U.S. patent application number 14/326760 was filed with the patent office on 2014-10-30 for semiconductor devices and methods of manufacturing the same.
The applicant listed for this patent is Samsung Electronics Co., Ltd.. Invention is credited to Jeong-Nam Han, Sang-Jine Park, Myung-Geun Song, Bo-Un Yoon.
Application Number | 20140322881 14/326760 |
Document ID | / |
Family ID | 45995732 |
Filed Date | 2014-10-30 |
United States Patent
Application |
20140322881 |
Kind Code |
A1 |
Park; Sang-Jine ; et
al. |
October 30, 2014 |
SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME
Abstract
Provided are a semiconductor device, which can facilitate a
salicide process and can prevent a gate from being damaged due to
misalign, and a method of manufacturing of the semiconductor
device. The method includes forming a first insulation layer
pattern on a substrate having a gate pattern and a source/drain
region formed at both sides of the gate pattern, the first
insulation layer pattern having an exposed portion of the
source/drain region, forming a silicide layer on the exposed
source/drain region, forming a second insulation layer on the
entire surface of the substrate to cover the first insulation layer
pattern and the silicide layer, and forming a contact hole in the
second insulation layer to expose the silicide layer.
Inventors: |
Park; Sang-Jine; (Yongin-si,
KR) ; Yoon; Bo-Un; (Seoul, KR) ; Han;
Jeong-Nam; (Seoul, KR) ; Song; Myung-Geun;
(Yongin-si, KR) |
|
Applicant: |
Name |
City |
State |
Country |
Type |
Samsung Electronics Co., Ltd. |
Suwon-si |
|
KR |
|
|
Family ID: |
45995732 |
Appl. No.: |
14/326760 |
Filed: |
July 9, 2014 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
13241324 |
Sep 23, 2011 |
8803248 |
|
|
14326760 |
|
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Current U.S.
Class: |
438/285 |
Current CPC
Class: |
H01L 29/66636 20130101;
H01L 21/28518 20130101; H01L 29/4966 20130101; H01L 29/7834
20130101; H01L 21/76802 20130101; H01L 29/7845 20130101; H01L
29/6659 20130101; H01L 29/495 20130101; H01L 29/4175 20130101; H01L
29/66628 20130101; H01L 29/7848 20130101; H01L 29/66545 20130101;
H01L 29/41775 20130101; H01L 29/665 20130101 |
Class at
Publication: |
438/285 |
International
Class: |
H01L 29/66 20060101
H01L029/66 |
Foreign Application Data
Date |
Code |
Application Number |
Nov 3, 2010 |
KR |
10-2010-0108669 |
Claims
1. A method of manufacturing a semiconductor device, the method
comprising: forming, on a substrate, a source/drain region on
substantially opposing sides of a gate pattern that is on the
substrate; forming a first insulation layer pattern on the
substrate, the first insulation layer pattern including an exposed
portion of the source/drain region; forming a silicide layer on the
exposed portions of the source/drain region by depositing at least
one metal layer on the exposed portion of the source/drain region
to react with the source/drain region; forming a second insulation
layer on the surface of the substrate to cover the first insulation
layer pattern and the silicide layer; forming a contact hole in the
second insulation layer by etching the second insulation layer to
expose the silicide layer; and forming a metal wire contact by
filling the contact hole with conductive material.
2. The method according to claim 1, wherein an aspect ratio of the
source/drain region to the gate pattern is about 3:1 or less.
3. The method according to claim 1, wherein a step difference
between the source/drain region and the gate pattern is about 250
.ANG. or less from the substrate.
4. The method according to claim 1, wherein the source/drain region
and the gate pattern are positioned at substantially a same height
from the substrate.
5. The method according to claim 1, wherein the gate electrode is
formed of a metal containing material.
6. The method according to claim 1, wherein the first insulation
layer pattern includes a first material and the second insulation
layer includes a second material that is different from the first
material.
7. The method according to claim 1, wherein the first insulation
layer pattern is formed of SiN.
8. The method according to claim 1, wherein the second insulation
layer is formed of silicon oxide.
9. The method according to claim 1, wherein the source/drain region
is formed by implanting n- or p-type impurity ions through
epitaxial growth.
10. The method according to claim 1, wherein forming the silicide
layer on the exposed portions of the source/drain region comprises
reacting the metal layer with silicon of the source/drain
region.
11. The method according to claim 1, wherein the source/drain
region is formed by epitaxially growing a silicon germanium layer
in a trench formed by etching a predetermined region of the
substrate.
12. The method according to claim 11, wherein the trench has a
hexagonal profile.
13. The method according to claim 11, wherein the trench includes a
tip having a maximum width that is aligned with sidewalls of the
gate pattern.
Description
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application is a divisional application of U.S. Ser.
No. 13/241,324 filed on Sep. 23, 2011, which claims priority from
Korean Patent Application No. 10-2010-0108669 filed on Nov. 3, 2010
in the Korean Intellectual Property Office, and all the benefits
accruing therefrom under 35 U.S.C. 119, the contents of which in
their entirety are herein incorporated by reference.
