U.S. patent application number 11/675021 was filed with the patent office on 2008-10-09 for test structures and methods for inspection of semiconductor integrated circuits.
This patent application is currently assigned to KLA Tencor. Invention is credited to David L. Adler, Robert Thomas Long, Lynda C. Mantalas, Gustavo A. Pinto, Neil Richardson, Akella V.S. Satya, Padma A. Satya, David J. Walker, Kurt H. Weiner.
Application Number | 20080246030 11/675021 |
Document ID | / |
Family ID | 38041394 |
Filed Date | 2008-10-09 |
United States Patent
Application |
20080246030 |
Kind Code |
A1 |
Satya; Akella V.S. ; et
al. |
October 9, 2008 |
TEST STRUCTURES AND METHODS FOR INSPECTION OF SEMICONDUCTOR
INTEGRATED CIRCUITS
Abstract
Disclosed is a semiconductor die having a scanning area. The
semiconductor die includes a first plurality of test structures
wherein each of the test structures in the first plurality of test
structures is located entirely within the scanning area. The
semiconductor die further includes a second plurality of test
structures wherein each of the test structures in the first
plurality of test structures is located only partially within the
scanning area. The test structures are arranged so that a scan of
the scanning area results in detection of defects outside of the
scanning area.
Inventors: |
Satya; Akella V.S.;
(Milpitas, CA) ; Pinto; Gustavo A.; (Belmont,
CA) ; Adler; David L.; (San Jose, CA) ; Long;
Robert Thomas; (Santa Cruz, CA) ; Richardson;
Neil; (Palo Alto, CA) ; Weiner; Kurt H.; (San
Jose, CA) ; Walker; David J.; (Sunol, CA) ;
Mantalas; Lynda C.; (Campbell, CA) ; Satya; Padma
A.; (Milpitas, CA) |
Correspondence
Address: |
WEAVER AUSTIN VILLENEUVE SAMPSON LLP - KLA TENCOR;KLA TENCOR
P.O. BOX 70250
OAKLAND
CA
94612
US
|
Assignee: |
KLA Tencor
|
Family ID: |
38041394 |
Appl. No.: |
11/675021 |
Filed: |
February 14, 2007 |
Related U.S. Patent Documents
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Application
Number |
Filing Date |
Patent Number |
|
|
09648095 |
Aug 25, 2000 |
7179661 |
|
|
11675021 |
|
|
|
|
60198042 |
Apr 18, 2000 |
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Current U.S.
Class: |
257/48 ;
257/E21.001; 257/E23.001; 257/E23.145; 438/5 |
Current CPC
Class: |
H01L 2924/0002 20130101;
H01L 2924/0002 20130101; H01L 2924/00 20130101; H01L 22/34
20130101; H01L 23/5226 20130101 |
Class at
Publication: |
257/48 ; 438/5;
257/E23.001; 257/E21.001 |
International
Class: |
H01L 23/58 20060101
H01L023/58; H01L 21/00 20060101 H01L021/00 |
Claims
1. A semiconductor die having a scanning area, the semiconductor
die comprising: a first plurality of test structures wherein each
of the test structures in the first plurality of test structures is
located entirely within the scanning area; a second plurality of
test structures wherein each of the test structures in the first
plurality of test structures is located only partially within the
scanning area, wherein the test structures are arranged so that a
scan of the scanning area results in detection of defects outside
of the scanning area.
2. The semiconductor die of claim 1 wherein the first plurality of
test structures comprises test structures that are electrically
isolated and others that are not.
3. The semiconductor die of claim 1 wherein the second plurality of
test structures comprises test structures that are electrically
isolated and others that are not.
4. The semiconductor die of claim 1 the first plurality of test
structures comprises test structures that are electrically isolated
and others that are not and the second plurality of test structures
comprises test structures that are electrically isolated and others
that are not.
5. The semiconductor die of claim 1 wherein the second plurality of
test structures comprises test structures that are primarily
located outside the scanning area.
6. A semiconductor die as recited in claim 5 wherein the second
plurality of test structures are arranged such that a short
associated with a portion of the second plurality of test
structures that is located outside the scanning area is detectable
by performing voltage contrast on a portion of the second plurality
of test structures that is located within the scanning area.
7. The semiconductor die of claim 1 wherein product circuitry
resides on the semiconductor die outside of the primary scan
area.
8. The semiconductor die of claim 1 wherein the scanning area is
located in the middle of semiconductor die.
9. A wafer having a plurality semiconductor dies as recited in
claim 1.
10. A wafer as recited in claim 9, wherein at least two of the
scanning areas from two of the semiconductor dies are aligned along
their longitudinal axis.
11. The semiconductor die of claim 1, wherein the semiconductor die
has a plurality of scanning areas.
12. The semiconductor die of claim 1, wherein the second plurality
of test structures form a rectangular shape and the scanning areas
are arranged to optimize an aspect ratio of the second plurality of
test structures of each scanning area.
13. The semiconductor die of claim 1, wherein the scanning areas
are arranged in a checkerboard pattern.
14. The semiconductor die of claim 1, wherein the first plurality
of test structures include a mix of test structure types.
15. The semiconductor die of claim 11 wherein the first plurality
of test structures include a first type of test structure and a
second type of test structure, the first type differing from the
second type, and the first and second test structures are selected
from a group consisting of a via chain test structure, a chemical
mechanical polishing (CMP) test structure, a contact array test
structure, a test structure for measuring misalignment, and a CMP
dummy metal filler test structure.
16. The semiconductor die of claim 15, wherein the CMP test
structure is arranged for measurement of a CMP parameter selected
from a group consisting of a pitch value, a density value, and a
horizontal aspect ratio value.
17. The semiconductor die of claim 1, wherein the first plurality
of test structures for a contiguous single structure that is
coupled to a predefined voltage potential and the second plurality
of test structures form a plurality of separate lines interleaved
between portions of the first test structures.
18. The semiconductor die of claim 17, wherein the first test
structures form a serpentine shaped structure and includes one or
more contacts that are coupled to the predefined voltage
potential.
19. The semiconductor die of claim 18, wherein the one or more
contacts are located within the middle of the first test structures
and is coupled to a ground potential, the second test structures
being designed to be floating.
20. A semiconductor die comprising a scanning area having a
plurality of test structures located entirely within the scanning
area, wherein the test structures include a first type of test
structure and a second type of test structure, the first type
differing from the second type.
21. The semiconductor die of claim 20, wherein the first type of
test structures and the second type of test structures are selected
from a group consisting of a via chain test structure, a chemical
mechanical polishing (CMP) test structure, a contact array test
structure, a test structure for measuring misalignment, and a CMP
dummy metal filler test structure.
22. The semiconductor die of claim 21, wherein the CMP test
structure is arranged for measurement of a CMP parameter selected
from a group consisting of a pitch value, a density value, and a
horizontal aspect ratio value.
23. The semiconductor die of claim 20, wherein the test structures
include multiple test structures of the first type and multiple
test structures of the second type.
24. A semiconductor die comprising at least one electrically
isolated conductive test structure positioned adjacent to at least
one electrically non-isolated conductive test structures, wherein a
first portion of the at least one electrically isolated test
structure is located within a scanning area and a second portion of
the at least one electrically isolated test structure is located
outside the scanning area so that a short between the second
portion of the at least one electrically isolated test structure
and the at least one electrically non-isolated test structure is
detectable through voltage contrast on the first portion of the at
least one electrically isolated test structure.
25. A semiconductor as recited in claim 24, wherein the
electrically isolated test structure is formed from a same
conductive layer as the electrically non-isolated test
structure.
26. A semiconductor as recited in claim 24, wherein the
electrically isolated test structure is formed from a different
conductive layer as the electrically non-isolated test
structure.
27. A semiconductor as recited in claim 21, wherein a width of the
first portion of the at least one electrically non-isolated test
structure is substantially equal to or less than a width of the
second portion.
28. A semiconductor die comprising at least one electrically
non-isolated conductive test structure, wherein a first portion of
the at least one electrically non-isolated test structure is
located within a scanning area and a second portion of the at least
one electrically non-isolated test structure is located outside the
scanning area so that an open type defect within the at least one
electrically non-isolated test structure is detectable through
voltage contrast on the first portion of the at least one
electrically isolated test structure and wherein a width of the
first portion of the at least one electrically non-isolated test
structure is substantially equal to or less than a width of the
second portion.
29. A method of forming a semiconductor die comprising a scanning
area, the method comprising: forming a plurality of test structures
located entirely within the scanning area, wherein the test
structures include a first type of test structure and a second type
of test structure, the first type differing from the second
type.
30. The method of claim 29, wherein the first type of test
structures and the second type of test structures are selected from
a group consisting of a via chain test structure, a chemical
mechanical polishing (CMP) test structure, a contact array test
structure, a test structure for measuring misalignment, and a CMP
dummy metal filler test structure.
31. The method of claim 30, wherein the CMP test structure is
arranged for measurement of a CMP parameter selected from a group
consisting of a pitch value, a density value, and a horizontal
aspect ratio value.
32. The method of claim 29, wherein the test structures include
multiple test structures of the first type and multiple test
structures of the second type.
Description
CROSS REFERENCE TO RELATED PATENT APPLICATION
[0001] This application is a continuation of co-pending U.S.
application Ser. No. 09/648,095, filed 25 Aug. 2000 by Akella V. S.
Satya et al, which claims the benefit of U.S. Provisional
Application No. 60/198,042 filed on 18 Apr. 2000. These
applications are incorporated herein by reference in their entirety
for all purposes.
BACKGROUND OF THE INVENTION
[0002] 1. Field of the Invention
[0003] The present invention generally relates to the field of
inspection and analysis of specimens and, more particularly, to
defect inspection and analysis of semiconductor integrated
circuits.
[0004] 2. Description of the Prior Art
[0005] In the semiconductor integrated circuit (IC) industry, there
is a continuing demand for higher circuit packing densities. This
demand of increased packing densities has led the semiconductor
industry to develop new materials and processes to achieve
sub-micron device dimensions. Manufacturing IC's at such minute
dimensions adds more complexity to circuits and the demand for
improved methods to inspect integrated circuits in various stages
of their manufacture is ever present.
[0006] Although inspection of such products at various stages of
manufacture is very important and can significantly improve
production yield and product reliability, the increased complexity
of IC's increases the cost of such inspections, both in terms of
expense and time. However, if a defect can be detected early in
production, the cause of the defect can be determined and corrected
before a significant number of defective IC's are manufactured.
[0007] In order to overcome the problems posed by defective IC's,
IC manufacturers sometimes fabricate semiconductor defect test
structures. Such defect test structures are dedicated to defect
analysis. The defect test structures are fabricated such that they
are sensitive to defects that occur in IC product, but are designed
so that the presence of defects is more readily ascertained. Such
defect test structures are often constructed on the same
semiconductor substrate as the IC products.
[0008] One example of a defect test structure is found in the
Copper CMP Test Mask Set designed at MIT. This test mask set is
designed to quantify the dependence of the resulting copper line
profile on parameters such as line pitch, line width and line
aspect ratio. However, the MIT mask set is designed to be probed
using conventional electrical testing in which current is passed
through the device by contacting predefined pad of large area
(approximately 100.times.100 .mu.m.sup.2) with electrical probes,
not by electron beam. As is well known in the art, defect detecting
systems frequently utilize charged particle beams. In such systems,
a charged particle beam, such as an electron beam, is irradiated on
defect test structures. The interaction of the electron beam with
features in the circuitry generates a number of signals in varying
intensities, such as secondary electrons, back-scattered electrons,
x-rays, etc. Typically, electron beam methods employ secondary
electron signals for the well known "voltage contrast" technique
for circuit defect detection.
[0009] The voltage contrast technique operates on the basis that
potential differences in the various locations of a test structure
under examination cause differences in secondary electron emission
intensities. Thus, the potential state of the scanned area is
acquired as a voltage contrast image such that a low potential
portion of, for example, a wiring pattern might be displayed as
bright (intensity of the secondary electron emission is high) and a
high potential portion might be displayed as dark (lower intensity
secondary electron emission). Alternatively, the system may be
configured such that a low potential portion might be displayed as
dark and a high potential portion might be displayed as bright.
