nanosheets that
intersect the gate region.
20. The method of claim 11, further comprising forming another
backside contact electrically coupled to the source region or the
drain region, wherein the other backside contact intersects a
portion of the substrate.
Description
BACKGROUND
Field of the Disclosure
[0001] Certain aspects of the present disclosure generally relate
to electronic circuits and, more particularly, to a semiconductor
device having a backside contact.
Description of Related Art
[0002] As electronic devices are getting smaller and faster, the
demand for integrated circuits (ICs) with higher I/O count, faster
data processing rate, and/or better signal integrity greatly
increases. The ICs may include various conductors (e.g., conductive
contacts and/or metal layers), which are often formed during a
back-end-of-line (BEOL) fabrication process. The conductors
facilitate electrical wiring to various electrical components
including transistors, amplifiers, inverters, control logic,
memory, power management circuits, buffers, filters, resonators,
capacitors, inductors, resistors, etc.
SUMMARY
[0003] The systems, methods, and devices of the disclosure each
have several aspects, no single one of which is solely responsible
for its desirable attributes. Without limiting the scope of this
disclosure as expressed by the claims which follow, some features
will now be discussed briefly. After considering this discussion,
and particularly after reading the section entitled "Detailed
Description," one will understand how the features of this
disclosure provide advantages that include improved gate contacts
for a semiconductor device.
[0004] Certain aspects of the present disclosure provide a
semiconductor device. The semiconductor device generally includes a
transistor disposed above a substrate, wherein the transistor
comprises a gate region, a channel region, a source region, and a
drain region, wherein the gate region is disposed adjacent to the
channel region. The semiconductor device further includes a
backside gate contact that is electrically coupled to a bottom
surface of the gate region and that extends below a bottom surface
of the substrate.
[0005] Certain aspects of the present disclosure provide a method
of fabricating a semiconductor device. The method generally
includes forming a transistor above a substrate, wherein the
transistor comprises a gate region, a channel region, a source
region, and a drain region, wherein the gate region is adjacent to
the channel region. The method further includes forming a backside
gate contact that is electrically coupled to a bottom surface of
the gate region and that extends below a bottom surface of the
substrate.
[0006] To the accomplishment of the foregoing and related ends, the
one or more aspects comprise the features hereinafter fully
described and particularly pointed out in the claims. The following
description and the annexed drawings set forth in detail certain
illustrative features of the one or more aspects. These features
are indicative, however, of but a few of the various ways in which
the principles of various aspects may be employed, and this
description is intended to include all such aspects and their
equivalents.
BRIEF DESCRIPTION OF THE DRAWINGS
[0007] So that the manner in which the above-recited features of
the present disclosure can be understood in detail, a more
particular description, briefly summarized above, may be had by
reference to aspects, some of which are illustrated in the appended
drawings. It is to be noted, however, that the appended drawings
illustrate only certain typical aspects of this disclosure and are
therefore not to be considered limiting of its scope, for the
description may admit to other equally effective aspects.
[0008] FIG. 1A is a top view of an example semiconductor device
having a backside gate contact, in accordance with certain aspects
of the present disclosure.
[0009] FIG. 1B is a cross-sectional view taken along line segment
AA' of FIG. 1A, in accordance with certain aspects of the present
disclosure.
[0010] FIG. 2 is a cross-sectional view taken along line segment
BB' of FIG. 1A illustrating the fan-out in different metal layers,
in accordance with certain aspects of the present disclosure.
[0011] FIG. 3 illustrates another portion of the semiconductor
device of FIG. 1A taken along a cross-section orthogonal to that of
the cross-section depicted in FIG. 2, in accordance with certain
aspects of the present disclosure.
[0012] FIG. 4 illustrates a cross-sectional view of an example
gate-all-around (GAA) transistor with a backside gate contact, in
accordance with certain aspects of the present disclosure.
[0013] FIG. 5 illustrates an isometric view of an example of the
GAA transistor of FIG. 4, in accordance with certain aspects of the
present disclosure.
[0014] FIGS. 6-12 illustrate various top and cross-sectional views
of example operations for fabricating a semiconductor device, in
accordance with certain aspects of the present disclosure.
[0015] FIG. 13 is a flow diagram of example operations for
fabricating a semiconductor device, in accordance with certain
aspects of the present disclosure.
DETAILED DESCRIPTION
[0016] Aspects of the present disclosure generally relate to a
semiconductor device having backside contacts and various methods
for fabricating such a semiconductor device.