BACKGROUND
[0002] A recent trend toward high integration of semiconductor
devices uses a gate electrode of a memory device that occupies an
increasingly smaller space. In this regard, the width and contact
area of the gate electrode may be gradually reduced. Accordingly,
contact resistance and sheet resistance of the gate electrode tend
to increase, which may undesirably lower the operating speed.
Therefore, a salicide (self-aligned silicide) process in which a
metal gate is employed in order to reduce the resistance has been
studied and developed.
[0003] However, since a highly integrated semiconductor device may
have a reduced gate line width compared to a height of the gate
electrode, it may not be easy to deposit the metal material during
the salicide process. In addition, in a case where the metal gate
and the salicide process are both employed, the metal gate may be
dissolved in a wet-etching solution used in the salicide process or
a metal stripping material. As such the metal gate may be damaged.
Further, the more highly integrated the semiconductor device, the
smaller the manufacturing margin thereof. Thus, in a case where
misalignment occurs during the salicide process, a probability of
the metal gate being damage may be increased.
SUMMARY
[0004] Some embodiments of the present invention provide
semiconductor devices, which can facilitate a salicide process and
can reduce or prevent damage to a gate due to misalignment.
[0005] Some embodiments of the present invention provide methods of
manufacturing of semiconductor devices.
[0006] These and other objects of the present inventive concept
will be described in or be apparent from the following
description.
[0007] According to an aspect of the present disclosure, methods of
manufacturing of a semiconductor device may include forming a first
insulation layer pattern on a substrate having a gate pattern and a
source/drain region formed at both sides of the gate pattern, the
first insulation layer pattern having an exposed portion of the
source/drain region. Operations may include forming a silicide
layer on the exposed source/drain region, forming a second
insulation layer on the entire surface of the substrate to cover
the first insulation layer pattern and the silicide layer, and
forming a contact hole in the second insulation layer to expose the
silicide layer.
[0008] Some embodiments provide that methods of manufacturing a
semiconductor device may include forming on a substrate a dummy
gate pattern and source/drain region formed at both sides of the
gate pattern, forming a passivation layer on the dummy gate pattern
and the source/drain region, and removing the passivation layer to
expose the dummy gate pattern and removing the exposed dummy gate
pattern. Operations may further include forming a gate insulation
layer and a metal layer on the entire surface of the substrate to
cover a region having the dummy gate pattern removed therefrom and
the passivation layer, and forming a metal gate pattern by
performing planarization until the passivation layer is exposed.
The passivation layer may be removed and a first insulation layer
pattern may be formed on the entire surface of the substrate having
a portion of the source/drain region exposed. Operations may
further include forming a silicide layer on the exposed
source/drain region, forming a second insulation layer pattern on
the entire surface of the substrate to cover the first insulation
layer pattern and the silicide layer, and forming a contact hole in
the second insulation layer to expose the silicide layer.
[0009] In some embodiments, a semiconductor device includes a gate
pattern including a gate insulation layer and a gate electrode
formed on a substrate, a source/drain region formed at both sides
of the gate pattern, a silicide layer formed on the source/drain
region, a contact hole formed on the silicide layer, and an
insulation layer formed on the gate pattern and the source/drain
region and including the contact hole formed therein.
[0010] Some embodiments provide that the gate pattern and the
source/drain region have an aspect ratio of 3:1 or less.
[0011] In some embodiments, a semiconductor device may include a
gate pattern including a gate insulation layer and a gate electrode
formed on a substrate, a source/drain region formed at both sides
of the gate pattern, a silicide layer formed on the source/drain
region, a contact hole formed on the silicide layer, and an
insulation layer formed on the gate pattern and the source/drain
region and including the contact hole formed therein, wherein the
gate pattern and the source/drain region have an aspect ratio of
3:1 or less.
[0012] As described above, in the methods disclosed herein, since a
silicide layer is formed on a source/drain region before forming a
contact hole, a difficulty with deposition of a metal during a
salicide process performed after forming the contact hole can be
overcome.
[0013] In addition, in the methods disclosed herein, it is possible
to reduce or prevent damage to a metal gate due to misalignment
during a salicide process.
[0014] Further, since the semiconductor devices disclosed herein
may have a relatively small step difference between a source/drain
region and a gate, which reduces an aspect ratio of a contact hole,
efficiency of subsequent processes may be increased.