[0010] A secondary electron detector is used to measure the
intensity of the secondary electron emission that originates only
at the path swept by the scanning electron beam. A defective
portion can be identified from the potential state of the portion
under inspection. In one form of inspection, the mismatched portion
between the defective voltage contrast image and the defect free
one reveals the defect location.
[0011] Thus, in such systems, the voltage contrast is
simultaneously monitored for both defective and defect free
circuits for each circuit manufactured. However, considering the
density of IC's currently produced, the time necessary to scan
voltage contrast data to perform comparisons is significant. The
inspection and analysis of such circuits may take several days.
Accordingly, more efficient voltage contrast inspection systems are
desirable.
SUMMARY
[0012] The present invention includes a system for detecting
defects in test structures. The system operates so as to provide
efficient and effective testing of defects. It also includes novel
test structures that provide for improved defect testing, as are
described more fully below.
[0013] In one embodiment, a semiconductor die having a scanning
area is disclosed. The semiconductor die includes a first plurality
of test structures wherein each of the test structures in the first
plurality of test structures is located entirely within the
scanning area. The semiconductor die further includes a second
plurality of test structures wherein each of the test structures in
the first plurality of test structures is located only partially
within the scanning area. The test structures are arranged so that
a scan of the scanning area results in detection of defects outside
of the scanning area. In a preferred embodiment, the second
plurality of test structures include test structures that are
primarily located outside the scanning area. In another aspect, the
second plurality of test structures are arranged such that a short
associated with a portion of the second plurality of test
structures that is located outside the scanning area is detectable
by performing voltage contrast on a portion of the second plurality
of test structures that is located within the scanning area. In a
specific implementation, the first plurality of test structures
include a mix of test structure types, and these test structures
include a first type of test structure and a second type of test
structure. The first type differs from the second type, and the
first and second test structures may be a via chain test structure,
a chemical mechanical polishing (CMP) test structure, a contact
array test structure, a test structure for measuring misalignment,
or a CMP dummy metal filler test structure.
[0014] In another embodiment, a semiconductor die has at least one
electrically isolated conductive test structure positioned adjacent
to at least one electrically non-isolated conductive test
structures. A first portion of the electrically isolated test
structure is located within a scanning area, and a second portion
of the electrically isolated test structure is located outside the
scanning area so that a short between the second portion of the
electrically isolated test structure and the electrically
non-isolated test structure is detectable through voltage contrast
on the first portion of the at least one electrically isolated test
structure. In a preferred embodiment, a width of the first portion
of the electrically non-isolated test structure is substantially
equal to or less than a width of the second portion of the
electrically non-isolated test structure.
[0015] In yet another embodiment, a semiconductor die includes at
least one electrically non-isolated conductive test structure. A
first portion of the electrically non-isolated test structure is
located within a scanning area, and a second portion of the
electrically non-isolated test structure is located outside the
scanning area so that an open type defect within the at least one
electrically non-isolated test structure is detectable through
voltage contrast on the first portion of the electrically isolated
test structure. Also, a width of the first portion of the
electrically non-isolated test structure is substantially equal to
or less than a width of the second portion.
[0016] These and other features and advantages of the present
invention will be presented in more detail in the following
specification of the invention and the accompanying figures which
illustrate by way of example the principles of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
[0017] FIG. 1 illustrates a block diagram of an SEM inspection
system in accordance with one embodiment of the present
invention.
[0018] FIG. 2 illustrates the typical scan pattern of the present
invention.
[0019] FIG. 3 is a flow chart illustrating an inspection procedure
in accordance with one embodiment of the present invention.
[0020] FIGS. 4a and 4b illustrate a semiconductor wafer comprising
a die array that is prepared in accordance with the principles of
the present invention.
[0021] FIGS. 4c and 4d illustrate a test die fabricated in
accordance with the principles of the present invention.
[0022] FIG. 5 illustrates in plan view an exemplary portion of the
test die of FIGS. 4c and 4d.
[0023] FIGS. 6a through 6c illustrate a part of a test structure in
plan view, cross section and a side view.
[0024] FIGS. 7a and 7b show a part of a test structure having M2
interconnect wiring and island elements at the top.
[0025] FIGS. 8 through 13 illustrate test structures that are
designed to test the integrity of covered metal layers.
[0026] FIGS. 14a through 14c exemplify a part of a test structure
comprising an array of via chains.
[0027] FIGS. 15a and 15b show an exemplary array of isolated
contact test structures.
[0028] FIGS. 16a through 16c illustrate a CMP pitch test
pattern.
[0029] FIG. 17 illustrates a CMP density test pattern.
[0030] FIG. 18 illustrates a further CMP density test pattern.
[0031] FIG. 19 illustrates a CMP horizontal aspect ratio test
pattern.
[0032] FIG. 20 shows a section of a CMP aspect ratio test
pattern.
[0033] FIG. 21 shows a section of a CMP aspect ratio test
pattern.
[0034] FIGS. 22a and 22b show top view test structures used to
observe misalignment problems.
[0035] FIG. 22c shows a cross section of the test structures of
FIGS. 22a and 22b.
[0036] FIGS. 23a and 23b shows an array of test structures used to
observe misalignment and amount of misalignment in the y direction
and x direction, respectively.
[0037] FIGS. 24a and 24b exemplify a multilevel test structure
converted from a metal filler for monitoring the integrity of the
CMP process with the addition of vias and/or contacts.
[0038] FIG. 25 is a diagrammatic representation of an analysis tool
for analyzing a failed test die containing test structures.
[0039] FIGS. 26a through 26c illustrate the process for utilizing
dummy shapes for purposes of testing for defects.
[0040] FIG. 27 illustrates a product chip.
[0041] FIG. 28 provides a cross-sectional view of vertical taps for
testing purposes.
[0042] FIG. 29 shows test structures that can be included in a
scanned swath.
[0043] FIG. 30 illustrates a test structure having a plurality of
straight and uniform-width lines.
[0044] FIG. 31 illustrates a CMP test structure for measuring CMP
line thickness.
[0045] FIG. 32 illustrates a serpentine type test structure that
may be utilized to measure line resistance.
[0046] FIG. 33 illustrates test structures suitable for
stepper-type techniques.
[0047] FIG. 34 is an example of a defect that forms an edge type
pattern.
[0048] FIG. 35 is a diagrammatic representation of the test
structure of FIG. 32 with the addition of a conductive guard
ring.
DESCRIPTION OF SPECIFIC EMBODIMENT(S)
[0049] As will be further described below, the preferred embodiment
of the present invention provides automated, rapid, contactless
wafer inspection capabilities in order to detect, isolate and
characterize electrical defects impacting integrated circuits.
[0050] Several embodiments of the present invention are described
herein in the context of exemplary multilevel integrated circuit
structures, including semiconductor structures and overlying
metallization or other interconnects, using various levels of
conductors that are separated from each other and the substrate by
dielectric layers. However, structures formed using other methods
of semiconductor fabrication also fall within the scope of the
present invention.
[0051] One application of the present invention includes the
operation of a scanning electron microscope (SEM) with a
continuously moving stage. However, the test structures and many of
the methods described herein are also useful in the context of
other testing devices, including SEM's operated in step and repeat
mode. As an alternative to moving the stage with respect to the
beam, the beam may be moved by deflecting the field of view with an
electromagnetic lens. Alternatively, the beam column may be moved
with respect to the stage.
A. Utilization of Scanning Electron Microscope With Continuously
Moving Stage for Scanning Primary Area
[0052] The present invention, in one embodiment, utilizes an SEM
with a continuously moving stage. Use of such an SEM provides
significant advantages in connection with the detection of defects
in semiconductor devices, as is described more fully below.
[0053] An SEM system may be used to provide automatic inspection of
wafers and other substrates. Such SEM systems are well known in the
art. For example, U.S. Pat. No. 5,578,821, issued to Meisburger et
al. on Nov. 26, 1996 and entitled "ELECTRON BEAM INSPECTION SYSTEM
AND METHOD," describes an apparatus for a charged particle scanning
system and an automatic inspection system, including wafers used in
microcircuit fabrication. This patent is herein incorporated by
reference in its entirety. In the Meisburger apparatus, a charged
particle beam is directed at the surface of a substrate for
scanning that substrate and a selection of detectors are included
to detect at least one of the secondary charged particles,
back-scattered charged particles and transmitted charged particles
from the substrate.
[0054] The substrate is mounted on an x-y stage to provide at least
one degree of freedom in movement while the substrate is being
scanned by the charged particle beam. The substrate may also be
subjected to an electric field on or near its surface to accelerate
the secondary charged particles. The system facilitates inspection
at low beam energies on charge sensitive insulating substrates and
has the capability to accurately measure the position of the
substrate with respect to the charged particle beam.
[0055] Additionally, there is an optical alignment system for
initially aligning the substrate beneath the charged particle beam.
To function most efficiently there is also a vacuum system for
evacuating and repressurizing a chamber containing the substrate.
The vacuum system can be used to hold one substrate at vacuum while
a second one is being loaded/unloaded, evacuated or repressurized.
In the inspection configuration, there is also a comparison system
for comparing the pattern on the substrate with a second
pattern.
[0056] The '821 patent further describes an automatic system for
the automatic inspection of a substantially non-conductive
substrate. The system includes a field emission electron source to
provide an electron beam, a charged particle beam column to deliver
and scan the electron beam from the field emission electron source
on a surface of the substrate, one or more charged particle
detector(s) to detect one or more of three types of charged
particles emanating from the top and bottom surfaces of the
substrate, (namely, secondary charged particles, back-scattered
charged particles and transmitted charged particles). The system
also includes a continuously moving x-y stage disposed to receive
the substrate and to provide at least one degree of motion to the
substrate while the substrate is being scanned by the charged
particle beam and a multi-processor image defect computer coupled
to the charged particle detector(s) to identify defects on the
substrate. Such a system is suitable for practicing the preferred
embodiment of the present invention.
[0057] Similarly, U.S. Pat. No. 5,502,306, issued to Meisburger et
al. on Mar. 26, 1996, entitled "ELECTRON BEAM INSPECTION SYSTEM AND
METHOD," describes an inspection system suitable for practice of
the present invention. In the '306 patent, numerous embodiments of
a method and apparatus for a particle scanning system and an
automatic inspection system suitable for practice of the preferred
embodiment of the present invention are described. Applicants
incorporate herein this reference U.S. Pat. No. 5,502,306 in its
entirety.
[0058] The inspection system utilized in the practice of the
present invention can operate in several modes, including, for
example, array, die-to-die and die-to-database. In each of these
modes, defects are detected by comparing an electron beam image
derived from scanning the substrate against a standard. In array
mode, signals from a first portion of an array of substantially
identical circuit elements are compared with signals from a second
portion of such an array. In a variation on this technique, an
image of the array can be compared with an electronically modified
version of the same image, and the repeating content can be
subtracted. A resulting difference image will show the defects. An
example of such a system is shown in commonly assigned U.S. Pat.
No. 5,537,669, issued to Evans et al. on Jul. 16, 1996, entitled
"INSPECTION METHOD AND APPARATUS FOR THE INSPECTION OF EITHER
RANDOM OR REPEATING PATTERNS," which patent is incorporated herein
by reference in its entirety.
[0059] In die-to-die inspection, signals from two die of the same
substrate are compared with each other. In die-to-database
inspection the signal from one die derived from the electron
microscope is compared with a signal that is derived from the
database. The database may include design data that is used to make
the die and to generate a plurality of perfect images of how the
die would appear without any defects. For example, each image
contains voltage contrast signatures specifying how the
corresponding test image should appear without defects. The perfect
images are compared to corresponding images obtained from the die.
Alternatively, the database may include the plurality of perfect
images themselves. In the case of die-to-die inspection, the
function of the defect processor is to compare image data obtained
from a first die with image data obtained from a second die, or, in
the case of die-to-database inspection, to compare image data
obtained from a die with data derived from a database adapter.
Preferably, the defect processor is a multi-pixel image computer
that allows efficient comparisons to take place. In a specific
embodiment, the processor operates with pixel resolution sizes in a
range of about 25 nm to 2000 nm. In more general terms, the
processor operates with a pixel size nominally equivalent to two
times a width of the test structure line width to maximize
throughput at optimal signal to noise sensitivity. The routines and
the basic implementation of a defect processor are described in
U.S. Pat. No. 4,644,172, issued to Sandland et al. on Feb. 17,
1987, entitled "ELECTRONIC CONTROL OF AN AUTOMATIC WAFER INSPECTION
SYSTEM," which patent is incorporated herein by reference in its
entirety. Other inventive inspection techniques (e.g., die-to-truth
table and die-to-perfect image) are also described below.
