Patent | Date |
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Line break repairing layer for extreme ultraviolet patterning stacks Grant 11,300,881 - Meli Thompson , et al. April 12, 2 | 2022-04-12 |
Semiconductor structure with fully aligned vias Grant 11,302,573 - De Silva , et al. April 12, 2 | 2022-04-12 |
Bottom Source/drain Etch With Fin-cut-last-vtfet App 20220069106 - Li; Tao ;   et al. | 2022-03-03 |
Polymer Brush Adhesion Promoter With Uv Cleavable Linker App 20220043353 - Guo; Jing ;   et al. | 2022-02-10 |
Bottom source/drain etch with fin-cut-last-VTFET Grant 11,245,027 - Li , et al. February 8, 2 | 2022-02-08 |
Litho-etch-litho-etch with self-aligned blocks Grant 11,239,077 - Liu , et al. February 1, 2 | 2022-02-01 |
Self-priming resist for generic inorganic hardmasks Grant 11,226,561 - Liu , et al. January 18, 2 | 2022-01-18 |
Spacer-defined Process For Lithography-etch Double Patterning For Interconnects App 20220013405 - Felix; Nelson ;   et al. | 2022-01-13 |
Inverse Tone Pillar Printing App 20210398816 - Felix; Nelson ;   et al. | 2021-12-23 |
Polymer brush adhesion promoter with UV cleavable linker Grant 11,199,778 - Guo , et al. December 14, 2 | 2021-12-14 |
Method to create multilayer microfluidic chips using spin-on carbon as gap filling materials Grant 11,192,101 - Liu , et al. December 7, 2 | 2021-12-07 |
Back-end-of-line compatible processing for forming an array of pillars Grant 11,195,995 - Liu , et al. December 7, 2 | 2021-12-07 |
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Grant 11,177,130 - De Silva , et al. November 16, 2 | 2021-11-16 |
Spacer-defined process for lithography-etch double patterning for interconnects Grant 11,164,772 - Felix , et al. November 2, 2 | 2021-11-02 |
Organic Photoresist Adhesion To Metal Oxide Hardmasks App 20210325784 - Arceo de la Pena; Abraham ;   et al. | 2021-10-21 |
Extreme ultraviolet (EUV) mask stack processing Grant 11,131,919 - Xu , et al. September 28, 2 | 2021-09-28 |
Self-aligned top via Grant 11,133,260 - Liu , et al. September 28, 2 | 2021-09-28 |
Inverse tone pillar printing method using polymer brush grafts Grant 11,133,195 - Felix , et al. September 28, 2 | 2021-09-28 |
Bottom Source/drain Etch With Fin-cut-last-vtfet App 20210288164 - Li; Tao ;   et al. | 2021-09-16 |
Tunable hardmask for overlayer metrology contrast Grant 11,121,024 - De Silva , et al. September 14, 2 | 2021-09-14 |
Method to create multilayer microfluidic chips using spin-on carbon as gap fill and spin-on glass tone inversion Grant 11,084,032 - Liu , et al. August 10, 2 | 2021-08-10 |
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay Grant 11,067,896 - Murray , et al. July 20, 2 | 2021-07-20 |
Back-end-of-line Compatible Processing For Forming An Array Of Pillars App 20210210679 - Liu; Chi-Chun ;   et al. | 2021-07-08 |
Multi-channel overlay metrology Grant 11,054,250 - Muthinti , et al. July 6, 2 | 2021-07-06 |
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Grant 11,037,786 - De Silva , et al. June 15, 2 | 2021-06-15 |
Self-aligned Top Via App 20210151377 - Liu; Chi-Chun ;   et al. | 2021-05-20 |
Litho-etch-litho-etch With Self-aligned Blocks App 20210143013 - Liu; Chi-Chun ;   et al. | 2021-05-13 |
Sequential infiltration synthesis extreme ultraviolet single expose patterning Grant 10,998,192 - De Silva , et al. May 4, 2 | 2021-05-04 |
Processes For Forming Fully Aligned Vias App 20210104432 - De Silva; Ekmini Anuja ;   et al. | 2021-04-08 |