BRIEF DESCRIPTION OF THE DRAWINGS
[0015] The above and other features and advantages of the present
invention will become more apparent by describing in detail
preferred embodiments thereof with reference to the attached
drawings in which:
[0016] FIG. 1 is a cross-sectional view of a semiconductor device
according to some embodiments disclosed herein;
[0017] FIG. 2 is a cross-sectional view of a semiconductor device
according to some embodiments disclosed herein;
[0018] FIG. 3 is a flow chart illustrating operations corresponding
to methods of manufacturing a semiconductor device according to
some embodiments disclosed herein;
[0019] FIGS. 4A through 4G are cross-sectional views illustrating
operations corresponding to methods of manufacturing a
semiconductor device shown in FIG. 3;
[0020] FIG. 5 is a flow chart illustrating operations corresponding
to methods of manufacturing a semiconductor device according to
some other embodiments disclosed herein; and
[0021] FIGS. 6A through 6N are cross-sectional views illustrating
operations corresponding to methods of manufacturing a
semiconductor device shown in FIG. 5.
DETAILED DESCRIPTION
[0022] Advantages and features of the present disclosure and
methods of accomplishing the same may be understood more readily by
reference to the following detailed description of preferred
embodiments and the accompanying drawings. The present invention
may, however, be embodied in many different forms and should not be
construed as being limited to the embodiments set forth herein.
Rather, these embodiments are provided so that this disclosure will
be thorough and complete and will fully convey the concept of the
invention to those skilled in the art, and the present invention
will only be defined by the appended claims. In the drawings, the
thickness of layers and regions are exaggerated for clarity.
[0023] It will be understood that when an element or layer is
referred to as being "on," or "connected to" another element or
layer, it can be directly on or connected to the other element or
layer or intervening elements or layers may be present. In
contrast, when an element is referred to as being "directly on" or
"directly connected to" another element or layer, there are no
intervening elements or layers present. As used herein, the term
"and/or" includes any and all combinations of one or more of the
associated listed items.
[0024] It will be understood that, although the terms first,
second, etc. may be used herein to describe various elements, these
elements should not be limited by these terms. These terms are only
used to distinguish one element from another element. Thus, for
example, a first element, a first component or a first section
discussed below could be termed a second element, a second
component or a second section without departing from the teachings
of the present invention.
[0025] The terminology used herein is for the purpose of describing
particular embodiments only and is not intended to be limiting of
the invention. As used herein, the singular forms "a", "an" and
"the" are intended to include the plural forms as well, unless the
context clearly indicates otherwise. It will be further understood
that the terms "comprises" and/or "made of," when used in this
specification, specify the presence of stated features, integers,
steps, operations, elements, and/or components, but do not preclude
the presence or addition of one or more other features, integers,
steps, operations, elements, components, and/or groups thereof.
[0026] Embodiments described herein will be described referring to
plan views and/or cross-sectional views by way of ideal schematic
views of the invention. Accordingly, the example views may be
modified depending on manufacturing technologies and/or tolerances.
Therefore, the embodiments disclosed herein are not limited to
those shown in the views, but include modifications in
configuration formed on the basis of manufacturing processes.
Therefore, regions exemplified in figures have schematic properties
and shapes of regions shown in figures, exemplify specific shapes
of regions of elements and do not limit aspects of the
disclosure.
[0027] Unless otherwise defined, all terms (including technical and
scientific terms) used herein have the same meaning as commonly
understood by one of ordinary skill in the art to which this
invention belongs. It will be further understood that terms, such
as those defined in commonly used dictionaries, should be
interpreted as having a meaning that is consistent with their
meaning in the context of the relevant art and the present
disclosure, and will not be interpreted in an idealized or overly
formal sense unless expressly so defined herein.
[0028] Hereinafter, the embodiments disclosed herein will be
described in further detail with reference to the accompanying
drawings.
[0029] A semiconductor device according to some embodiments will
now be described in more detail with reference to FIG. 1, which is
a cross-sectional view of a semiconductor device according to some
embodiments of the present disclosure.
[0030] Referring to FIG. 1, the semiconductor device 100 according
to the illustrated embodiment includes a gate pattern 120, a
source/drain region 132, a silicide layer 147, a contact hole 151,
a first insulation layer 143 and a second insulation layer 148. The
semiconductor device 100 according to the illustrated embodiments
may further include a gate spacer 124.
[0031] The gate pattern 120 is formed on a substrate 110 and
includes a gate insulation layer 120a and a gate electrode
120b.
[0032] The substrate 110 may be a silicon substrate, an SOI
(Silicon On Insulator) substrate, a gallium arsenic substrate, a
silicon germanium substrate, a ceramic substrate, a rigid substrate
such as a quartz substrate or a glass substrate for a display, or a
substrate made of a flexible plastic such as polyimide, polyester,
polycarbonate, polyethersulfone, polymethylmethacrylate,
polyethylenenaphthalate, and/or polyethyleneterephthalate, among
others.
[0033] The gate insulation layer 120a may use a silicon oxide
layer, SiON, Ge.sub.xO.sub.yN.sub.z, Ge.sub.xSi.sub.yO.sub.z, a
highly dielectric material, combinations of these materials, and/or
a stack of layers formed by sequentially stacking these materials.
