Felix; Nelson

Patent Applications and Registrations

Patent applications and USPTO patent grants for Felix; Nelson.The latest application filed is for "bottom source/drain etch with fin-cut-last-vtfet".

Company Profile

45.38.47

Felix; Nelson - Slingerlands NY
Felix; Nelson - Singerlands NY
Felix; Nelson - Briarcliff Manor NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Line break repairing layer for extreme ultraviolet patterning stacks Grant 11,300,881 - Meli Thompson , et al. April 12, 2	2022-04-12
Semiconductor structure with fully aligned vias Grant 11,302,573 - De Silva , et al. April 12, 2	2022-04-12
Bottom Source/drain Etch With Fin-cut-last-vtfet App 20220069106 - Li; Tao ; et al.	2022-03-03
Polymer Brush Adhesion Promoter With Uv Cleavable Linker App 20220043353 - Guo; Jing ; et al.	2022-02-10
Bottom source/drain etch with fin-cut-last-VTFET Grant 11,245,027 - Li , et al. February 8, 2	2022-02-08
Litho-etch-litho-etch with self-aligned blocks Grant 11,239,077 - Liu , et al. February 1, 2	2022-02-01
Self-priming resist for generic inorganic hardmasks Grant 11,226,561 - Liu , et al. January 18, 2	2022-01-18
Spacer-defined Process For Lithography-etch Double Patterning For Interconnects App 20220013405 - Felix; Nelson ; et al.	2022-01-13
Inverse Tone Pillar Printing App 20210398816 - Felix; Nelson ; et al.	2021-12-23
Polymer brush adhesion promoter with UV cleavable linker Grant 11,199,778 - Guo , et al. December 14, 2	2021-12-14
Back-end-of-line compatible processing for forming an array of pillars Grant 11,195,995 - Liu , et al. December 7, 2	2021-12-07
Method to create multilayer microfluidic chips using spin-on carbon as gap filling materials Grant 11,192,101 - Liu , et al. December 7, 2	2021-12-07
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Grant 11,177,130 - De Silva , et al. November 16, 2	2021-11-16
Spacer-defined process for lithography-etch double patterning for interconnects Grant 11,164,772 - Felix , et al. November 2, 2	2021-11-02
Organic Photoresist Adhesion To Metal Oxide Hardmasks App 20210325784 - Arceo de la Pena; Abraham ; et al.	2021-10-21
Inverse tone pillar printing method using polymer brush grafts Grant 11,133,195 - Felix , et al. September 28, 2	2021-09-28
Extreme ultraviolet (EUV) mask stack processing Grant 11,131,919 - Xu , et al. September 28, 2	2021-09-28
Self-aligned top via Grant 11,133,260 - Liu , et al. September 28, 2	2021-09-28
Bottom Source/drain Etch With Fin-cut-last-vtfet App 20210288164 - Li; Tao ; et al.	2021-09-16
Tunable hardmask for overlayer metrology contrast Grant 11,121,024 - De Silva , et al. September 14, 2	2021-09-14
Method to create multilayer microfluidic chips using spin-on carbon as gap fill and spin-on glass tone inversion Grant 11,084,032 - Liu , et al. August 10, 2	2021-08-10
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay Grant 11,067,896 - Murray , et al. July 20, 2	2021-07-20
Back-end-of-line Compatible Processing For Forming An Array Of Pillars App 20210210679 - Liu; Chi-Chun ; et al.	2021-07-08
Multi-channel overlay metrology Grant 11,054,250 - Muthinti , et al. July 6, 2	2021-07-06
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Grant 11,037,786 - De Silva , et al. June 15, 2	2021-06-15
Self-aligned Top Via App 20210151377 - Liu; Chi-Chun ; et al.	2021-05-20
Litho-etch-litho-etch With Self-aligned Blocks App 20210143013 - Liu; Chi-Chun ; et al.	2021-05-13