[0017] In certain cases, a backside contact may be used to provide
electrical routing below an active electrical device, such as a
transistor. For example, the backside contact may provide a
conductive contact coupled between metal layers disposed above and
below a substrate and/or a conductive contact coupled between a
source/drain region and a metal layer disposed below the substrate.
In certain cases, layer-transfer technologies may allow the
formation of backside contacts that are coupled directly to one or
more diffusion regions, such as a source or drain region of a
transistor. The process of backside silicidation may increase the
complexity of the fabrication process, resulting in yield loss
risks. The silicidation process may also produce a higher thermal
budget, which may have adverse effects on the device performance,
back-end-of-line (BEOL) integrity of frontside contacts, and, in
radio frequency (RF) applications, possible loss of RF performance,
such as harmonics or distortion products (e.g., the input intercept
point (IIP)).
[0018] Aspects of the present disclosure provide a semiconductor
device having a backside contact that is coupled directly to a gate
region, such as a polycrystalline silicon layer of the gate region.
As described herein with respect to the backside gate contact, the
direct contact to the gate region may improve device design
space/options and electrical routing approaches of the
semiconductor device. For example, the backside gate contact may
enable improved design space and options by reducing the electrical
routing to the gates of transistors via the backside of the
semiconductor device. As an example, the backside gate contacts may
enable electrical routing options on the frontside where routing
would have been used to connect to the gate contacts. In certain
cases, the backside gate contacts may facilitate electrical routing
to decoupling capacitors or other passive components attached on
the landside of the semiconductor device. Such electrical routing
may enable improved performance of the semiconductor device, for
example, by reducing parasitic losses encountered with electrical
routing on the frontside. In certain aspects, layer transfer
processes may be performed to couple the various backside contacts
and metal layers disposed below an active electrical device, such
as a transistor.
Example Backside Contact
[0019] FIGS. 1A and 1B illustrate a top view and a cross-sectional
view, respectively, of an example semiconductor device 100 that has
a backside gate contact coupled to a gate region of a transistor,
in accordance with certain aspects of the present disclosure. FIG.
1B illustrates the semiconductor device 100 across the
cross-section AA' as depicted in FIG. 1A. As shown in FIGS. 1A and
1B, the semiconductor device 100 may include a transistor 102, a
substrate 104, and one or more backside gate contacts 106 (shown in
FIG. 1B). In certain aspects, the semiconductor device 100 may
further include frontside contacts 108 and 109, frontside
dielectric layers 110, frontside conductive vias (not shown),
frontside conductive traces 112 (e.g., metal layer one (M1)),
backside dielectric layers 114, backside conductive traces 116
(e.g., first, second, and third backside metal layers labeled
"BSM1," "BSM2," "BSM3"), and backside conductive vias 118.
[0020] In aspects, the transistor 102 may be formed during a
front-end-of-line (FEOL) fabrication process. The frontside aspects
(including the frontside contacts 108 and 109, frontside dielectric
layers 110, and frontside conductive traces 112) may be formed
during the BEOL fabrication process. In certain aspects, the
backside aspects (including the backside dielectric layers 114,
backside conductive traces 116, and backside conductive vias 118)
may be formed during a layer transfer process of the BEOL
fabrication process.
[0021] The transistor 102 is disposed above the substrate 104. The
transistor 102 may include a metal-oxide-semiconductor field-effect
transistor (MOSFET), and the MOSFET may include a finFET and/or a
GAA FET. In the example depicted in FIGS. 1A and 1B, the transistor
102 is a finFET.
[0022] The transistor 102 may include a gate region 120, a channel
region 122, a source region 124, and a drain region 126. As the
transistor 102 is a finFET, the channel region 122 may include one
or more semiconductor fin structures. In certain aspects, the
semiconductor fin structures may extend above the substrate 104. In
certain aspects, the channel region 122 may include nanosheets
and/or nanowires (not shown), for example, in cases where the
transistor 102 is a GAA FET.
[0023] In aspects, the gate region 120 may include a conductive
layer disposed adjacent (e.g., above) at least one dielectric layer
(not shown). The conductive layer may include one or more layers of
electrically conductive materials such as polycrystalline silicon
(polysilicon) or various work function metals including titanium
nitride (TiN), aluminum (Al), tantalum nitride (TaN), titanium
aluminide (TiAl), tungsten (W), etc. In aspects, the dielectric
layer may include a dielectric material (e.g., hafnium dioxide
(HfO.sub.2), zirconium dioxide (ZrO.sub.2), and/or titanium dioxide
(TiO.sub.2)) with a dielectric constant (.kappa.) higher than
silicon dioxide (SiO.sub.2) (e.g., .kappa.=3.9). In some aspects,
the dielectric material may be referred to as a high-.kappa.
dielectric.