Here, the highly dielectric material is formed using HfO.sub.2,
ZrO.sub.2, Al.sub.2O.sub.3, Ta.sub.2O.sub.5, hafnium silicate,
zirconium silicate or a combination thereof but not limited
thereto. FIG. 1 illustrates a structure in which the gate
insulation layer 120a surrounds sidewalls and a bottom of the gate
electrode 120b, but a structure in which the gate electrode 120b is
stacked on the gate insulation layer 120a may also be applied to
embodiments disclosed herein.
[0034] The gate electrode 120b may be formed of a single film of
poly-Si, poly-SiGe, impurity-doped poly-Si, a metal such as Ta,
TaN, TaSiN, TiN, Mo, Ru, Ni, or NiSi, or metal silicide, or a
stacked film of a combination of these materials, but not limited
thereto. Some embodiments provide that the gate electrode 26 may be
formed of a metal or metal silicide capable of implementing low
resistance on a finer line width while not necessitating doping of
impurities.
[0035] Although not shown in FIG. 1, a hard mask film that protects
the gate electrode 120b may be formed on the gate electrode 120b.
Here, the hard mask film may be formed of SiN or SiON.
[0036] The gate spacer 124 is formed on sidewalls of the gate
insulation layer 120a and the gate electrode 120b to protect the
gate electrode 120b.
[0037] The gate spacer 124 may include a first spacer 124a and a
second spacer 124b. The first spacer 124a may be formed of a
silicon oxide film, and the second spacer 124b may be formed of a
silicon nitride film.
[0038] The source/drain region 132 is formed at both sides of the
gate pattern 120, respectively and may have an elevated structure
in which the source/drain region 132 is elevated from the substrate
110, thereby forming a junction having a constant depth. The
elevated source and drain region structure is formed on a top
surface of the substrate 110 having a penetration range (Rp) caused
by impurity implementation, thereby obtaining a shallow junction
structure. Accordingly, deterioration in the device characteristic
due to a short channel effect can be improved.
[0039] The source/drain region 132 may be formed of an epitaxially
grown silicon layer. Specifically, in order to suppress diffusion
of impurities and improve mobility of carriers in a channel region,
an NMOS is formed by implanting an impurity such as phosphorus (P)
as an n-type dopant into Si or a SiC epitaxial layer, while a PMOS
is formed by implanting an impurity such as boron (B) as an n-type
dopant into a SiGe epitaxial layer. In addition, since the
source/drain region 132 has a facet formed on upper side surface, a
gap between the source/drain region 132 and the gate pattern 120
may be created at a portion where a facet of the source/drain
region 132 is formed.
[0040] The gate pattern 120 and the source/drain region 132 may
have an aspect ratio of 3:1 or less. As used herein, the aspect
ratio refers to a ratio of a step difference (a) between a top
portion of the gate pattern 120 and a top portion of the
source/drain region 132 to a width (b) of the source/drain region
132. When the aspect ratio is 3:1 or less, uniform deposition may
be achieved in a subsequent process. The gate pattern 120 and the
source/drain region 132 may have a step difference of 250 A or less
from the substrate 110. If the step difference between the gate
pattern 120 and the source/drain region 132 is 250 .ANG. or less,
the aspect ratio may be reduced, thereby facilitating deposition in
a subsequent deposition process performed on the gate pattern 120
and the source/drain region 132 and forming a uniformly deposited
film.
[0041] The source/drain region 132 may be formed to have the same
height as the gate pattern 120. FIG. 1 illustrates a structure in
which the source/drain region 132 is elevated as high as the gate
pattern 120.
[0042] The silicide layer 147 is formed on the source/drain region
132 to reduce contact resistance. The silicide layer 147 may be
formed by depositing a metal layer on the source/drain region 132
and reacting the metal layer with the source/drain region 132,
followed by removing the unreacted portion of the metal layer.
[0043] The silicide layer 147 may include Ni, Co, Pt or Ti, and may
be formed by being permeated to the top portion of the source/drain
region 132 to a predetermined depth. Alternatively, the silicide
layer 147 may be formed on the source/drain region 132 to a
predetermined height.
[0044] The first insulation layer 143 is formed on the gate pattern
120 and the source/drain region 132. The first insulation layer 143
serves to planarize the surface of the substrate 110 having the
gate pattern 120 and the source/drain region 132 while
substantially completely covering the gate pattern 120 and the
source/drain region 132. In addition, the first insulation layer
143 serves to prevent the gate electrode from being damaged in a
subsequent process by filling the gap by the facet of the
source/drain region 132. Further, the first insulation layer 143
may function as an etch stopper in an etching process of forming,
for example, a contact hole 151. Therefore, the first insulation
layer 143 may be formed of a material having a different etch ratio
from the second insulation layer 148. Specifically, the first
insulation layer 143 may be formed by a silicon oxide film, a
silicon nitride film, or a double-layered structure of these films.
The first insulation layer 143 may be formed by a silicon nitride
film.
[0045] The second insulation layer 148 is formed on the first
insulation layer 143, and may be formed of, but is not limited to,
a silicon oxide film, a silicon nitride film, or a multiple-layered
structure of one or more of these films.