[0060] The sample to be inspected may be supported by a holder that
is placed beneath an electron beam column on an x-y stage. The
sample should be aligned on the stage such that the x-directional
motion of the stage is substantially parallel to the x-axis of the
core area of the sample patterns, i.e., the area of interest for
the inspection. Once the sample is properly aligned, the inspection
process is initiated.
[0061] The column and an analog deflection circuit direct an
electron beam towards the sample surface, and the detector(s) may
detect one or more of the secondary electrons, back-scattered
electrons, and transmitted electrons. The position and movement of
the stage during the inspection of the sample is controlled by a
stage servo.
[0062] FIG. 1 provides an overall block diagram of an inspection
system 10 suitable for practice of one embodiment of the present
invention. In system 10 an automatic inspection apparatus of X-ray
masks, wafers, and other samples, is shown which uses a scanning
electron microscope as its sensor.
[0063] Sample 57 to be inspected is held in a holder which is
automatically placed beneath electron beam column 20 on x-y stage
24 by sample handler 34. This is accomplished by commanding sample
handler 34 by system computer 36 to remove the sample 57 of
interest from a cassette with the flat or notch (see FIG. 4a) on
sample 57 being detected automatically to properly orient the
sample 57 in handler 34. The sample is then loaded under column 20.
Next, the operator visually observes the mask through optical
alignment system 22 to locate the alignment points on the sample
(these may be any operator selected features on the sample) to
ensure that the x-directional motion of the stage is substantially
parallel to the x-axis of the care area of the sample patterns,
i.e., the area of interest for the inspection. That completes the
coarse alignment.
[0064] Fine alignment is subsequently achieved by the operator
scanning the sample with the electron beam and observing the image
on image display 46. All alignment data is then stored in alignment
computer 21 which works in cooperation with system computer 36 for
calculation of the actual combined x and y motions necessary to
scan the die along its x and y axes so that no further operator
alignment action is required for inspections of the same type of
samples. Once the sample is properly aligned, the inspection
process is initiated.
[0065] Column 20 and its optical alignment system 22 and analog
deflection circuit 30 (as described more completely below) then
direct an electron beam towards sample surface 57, and detectors 32
detect the secondary electrons, the back-scattered electrons and
those electrons which pass through sample 57. That operation and
the data collection from that exposure is performed by column
control computer 42, video frame buffer 44, acquisition
pre-processor 48, deflection controller 50, memory block 52. Bus
VME1 29, serves as the communication link between the
subsystems.
[0066] The position and movement of stage 24 during the inspection
of sample 57 is controlled by stage servo 26 and interferometers 28
under the control of deflection controller 50 and alignment
computer 21.
[0067] When the comparison mode is die-to-database, database
adapter 54 in communication with memory block 52 is used as a
source of the signal that is equivalent to the expected die
format.
[0068] The actual defect processing is performed on the data in
memory block 52 by defect processor 56 in conjunction with post
processor 58, with the communication between these blocks being via
bus VME2 31.
[0069] The overall operation of the system is performed by system
computer 36, user keyboard 40 and computer display 38 in
communication with the other blocks via a data bus 23 which may be
similar to an Ethernet bus. (Ethernet is a trademark of Xerox
Corp.).
[0070] In one embodiment of the invention, significant benefits are
achieved by scanning with a continuously moving stage. That is,
measurements of the sample are obtained while the stage (or beam)
is moving. In contrast, stepper type systems utilize alternating
cycles of movement and measurement of the sample. Additionally,
stepper type systems require time to settle after each movement
before measurements of the sample can be taken. The illustrated
embodiment provides a more efficient mechanisms for taking
measurements during movement of the sample without requiring any
settle periods.
[0071] In the illustrated embodiment, the stage moves continuously
in the x-direction. More preferably, the stage moves continuously
at a constant speed in the x-direction. Typical speeds of the
continuous movement of the stage are approximately 1.0 to 200 mm
per second. Note that movement in the x-direction can also be
achieved by movement of the e-beam, whether by movement of the
actual e-beam column or by deflection of the beam rather than the
stage. Moreover, the stage itself can operate such that it moves in
both the x- and y-directions or a combination thereof.
[0072] Simultaneously with the continuous movement of the stage in
the x-direction, the electron beam is repeatedly deflected back and
forth in the y-direction. During a typical application of the
present invention, the e-beam may move back and forth at
approximately 100 kHz. Preferably, the deflection is largely free
of distortion and is substantially perpendicular to the surface, so
that the imaging characteristics are uniform over the scan
field.
[0073] FIG. 2 illustrates a scan pattern. Here a single test chip
100 is shown on a substrate. Within the test chip there is a
scanned swath (or "area of significance" or "primary scan area")
101 that is to be inspected. During the inspection of the die, the
effective scanning motion in the x-direction is provided by a
moving stage and the effective motion in the y-direction is
provided by deflection of the electron beam.
[0074] As a result of the combined movement of the stage and the
e-beam, the path of the beam relative to the substrate forms a scan
pattern 102 as is shown in FIG. 2. Although this scan pattern 102
is shown as a sinusoidal pattern, it could instead be a triangular
pattern or other shape, and data could be gathered from the
resulting secondary electrons or other emissions as the beam is
scanned in either direction, or in both directions. In the
illustrated embodiment, the length of the scanned swath is the
width of the test chip (e.g., 7 mm for a 7 mm by 7 mm test chip or
10 mm for a 10 mm by 10 mm test chip). However, the scanned swath
can be less than the width of the test chip and still fall within
the scope of the present invention. Preferably, the width of the
scanned swath is as large as possible. For current commercially
available systems the scan swath is between 50 .mu.m and 500 .mu.m
in width. More preferably, the scanned swath is approximately 200
.mu.m.
[0075] In one embodiment, the scanned swath includes at least part
of each test structure on the test chip. So that a single scan may
test all of the test structures. The scanned swath can contain a
variety of different types of test structures. This permits the
system to detect differing types of defects with a single pass
through one scanned swath. However, it is also possible to create a
structure having multiple swaths where each swath has only one type
of test structure wholly or partially therein. The various types of
test structures that can be included within the scanned swath are
described more fully below.
[0076] FIG. 3 is a flowchart illustrating a process and test
procedure in accordance with one embodiment of the present
invention. Initially 3, in operation 1, a sequence of initial
manufacturing process steps are performed to form a test structure
such as conductive lines on a substrate. In operation 2 the
structure is inspected by an electron beam inspection system. In
operation 3, detected signals from the electron beam inspection are
processed to determine whether a potential defect such as an open
or a short in the conductive lines has been detected. If potential
defects of sufficient severity to warrant termination of the
manufacturing process have not been detected, then in operation 4 a
subsequent manufacturing process step is performed. It is not
unusual for thousands of potential defects to be found during
inspection; however, they are often of insufficient number and
severity to warrant termination of the manufacturing process, even
for product wafers. If the process is still undergoing
characterization, and the wafers are not product wafers, the
processing of such wafers and the test structures thereon can
continue even if numerous severe defects are located.
[0077] The number of test structures present in a lot of wafers and
the relative area required for the test structures can be varied in
a number of ways. One possibility is to have several reticles, each
with varying amounts of area dedicated to test structures, which
may be used in the manufacturing process. Reticles having a
relatively large area devoted to test structures that can be used
for certain wafers in a lot (or can be stepped over for a
predetermined fraction of such wafers), while reticles having
relatively fewer test structures can be used for other wafers in
the lot (or stepped over a remaining fraction of such wafers). The
relative extent of usage of each type of reticle determines the
number of test structures in the lot, and this fraction can be
varied from lot to lot depending on the testing requirements of the
process at the time each lot is fabricated. Alternatively, a
portion of a reticle containing test structures can be "bladed off"
to a sufficient extent to create the desired predetermined number
of test structures, and the remainder of each wafer would be
covered with product structures.
[0078] If there is no subsequent manufacturing process step, the
manufacturing process is finalized at 5. If there remains a
subsequent manufacturing process step, the next manufacturing
process step is initiated at 6.
[0079] However, if, in operation 3 a potential defect is detected,
in operation 7 the location of the potential defect can be
recorded. In operation 8, the potential defects can be re-located
on the substrate and can be characterized using various
characterization techniques such as scanning electron microscopy,
optical microscopy, Energy Dispersive X-Ray Spectroscopy (EDS)
and/or Focused Ion Beam (FIB) techniques, or any combination
thereof. Finally, in operations 9 and 10 information from the
characterization process is analyzed and the resulting data can be
used to eliminate defect-causing process conditions. Of course, if
the testing defect characterization process is nondestructive, the
substrate can be returned to the process line for further
processing.
C. Test Chip Design
[0080] Scanning a test chip using an apparatus with a moving stage
provides a fast and efficient method for testing semiconductor
devices for defects. It should be noted, as is described more fully
below, that in order to be tested, a test structure need not reside
wholly within the scanned swath. For many structures, voltage
contrast testing can be accomplished by scanning only a small
portion of a test structure. In such a case, if a defect is
detected via the voltage contrast technique, the exact location of
the defect can be determined in a subsequent operation, even if the
defect is located outside the scanned swath.
[0081] As is discussed more fully below, a myriad of different
types of test structures can be fabricated within the scanned
swath. Some of these test structures are described more fully
below. Such structures can include via chains and conductive lines,
which preferably (but not necessarily) reside within the scanned
swath only in part. The preferred structure of the via chains and
conductive lines is described in more detail herein. Such
structures can also include more compact test elements such as
contact arrays and elements designed to detect defects caused by
specific process steps, such as chemical mechanical polishing.
These more compact elements preferably (but not necessarily) reside
entirely within the scanned swath.
[0082] It should be further noted that the test structures
described herein can also be tested by techniques other than that
described herein as the preferred embodiment. For example, such
test structures might be tested by a particle beam without a
continuously moving stage, e.g. a step and repeat type stage in
which the electron beam scanning is accomplished while the stage is
stationary, and the stage is then moved and allowed to settle
before a subsequent electron beam scanning step takes place. One
embodiment of a stepper type test structure is described further
below with reference to FIG. 33. Also, voltage contrast techniques
that do not involve scanning with a particle beam can also be used
in connection with many of the test structures described herein.
For example, a photon beam (rather than an incident electron beam)
could be used to induce voltage contrast. The photon beam could be
used under conditions suitable for photo electron emission
microscopy ("PEEM").
D. Exemplary Test Chip
[0083] Described in this section is an exemplary test chip that is
specifically designed to take full advantage of the present
invention. It should be recognized, however, that the specific
design described herein is exemplary only and that many other
designs or configuration are possible within the scope of the
present invention.
[0084] Several embodiments of the present invention are described
herein in the context of exemplary multilevel integrated circuit
structures, including semiconductor structures and overlying
metallization or other interconnects, using various levels of
conductors that are separated from each other and the substrate by
dielectric layers. As is well known in the art, in such multilevel
structures, a first conductor (M1) and a second conductor (M2) can
be connected by vias formed through an interlayer dielectric (ILD).
Similarly, contacts can be formed between the conductors and the
substrate. The defect detection system of the present invention is
advantageously able to detect opens, intra-layer shorts (within M1
or M2) or interlayer (between M1 and M2) shorts caused by errors
occurring systematically or randomly during the manufacturing
process.
[0085] In addition, specific embodiments of the present invention
are also able to detect defects caused by particular process steps,
such as lithographic steps, dry etch steps, deposition steps, or a
chemical mechanical polishing (CMP) process. As is well known in
the art, the CMP process is often used to planarize structures that
build up during multilevel deposition processes. These structures
can be used as damascene interconnects, conductive plugs, or for
other purposes. The CMP process is expected to become even more
important as the semiconductor industry shifts to copper
metallization, since copper cannot be easily dry-etched (the etch
products being non-volatile), but is readily processed using CMP.