[0024] In aspects, the gate region 120 includes an upper surface
128 and a bottom surface 130. The upper surface 128 of the gate
region 120 may be disposed above the substrate 104 and coupled to
the frontside contacts 109, and the bottom surface 130 of the gate
region 120 may be embedded in the substrate 104 and coupled to the
backside gate contacts 106. That is, the backside gate contacts 106
may engage the bottom surface 130 of the gate region 120.
[0025] In aspects, the gate region 120 wraps around a portion of an
upper surface 140, a portion of a first lateral surface 144, and a
portion of a second lateral surface 146 of the channel region 122.
As shown, the channel region 122 may also have a bottom surface 142
disposed below the upper surface 140. In certain aspects, the gate
region 120 comprises a first portion 148 disposed above the portion
of the upper surface 140 of the channel region 122, a second
portion 150 extending orthogonally from the first portion 148 and
disposed adjacent to the portion of the first lateral surface 144
of the channel region 122, and a third portion 152 extending
orthogonally from the first portion 148 and disposed adjacent to
the portion of the second lateral surface 146 of the channel region
122. The backside gate contacts 106 may be electrically coupled to
a bottom surface 130 of the second and/or third portions 150, 152
of the gate region 120.
[0026] In aspects, a conductive layer 132 (e.g., tungsten (W)) may
be disposed above the gate region 120. The conductive layer 132 may
be electrically coupled between the gate region 120 and the
frontside contacts 109.
[0027] In aspects, the gate region 120 may be disposed between gate
spacers 134. In certain aspects, the gate spacers 134 may serve as
a mold for forming the gate region 120.
[0028] As shown, the gate region 120 is disposed adjacent to the
channel region 122. For example, the gate region 120 may surround a
portion of the semiconductor fin structures of the channel region
122. In certain cases, for example, where the transistor 102 is a
GAA FET, the gate region 120 may wrap around the channel region
122, as further described herein with respect to FIGS. 4A and
4B.
[0029] Referring to FIG. 1A, the source and drain regions 124, 126
may be adjacent to the gate region 120, such that the gate region
120 is disposed between the source and drain regions 124, 126. In
certain aspects, the transistor 102 may be configured as an n-type
metal-oxide-semiconductor (NMOS) transistor. For example, the
source region 124 and drain region 126 of the transistor 102 may be
n+ doped semiconductors. In other aspects, the transistor 102 may
be a p-type MOS (PMOS) transistor. For example, the source region
124 and drain region 126 of the transistor 102 may be p+ doped
semiconductors.
[0030] The substrate 104 may be, for example, a portion of a
semiconductor wafer including a silicon wafer. In certain aspects,
the substrate 104 may be a silicon-on-insulator (SOI) substrate
having an electrical insulator layer disposed between layers of
silicon, for example, as further described herein with respect to
FIG. 6. In aspects, the insulator layer may include a dielectric
region, which may be composed of any of various suitable
electrically insulating materials, such as silicon dioxide
(SiO.sub.2).
[0031] The substrate 104 may have an upper surface 136 and a bottom
surface 138. The frontside dielectric layers 110 may be disposed
above the upper surface 136 of the substrate 104, and the backside
dielectric layers 114 may be disposed below the bottom surface 138
of the substrate 104.
[0032] The backside gate contacts 106 may be electrically
conductive local interconnects disposed below the transistor 102
and electrically coupled to the gate region 120 of the transistor
102. The backside gate contacts 106 may enable improved electrical
routing approaches for the semiconductor device 100. For example,
the backside gate contacts 106 may facilitate electrical routing to
decoupling capacitors or other passive components attached on the
landside (or die-side) of the semiconductor device 100. In certain
cases, the backside gate contacts 106 may enable electrical routing
to a power distribution network that enters via the landside (or
die-side) of the semiconductor device 100. In certain cases, the
backside gate contacts 106 may improve the performance of the
semiconductor device, for example, by reducing parasitic losses
encountered with electrical routing on the frontside.
[0033] The frontside contacts 108 and 109 may be electrically
conductive interconnects disposed above the transistor 102 and
electrically coupled to the transistor 102. For example, as shown
in FIG. 1A, the source and/or drain regions 124, 126 of the
transistor 102 may be electrically coupled to the frontside
contacts 108. As shown in FIG. 1B, the gate region 120 may be
electrically coupled to the frontside contacts 109.