[0046] The contact hole 151 is formed in the first insulation layer
143 and the second insulation layer 148 to expose the predetermined
region of the silicide layer 147. In detail, since the contact hole
151 is formed on the silicide layer 147, the silicide layer 147 is
exposed at the bottom of the contact hole 151, thereby reducing
contact resistance while not necessitating separately forming a
silicide layer in the bottom of the contact hole 151. The contact
hole 151 may be filled with a metal such as tungsten (W).
[0047] In the illustrated embodiments, the source/drain region 132
and the gate pattern 120 may have a relatively small step
difference and the contact hole 151 is formed on the silicide layer
147. Therefore, even if misalignment occurs during formation of the
contact hole, it is possible to prevent the gate electrode from
being damaged.
[0048] Next, a semiconductor device 200 according to other
embodiments disclosed herein will be described with reference to
FIG. 2, which is a cross-sectional view of a semiconductor device
according to such embodiments.
[0049] The semiconductor device 200 is different from the
semiconductor device 100 shown in FIG. 1 in that it has a source
and drain region 232 different from the corresponding portion of
the previous embodiment in view of configuration, including a
lightly doped source/drain region 211 and a heavily doped
source/drain region 212. Thus, the following description of the
illustrated semiconductor device will focus on the differences from
the previously described embodiments of FIG. 1. Accordingly, the
same reference numerals will be used to refer to the same elements
as those described in FIG. 1, and detailed explanation thereof may
be omitted.
[0050] The source and drain regions 232 may be formed of an
epitaxial layer formed in a trench formed by etching a
predetermined area of the substrate 110. In detail, a preliminary
trench is formed in the substrate 110 and a trench for epitaxial
formation is formed by further laterally etching sidewalls of the
preliminary trench, followed by being subjected to epitaxial growth
in the trench for epitaxial formation.
[0051] The trench for epitaxial formation may have a hexagonal
profile, and the epitaxial layer may be a silicon layer or a
silicon germanium (SiGe) layer formed by being subjected to
epitaxial growth in the trench for epitaxial formation. The silicon
germanium layer may increase current by applying a compressive
stress to a channel region to increase the mobility of holes. A tip
213 corresponding to a portion of the trench having the maximum
width may be positioned on the same line or may be aligned with the
sidewalls of the gate pattern 120. Since the silicon germanium
layer formed in the trench for epitaxial formation is formed closer
to the channel region, the compressive stress applied to the
channel region is increased thereby further increasing the mobility
of holes.
[0052] A top portion of the epitaxial layer may be formed higher
than a top portion of the substrate. An aspect ratio of the
source/drain region 232 formed of the epitaxial layer to gate
pattern 120 may be 3:1 or less. In addition, the source and drain
region 232 and the gate pattern 120 may have a step difference of
250 .ANG. or less. Further, the epitaxial layer may be formed to
have the same height as the gate pattern 120.
[0053] The lightly doped source/drain region 211 and the heavily
doped source/drain region 212 surround a peripheral portion of the
trench, and the trench may be formed in the lightly doped
source/drain region 211 and the heavily doped source/drain region
212. A PMOS transistor may be formed using p-type impurity such as
boron (B), and an NMOS transistor may be formed using n-type
impurity such as phosphorus (P) or arsenic (As).
[0054] The lightly doped source/drain region 211 is formed by
implanting impurity into the substrate in both sides of the gate
pattern 120, and the heavily doped source/drain region 212 is
formed by implanting impurity into a lower portion of the lightly
doped source/drain region 211 from both sides of the gate spacer
124.
[0055] Hereinafter, methods of manufacturing a semiconductor device
according to some embodiments disclosed herein will now be
described with reference to FIGS. 3 and 4A through 4G. FIG. 3 is a
flow chart illustrating operations corresponding to methods of
manufacturing a semiconductor device according to some embodiments
herein, and FIGS. 4A through 4G are cross-sectional views
illustrating operations of the methods of manufacturing a
semiconductor device shown in FIG. 3.
[0056] Referring to FIG. 3, the methods of manufacturing a
semiconductor device according to some embodiments include forming
a first insulation layer pattern (block 10), forming a silicide
layer (block 20), forming a second insulation layer (block 30),
forming a contact hole (block 40), and filling (block 50).
[0057] Referring to FIGS. 4A and 4B, a first insulation layer
pattern 143 is formed on a substrate having a gate pattern 120 and
a source/drain region 132 formed at both sides of the gate pattern
120 (FIG. 3, block 10).
[0058] In detail, a first insulation layer 143' is deposited to
cover the entire surface of the gate pattern 120 and the
source/drain region 132, a photoresist pattern 142 is formed on the
first insulation layer 143', and a photolithography process is
performed using the photoresist pattern 142 as an etch mask,
thereby forming the first insulation layer pattern 143 having a
predetermined exposed portion of the source/drain region 132. The
first insulation layer 143' may be formed of a silicon oxide film
or a silicon nitride film.