Sequential Infiltration Synthesis Extreme Ultraviolet Single Expose Patterning App 20210082697 - De Silva; Ekmini Anuja ;   et al. | 2021-03-18 |
Patterning directly on an amorphous silicon hardmask Grant 10,950,440 - Arceo de la Pena , et al. March 16, 2 | 2021-03-16 |
Process Optimization by Clamped Monte Carlo Distribution App 20210049242 - Halle; Scott ;   et al. | 2021-02-18 |
Dynamic Adjustment Of Post Exposure Bake During Lithography Utilizing Real-time Feedback For Wafer Exposure Delay App 20200379354 - MURRAY; Cody John ;   et al. | 2020-12-03 |
Photoactive polymer brush materials and EUV patterning using the same Grant 10,831,102 - De Silva , et al. November 10, 2 | 2020-11-10 |
Inverse Tone Pillar Printing App 20200350177 - Felix; Nelson ;   et al. | 2020-11-05 |
Polymer Brush Adhesion Promoter With Uv Cleavable Linker App 20200292942 - Guo; Jing ;   et al. | 2020-09-17 |
Co-optimization of lithographic and etching processes with complementary post exposure bake by laser annealing Grant 10,768,532 - Sha , et al. Sep | 2020-09-08 |
Enabling Residue Free Gap Fill Between Nanosheets App 20200279956 - SESHADRI; Indira ;   et al. | 2020-09-03 |
EUV Pattern Transfer Using Graded Hardmask App 20200272045 - Felix; Nelson ;   et al. | 2020-08-27 |
Patterning directly on an amorphous silicon hardmask Grant 10,755,926 - Arceo de la Pena , et al. A | 2020-08-25 |
Fabricating electrically nonconductive blocks using a polymer brush and a sequential infiltration synthesis process Grant 10,755,928 - Liu , et al. A | 2020-08-25 |
Embedded etch rate reference layer for enhanced etch time precision Grant 10,748,823 - Mignot , et al. A | 2020-08-18 |
Boundary protection for CMOS multi-threshold voltage devices Grant 10,741,454 - Guo , et al. A | 2020-08-11 |
Fabricating Electrically Nonconductive Blocks Using A Polymer Brush And A Sequential Infiltration Synthesis Process App 20200243335 - Liu; Chi-Chun ;   et al. | 2020-07-30 |
Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer Grant 10,656,527 - De Silva , et al. | 2020-05-19 |
Enabling residue free gap fill between nanosheets Grant 10,658,521 - Seshadri , et al. | 2020-05-19 |
Spacer-defined Process For Lithography-etch Double Patterning For Interconnects App 20200135542 - Felix; Nelson ;   et al. | 2020-04-30 |
Line Break Repairing Layer For Extreme Ultraviolet Patterning Stacks App 20200124972 - MELI THOMPSON; Luciana ;   et al. | 2020-04-23 |
Tunable hardmask for overlayer metrology contrast Grant 10,622,248 - De Silva , et al. | 2020-04-14 |
Embedded Etch Rate Reference Layer For Enhanced Etch Time Precision App 20200105628 - Mignot; Yann ;   et al. | 2020-04-02 |
Patterning Directly On An Amorphous Silicon Hardmask App 20200090928 - Arceo de la Pena; Abraham ;   et al. | 2020-03-19 |
Wet strippable OPL using reversible UV crosslinking and de-crosslinking Grant 10,586,697 - De Silva , et al. | 2020-03-10 |
Method To Create Multilayer Microfluidic Chips Using Spin-on Carbon As Gap Filling Materials App 20200070150 - Liu; Chi-Chun ;   et al. | 2020-03-05 |
Method To Create Multilayer Microfluidic Chips Using Spin-on Carbon As Gap Fill And Spin-on Glass Tone Inversion App 20200070151 - Liu; Chi-Chun ;   et al. | 2020-03-05 |
Post-lithography defect inspection using an e-beam inspection tool Grant 10,578,981 - Meli Thompson , et al. | 2020-03-03 |
Alternating Hard Mask For Tight-pitch Fin Formation App 20200066520 - ARNOLD; JOHN C. ;   et al. | 2020-02-27 |