[0034] The frontside conductive traces 112 are disposed above the
transistor 102. The frontside conductive traces 112 may be
electrically coupled to the transistor 102 via the frontside
contacts 109. In aspects, additional layers of frontside conductive
traces (not shown) may be disposed above the transistor 102, for
example, as depicted in FIG. 2.
[0035] The frontside dielectric layers 110 are disposed above the
transistor 102 and/or the substrate 104. The frontside contacts 108
and 109 and frontside conductive traces 112 may be embedded in the
frontside dielectric layers 110. In aspects, the frontside
dielectric layers 110 may comprise an oxide, such as silicon
dioxide.
[0036] The backside conductive traces 116 are disposed below the
substrate 104. The backside conductive traces 116 may be
electrically coupled to the transistor 102 via the backside gate
contacts 106. The backside conductive vias 118 are disposed between
layers of the backside conductive traces 116 and below the
substrate 104. The backside conductive vias 118 may include an
electrically conductive material.
[0037] The backside dielectric layers 114 are disposed below the
substrate 104. The backside conductive traces 116 and backside
conductive vias 118 may be embedded in the backside dielectric
layers 114. In aspects, the backside dielectric layers 114 may
comprise an oxide, such as silicon dioxide.
[0038] The various conductors (such as the frontside and backside
traces, vias, and contacts) provide electrical routing between the
transistor 102 and other electrical components (not shown),
including, for example, other transistors, capacitors, inductors,
resistors, an integrated passive device, a power management IC
(PMIC), a memory chip, etc.
[0039] In aspects, the semiconductor device 100 may be a flip-chip
ball grid array (FC-BGA) integrated circuit having multiple solder
bumps (not shown) electrically coupled to under-bump conductive
pads (not shown). In aspects, the under-bump conductive pads may be
disposed above the various frontside conductors or below the
various backside conductors. In certain cases, the semiconductor
device 100 may have conductive pillars (e.g., copper (Cu) pillars)
that electrically couple the semiconductor device 100 to a package
substrate, an interposer, or a circuit board, for example.
[0040] In certain aspects, the backside gate contacts 106 may
directly engage the channel region 122. For example, the backside
gate contacts 106 may engage the bottom surface 142 of the channel
region 122. In such a case, the backside gate contact 106 may
facilitate forming a bipolar junction transistor (BJT).
[0041] FIG. 2 illustrates the semiconductor device 100 across the
cross-section BB' as depicted in FIG. 1A. As shown in FIG. 2, the
backside gate contact 106 is electrically coupled to the gate
region 120 and extends below the substrate 104.
[0042] In certain aspects, the backside conductive traces 116 may
be electrically coupled to other backside contacts, such as a
backside contact 206. Referring to FIG. 2, the backside contact 206
may be laterally spaced from the backside gate contact 106 and
extend below the substrate 104. In aspects, the backside contact
206 may be an electrically conductive local interconnect that
intersects the substrate 104. The backside contact 206 may be
electrically coupled to a frontside contact 208, which is disposed
above the backside contact 206. The frontside contact 208 may be
disposed above the substrate 104 and electrically coupled to the
frontside conductive traces 112.
[0043] In this example, frontside conductive vias 214 are disposed
between layers of the frontside conductive traces 112 and above the
substrate 104.
[0044] In certain aspects, the backside contact 206 may be
electrically coupled to a source or drain of the transistor 102 or
of another transistor. For example, FIG. 3 illustrates another
portion of the semiconductor device 100 across a cross-section
orthogonal to that of the cross-section depicted in FIG. 2.
Referring to FIG. 3, the backside contact 206 is electrically
coupled to a source region 340 of a second transistor 302. The
second transistor 302 includes a channel region 310, a gate region
320, the source region 340, and a drain region 342. The drain
region 342 of the second transistor 302 may be electrically coupled
to a frontside contact 308, which is disposed above the drain
region 342. The frontside contact 308 may be electrically coupled
to the frontside conductive traces 112. The second transistor 302
may function as an electrical switch between the backside contact
206 and the frontside contact 308.
[0045] In aspects, a backside gate contact 306 may be disposed
below the channel region 310 of the second transistor 302 and
extend below the substrate 104. A portion of the substrate may be
disposed between the channel region 310 and the backside gate
contact 306. In aspects, the backside gate contact 306 may serve as
a gate terminal of the second transistor 302 disposed below the
channel region 310.