[0059] Here, the gate pattern 120 may have a stacked structure in
which the gate insulation layer 121, the gate electrode 122 and the
hard mask film 123 are sequentially stacked. In some embodiments,
the hard mask film 123 may be omitted.
[0060] The gate spacer 124 having a single layered structure or a
double layered structure may be formed on sidewalls of the gate
pattern 120 and the gate electrode 120b to protect the gate
electrode 120b. FIG. 4B illustrates that the gate spacer 124 has a
double layered structure of an oxide film 124a and a nitride film
124b.
[0061] The source/drain region 132 may be formed at both sides of
the gate pattern 120 to have a predetermined height so as to have a
structure in which the source/drain region 132 is elevated from the
surface of the substrate 110. In addition, the source and drain
region may be formed through epitaxial growth. Further, the
source/drain region 132 may be an epitaxial silicon layer formed in
the trench recessed into the substrate 110 to a predetermined
depth.
[0062] Methods for forming the source/drain region of a PMOS
transistor will now be described in more detail. First, a lightly
doped source/drain region is formed by implanting low concentration
impurity ions using the gate pattern as an etch mask, and then a
gate spacer is formed, followed by implanting high-concentration
impurity ions using the gate pattern and the gate spacer as etch
masks, thereby forming a heavily doped source/drain region.
Subsequently, a predetermined region of the substrate exposed by
the gate pattern and the gate spacer is etched to form a trench,
and a SiGe epitaxial layer is formed in the trench. Here, the
trench may have a hexagonal profile, and the trench may be etched
such that a tip of the trench having a maximum width is positioned
on the same line with sidewalls of the gate pattern.
[0063] Here, the source/drain region 232 formed of an epitaxial
layer and the gate pattern 120 may have an aspect ratio of 3:1 or
less. In addition, the source/drain region 232 and the gate pattern
120 may have a step difference of 250 .ANG. or less. A top portion
of the gate pattern 120 and a top portion of the source/drain
region 132 are positioned at the same height. Since the gate
pattern 120 and the source/drain region 132 have a step difference
of 250 .ANG. or less, the aspect ratio thereof are reduced, thereby
achieving uniform deposition of the first insulation layer
143'.
[0064] Referring to FIGS. 4C and 4D, metal layers 144, 145 and 146
are deposited on a predetermined portion of the source/drain region
exposed in operations corresponding to block 10 and the first
insulation layer pattern 143 to react with silicon of the
source/drain region 132 to form the silicide layer 147 (FIG. 3,
block 20).
[0065] In detail, forming the silicide layer 147 may include
forming a single layer or a multi-layered metal layers 144, 145 and
146 containing Ni, Co, Pt, Ti or an alloy thereof on the exposed
source/drain region and the first insulation layer pattern 143. An
annealing process is performed at a temperature of approximately
500 degrees C. to approximately 800 degrees C. to react the
deposited metal with silicon of the source/drain region 132 and
remove unreacted metal using an etching process, thereby forming
the silicide layer 147. That is to say, the silicide layer 147 of
the illustrated embodiments may be formed through a salicide (self
aligned silicide) process. The silicide layer 147 resulting from
the reacting of the deposited metal layer with silicon may be
permeated into the source/drain region 132. While FIG. 4D
illustrates that the silicide layer 147 is substantially completely
permeated into the source/drain region 132, the invention is not
limited thereto and the silicide layer 147 may protrude toward the
top portion of the source/drain region 132.
[0066] In the illustrated embodiments, before forming a contact
hole, the silicide layer 147 is formed on the source/drain region
132. In a case where the silicide layer 147 is formed after forming
the contact hole, a metal layer may not be uniformly deposited in
the contact hole due to a large aspect ratio of the contact hole,
making it difficult to form a sufficiently thick silicide layer. In
the illustrated embodiments, however, the silicide layer may be
formed before forming the contact hole and the gate pattern and the
source/drain region may have a small aspect ratio. In this manner,
a silicide layer having a uniform thickness may be formed. In
addition, since the first insulation layer pattern 143 serves to
protect a gate electrode, it is possible to reduce or prevent
damage to the gate electrode when the unreacted metal is
etched.
[0067] Referring to FIG. 4E, the second insulation layer 148 is
formed on the silicide layer 147 and the first insulation layer
pattern 143 (FIG. 3, block 30). In detail, a silicon oxide film or
a silicon nitride film substantially completely covering top
surfaces of the silicide layer 147 and the first insulation layer
pattern 143 is deposited, thereby forming the second insulation
layer 148. The first insulation layer 143' and the second
insulation layer 148 may be made of different materials.
Specifically, the first insulation layer 143' may be formed of a
silicon nitride film, while the second insulation layer 148 may be
formed of a silicon oxide film.
