Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography
De Silva; Ekmini Anuja ; et al.
U.S. patent application number 15/846942 was filed with the patent office on 2019-06-20 for patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (euv) lithography. The applicant listed for this patent is International Business Machines Corporation. Invention is credited to Daniel Corliss, Ekmini Anuja De Silva, Nelson Felix, Dario Goldfarb, Rudy J. Wojtecki.
| Application Number | 20190189428 15/846942 |
| Document ID | / |
| Family ID | 66814666 |
| Filed Date | 2019-06-20 |
D00000
D00001
D00002
D00003
XML
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 