[0046] In certain aspects, a backside gate contact may be coupled
to the gate region of a GAA transistor. For example, FIG. 4
illustrates an example of a semiconductor device 400 that has a
backside gate contact coupled to a gate region of a GAA transistor,
in accordance with certain aspects of the present disclosure. As
shown, the semiconductor device 400 includes a GAA transistor 402,
a substrate 404, and a backside gate contact 406.
[0047] In aspects, the GAA transistor 402 may be disposed above the
substrate 404. The GAA transistor 402 may include a stack structure
408, a gate region 410, a source region 412, and a drain region
414. The stack structure 408 may include a plurality of channel
layers 416 and a plurality of gate layers 418. In certain aspects,
the stack structure 408 may be a stack of nanosheets, where each of
the channel layers 416 is a separate nanosheet, surrounded or at
least separated by the gate layers 418.
[0048] The channel layers 416 may be arranged in the stack
structure 408 such that the channel layers 416 alternate with the
gate layers 418. For example, each of the channel layers 416 may be
disposed between two of the gate layers 418. In aspects, one of the
gate layers 418 may be the topmost layer of the stack structure
408, and another one of the gate layers 418 may be the bottommost
layer of the stack structure 408, as illustrated in FIG. 4.
[0049] The channel layers 416 may include a semiconductor material,
such as silicon (Si) or silicon germanium (SiGe). In certain
aspects, the semiconductor material of the channel layers 416 may
be an n-type or p-type semiconductor material (e.g., via doping).
In aspects, the channel layers 416 may have a height of 5
nanometers (nm) or less.
[0050] In aspects, each of the gate layers 418 may include a
conductive layer 420 disposed adjacent (e.g., above) at least one
dielectric layer 422. The conductive layer 420 may include one or
more layers of electrically conductive materials such as
polycrystalline silicon or various work function metals including
titanium nitride (TiN), aluminum (Al), tantalum nitride (TaN),
titanium aluminide (TiAl), tungsten (W), etc. In aspects, the
dielectric layer 422 may include a dielectric material (e.g.,
hafnium dioxide (HfO.sub.2), zirconium dioxide (ZrO.sub.2), and/or
titanium dioxide (TiO.sub.2)) with a dielectric constant (.kappa.)
higher than silicon dioxide (SiO.sub.2) (e.g., .kappa.=3.9). In
some aspects, the dielectric material may be referred to as a
high-.kappa. dielectric, which may be abbreviated as "HiK" as
depicted in FIG. 4.
[0051] The gate region 410 is disposed around the stack structure
112 as further described herein with respect to FIG. 5. In aspects,
the gate region 410 may engage surfaces of the stack structure 408.
The gate region 410 may include an electrically conductive material
424 disposed between gate spacers 426, which may serve as a mold in
patterning the conductive material 424 around the stack structure
408. In aspects, the conductive material 424 may include various
gate electrode materials including tungsten, aluminum, titanium,
etc.
[0052] The source region 412 may be coupled to a lateral surface of
the stack structure 408, and the drain region 414 may be coupled to
a second lateral surface of the stack structure 408. In certain
aspects, each of the source region 412 and drain region 414 may
include a doped (e.g., p+/n+), epitaxially grown semiconductor
structure. In aspects, the stack structure 408 is disposed between
the source region 412 and drain region 414. In aspects, a
dielectric material 428 (e.g., a silicon dioxide) may be disposed
between the gate layers 418 and the source and drain regions 412,
414.
[0053] In certain aspects, the GAA transistor 402 may be configured
as an n-type metal-oxide-semiconductor (NMOS) transistor. For
example, the source region 412 and drain region 414 of the GAA
transistor 402 may be n+ doped semiconductors. In other aspects,
the GAA transistor 402 may be a p-type MOS (PMOS) transistor. For
example, the source region 412 and drain region 414 of the GAA
transistor 402 may be p+ doped semiconductors.
[0054] The substrate 404 may be a portion of, for example, a
semiconductor wafer such as a silicon wafer. Frontside dielectric
layers 430 may be disposed above the substrate 404, and backside
dielectric layers 432 may be disposed below the substrate 404.
[0055] The backside gate contact 406 may be an electrically
conductive local interconnect disposed below the transistor 402 and
coupled to one of the gate layers 418 of the transistor 402. As
shown, the backside gate contact 406 is coupled to the bottommost
layer of the stack structure 408 and a backside conductive trace
434. The backside gate contact 406 may extend below the substrate
404 and intersect the backside dielectric layers 432. The backside
gate contact 406 may enable improved electrical routing approaches
of the semiconductor device 400, for example, as described herein
with respect to FIG. 1.