However, the CMP process may polish away functioning circuit parts
through dishing (leading to opens) or copper smearing (leading to
shorts) when the circuit layout changes drastically in density,
pitch and or in the horizontal aspect ratio (length:width). The
defects created by CMP process are preferably detected during the
inspection process.
[0086] FIGS. 4a and 4b illustrate a semiconductor wafer 200
comprising a die array 202 that is prepared in accordance with the
principles of one embodiment of the present invention. As
illustrated in FIG. 4b, the array 202 may be comprised of a
plurality of test dies 204 and a plurality of actual product dies
206 containing intended integrated circuitry. As will be described
below, the test dies 204 allow defect location, defect
identification, defect type and defect density through in-line
inspections during the actual manufacturing process of integrated
circuits.
[0087] The ability to detect defects in line (i.e., during the
manufacturing process) is a significant advantage of the present
invention. Unlike functional testing of semiconductor devices
performed on completed wafers by wafer probing methods, the present
invention can perform testing in line. This results in better and
more timely information for the engineers controlling the
manufacturing the process, and provides them with an opportunity to
service machinery or alter process conditions to improve yield,
before many devices are lost as scrap. By contrast, if the engineer
were to wait until processing of the devices were completed,
millions of dollars may be lost due to poor yield because of the
delay. Moreover, the test methodologies of the present invention
could be used as part of an Advanced Process Control ("APC")
system, in which data from the testing process is fed to automated
control systems that improve process yield with little or no human
intervention, based on software algorithms that take into account
the equipment and process technology used in the manufacturing
process. As an example, test structures designed to detect CMP
overpolish could provide data that automatically feeds back to the
CMP process and causes the process to be modified such that
polishing time is reduced, or pressure on the polishing pad is
diminished.
[0088] The test dies 204 may be laid out in an orderly row-column
fashion as shown in FIG. 4b. Such an orderly layout can be also
used as a map to evaluate final test data and to locate certain
types of defects occurring on various locations on the wafer during
the manufacturing process. In one embodiment, the test dies 204
occupy a predetermined area on the wafer 200 so as to provide a
statistically significant data set of test data, yet minimize the
inspection cost and avoid adversely affecting the production yield.
Such a test die has about the same dimensions as the product die in
the range (e.g., 10 mm by 10 mm or 7 mm by 7 mm). Alternatively,
when developing a new process, the wafer could be comprised
entirely of test dies.
[0089] As illustrated in FIG. 4c, each individual test die 204 may
be square or rectangular in shape defined by first, second, third
and fourth edges 204A-204D, and configured to have a number of
portions, namely, a first portion 206 and a second portion 208
separated by an intermediate portion 210. Sections 206-210 define
the test sites where the test structures are formed. The portions
206, 208 and 210 of the test die 204 are preferably rectangular in
shape.
[0090] As shown in FIG. 4c, the first portion 206 may be defined by
a proximal edge 206A, a distal edge 206B, a first edge 207A and a
second edge 207B. The second portion 208 may be defined by a
proximal edge 208A, a distal edge 208B, a first edge 209A, and a
second edge 209B. Finally, the intermediate portion 210 may be
defined by the distal edges 206A and 208A, a first edge 210A and a
second edge 210B.
[0091] As will be described more fully below, the test structures
represent structures constructed in various steps of the
semiconductor IC manufacturing process. Once the portions 206-210
are defined on the test die 204, the portions 206-210 may also be
further divided into a plurality of sections, preferably
rectangular, on which test structures may be placed by test type,
as in the manner shown in FIG. 4c.
[0092] In a specific embodiment, the first portion may comprise a
first section 212, a second section 214 and a third section 216.
Similarly, the second portion 208 may be divided into three
sections: namely a fourth section 218, a fifth section 220 and a
sixth section 222. As will be described more fully below, each of
the sections 212-222 as well as the portion 210 may comprise one or
more groups of test structures that are laid out in a predetermined
fashion according to their design (i.e., the type of functional
structure to which the test structures correspond, or the type of
defect the test structure is designed to find). The quantity of
test structures of each type in a given portion, or on a test chip,
or over an entire wafer, is selected to provide a statistically
significant sample of such test structures, so that a statistically
significant quantity of defective regions is likely to be found
therein. This quantity will vary with the expected yield of the
chips on the wafer. For example, in a low yield process (as might
be expected to be found in a process that is under development and
not yet in production), a relatively small number of test devices
might be needed to obtain a reasonable sample size. By contrast, in
a high yield process, a larger sample size (and therefore more test
structures) may be needed. The quantity of test structures may also
be varied depending on the goals of the chip manufacturer. For
example, if the chip manufacturer is unwilling to devote much space
on the wafer to test structures, the number of such structures
could be kept relatively small. If process problems arise, the
quantity of test structures present on each wafer could then be
increased (to provide the manufacturer with more test data
regarding the process) until the nature of the problem has been
determined and corrected.
[0093] Data from such testing can also be used by both fabless
integrated circuit makers, and the foundries that do their
manufacturing. For example, the test structures may be inspected
during the manufacturing process by the foundry. The same test
structures may then be re-inspected by the fabless IC company
before acceptance, to determine if the lot of wafers is likely to
have an acceptable yield, to have an acceptable result during
reliability testing, and to have acceptable quality. The data can
also be used by the fabless IC company to improve the designs of
its integrated circuits to make them easier to manufacture at
higher yield and/or with superior quality. This data may be used as
part of the purchasing process, so that the fabless companies could
base their payment to the foundry, at least in part, on statistics
calculated from the testing process, such as the predicted yield.
For example, if the payment were to be made based on predicted good
die, a lot having 500 die, and a predicted yield of 80 percent
based on voltage contrast testing, could result in a payment for
400 predicted good die to the IC manufacturer. Testing by the
fabless company could be facilitated, as described in more detail
below, by using stacked vias containing stacked conductive plugs to
create vertical conductive paths that tap down to the lowest test
structures. Such test structures would otherwise be rendered
inaccessible by subsequent processing, which would bury them under
insulators and make them impossible to see in an electron beam
system. However, by adding one or more conductive taps, these
buried features can be re-tested even after all levels of the
entire wafer have been fabricated. This makes the wafer testable by
fabless semiconductor companies, and permits them to verify test
data provided by the foundry. As described below, probable pads may
also be added to the described voltage contrast test structures so
that standard wafer probing techniques may also be implemented
without the need for an expensive SEM device, for example.
[0094] Data from such testing could also be used to determine the
need for other sorts of tests. For example, reliability is a
relatively time consuming and expensive test. By processing data
derived from the test structures of the present invention, one can
better predict whether reliability testing is needed and how many
chips from each lot should be subjected to such testing. For
example, certain reliability failure mechanisms may be indicated as
likely when test data from at least certain types of the test
structures of the present invention indicates that defects are
present which are close to, but not quite reaching, a quantity or
level of severity that would affect device functionality. Under
such circumstances, one could predict that reliability testing
conditions would cause such devices to fail at an unacceptable
level. Reliability testing could be conducted to verify this, and
the process (if desired) could be altered to lessen the severity of
such predicted reliability failures, even before the reliability
testing is actually performed.
[0095] As previously mentioned above, the first section 212 may
comprise test structures involving M1 interconnect level, for
example. A test structure formed on the first section 212 may
represent the M1 processing stage of an integrated circuit and
allow testing and evaluation at this stage of the production. At
this stage, inspections may be performed to detect opens and
intra-layer shorts in the M1 interconnect wiring, in-line, during
the manufacturing process. Similarly, test structures relating to
M2 and M3 interconnect lines are formed on the third and fifth
sections 216 and 220 respectively. M2 and M3 test structures also
allow detection of opens and shorts, and interlayer shorts such as
those between the M1 and M2 interconnect test structures. Via chain
test structures may be formed on the second, fourth and sixth
sections 214, 218 and 222. The second section 214, for example, may
represent via chains constructed between M1 and M2 interconnect
lines. In this respect, the fourth and sixth sections 218 and 222
may have via chain test structures representing vias between M2 and
M3 interconnect lines and M3 and M4 interconnect lines,
respectively.
[0096] As will be described below, via chain test structures allow
two types of tests, namely opens only tests to detect opens in via
chains, and opens and shorts tests to detect both opens in the
chain and shorts between the neighboring conductor or metal
shapes.
[0097] In this embodiment, various other groups of test structures
are formed along the intermediate portion 210 of the die 204. As is
described more fully below, such test structure groups may comprise
CMP test structures, overlay or misalignment structures and
individual contacts, as well as dummy CMP fillings. In this
embodiment, dummy CMP fillings can also be formed on available
unoccupied areas on the product dies, such as those available along
the corners of the die or unoccupied areas found between the
neighboring circuit layout sections.
[0098] As illustrated in FIG. 4d, sections 212-222 may be further
divided into a plurality of subsections or modules to have test
structures with differing critical dimensions over such modules. In
this context, critical dimension often refers to a predetermined
test size of a feature or the distance between features. By way of
using test structures having different critical dimensions,
superior IC features can be produced. In other words, if a
particular acceptable critical dimension produces the best result
with respect to a specific design feature, that critical dimension
can be adopted and design rules for that process or product family
can be altered accordingly. More importantly, test structures
implemented with various geometries and critical dimensions help to
determine which device geometries or dimensions are more prone to
certain defects, and can predict the resulting defects occurring
between the two devices due to the distance between them.
[0099] In this respect, for example, the M1 interconnect lines in
the section 212 may be formed on a first, second, third, fourth and
fifth modules 212A-212E, each module having one type of test
structure group formed with a critical dimension different than the
critical dimensions used in other modules. The modules 212A-212E
help to determine which critical dimension for M1 interconnects are
more vulnerable to opens, shorts and interlayer short type of
defects. Similarly, first, second, third, fourth and fifth modules
216A-216E in section 216 and first, second, third, fourth and fifth
modules 220A-220E in section 220 provide interconnect lines with
differing critical dimensions for M2 and M3 process steps
respectively, for opens, shorts and interlayer short types of
defects.
[0100] Referring to FIG. 4d, the section 214 may be comprised of
two modules, namely first and second modules 214A and 214B, each
comprising via chain test structures formed between the M1 and M2
interconnect levels. In this embodiment, first module 214A may
comprise via chains that are formed to detect opens type of defects
while the second module 214B comprises via chains to detect both
opens and shorts type of defects. As will be described more fully
below, in the second module 214B, individual via chain lines may be
interposed neighboring metal lines so as to detect and monitor both
shorts occurring between the via chains and the neighboring metal
lines and opens in individual chains. Similarly, first and second
modules 218A and 218B in section 218 and first and second modules
222A and 222B in the section 222 provide via chain test structures
to monitor and detect opens as well as opens and shorts types of
defects as described for modules 214a and 214B.
[0101] It should be noted again that the above-described test chip
is exemplary only. For example, test structures can be located in
different places in such a chip, or certain test structures
described herein may not be included at all. Many different
configurations are possible within the scope of the present
invention.
E. Testing of the Exemplary Test Chip
[0102] As previously described, an electron beam inspection system,
such as an SEM, may be used. When the electron probe strikes over
the surface of the die at a given point, this action gives rise to
signals that can be collected by the detector to give information
about that point. The electron beam system is programmed to move
the wafer to bring the first test chip into position at a low
magnification (60-500.times.), and locate, for example the first
line of features such as opens/shorts-test-patterns in a linear
array, and draw the electron beam scan line through them in a
raster mode.
[0103] In one embodiment, the primary signal source comprises
electrons. Secondary electrons are generated as a result of the
incident (primary) electron beam striking the surface of the wafer.
The secondary electrons are emitted from the wafer and collected by
the detector to create the image. In the image, the high-intensity
secondary electron emitting features come out, for example,
visually brighter than the low-intensity secondary electron
emitting features. If this variation in secondary electron emission
intensity is plotted with respect to the distance, along the
swath-length that the electron beam scans, an intensity
distribution of the scanned test structure is obtained.