Sequential infiltration synthesis extreme ultraviolet single expose patterning Grant 10,998,192 - De Silva , et al. May 4, 2	2021-05-04
Processes For Forming Fully Aligned Vias App 20210104432 - De Silva; Ekmini Anuja ; et al.	2021-04-08
Sequential Infiltration Synthesis Extreme Ultraviolet Single Expose Patterning App 20210082697 - De Silva; Ekmini Anuja ; et al.	2021-03-18
Patterning directly on an amorphous silicon hardmask Grant 10,950,440 - Arceo de la Pena , et al. March 16, 2	2021-03-16
Process Optimization by Clamped Monte Carlo Distribution App 20210049242 - Halle; Scott ; et al.	2021-02-18
Dynamic Adjustment Of Post Exposure Bake During Lithography Utilizing Real-time Feedback For Wafer Exposure Delay App 20200379354 - MURRAY; Cody John ; et al.	2020-12-03
Photoactive polymer brush materials and EUV patterning using the same Grant 10,831,102 - De Silva , et al. November 10, 2	2020-11-10
Inverse Tone Pillar Printing App 20200350177 - Felix; Nelson ; et al.	2020-11-05
Polymer Brush Adhesion Promoter With Uv Cleavable Linker App 20200292942 - Guo; Jing ; et al.	2020-09-17
Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing Grant 10,768,532 - Sha , et al. Sep	2020-09-08
Enabling Residue Free Gap Fill Between Nanosheets App 20200279956 - SESHADRI; Indira ; et al.	2020-09-03
EUV Pattern Transfer Using Graded Hardmask App 20200272045 - Felix; Nelson ; et al.	2020-08-27
Patterning directly on an amorphous silicon hardmask Grant 10,755,926 - Arceo de la Pena , et al. A	2020-08-25
Fabricating electrically nonconductive blocks using a polymer brush and a sequential infiltration synthesis process Grant 10,755,928 - Liu , et al. A	2020-08-25
Embedded etch rate reference layer for enhanced etch time precision Grant 10,748,823 - Mignot , et al. A	2020-08-18
Boundary protection for CMOS multi-threshold voltage devices Grant 10,741,454 - Guo , et al. A	2020-08-11
Fabricating Electrically Nonconductive Blocks Using A Polymer Brush And A Sequential Infiltration Synthesis Process App 20200243335 - Liu; Chi-Chun ; et al.	2020-07-30
Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer Grant 10,656,527 - De Silva , et al.	2020-05-19
Enabling residue free gap fill between nanosheets Grant 10,658,521 - Seshadri , et al.	2020-05-19
Spacer-defined Process For Lithography-etch Double Patterning For Interconnects App 20200135542 - Felix; Nelson ; et al.	2020-04-30
Line Break Repairing Layer For Extreme Ultraviolet Patterning Stacks App 20200124972 - MELI THOMPSON; Luciana ; et al.	2020-04-23
Tunable hardmask for overlayer metrology contrast Grant 10,622,248 - De Silva , et al.	2020-04-14
Embedded Etch Rate Reference Layer For Enhanced Etch Time Precision App 20200105628 - Mignot; Yann ; et al.	2020-04-02
Patterning Directly On An Amorphous Silicon Hardmask App 20200090928 - Arceo de la Pena; Abraham ; et al.	2020-03-19
Wet strippable OPL using reversible UV crosslinking and de-crosslinking Grant 10,586,697 - De Silva , et al.	2020-03-10
Method To Create Multilayer Microfluidic Chips Using Spin-on Carbon As Gap Filling Materials App 20200070150 - Liu; Chi-Chun ; et al.	2020-03-05
Method To Create Multilayer Microfluidic Chips Using Spin-on Carbon As Gap Fill And Spin-on Glass Tone Inversion App 20200070151 - Liu; Chi-Chun ; et al.	2020-03-05
Post-lithography defect inspection using an e-beam inspection tool Grant 10,578,981 - Meli Thompson , et al.	2020-03-03
Alternating Hard Mask For Tight-pitch Fin Formation App 20200066520 - ARNOLD; JOHN C. ; et al.	2020-02-27