[0056] While the examples provided herein are described with
respect to the stack structure comprising channel layers and gate
layers to facilitate understanding, aspects of the present
disclosure may also be applied to other suitable GAA structures.
For example, the stack structure may be replaced by a gate
structure having semiconductor nanowires (e.g., the channels) that
intersect the gate structure, which may include various work
function metals.
[0057] FIG. 5 illustrates an isometric view of the GAA transistor
402 of the semiconductor device 400 depicted in FIG. 4, in
accordance with certain aspects of the present disclosure. As
shown, the gate region 410 surrounds the stack structure 408. In
aspects, the gate region 410 may engage lateral surfaces of the
stack structure 408, such that the conductive material 424 of the
gate region 410 is electrically coupled to the gate layers of the
stack structure 408. The conductive material 424 of the gate region
410 in combination with the gate layers 418 of the stack structure
408 may effectively surround each of the channel layers 416 of the
stack structure 408 to facilitate a GAA structure. The source and
drain regions 412, 414 may extend laterally from the stack
structure 408. In aspects, the source and drain regions 412, 414
may engage the channel layers 416 of the stack structure 408, such
that the source and drain regions 412, 414 are electrically coupled
to the channel layers 416 of the stack structure 408.
[0058] FIGS. 6-12 illustrate example operations for fabricating a
semiconductor device, in accordance with certain aspects of the
present disclosure. Each of FIGS. 6-12 illustrates a top view, a
cross-sectional view along the cross-section AA' of the top view,
and another cross-sectional view along the cross-section BB' of the
top view. The operations may be performed by a semiconductor
fabrication facility, for example. The operations may include
various front-end-of-line (FEOL) fabrication processes, when
electrical devices (e.g., transistors and capacitive elements) are
patterned on a substrate (e.g., the substrate 104), and/or various
back-end-of-line (BEOL) fabrication processes, when the electrical
devices are electrically interconnected. The operations may also
include various layer transfer processes, such as coupling the
various backside elements (e.g., dielectric layers and/or
conductors) to the substrate of the semiconductor device.
[0059] As shown in FIG. 6, a substrate 602 may be formed. The
substrate 602 may be a silicon-on-insulator (SOI) substrate having
a dielectric layer 606 (e.g., silicon dioxide (SiO.sub.2)) disposed
between a first semiconductor layer 604 and a second semiconductor
layer 608. In certain cases, a boule of a semiconductor (e.g.,
silicon) may be formed and sliced into individual wafers, which may
serve as the base material for forming SOI substrates. The
substrate 602 may be formed using various methods such as wafer
bonding between two silicon substrates, seeding the first
semiconductor layer 604 above the dielectric layer 606, or ion beam
implantation to form an embedded dielectric layer 606 in a silicon
substrate.
[0060] Referring to FIG. 7, a semiconductor region 610 may be
formed from the first semiconductor layer 604. In certain cases, a
first hard mask layer 612 may be formed above the first dielectric
layer 606 and surrounding lateral surfaces of the semiconductor
region 610. In aspects, the first hard mask layer 612 may be
silicon nitride (Si.sub.3N.sub.4). A dielectric region 614 (e.g.,
silicon dioxide (SiO.sub.2)) may be formed above the first hard
mask layer 612. A dummy gate region 616 may be formed above a
portion of the semiconductor region 610 and a portion of the
dielectric region 614. The dummy gate region 616 may include a
second dielectric layer 618 and a polycrystalline silicon layer
disposed above the second dielectric layer 618. The dummy gate
region 616 may serve as a cast for forming a mold of the gate
region of a transistor as further described herein.
[0061] As illustrated in FIG. 8, a second hard mask layer 622 may
be formed above the dielectric region 614. In aspects, the second
hard mask layer 622 may be silicon nitride (Si.sub.3N.sub.4). A
planarization process (e.g., a chemical mechanical planarization
(CMP) process) may be performed to smooth an upper surface of the
second hard mask layer 622 to expose the dummy gate region 616.
[0062] Referring to FIG. 9, the dummy gate region 616 and a portion
of the dielectric region 614 may be removed, such that effectively,
a cavity 624 is formed in the second hard mask layer 622. The
cavity 624 may serve as a mold for the gate region of the
transistor. In certain aspects, the dummy gate region 616 and the
portion of the dielectric region may be removed using an etching
process (e.g., wet etching process and/or dry etching process), and
the first and second hard mask layers 612, 622 may serve as the
etch-stop barriers for the etching process.