[0104] In a die-to-database or die-to-perfect-image inspection
mode, the system operates to match the intensity distribution of a
defect-free test structure as represented in the data base to the
intensity plot of the corresponding structure on the test chip
provided by the electron beam unit. In one embodiment, the die
under test is compared to an image that represents what the die
under test looks like without any defects. For example, an array of
interconnect lines may alternate between being tied to ground and
left floating. In this case, a perfect image is generated that has
alternating dark and bright interconnect lines. This comparison
operation allows the detection of all the defects in the test
structure in terms of missing and/or extra peaks. Alternatively,
the intensity peaks of the test structure may be compared to a
predetermined set of expected values, e.g., arranged in a truth
table. For example, a set of interconnect lines on the test
structure under test may be expected to have alternating high and
low intensity values. In one embodiment, each line is compared with
a predetermined threshold to determine whether the conductive line
is grounded or floating. These high and low values are then
compared to the expected high and low values. The test structure
itself may also be configured to facilitate die-to-perfect die
inspection and die-to-truth table inspection. In one embodiment,
the length of the proximal-ends (or stubs) of the test pattern have
varying lengths, which may also be matched to the corresponding
perfect die portion or truth table values. For example, two stubs
in a row may have a same length (while the other stubs have a
different same length) to indicate a starting or reference point to
begin the comparison procedure. In a second example programmed
defects are incorporated at fixed intervals along the scan path to
form a fixed grid to aid in defect location during subsequent
analysis.
[0105] The generated perfect image and/or set of predetermined
intensity values or truth table values, along with the
corresponding test structures, may also be provided to the customer
so that they may easily inspect the corresponding test structures.
Of course, standard die-to-die and array inspection techniques may
also be utilized. However, the die-to-database, die-to-perfect
image, and die-to-truth-table techniques represent a more efficient
inspection procedure since a perfect die or die portion does not
have to be found for comparison to the die under test.
[0106] The scanning electron microscope, in the voltage contrast
mode, enables one to distinguish the charged floating conductor
shapes from the charge-drained grounded shapes in terms of visual
or intensity contrasts. These shapes can be monitored visually on a
CRT-screen, or, preferably, stored and analyzed electronically.
This principle has been used previously to manually locate,
isolate, and in-situ characterize defects causing unintended
discontinuities to ground or unintended shorts to the neighboring
grounded-shapes in a product chip. However, such a manual
product-inspection process is extremely tedious and slow because of
the complexity of the product design and the high magnification
source on the poorly contrasting CRT screen of the SEM.
[0107] In FIG. 5, in plan view, an exemplary portion 400 of the
test die 204 is shown in detail. The portion 400 gives a detailed
view of parts of the first portion 206, the second portion 208 and
the intermediate portion 210 of the test die 204 (e.g., of FIG.
4c). One technique of the present invention will be exemplified
using first test structures 402 on the first portion, second test
structure 404 on the second portion of the test die 204 and third
test structures 406 on the intermediate portion of the test die
204. It is understood that, during the electron beam inspection of
the test die 204, the electron beam is scanned over the
intermediate portion in a raster mode and in the direction of arrow
A. The electron beam interacts with the test structures on the
intermediate portion as well as with the proximal ends (referred to
as "stubs") of the test structures on the first and second portions
but located adjacent to proximal edges of the first and second
portions. In the following section of this application, the first,
second and third test structures are described in further
detail.
[0108] As is described more fully below and seen in FIGS. 5, 6a,
6b, 6c, the first test structures 402 comprises rows of first
conductors 408 and second conductors 409, extending parallel to the
edges 204B and 204D, and between the proximal and distal edges 206A
and 206B of the test die 204 (See FIG. 4c). The second conductors
409 are located between the rows of first connectors 408 as in the
manner shown in FIG. 5. In a specific embodiment, proximal stub
ends 410 of the first connectors 408, which are referred to herein
as interconnect lines, are located at the proximal edge 206A of the
portion 206 of the test die 204 (See FIG. 4c), and distal ends 412
of the interconnect lines 408 are located at the distal edge 206B
of the die portion 206. It is understood that the first test
structure 402 exemplified in FIG. 5 may represent a plan view of
any of the metal interconnect layers such as M1, M2, M3 or M4. As
will be described below, the distal ends 412 of the interconnect
lines 408 are grounded to the substrate of the die 204 while the
proximal stub ends 410 are free and are not grounded to the
substrate. As is described below, the second connectors 409, which
are referred to as island members, are not grounded and help to
distinguish defects occurring in grounded interconnect lines 408 in
the voltage contrast mode. These proximal ends of 408 and 409 may
be extended to different lengths for exposure in the primary-scan
area, as described earlier. Also, it will be understood that 408
and 409 shapes can be straight-lines without corners or islands as
shown in FIG. 32.
[0109] In a preferred embodiment, each stub 410 has a width that is
the same or less than the rest of the interconnect line 408. That
is, a widened flag area is not utilized. Since the stub width is
the same or less than the rest of the interconnect line, a
plurality of interconnect lines may be densely packed in a
simplified array. In other words, the proximal end of the test
structure itself can be scanned "as is" in the Primary-Scan Area.
In this embodiment, the spot size of the inspection SEM is
generally configured to the stub's dimensions.
[0110] Referring to the exemplary test chip illustrated in FIGS.
4a-d, the test chip is preferably scanned in a single pass. The
scanned swath preferably includes all of intermediate portion 210.
Further, portion 210 is preferably located substantially in the
center of the test chip. Additionally, in one embodiment, the
intermediate portions 210 of a plurality of test chips are aligned
such that a single scan may be performed on a plurality of
intermediate portions 210 on a plurality of test chips.
[0111] Preferably, the scanned swath includes an area larger than
portion 210, however. In a specific embodiment, all of the test
structures on the test chip are scanned in a single pass.
Therefore, where the width of the scanned swath is 200 .mu.m, for
example, the width of portion 210 might be 190 .mu.m. In such an
instance, the scanned swath might include up to 5 .mu.m above and
up to 5 .mu.m below portion 210.
[0112] In such an instance, it would be possible, and preferable,
to inspect all of the test structures of the test chip with only a
single scan of the scanned swath (e.g., the Primary-Scan Area). In
this regard, a scan of the scanned swath would scan all the test
structures that reside in portion 210. Such a scan would also scan
portions of the test structures of portions 212, 214, 216, 218,
220, and 222. In the event the scan of the scanned swath reveals a
defect in one of the test structures of portions 212, 214, 216,
218, 220, or 222, the system, according to a specific embodiment,
would then take steps to locate and further characterize the defect
(which is typically located outside the scanned swath (e.g., in the
potential Secondary-Scan Area).
[0113] It should be noted that the scanned swath need not be
located in the center of the test chip, but can be located
elsewhere on the chip. For example, the scanned swath could be
located at the bottom or top of the chip. In the case, for example,
where the scanned swath is located at the bottom of the chip, the
scanned swath might comprise test structures that reside entirely
within the scanned swath, as well as portions of test structures
that extend upward from the scanned swath.
[0114] Further, a test chip might be designed to have more than one
scanned swath. In an alternative embodiment, there are multiple
intermediate portions 210 within a single test die so that the
aspect ratio of each test structure is optimized. For example, the
interconnect lines 408 may be shortened so as to reduce their
resistance, capacitance and/or the time required to locate a defect
on such lines. In another embodiment, intermediate portions (e.g.,
210) and corresponding first and second portions (e.g., 206 and
208) are configured in an array so that scans of the intermediate
portions may be conducted in an array mode. In addition, a scanned
swath might not be coextensive with the width of the test chip, but
might be located entirely on the inside of the test chip. In fact,
it is possible to have several scanned swaths on a single test
chip, all located entirely inside the chip. However, it should be
recognized that it is preferred that any scanned swath comprise
specific test structures that reside entirely within the scanned
swath and other-specific test structures that reside only in part
within the scanned swath.
F. Conductive Line Test Structures
[0115] One type of test structure that can be included on a test
chip may have its end-regions projecting into the
Primary-Scan-swath. In the preferred embodiment, such test
structures will reside within a scanned swath only in part. It is
preferable only to scan initially a small portion of a conductive
line. If a defect is detected, then further testing and analysis
can be undertaken in order to locate the defect more precisely and
to characterize it.
[0116] FIGS. 6a-6c illustrate a part of the test structure 402 an
M1 wiring test structure in plan view, cross section and a side
view in detail. Referring to FIGS. 6a-6c, the M1 interconnect 408
and the floating-member 409 are formed over a substrate 420 using
conventional semiconductor IC process techniques such as Chemical
Vapor Deposition (CVD), patterning and etching techniques. An
isolation layer 421, such as an oxide layer, that is interposed
between the substrate 420 and the M1 interconnect 408 isolates the
M1 interconnect 408 from the substrate 420. The island member 409
is separated from the M1 interconnect by a dielectric layer 422 and
configured such that the island member 409 has an elevated posture
as in the manner shown in FIG. 6c in side view. The interconnect
line 408 is connected to the substrate 420 through a contact that
may be etched through the oxide layer 421. Through the contact 424,
the interconnect line 408 is electrically grounded to the substrate
420.
[0117] An electron beam may scan across the distal end 410 of the
exposed metals of the interconnects 408 and floating-members 409 to
detect defects, for example, opens, shorts and intra-layer shorts
in the M1 wiring. This preferred embodiment provides an immediate
calibration of the scan-intensities of the grounded or floating
shapes during the Primary Scan. Detection of intra-layer shorts and
opens tests are performed by scanning the electron beam across the
distal end 410.
[0118] During the electron beam inspection, since the island
members 409 are not grounded, electron flow from the incoming
incident electron beam charges island members 409. Contrary to the
grounded interconnect lines 408, electrons cannot find a path to
the ground and secondary electron emission does not occur, as a
result the island members 409 charged by the beam remain nominally
dark. Owing to their ground connection and assuming that they are
defect free, however, the interconnect lines 408 remain
charge-drained and generate significant amount of secondary
electron radiation to be detected by the detector of the electron
beam system. For the grounded interconnect lines 408, the electrons
from the beam will find a path to ground and secondary electrons
will be emitted from that particular interconnect line 408 if such
interconnect line 408 is not broken. As a result, that interconnect
line 408 will appear brighter or appear to glow, thus indicating
that the corresponding interconnect line does not have an open
(i.e., it is not defective). The intensity peak arising from this
secondary electron emission will also be registered by the system
to match with the corresponding data on this particular test
structure. However, if the line under test is broken (i.e., it is
open), there will be less secondary electron emission and, thus,
the interconnect 408 will remain dark. As previously mentioned, the
missing peak will then be registered by the system, hence
indicating a potentially defective interconnect for further
analysis. In another possible case, if an interconnect line is
shorted to another interconnect line for the same M1 wiring, both
interconnect lines 408 and 409 will glow, indicating the electrical
short between them.
[0119] With the inventive test die, the quality of the M1 wiring or
other levels of wiring can be monitored throughout the
manufacturing process. During the manufacture of multi-level metal
structures, elevated temperatures may cause shorts and opens in the
previously produced wiring interconnect patterns having latent
defects. This problem can be monitored using a test structure shown
in FIGS. 7a and 7b. In the following section, for the purpose of
clarity, island members 409 will not be shown in the figures that
provide sectional views.
[0120] FIGS. 7a and 7b show a part of the test structure 402 having
M2 interconnect wiring 430 and island elements 432 at the top. That
is, the M1 interconnect wiring is buried. As shown in cross section
in FIG. 7b, the M1 interconnect lines 408 are connected to the
substrate 420 through the contact 424 as in the manner shown also
in FIG. 6b. An interlayer dielectric layer 433 is interposed
between an M2 interconnect layer 430 and the M1 interconnect layer
408. A via 434 connects the proximal end 410 of the interconnect
430 to the M1 interconnect through the dielectric 433.
[0121] However, in this embodiment, in order to monitor the quality
of the M1 interconnect layer, after the M2 process step, the M2
interconnect 430 is made discontinuous by forming an opening 436
adjacent to the via 434 between the interconnects 408 and 430 and
separating a distal portion 438 from the rest of the M2
interconnect. The opening 436 may be filled with an isolating
material such as a damascene oxide using techniques well known in
the art. The distal portion 438, is referred to as the first scan
element hereinafter (also later referred to as a "tap").