[0068] Referring to FIG. 4F, a contact hole 151 is formed on the
silicide layer 147 (FIG. 3, block 40). In detail, the contact hole
151 is formed by etching the second insulation layer 148 so as to
expose the silicide layer 147. The etching of the second insulation
layer 148 may be performed by a method known in the art. Through
the above-described process, the silicide layer 147 exists to a
lower portion of the contact hole 151, and it is not necessary to
separately form a silicide layer in the contact hole 151. In the
process of etching the second insulation layer 148 in order to form
the contact hole 151, the first insulation layer 143' may be used
as an etch stopper, thereby preventing the gate electrode 122 from
being damaged.
[0069] Referring to FIG. 4G, a conductive material is filled in the
contact hole 151 (FIG. 3, block 50). In detail, the inside of the
contact hole 151 is filled with a conductive material such as a
metal, thereby forming a metal wire contact. Specifically, tungsten
(W) may be used as the metal.
[0070] Reference is now made to FIG. 5, which is a flow chart
illustrating operations corresponding to methods of manufacturing a
semiconductor device according to some embodiments disclosed herein
and to FIGS. 6A through 6N, which are cross-sectional views
illustrating operations corresponding to the methods of
manufacturing a semiconductor device shown in FIG. 5. For brevity
of explanation, in the methods of manufacturing the semiconductor
device according to the illustrated embodiments, portions that are
the same as or similar to those of the method of manufacturing the
semiconductor device according to the previous embodiment are
denoted by the same reference numerals, and a detailed explanation
thereof may be omitted. Accordingly, the following description of
the illustrated semiconductor device will focus on the
differences.
[0071] Referring to FIG. 5, operations include forming a dummy gate
pattern and a gate spacer (block 1), forming a source/drain region
(block 2), forming a passivation layer (block 3), removing the
dummy gate pattern (block 4), forming a metal gate (block 5) and
removing the passivation layer (block 6). In addition to, the
methods of manufacturing the semiconductor device according to the
illustrated embodiment of the present invention may further include
steps of forming a first insulation layer pattern (block 10),
forming a silicide layer (block 20), forming a second insulation
layer (block 30), forming a contact hole (block 40) and filling
(block 50).
[0072] Referring to FIG. 6A, the dummy gate pattern 120 and the
gate spacer 124 are formed on the substrate 110 (FIG. 5, block 1).
In detail, a first insulation layer, a polysilicon layer, and a
second insulation layer are sequentially stacked on the substrate
110 and patterned to form a dummy gate pattern 120 having a stacked
structure in which the gate insulation layer 121, the dummy gate
122 and the hard mask film 123 are sequentially stacked. Next, an
insulation layer for a first spacer and an insulation layer for a
second spacer are sequentially formed on sidewalls of the gate
pattern 120 and etched to form a gate spacer 124. The first spacer
124a is formed of a silicon oxide film, while the second spacer
124b may be formed of a silicon nitride film. Some embodiments
provide that the hard mask film 123 may be omitted.
[0073] Referring to FIG. 6B, the source/drain region 132 is formed
at both sides of the dummy gate pattern 120, respectively (FIG. 5,
block 2). In detail, the source/drain region 132 doped with
impurity ions is formed at both sides of the gate pattern 120
through epitaxial growth, respectively. The epitaxial process for
forming the source/drain region 132 may be performed at a
temperature of approximately 500 degrees C. to about 900 degrees C.
under approximately 1 to 500 torr using a selective epitaxial
growth process such as a low pressure chemical vapor deposition
(LPCVD), ultrahigh vacuum chemical vapor deposition (UHV-CVD), or
the like, but may be appropriately adjusted within the scope of the
present invention. The source/drain region 132 may be formed of an
epitaxial layer such as Si, SiC or SiGe. In the epitaxial process,
SiH.sub.4, SiH.sub.2Cl.sub.2, SiHCl.sub.3, SiCl.sub.4,
SiH.sub.4Cl.sub.y(x+y=4), Si(OC.sub.4H.sub.9).sub.4,
Si(OCH.sub.3).sub.4, Si(OC.sub.2H.sub.5).sub.4, or the like, may be
used as a silicon source material, GeH.sub.4, GeCl.sub.4,
GeH.sub.xCl.sub.y(x+y=4), or the like, may be used as a germanium
source material, and C.sub.xH.sub.y, CH.sub.3SiH.sub.3, or the
like, and/or may be used as a carbon source material, among others.
In order to improve selective characteristics, a gas such as HCl or
Cl.sub.2 may also be added. Specifically, for the purpose of
doping, a gas such as B.sub.2H.sub.6, PH.sub.3, AsH.sub.3, or the
like may be added.
[0074] As shown in FIG. 6C, the source/drain region 232 of PMOS may
be formed of an epitaxially grown silicon germanium layer. The
silicon germanium layer is formed through epitaxial growth in a
trench formed by etching a predetermined portion of the substrate
110. The lightly doped source/drain region 211 and the heavily
doped source/drain region 212 surround a peripheral portion of the
trench, and the trench may have a hexagonal profile. A tip 213 of
the trench may be positioned on the same line or aligned with
sidewalls of the dummy gate pattern 120.