[0063] As depicted in FIG. 10, a gate region 626 (e.g., the gate
region 120) may be formed in the cavity 624, and the second hard
mask layer 622 may be removed. The gate region may wrap around a
portion of an upper surface, a portion of a first lateral surface,
and a portion of a second lateral surface of the semiconductor
region, for example, as described herein with respect to FIGS. 1A
and 1B. The gate region 626 may include a conductive layer 630
(e.g., a gate stack) disposed above a third dielectric layer 628
(e.g., a gate oxide such as silicon dioxide). The conductive layer
630 may include one or more layers of electrically conductive
materials such as polycrystalline silicon and/or various work
function metals including titanium nitride (TiN), aluminum (Al),
tantalum nitride (TaN), titanium aluminide (TiAl), tungsten (W),
etc. In aspects, the third dielectric layer 628 may include a
dielectric material (e.g., hafnium dioxide (HfO.sub.2), zirconium
dioxide (ZrO.sub.2), and/or titanium dioxide (TiO.sub.2)) with a
dielectric constant (.kappa.) higher than silicon dioxide
(SiO.sub.2) (e.g., .kappa.=3.9).
[0064] Referring to FIG. 11, a source region 632 (e.g., the source
region 124), drain region 634 (e.g., the drain region 126), and
channel region 636 (e.g., the channel region 122) may be formed
from the semiconductor region 610 disposed above a portion of the
substrate 602 (e.g., the first dielectric layer 606). Gate spacers
638 may be formed adjacent to the gate region 626. The gate spacers
638 may enable aligning the doping of the source and drain regions
632, 634. Frontside source contacts 640 may be formed above the
source region 632, frontside drain contacts 642 may be formed above
the drain region 634, and frontside gate contacts 644 may be formed
above the gate region 626. Frontside dielectric layers 646 (e.g.,
the frontside dielectric layers 110) may be formed above the
dielectric region 614, such that the conductive contacts (e.g., the
frontside source contacts, frontside drain contacts, and frontside
gate contacts) are embedded in the frontside dielectric layers
646.
[0065] As shown in FIG. 12, backside source contacts 648 may be
formed below the source region 632, backside drain contacts 650 may
be formed below the drain region 634, and backside gate contacts
652 may be formed below the gate region 626. Backside conductive
traces 654 may be formed below the backside gate contacts 652.
Backside dielectric layers 656 may be formed below the first
dielectric layer 606.
[0066] In aspects, the backside elements (contacts, conductive
traces, and dielectric layers) may be formed using a layer transfer
process. For example, the backside elements may be formed on a
separate backside substrate 658 than the substrate (e.g., the
substrate 602) on which the transistor is formed, and the
dielectric layers of the backside substrate 658 may be bonded to a
bottom surface of the transistor substrate, for example, a bottom
surface of the first dielectric layer 606.
[0067] FIG. 13 is a flow diagram of example operations 1300 for
fabricating a semiconductor device (e.g., the semiconductor device
100 of FIGS. 1A and 1B), in accordance with certain aspects of the
present disclosure. The operations 1300 may be performed by an
integrated circuit fabrication facility, for example.
[0068] The operations 1300 begin, at block 1302, by forming a
transistor (e.g., the transistor 102 or GAA transistor 402) above a
substrate (e.g., the substrate 104 or the substrate 602). The
transistor includes a gate region (e.g., the gate region 120), a
channel region (e.g., the channel region 122), a source region
(e.g., the source region 124), and a drain region (e.g., the drain
region 126). The gate region is adjacent to the channel region. At
block 1304, a backside gate contact may be formed below the gate
region, such that the backside gate contact is electrically coupled
to a bottom surface of the gate region and extends below a bottom
surface of the substrate.
[0069] In aspects, forming the transistor includes forming the
channel region from a semiconductor region (e.g., the first
semiconductor layer 604) disposed above the substrate or a portion
of the substrate (e.g., the first dielectric layer 606). Forming
the transistor at block 1302 further includes forming the gate
region, such that the gate region wraps around a portion of an
upper surface 140, a portion of a first lateral surface 144, and a
portion of a second lateral surface 146 of the channel region
122.