[0122] At this step of the process, an electron beam probe may be
scanned across the first scan element 438 of the M2 interconnects
and island members 430 to detect defects, for example, opens,
shorts and intra-layer shorts in the M1 wiring. Detection of
intra-layer shorts and opens tests are performed by scanning the
electron beam across the scan element 438. In one situation, if M1
interconnect line 408 is not broken, the electrons from the beam
will find a path to ground from the scan element to substrate
through the M1 interconnect 408. As a result, secondary electrons
will be emitted from the scan element 438, thus indicating that the
M1 interconnect line 408 is still good after the M2 wiring process
step. In another situation, if the M2 wiring step causes an open in
the M1 interconnect 408, the first scan element 438 will not emit
secondary electrons and thus the first scan element 438 will remain
dark. If the rest of the M2 interconnect 430 is shorted to the
underlying M1 interconnect line, the electrons from the electron
beam will find a path to ground and the shorted M2 interconnect and
the corresponding scan element will glow, indicating the interlayer
short between the M1 and M2 wiring at that interconnect.
[0123] In configurations constructed in accordance with the
principle exemplified by FIG. 7b, it is also possible to make use
of stacked vias (vias that extend upward through multiple layers).
In this manner, for example, one or more stacked vias may extend
from M1 to M3 to allow testing of the integrity of M1 after the
fabrication of M3. Additionally, redundant vias (i.e., multiple
vias) may be utilized in place of any of the single vias (e.g., 434
and 424). Redundant vias tend to result in less defects than single
vias, but redundant vias have slightly more complex design
requirements.
[0124] As illustrated in FIGS. 8-10, the integrity of the M1
interconnect 408 can be further detected after the fabrication of
the third, fourth and more metal interconnect layers. For example,
in FIG. 8, an M3 interconnect 440 having a first scan element 442
connected to the first scan element 438 of the M2 interconnect 430
can be formed on an interlayer dielectric 444. In other words, a
stacked plug (first scan elements 442 and 438) is formed to monitor
opens within a buried metal layer M1. As shown in FIG. 9, by
forming a number of vias 446 between the M3 and M2 interconnects, a
second scan element 448 can be formed to monitor a possible short
between the M1 and M2 interconnects. During the electron beam
inspection of the scanned swath, a proximal end of the M3
interconnect may be scanned. Similarly, as shown in FIG. 10 after
forming first and second scan elements 452 and 454 of a M4
interconnect 456, opens in the M1 layer (through stacked plugs
452), as well as shorts between the M1 and M2 interconnects, can
still be inspected through scan elements 452 and 454).
[0125] As illustrated in FIGS. 11 to 13, the same aspects can be
applied to the testing of M2 interconnects. As shown in FIG. 11,
the M2 interconnect is grounded through a disconnected portion 450
of the M1 interconnect. As shown in FIG. 12, the integrity of the
M2 layer can be still tested using a first scan element 452 of M3
interconnect 440. As shown in FIG. 13, possible shorts between the
M3 and M2 interconnects, after forming the M4 interconnect, can be
detected using a second scan element 454 of the M4
interconnect.
[0126] The above described stacked test structures may be utilized
to inspect buried structures. A single test structure may include
mechanisms for inspecting two or more buried structures each at
different levels. For example, a first tap may be connected to an
M1 conductive line that is grounded at its distal end, while a
second tap is coupled to an M2 conductive line that is grounded at
its distal end. Alternatively, there can be dedicated areas for
inspecting particular buried layers (e.g., as described with
reference to FIG. 4d). For example, a first area may include test
structures having taps to a first buried layer, and a second area
may include test structures having taps to a second buried
layer.
[0127] Additionally, the above described taps may also be each
coupled to a probable pad. Thus, parametric information regarding a
buried layer may also be obtained. That is, standard wafer probing
techniques may be utilized on the finished, or partially finished,
wafer to inspect buried structures (e.g., conductive interconnect
lines). For example, leakage current may be measured in a buried
interconnect structure having a short. Additionally, mixed signal
tests may also be performed on the buried structure via the
probable pad. In this embodiment, parametric information and
voltage contrast information may be obtained from a buried
structure. One such probable test structure in described below with
reference to FIG. 31.
G. Via Chains
[0128] As is described more fully below, the second test structures
404 preferably comprise rows of first via chains 500 that may be
formed in one specified module (see FIGS. 14a-14b), and second
chains 501 formed in another module (see FIG. 4c) in portion 208 of
the test die 204. The via chains 500 and 501 extend parallel to the
edges 204B and 204D, and between the proximal and distal edges 208A
and 208B of the test die 204 (e.g., of FIG. 4c). In a specific
embodiment, proximal ends 502 of the via chains 500 and 501 are
located at the proximal edge 208A of the portion 208 of the test
die 204 (e.g., of FIG. 4c), and distal ends 504 of the vias 500 and
501 are located at the distal edge 208B of the die portion 206. It
is understood that, the second test structure 404 exemplified in
FIG. 5 may represent plan view of any of the via chains constructed
between any of the metal layers, such as between M1 and M2, M2 and
M3 or M3 and M4, etc.
[0129] FIGS. 14a and 14b exemplify a part of the test structure 404
comprising an array of via chains 500, constructed between an M1
interconnect and an M2 interconnect, having a proximal end 502 and
a distal end 504. Referring to FIG. 14b, in cross section, via
chains 500 may be constructed over a substrate 506 that is isolated
from an M1 interconnect line 508 by an oxide layer 510. A contact
512 formed through the oxide 510 grounds the M1 interconnect 508,
and hence the via chain 500 to the substrate 506. A series of vias
514 formed through an interlayer dielectric 516 connects M1 and M2
interconnects 508 and 518.
[0130] As is described below, the via chain test structure 500
allows opens-only test types to detect opens in via chains. At this
step of the process, an electron beam probe may be scanned across
exposed metals of the M2 interconnects at the proximal end 502 to
detect defects, for example, opens, in the test structure 404. If
the via chain does not have opens, electrons from the beam will
find a path to ground and secondary electrons will be emitted from
the top M2 interconnect indicating that the via chain is good.
However, if the chain is broken, the M2 interconnect will remain
dark and will be registered by the system as a potentially
defective chain for further processing.
[0131] The via chains 501 shown in FIG. 14c are configured such
that both shorts between the neighboring chains as well as opens in
individual via chains can be advantageously observed. For this
purpose, the via chains 501 are formed as in the manner the via
chains 500 are formed, as shown in FIG. 14b, except that every
other via chain is not grounded to the substrate. For example, in
FIG. 14c, while a first row 520 and a third row 524 of via chains
501 are grounded at the distal end 504, a second row 522 is not
grounded. Since the via chain at row 522 is not grounded to the
substrate and cannot generate secondary electrons, it remains dark
as long as it is not shorted to the neighboring grounded via
chains. When the via chain at row 522 is shorted to the via chain
at a next row, for example 520, the neighboring chain 520 provides
a path for the electrons to the ground and secondary electron
emission occurs in both the via chain in row 522 and 520, thus
indicating a short-type defect. Moreover, grounded via chains at
the first and second rows 520 and 524 are used to observe opens in
the via chains as described for the via chains 500 in FIGS.
14a-14b.
H. Test Structures for Defects Caused by Chemical Mechanical
Polishing
[0132] As is described more fully below, the third test structures
406 are located on the intermediate portion of the exemplary test
die 204 and distributed along the scan direction `A` shown in FIG.
5. As previously mentioned, the third test structures may, for
example, comprise arrays of isolated contact test structures, CMP
test structures, overlay test structures and CMP dummy metal test
structures. Each of these structures may be contained within a
plurality of modules.
[0133] One aspect of the present invention is able to detect
defects caused by the chemical mechanical polishing (CMP) process.
As is well known in the art, the CMP process is often used to
planarize profiles that build up during multilevel deposition
processes. As various layers are etched into the patterns during
the process, the surface becomes uneven. In order to perform
subsequent photolithographic process steps, such unevenness is
planarized by the CMP process. However, the CMP process may polish
away functioning circuit parts or cause unwanted density, pitch and
or rise in the horizontal aspect ratio (length:width). Thus, it is
desirable to detect defects created by the CMP process.
[0134] In one embodiment, several test structures for detecting
defects caused by the CMP process are provided. Several different
structures for detecting defects resulting from the CMP process are
discussed below. Typically, these test structures will reside in
whole or in part within the scanned swath of the test chip.
[0135] 1. Test Structures For Detecting Pitch CMP Defects.
[0136] The test structure illustrated in FIGS. 16a-c exemplifies a
CMP pitch test pattern 700. In this pattern 700, test elements 702,
such as metal lines representing M1 interconnect lines, have
substantially the same line width 704. Each metal line 702 is
separated from one another by a space 706 that is substantially
equal to the line width of the test line. Therefore, the test
pattern 700 has a fixed density of about 50% line area. The test
pattern 700 is configured such that every other metal line in the
pattern is grounded (see FIG. 6c). FIG. 16b illustrates one of the
metal lines 702 that is grounded to a substrate 704 by a contact
710 formed through an isolation layer 708. Such test patterns can
be formed in a plurality of modules and in different critical
dimensions on the test die.
[0137] During the electron beam inspection, as the probe is scanned
across the metal lines 702 of the pitch test pattern 700, if there
are no defects, grounded metal lines will emit secondary electrons
indicating that all lines are good. If one of the grounded lines is
open, that line will remain dark, indicating a defect. If one of
the ungrounded lines is shorted to one of the neighboring grounded
lines, both lines will emit secondary electrons, thereby indicating
the short between them.
[0138] As mentioned above, in a preferred embodiment of the present
invention, the CMP pitch test patterns will generally be located in
whole or in part within the scanned swath of the test chip. In this
manner, the test patterns can be tested for defects during the scan
of the scanned swath.
[0139] The CMP pitch test structures will preferably comprise metal
lines that are less than 20 .mu.m in length. More preferably, such
test structures comprise metal lines that are about 10 .mu.m or
less in length. Still more preferably, such test structures
comprise metal lines that are 5 .mu.m or less in length.
[0140] A test chip may have various CMP pitch test structures, each
with a different pitch. The width of the metal lines in the test
structures with the widest lines will typically have lines of about
2 .mu.m to 3 .mu.m wide. Other CMP pitch test structures on the
test chip may comprise significantly thinner metal lines, such as
lines as thin, for example, as 0.05 .mu.m. Preferably, a majority
of the CMP pitch test structures on the test chip will generally
comprise metal lines of a width less than 0.5 .mu.m. More
preferably, the majority of the CMP pitch test structures on the
test chip will comprise lines of a width less than 0.2 .mu.m.
[0141] Typically, the CMP pitch test structures on a test chip will
each cover the same area (for example, 10 .mu.m by 10 .mu.m or 5
.mu.m by 5 .mu.m) such that all of the CMP pitch test structures
have lines of substantially the same length. However, the number of
lines in a CMP pitch test structure will be inversely proportional
to the width of the lines in the test structure. For example, if
the width of the lines is 1 .mu.m, a 10 .mu.m CMP pitch test
structure will comprise five lines and if the width of the lines is
0.5 .mu.m, a 10 .mu.m CMP pitch test structure will comprise 10
lines.
[0142] In order to save space on the test chip, multiple CMP pitch
test structures can be placed together in a row. Generally, in such
an instance, the width of the metal lines among the multiple test
structures will vary. For example, six CMP pitch test structures
might be placed in a row in the x-direction with each of the metal
lines in the test structures extending in the y-direction. The
first and sixth test structures might have wide lines, with the
second and fifth test structures having narrower lines and the
third and fourth test structures having still narrower lines. It
should be noted, however, that in this example, it would be
preferred that the "wide lines" be no more than 1.25 microns
wide.
[0143] 2. Test Structures For Detecting Density CMP Defects.
[0144] FIG. 17 shows a section of a CMP density test pattern 350 to
monitor the effects of the CMP process on patterns having metal
lines with differing line widths and line space between the
neighboring metals lines. The CMP density test pattern 350 as shown
in FIG. 17 has four sections (351, 352, 353, and 354), each section
having four metal lines. In section 351, the metal lines take
approximately 50% of the space. In section 352, the metal lines
take approximately 37% of the space. In section 353, the metal
lines take approximately 25% of the space. And, in section 354, the
metal lines take approximately 12% of the space. It is preferred
that the lines of each section be of substantially equal length and
width, as is illustrated in FIG. 17.
[0145] Similar to the test pattern discussed above with respect to
CMP pitch testing, the density test pattern illustrated in FIG. 17,
is configured such that every other metal line is connected to
ground. As such, the density test pattern can be tested using
voltage contrasting in the same manner as is described in
connection with the CMP pitch testing pattern.