Self-priming Resist For Generic Inorganic Hardmasks App 20200050108 - Liu; Chi-Chun ;   et al. | 2020-02-13 |
Boundary Protection For Cmos Multi-threshold Voltage Devices App 20200051872 - Guo; Jing ;   et al. | 2020-02-13 |
Patterning Material Film Stack With Hard Mask Layer Configured To Support Selective Deposition On Patterned Resist Layer App 20200050113 - De Silva; Ekmini Anuja ;   et al. | 2020-02-13 |
Post-lithography Defect Inspection Using An E-beam Inspection Tool App 20200033733 - Meli Thompson; Luciana ;   et al. | 2020-01-30 |
Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay Grant 10,545,409 - Murray , et al. Ja | 2020-01-28 |
Extreme Ultraviolet (euv) Mask Stack Processing App 20190391481 - Xu; Yongan ;   et al. | 2019-12-26 |
Tunable Hardmask For Overlayer Metrology Contrast App 20190371651 - De Silva; Ekmini A. ;   et al. | 2019-12-05 |
Enabling Residue Free Gap Fill Between Nanosheets App 20190355851 - SESHADRI; Indira ;   et al. | 2019-11-21 |
Co-optimization Of Lithographic And Etching Processes With Complementary Post Exposure Bake By Laser Annealing App 20190354022 - SHA; Jing ;   et al. | 2019-11-21 |
Multi-channel Overlay Metrology App 20190316900 - Muthinti; Gangadhara Raja ;   et al. | 2019-10-17 |
Care area generation by detection optimized methodology Grant 10,437,951 - Bonam , et al. O | 2019-10-08 |
Wet Strippable Opl Using Reversible Uv Crosslinking And De-crosslinking App 20190295841 - De Silva; Ekmini A. ;   et al. | 2019-09-26 |
Photoactive Polymer Brush Materials And Euv Patterning Using The Same App 20190271913 - De Silva; Ekmini A. ;   et al. | 2019-09-05 |
Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography App 20190267234 - De Silva; Ekmini Anuja ;   et al. | 2019-08-29 |
Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography App 20190259601 - De Silva; Ekmini Anuja ;   et al. | 2019-08-22 |
Wet strippable OPL using reversible UV crosslinking and de-crosslinking Grant 10,388,510 - De Silva , et al. A | 2019-08-20 |
Wet Strippable Opl Using Reversible Uv Crosslinking And De-crosslinking App 20190221423 - De Silva; Ekmini A. ;   et al. | 2019-07-18 |
Simplified block patterning with wet strippable hardmask for high-energy implantation Grant 10,354,922 - De Silva , et al. July 16, 2 | 2019-07-16 |
Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Grant 10,347,486 - De Silva , et al. July 9, 2 | 2019-07-09 |
Tunable Hardmask For Overlayer Metrology Contrast App 20190206722 - De Silva; Ekmini A. ;   et al. | 2019-07-04 |
Patterning Material Film Stack With Hard Mask Layer Configured To Support Selective Deposition On Patterned Resist Layer App 20190196340 - De Silva; Ekmini Anuja ;   et al. | 2019-06-27 |
Simplified Block Patterning With Wet Strippable Hardmask For High-energy Implantation App 20190198398 - De Silva; Ekmini Anuja ;   et al. | 2019-06-27 |
Patterning Material Film Stack With Metal-containing Top Coat For Enhanced Sensitivity In Extreme Ultraviolet (euv) Lithography App 20190189428 - De Silva; Ekmini Anuja ;   et al. | 2019-06-20 |
Patterning Directly On An Amorphous Silicon Hardmask App 20190157072 - Arceo de la Pena; Abraham ;   et al. | 2019-05-23 |
Care Area Generation By Detection Optimized Methodology App 20190065634 - Bonam; Ravi K. ;   et al. | 2019-02-28 |
Self-calibrated alignment and overlay target and measurement Grant 8,638,438 - Ausschnitt , et al. January 28, 2 | 2014-01-28 |
Self-Calibrated Alignment and Overlay Target and Measurement App 20130044320 - Ausschnitt; Christopher P. ;   et al. | 2013-02-21 |