[0070] In aspects, forming the backside gate contact at block 1304
includes forming the backside gate contact below the gate region of
the transistor. In certain aspects, the backside gate contact (and
other backside elements) may be formed via a layer transfer
process. In certain cases, forming the backside gate contact
includes forming dielectric layers (e.g., the backside dielectric
layers 656) above another substrate (e.g., the substrate 658),
forming the backside gate contact in the dielectric layers, and
coupling the dielectric layers and backside gate contact to the
bottom surface of the substrate.
[0071] In certain aspects, forming the transistor at block 1302 may
include forming the gate region using polycrystalline silicon, for
example, as a dummy gate region or as a portion of the gate region.
In aspects, the gate region may include a conductive layer (e.g.,
the conductive layer 630) disposed above a dielectric layer (e.g.,
the third dielectric layer 628). The conductive layer 630 may
include one or more layers of electrically conductive materials
such as polycrystalline silicon and/or various work function metals
including titanium nitride (TiN), aluminum (Al), tantalum nitride
(TaN), titanium aluminide (TiAl), tungsten (W), etc. In aspects,
the dielectric layer may include a dielectric material (e.g.,
hafnium dioxide (HfO.sub.2), zirconium dioxide (ZrO.sub.2), and/or
titanium dioxide (TiO.sub.2)) with a dielectric constant (.kappa.)
higher than silicon dioxide (SiO.sub.2) (e.g., .kappa.=3.9).
[0072] In aspects, forming the transistor at block 1302 may include
forming a finFET or a GAA-FET. For example, forming the transistor
may include forming the channel region as a fin structure disposed
above the substrate or a portion of the substrate. In certain
cases, forming the transistor may include forming the channel
region as one or more nanosheets that intersect the gate region,
for example, as described herein with respect to FIGS. 4 and 5.
[0073] In certain aspects, the operations 1300 may further comprise
forming a backside contact (e.g., the backside source or drain
contacts 648, 650) electrically coupled to the source region or the
drain region, where the backside contact intersects a portion of
the substrate.
[0074] In aspects, the operations 1300 may further comprise forming
a frontside gate contact (e.g., the frontside gate contacts 644)
electrically coupled to the gate region and above the gate
region.
[0075] It should be appreciated that backside gate contacts
described herein facilitate improved device design space/options
and electrical routing approaches of the semiconductor device.
[0076] The various operations of methods described above may be
performed by any suitable means capable of performing the
corresponding functions. The means may include various hardware
and/or software component(s) and/or module(s), including, but not
limited to a circuit, an application-specific integrated circuit
(ASIC), or processor. Generally, where there are operations
illustrated in figures, those operations may have corresponding
counterpart means-plus-function components.
[0077] The following description provides examples, and is not
limiting of the scope, applicability, or examples set forth in the
claims. Changes may be made in the function and arrangement of
elements discussed without departing from the scope of the
disclosure. Various examples may omit, substitute, or add various
procedures or components as appropriate. For instance, the methods
described may be performed in an order different from that
described, and various steps may be added, omitted, or combined.
Also, features described with respect to some examples may be
combined in some other examples. For example, an apparatus may be
implemented or a method may be practiced using any number of the
aspects set forth herein. In addition, the scope of the disclosure
is intended to cover such an apparatus or method which is practiced
using other structure, functionality, or structure and
functionality in addition to, or other than, the various aspects of
the disclosure set forth herein. It should be understood that any
aspect of the disclosure disclosed herein may be embodied by one or
more elements of a claim. The word "exemplary" is used herein to
mean "serving as an example, instance, or illustration." Any aspect
described herein as "exemplary" is not necessarily to be construed
as preferred or advantageous over other aspects.
[0078] As used herein, a phrase referring to "at least one of" a
list of items refers to any combination of those items, including
single members. As an example, "at least one of: a, b, or c" is
intended to cover: a, b, c, a-b, a-c, b-c, and a-b-c, as well as
any combination with multiples of the same element (e.g., a-a,
a-a-a, a-a-b, a-a-c, a-b-b, a-c-c, b-b, b-b-b, b-b-c, c-c, and
c-c-c or any other ordering of a, b, and c).
[0079] The methods disclosed herein comprise one or more steps or
actions for achieving the described method. The method steps and/or
actions may be interchanged with one another without departing from
the scope of the claims. In other words, unless a specific order of
steps or actions is specified, the order and/or use of specific
steps and/or actions may be modified without departing from the
scope of the claims.
[0080] It is to be understood that the claims are not limited to
the precise configuration and components illustrated above. Various
modifications, changes, and variations may be made in the
arrangement, operation, and details of the methods and apparatus
described above without departing from the scope of the claims.
* * * * *