[0146] The dimensions of each section in the example illustrated by
FIG. 17 is 5 .mu.m by 5 .mu.m. As such, the width of each of the
metal lines in section 351, for example, is 0.625 .mu.m, as is the
width of each of the spaces between the metal lines. The length of
each metal line in the pattern is 5 .mu.m.
[0147] In the example provided by FIG. 17, the width in the lines
in each section is substantially equal in both length and width.
Further, the spaces in each section are also substantially equal in
both length and width. Further, each section takes up the same
space (real estate) on the test chip. In addition, in the pattern,
the width of a line together with the width of the space to its
right equals a constant--in this example 1.25 .mu.m.
[0148] It should be noted that the pattern shown in FIG. 17 could
have additional lines extending both to the left and the right. For
example, to the left of section 351, there might be one or more
sections wherein the four metal lines are wider than the spaces
that separate them. To the left, there might be one or more
sections wherein the four metal lines are narrower than the metal
lines in section 354.
[0149] It should also be noted that the metal lines might be
significantly longer than 5 .mu.m and still be within the scope of
the invention. Preferably, however, each metal line will be no
longer than 10 .mu.m. More preferably, each metal line will be
approximately 5 .mu.m or less in length. At the same time, it
should be noted that, in a particular section, the metal lines can
be of any width that fits within the real estate allotted to a
metal line and its adjacent space. For example, a metal line might
take up 100% of the allotted real estate. Or it can take, for
example, closer to 4%, or even less.
[0150] Furthermore, the number of metal lines per section can vary.
In the preferred embodiment, each section has an even number of
metal lines, more preferably eight. However, a section can consist
of an odd number of metal lines. Furthermore, it is possible to
have sections within a single pattern that have differing numbers
of metal lines.
[0151] In a specific embodiment the density test pattern will
reside within the scanned swath of the test chip, either in whole
or in part, so that it is scanned and voltage contrast analysis can
be applied. It is preferred that each metal line in the density
test pattern reside entirely within the scanned swath so that it
can be scanned. However, the metal lines in the pattern might
reside only partially within the scanned swath and still be scanned
such that voltage contrasting methods are applied.
[0152] FIG. 18 provides a further example of a density pitch
pattern 380 for CMP defect-related testing. The pattern comprises a
plurality of metal lines 381 with a plurality of contacts to ground
382. The pattern shown in FIG. 18 illustrates three different
density patterns. In the embodiment shown here, the metal lines in
the test pattern are 5 microns or less in length and the widest
line (Density #3) is 0.2 microns or less in width. The metal lines
in the plurality of metal lines 381 are alternately electrically
isolated.
[0153] 3. Test Structures For Testing Horizontal Aspect Ratio.
[0154] FIG. 20 shows a section of a CMP aspect ratio test pattern
740 comprising metal lines 742 having different width and length to
accommodate reasonable utilization of the real estate on the test
die. As can be seen in FIG. 20, the lines in pattern 740 rise in
the horizontal aspect ratio from left to right. Also, the length
increases from left to right, while the width increases from right
to left. Similar to the previously described CMP test structures,
in this configuration every other metal line is grounded to the
substrate and test structure 740 is repeated in various modules
with different critical dimensions. As can also be seen in FIG. 20,
in one embodiment, the lines are paired into lines with the same
horizontal aspect ratio (and preferably the same dimensions). In
each such pair (e.g., pairs 743 and 744), one of the lines is
electrically isolated (floating) and the other is not electrically
isolated (preferably connected to ground).
[0155] It should be noted that the pattern 740 can be repeated on
the test die with increasing or decreasing space between lines.
This is true of any horizontal aspect ratio test pattern. Such
repetition (repeated test patterns with increasing or decreasing
space between lines) can be utilized to develop a row of test
patterns on the substrate.
[0156] FIG. 19 illustrates another horizontal aspect ratio test
pattern 720. Here the horizontal aspect ratio increases from left
to right, but the length of the lines remains the same, preferably
no more than 10 microns and even more preferably no more than 5
microns. This pattern can be repeated on the test die similar to
the test pattern of FIG. 20. Again, the lines of test pattern 720
are paired into lines of equal dimension, with the lines in the
pair alternately electrically isolated. Test patterns 720 and 740
are inspected the same way as the CMP pitch test structure 700.
[0157] FIG. 21 illustrates an additional horizontal aspect ratio
test pattern 750. The pattern comprises metal lines in increasing
horizontal aspect ratio from left to right. Every other line has a
contact to ground 752. On the bottom of each line is a scan
structure, which is of uniform size throughout the pattern 750. In
one embodiment of the present invention, the metal lines would be
scanned along the scan structures (in order to insure better
uniformity). However, such scan structures are not required to
practice the present invention. It should be noted, however, that
such scan structures can also be utilized in the other CMP patterns
(pitch and density) described above.
I. Contact Arrays
[0158] FIG. 15a shows an exemplary array 600 of isolated contact
test structures 602 that is located on the intermediate portion
210. Such structures enable monitoring of defective contacts in
integrated circuits.
[0159] Rows of the array 600 preferably extend parallel to the
proximal edges 206A and 208A of the first and second portions 206
and 208 of the test die 204 (See FIG. 4c). FIG. 15b exemplifies the
multilayer construction of the isolated contact test structure 602
formed on a substrate 604 using conventional semiconductor
processing techniques. An isolation layer 606, such as an oxide
layer, isolates a M1 layer portion 608 (M1 pad), from the substrate
604. A contact 610 formed through the isolation layer 606 connects
the M1 layer to the substrate 604. Preferably, an interlayer
dielectric 612 isolates the M1 layer portion from a M2 layer
portion 614 (M2 pad). M2 layer portion is connected to the M2 layer
portion by vias 616 formed through the interlayer dielectric 612,
thereby establishing a ground connection for the M2 pad 614. In the
illustrated embodiment, M1 and M2 layer portions 608 and 614 are
connected with four vias, which will be referred to as redundant
vias. In this embodiment redundant vias 616 help to monitor
defective contacts without concerning about failing vias, thus
limiting the failure mechanism to the contact 610. This
configuration shown in FIGS. 15a and 15b assures that the random
defects, in any of the vias 616, do not prevent contact to the
substrate 604. As long as one of the vias 616 is not defective,
ground connection between the M2 pad and the substrate will be
established.
[0160] During the electron beam inspection, as the probe is scanned
along the rows of exposed metal of M2 pads 614, if the contact 610
is not open the electrons from the beam will find path to the
ground and secondary electrons will be emitted from the pad 616
indicating that the contact is good. If the contact is open, the
pad 616 will remain dark.
J. Test Structures to Monitor Misalignment
[0161] As is well known in the semiconductor industry, each step of
IC manufacturing requires precise alignment control in order to
prevent unwanted contacts between devices or changes in device
dimensions. FIGS. 22a through 22c show six types of overlay test
structures 800a through 800f used to observe misalignment problems
occurring during the manufacturing process, such as those that
occur during the patterning of metal layers. Test structures 800a
and 800d are "M1 to contact" type structures and have strips of M1
metal (804a and 804d, respectively) extending over a contact (806a
and 806d). Test structures 800b and 800e are "via to M1" type
structures and have a M2 via (806b and 806e, respectively) over a
M1 metal strip (804b and 804e). Test structures 800c and 800f are
"M2 to via" type structures and have strips of M2 metal (802c and
802f, respectively) extending over a via (806c and 806f). Each type
includes a test structure for measuring misalignment in the x
direction (e.g., FIG. 22a), as well as the y direction (e.g., FIG.
22b). Of course, any other misalignment direction may be used.
[0162] As exemplified in FIGS. 23a and 23b, each test structure may
form part of an array that is utilized to determine whether a
misalignment has occurred and a measurement of such misalignment.
An array of "M1 to contact" type structures are shown in both FIGS.
23a and 23b. The structures are fabricated to be almost identical
to each other, except for positioning of a contact (e.g., 811 or
813). As shown in FIG. 23a, the middle test structure 810e has a
contact 811e that is perfectly centered when there is no
misalignment. The structures to the right of the middle structure
have incrementally misaligned contacts in the negative y direction.
The rightmost contact 811i is misaligned so that it no longer
touches the M1 layer. In contrast, the structures to the left of
the center are incrementally misaligned in the positive y
direction. the leftmost contact 811a is misaligned so that it no
longer touches the M1 layer. Similarly, the test structures of FIG.
23b are incrementally misaligned in the positive and negative x
directions.
[0163] The contacts 811 and 813 are tied to the substrate and
grounded. Thus, if the test structures are aligned, particular test
structures will be touching the contact and others will not. As a
result, during voltage contrast testing, the contacting test
structures should appear bright, while the non-contacting
structures should appear dark. In the illustrated example, the test
structures 810a, 810i, 812a, and 812i (which do not touch the
contacts 811 or 813) should appear dark, and the remaining
structures should appear bright.
[0164] However, when there is a misalignment, some of the test
structures that are expected to appear bright may actually appear
dark, and some of the structures that are expected to appear dark
may appear bright. The relative positions of the contacts 811 and
813 are chosen so that a misalignment may be readily measured. For
example, the contacts of the array are designed to be offset from
M1 by increments of 0.0005 .mu.m. Thus, the misalignment amount may
be determined by how many test structures appear dark. For example,
if only the two rightmost test structures 810g through 810i (and
the leftmost structure) appear dark, the misalignment is 0.0005
.mu.m or less in the negative y direction.
[0165] When using die to die comparison mode for defect analysis,
the overlay structures must have a set of corresponding structures
of which none are connected to ground. These ungrounded structures
serve as references and are compared to the grounded structures to
ensure that all connected overlay structures are detected. If the
reference structures are not provided the results from the overlay
structures will not be consistent.
K. CMP Dummy Metal Filings
[0166] Another test structure that may be formed within the
intermediate section 210 of the test die 204 is the test structures
using CMP dummy metal filings as a test pad to test for vias. As is
commonly known in the art, CMP dummy fillings are auxiliary metal
structures CMP process integrity distributed on a wafer to
facilitate an even polishing of a surface of the wafer. They
prevent rapid erosion of relatively soft materials located on the
surface when such materials are neighboring harder materials. In
one embodiment, as shown in FIGS. 24a-24b, a metal filler may be
converted to a multilevel test structure to monitor the integrity
of the CMP process with the addition of vias and/or contacts.
[0167] In one exemplary test structure 902, a contact 904 is formed
between a substrate 906 and a first metal layer portion 908 (first
metal pad), and through an isolation layer 910. The first metal pad
902 may be connected to the metal filler 900 by at least one via
912 formed through a interlayer dielectric 914. This structure 902
may have more metal layers above the metal under test (MUT) and
more redundant vias between these metal layers. During the electron
beam inspection, the probe is scanned along the rows of metal
fillers 900. If a defect free path to substrate is established,
metal filler 900 emits secondary electrons, indicating that the via
and the contact are not open. If any one of them are open, the
metal filler remains dark.
[0168] After the test chip is initially designed, it may be
determined whether empty space requires dummy fillings to prevent
defects caused by CMP polishing. Under current technology, this is
often determined using software tools available in the marketplace.
This determination will be based on the size and configuration of
the empty space. Once this determination is made, according to the
present invention, the dummy fillings can be fabricated as contacts
that can be tested similar to the contacts of the contact arrays
described above. In this manner, the empty space is utilized for
testing purposes on the test chip. In addition, this same method
can be utilized for empty space of VLSI products.
[0169] FIGS. 26a-26c illustrate the process for utilizing dummy
shapes for purposes of testing for defects. FIG. 26a illustrates a
product chip 900 with empty space 901. FIG. 26b illustrates a
pattern of typical dummy shapes 902 used to fill up empty space on
a product chip. FIG. 26c shows that contacts 904 have been added to
some of the dummy shapes 903 to permit voltage contrast testing
(the other dummy shapes are allowed to float). Such usable dummy
shapes can be included in both dedicated test chips and product
chips (for in-line voltage contrast testing).