[0075] In some embodiments, an aspect ratio of the source/drain
region 132 to the dummy gate pattern 120 may be 3:1 or less. Some
embodiments provide that the source/drain region 132 may be formed
to have a step difference of 250 .ANG. or less with respect to a
top surface of the dummy gate pattern 120. The smaller the step
difference between the source/drain region 132 and the gate pattern
120, the smaller the aspect ratio, thereby achieving substantially
uniform deposition in a subsequent process.
[0076] Referring to FIG. 6D, a passivation layer 141 covering the
gate pattern 120 and the source/drain region 132 is formed (FIG. 5,
block 3). In detail, the passivation layer 141 that is an
interlayer dielectric layer is formed on the entire surface of the
substrate 110 to cover the gate pattern 120 and the source/drain
region 132. The passivation layer 141 may be formed of a silicon
oxide film, a silicon nitride film, or a double layer of these
films.
[0077] Referring to FIGS. 6E and 6F, the passivation layer 141 is
removed to expose the dummy gate pattern 120 and the exposed dummy
gate pattern 120 is removed to expose the substrate 110 (FIG. 5,
block 4). In detail, the passivation layer 141 is polished by a
chemical mechanical polishing (CMP) process to expose the dummy
gate pattern 120 and the exposed dummy gate pattern 120 is removed
by a selective etching process to expose the substrate 110. In such
a manner, a trench is formed in a region from which the dummy gate
pattern 120 is removed.
[0078] FIGS. 6G and 6H, an insulation layer 125' and a metal layer
126' are sequentially stacked and planarized on the passivation
layer 141 while filling the trench, thereby forming the gate
insulation layer 125 and the metal gate 126 (FIG. 5, block 5).
Specifically, the insulation layer 125' and the metal layer 126'
are sequentially stacked in the trench formed after removing the
passivation layer 141 and the dummy gate pattern 120, and then
planarized by etching the insulation layer 125' and the metal layer
126', thereby allowing the passivation layer 141 to be exposed.
Here, since there is a small difference between the source/drain
region 142 and the gate pattern 120, the passivation layer 141 on
the source/drain region 132 is substantially completely removed in
the process of etching the passivation layer 141, thereby achieving
planarization so that the source/drain region 142 and the metal
gate 126 have the same height from the substrate 110. The
insulation layer 125' may generally be formed a silicon oxide film
or made of an insulating material such as Ta.sub.2O.sub.5,
Al.sub.2O.sub.3, and the metal layer 126' may be made of tungsten
(W), WN, Ti, TiN, Mo, and/or Ta, among others.
[0079] Through the above-described manner, a poly-gate electrode
made of polysilicon is removed to form a metal gate. The metal gate
may achieve low resistance in a finer line width than the
poly-gate.
[0080] Referring to FIG. 6I, the passivation layer 141 remaining on
the source/drain region 132 is removed (FIG. 5, block 6). In
detail, a top portion of the source/drain region 132 is exposed by
etching the exposed passivation layer 141. Here, the passivation
layer filling a gap created due to a facet of the source/drain
region 132 is substantially completely removed.
[0081] FIG. 6J is a cross-sectional view illustrating forming a
first insulation layer pattern (FIG. 5, block 10). FIG. 6K is a
cross-sectional view illustrating forming a silicide layer (FIG. 5,
block 20), FIG. 6L is a cross-sectional view illustrating forming a
second insulation layer (FIG. 5, block 30), FIG. 6M is a
cross-sectional view illustrating forming a contact hole (FIG. 5,
block 40), and FIG. 6N is a cross-sectional view illustrating
filling (FIG. 5, block 50). Since the steps of forming a first
insulation layer pattern (block 10), forming a second insulation
layer (block 30), forming a contact hole (block 40), and filling
(block 50) are substantially the same as those described in the
methods of manufacturing a the semiconductor device according to
previous embodiments, and a detailed description thereof will not
be given.
[0082] In the methods of manufacturing the semiconductor device
according to the illustrated embodiments disclosed herein, a step
difference between the gate pattern and the source/drain region is
small to reduce the aspect ratio, thereby obtaining a uniformly
deposited film in a subsequent process. In addition, since a
silicide layer is formed on the source/drain region before forming
the contact hole, it is not necessary to form a separate silicide
layer into the contact hole. Further, it is possible to reduce or
prevent damage to the metal gate in a salicide process.
[0083] While the present disclosure has been particularly shown and
described with reference to example embodiments thereof, it will be
understood by those of ordinary skill in the art that various
changes in form and details may be made therein without departing
from the spirit and scope of the present disclosure as defined by
the following claims. It is therefore desired that the present
embodiments be considered in all respects as illustrative and not
restrictive, reference being made to the appended claims rather
than the foregoing description to indicate the scope of the
disclosure.
* * * * *