Self-priming Resist For Generic Inorganic Hardmasks App 20200050108 - Liu; Chi-Chun ; et al.	2020-02-13
Boundary Protection For Cmos Multi-threshold Voltage Devices App 20200051872 - Guo; Jing ; et al.	2020-02-13
Patterning Material Film Stack With Hard Mask Layer Configured To Support Selective Deposition On Patterned Resist Layer App 20200050113 - De Silva; Ekmini Anuja ; et al.	2020-02-13
Post-lithography Defect Inspection Using An E-beam Inspection Tool App 20200033733 - Meli Thompson; Luciana ; et al.	2020-01-30
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay Grant 10,545,409 - Murray , et al. Ja	2020-01-28
Extreme Ultraviolet (euv) Mask Stack Processing App 20190391481 - Xu; Yongan ; et al.	2019-12-26
Tunable Hardmask For Overlayer Metrology Contrast App 20190371651 - De Silva; Ekmini A. ; et al.	2019-12-05
Enabling Residue Free Gap Fill Between Nanosheets App 20190355851 - SESHADRI; Indira ; et al.	2019-11-21
Co-optimization Of Lithographic And Etching Processes With Complementary Post Exposure Bake By Laser Annealing App 20190354022 - SHA; Jing ; et al.	2019-11-21
Multi-channel Overlay Metrology App 20190316900 - Muthinti; Gangadhara Raja ; et al.	2019-10-17
Care area generation by detection optimized methodology Grant 10,437,951 - Bonam , et al. O	2019-10-08
Wet Strippable Opl Using Reversible Uv Crosslinking And De-crosslinking App 20190295841 - De Silva; Ekmini A. ; et al.	2019-09-26
Photoactive Polymer Brush Materials And Euv Patterning Using The Same App 20190271913 - De Silva; Ekmini A. ; et al.	2019-09-05
Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography App 20190267234 - De Silva; Ekmini Anuja ; et al.	2019-08-29
Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography App 20190259601 - De Silva; Ekmini Anuja ; et al.	2019-08-22
Wet strippable OPL using reversible UV crosslinking and de-crosslinking Grant 10,388,510 - De Silva , et al. A	2019-08-20
Wet Strippable Opl Using Reversible Uv Crosslinking And De-crosslinking App 20190221423 - De Silva; Ekmini A. ; et al.	2019-07-18
Simplified block patterning with wet strippable hardmask for high-energy implantation Grant 10,354,922 - De Silva , et al. July 16, 2	2019-07-16
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Grant 10,347,486 - De Silva , et al. July 9, 2	2019-07-09
Tunable Hardmask For Overlayer Metrology Contrast App 20190206722 - De Silva; Ekmini A. ; et al.	2019-07-04
Patterning Material Film Stack With Hard Mask Layer Configured To Support Selective Deposition On Patterned Resist Layer App 20190196340 - De Silva; Ekmini Anuja ; et al.	2019-06-27
Simplified Block Patterning With Wet Strippable Hardmask For High-energy Implantation App 20190198398 - De Silva; Ekmini Anuja ; et al.	2019-06-27
Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography App 20190189428 - De Silva; Ekmini Anuja ; et al.	2019-06-20
Patterning Directly On An Amorphous Silicon Hardmask App 20190157072 - Arceo de la Pena; Abraham ; et al.	2019-05-23
Care Area Generation By Detection Optimized Methodology App 20190065634 - Bonam; Ravi K. ; et al.	2019-02-28
Self-calibrated alignment and overlay target and measurement Grant 8,638,438 - Ausschnitt , et al. January 28, 2	2014-01-28
Self-Calibrated Alignment and Overlay Target and Measurement App 20130044320 - Ausschnitt; Christopher P. ; et al.	2013-02-21

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