L. Location and Characterization of Defects
[0170] As discussed above, once a defect is detected via the
voltage contrast technique, it may be important to determine the
location of the defect and to characterize it. Where the scan of
the scanned swath has been in the x-direction, inspection of the
test structure at issue may be required in the y-direction. For
example, in connection with the exemplary test chip described
above, a conductive line may prove defective based on the analysis
of the scan of the primary scan area. As discussed above, these
defect(s) may reside outside the scanned swath (i.e., primary scan
area). In other words, the primary scan area is scanned first to
determine whether the test structure contains one or more
defect(s). Testing may then be performed in the y-direction to
locate and characterize the defect(s).
[0171] Preferably, defects are located after completion of the scan
in the x-direction. That is, all of the stubs of the conductive
lines are scanned to determine if any conductive line is defective.
The location of each defective stub and corresponding conductive
line is then recorded. After all of the stubs are scanned, each
conductive line may then be scanned in the y-direction in an
efficient pattern. For example, if the stubs were scanned left to
right in the x-direction, each conductive line is then scanned in
the y-direction, starting with the leftmost line. In sum, scanning
the test structure along the entire x-direction (prior to locating
the individual defects) allows a quick assessment of the number of
defects within the test structure. If required, the individual
defects may then be located and characterized as described
below.
[0172] Of course, any other suitable scan pattern may be
implemented. For example, when a conductive line is found defective
during an x-direction scan, the x-direction scan is halted and the
defect is immediately located along the y-direction conductive
line. The x-direction scan may then resume after the defect is
located. However, this scan pattern is not as efficient as a scan
pattern that allows the x-direction scan to complete prior to
locating the defects.
[0173] Accordingly, once the defective structures on the die are
relocated and identified, the exact location and the cause of the
defects may need to be identified. In a specific embodiment, this
can be carried out using an analysis tool. FIG. 25 shows a
fundamental construction of an analysis tool 950 for analyzing a
failed test die containing test structures. The analysis system may
preferably comprise a dual beam analysis tool comprising both a
Focused Ion Beam (FIB) unit 951 and an electron beam (SEM) unit
952. The analysis tool 950 is coupled to the system 10 of FIG. 1
and is a integral part of the system.
[0174] The system of 10 provides the recorded layout data for the
defective structures of the test circuit and the type of the defect
such as opens or shorts type of defects. The analysis tool 950 that
is used in specific embodiments of the present invention is able to
scan the defect containing locations with either a focused ion beam
(FIB) or an electron beam to provide two different types of
scanning action. The focused ion beam can be used to provide
localized cutting or removal of the material from a defect
containing location so as to expose underlying materials locally,
thereby avoiding the need for removal of an entire layer or layers
in certain instances. The electron beam can be used for chemical
analysis using Energy Dispersive X-ray (EDX) analysis and imaging
of the area under analysis.
[0175] As shown in FIG. 25, the exemplary FIB unit generally
contains a liquid metal ion source 954 using gallium (Ga) to
generate a Ga ion beam 956. A lens system 958 focuses the ion beam
to a spot size on the test die of the wafer which is placed on a
stage 959. A set of scan coils 960 is placed in the vicinity of the
lens system 958. When energized, the scan coils 960 cause the ion
beam 956 to scan over the test die. The output of ion source, lens
system focusing, and scan coil actions are controlled by an ion
beam control unit 962. During the material removal, the control
unit 962 controls scanning of a target surface by focused beam with
respect to scanning area, frequency, and time of scanning.
[0176] The focused ion beam, which is focused and scanned as
mentioned above, irradiates a selected portion of defected
structure. The acceleration voltage of ion beam 956 can range from
10 to 30 kev. Current of the focused ion beam 52 can be set between
10 pA and 1000 pA.
[0177] The scanning electron beam unit 952 irradiates an electron
beam 964 on the die in the vicinity of beam 956. The acceleration
voltage, current level and beam diameter of electron beam 964 are
controlled by an electron beam control unit 966. The electron beam
964 is used for imaging, e.g., secondary and/or back scattering
electron imaging, as well as EDX chemical analysis. The electron
beam 964 may also be used to irradiate the area of interest on the
die when that area is also being irradiated with the focused ion
beam.
[0178] As mentioned before, the wafer under inspection is mounted
on a stage 959, and further the stage is associated with a stage
control unit 968 for displacing wafer stage 959 in x, y and z
directions. A detection unit 970 may be placed at an appropriate
location for detecting various signals generated at the surface of
the wafer in response to irradiation by focused ion beam or
electron beam. Although simplified in FIG. 25, it is understood
that the detection unit 970 represents various detectors such as
secondary electron, back scattering electron, x-ray or mass
spectroscope or the like. A signal from the detection unit 970 is
amplified and inputted into a FIB/SEM computer. The ion beam
control unit 962, stage control unit 968 and the electron beam
control unit 966 are also connected to the FIB/SEM computer system
which is further connected to the system 10.
[0179] Once the defect site is relocated and marked, a chemical
analysis known as EDX (electron dispersion X-ray) is performed at
the location of interest. The EDX analysis is performed using
electron beam unit 952 by focusing electron beam on the defective
structure. Interaction of the beam electrons with the material
atoms generates an X-ray spectrum which reveals the chemistry of
the location under focus. When the X-ray spectrum of from the
material is determined the most of the elements present at that
location can be qualitatively identified, which may provide a
determination of the cause of the failure. For example, if there is
no tungsten at that location, the EDX spectrum should not show
tungsten at that location. At his stage, if the cause of the defect
is determined and identified, the process is completed and a new
test die can be tested. Assuming that the initial inspection has
not revealed the cause of the failure, FIB unit can be used to
either strip back a layer or produce a cross-section using the
focused ion beam to reveal cross sectional structure of the area of
interest.
[0180] After the FIB stripping has been performed, the locations
are then inspected once again using the scanning electron beam
imaging and/or another EDX analysis and it is once again determined
whether the cause of the failure can be identified. This process is
repeated until the cause of the failure is identified. It will be
appreciated that this process allows rapid corrective action to be
taken in real-time in a manufacturing environment because once the
cause of failure in the test structures is found, the manufacturing
process of the wafers may be modified in order to improve the yield
of the wafers.
[0181] In connection with the location of defects that have been
detected, an additional technique can be utilized to locate a
defect. The technique comprises pre-scanning the wafer under test
with a dose that is designed only to partially charge the
structures. Shorter lines will have less capacitance loading and
will be charged more completely to the equilibrium potential. Thus,
the potential of floating lines will vary approximately linearly
with the length of the line. Longer lines will take longer to
charge. The lines can then be scanned.
[0182] As such, defects on the line can be recognized, for example,
by using the following technique: [0183] 1. If the line is at
ground potential, the signal level from the end of the line will be
mid level (say 50% of full scale); [0184] 2. if the line is full
length and floating, then the signal level will be about 75% of
full scale; [0185] 3. if the line is partial length and floating,
then the signal level will approach 100% as the line length gets
progressively shorter.
[0186] By calibrating the signal level versus position, one can
infer the position of the end of the line and use this information
to quickly move the wafer so the defect is in the field of view to
image the defect for classification. Alternatively, each defective
line may be scanned in an array mode to locate the defect. In
general terms, a first field of view that is taken from a first
portion of the line is compared with a second field of view taken
from an adjacent second portion of the line. In one embodiment, the
first field of view is subtracted from the second field of view.
The subtraction result is directly related to whether the defect is
located within the first or second field of view. Thus, the defect
location may be determined based on such subtraction results.
M. Use of Voltage Contrast Testing In the Production of Product
Chips
[0187] The techniques and various test structures for voltage
contrast testing are not only useful in the context of test chips,
but can also be used in the context of product chips. FIG. 27
illustrates such a product chip 1000. The product chip 1000 has a
product circuitry portion 1001 (which includes the circuitry needed
to carry on the functions of the product chip) and a scanned swath
1002 at one edge of the chip. It is preferred that such a scanned
swath be located at the edge of a product chip, but such location
is not necessary in order to practice the present invention.
[0188] The scanned swath on a product chip can comprise any
combination of test structures of the type described above. In
fact, the exact combination of test structures may well depend on
the particular circuitry of the product chip. Also, the exact
combination may depend on particular concerns at the manufacturing
plant. In any event, the scanned swath can be tested at a single
point or multiple points during the manufacturing process.
Moreover, during the manufacturing process, new test structures can
be added to the scanned swath at any point of the manufacturing
process and then tested.
[0189] FIG. 28 provides a cross-sectional view of vertical taps
1004 (or stacked plugs) for testing purposes. The vertical taps
shown here are contained in the scanned swath of the exemplary
product chip 1000. Shown is the substrate 1003 of the product chip.
As shown, the vertical taps or stacked plugs 1004 may be used
monitor buried layer M1. Such vertical taps are but one type of
test device that can (if desired) be fabricated in the scanned
swath.
[0190] FIG. 29 shows test structures that can be included in the
scanned swath 1002. Included is a contacts array 1006 and
conductive lines alternately connected to ground 1005 and left
floating 1007. All of these structures can be tested using
conventional voltage contrasting techniques, as well as the novel
techniques described herein. In a specific embodiment, a scanning
device with a continuously moving stage, such as the type described
above, will be used to scan the test structures shown in FIG. 29.
The preferred direction of continuous motion is illustrated by the
arrow 1008, although the continuous motion can be in another
direction. Here, however, in order to take only a narrow strip of
the product chip for testing purposes, the conductive lines are
preferably scanned with the continuous motion being substantially
parallel to the conductive lines rather than substantially
perpendicular to the conductive lines (as is preferably applied in
the context of a dedicated test chip where space is less of a
concern).
[0191] Once the scanned swath of a product chip has been inspected
using voltage contrast techniques at an inspection station, the
total defects number of defects can be counted. When a sample stage
is continuously moved in a first direction through the primary scan
area to detect shorts, for example, the number of open shorts can
be quickly quantified. An algorithm can then be applied to infer
the expected impact on yield for the product die and this may be
used to produce a defect control limit for each defect type at that
layer. For example, if there are "n1" opens in an opens test
structure that has a critical area "A1" to open shorts per die,
then the expected defect level in the product die is given by
(n1)*(A1/A2), where A2 is the critical area of the product die for
open shorts at the given process layer. The critical area for a
given process layer is defined as the total area of the pattern
that would result in a failed device for a defect of a given type
at the at the critical dimension.
[0192] Once this control is established, if the defect level
measured on subsequent lots via scanning of the scanned swath of
subsequent product chips exceeds the control limit, the
manufacturer will know that its manufacturing process is trending
out of control. Further, the manufacturer will have direct feedback
from the scanning of the scanned swath as to which defect mechanism
is causing the problem. Since the test structures of the scanned
swath provide directly the classification of the defect, by the
location and signature of the defect in a given test structure, the
manufacturer is able to immediately diagnose the problem and fix
it.
N. Utilization of Voltage Contrast Testing To Optimize Other Test
Devices
[0193] The voltage control testing devices, configurations and
techniques described above also can be utilized to optimize other
inspection systems used during the manufacturing process. Such
inspection systems include, for example, KLA-Tencor products AIT II
(Patterned Wafer Inspection System) and the KLA-2138 (Wafer
Inspection System with Ultra-Broadband Technology). Such systems
detect many defects in semiconductor chips. However, some of these
detected defects may not be significant in that they do not affect
the performance or operation of chips. Voltage contrast testing, on
the other hand, by its nature, identifies only significant defects
(so-called "killer defects"). Therefore, the voltage contrasting
techniques and structures described above can be used to optimize
other testing systems so that such systems maximize the detection
of "killer defects" and/or minimize the detections of "nuisance
defects."
[0194] Such optimization will include doing the following
operations: [0195] 1. A test chip or test portion of a product chip
will be inspected by an SEM inspection device in order to detect
significant defects; [0196] 2. test structures with defects will
then be further scanned in order to locate the defect and classify
the defect according to its class (e.g., "open," "short" or "via
open") to produce a wafer map of significant defects by class;
[0197] 3. the same test chip or test portion of a product chip is
then inspected by the inspection tool to be optimized; [0198] 4.
preferably, the step 3 is repeated several times with the
inspection tool set at differing configurations; [0199] 5. defect
map(s) are generated based on the inspections using the inspection
tool to be optimized; [0200] 6. the various defect maps are each
overlaid with the wafer map generated by the voltage contrast
testing and analyzed to determine which configuration of the
inspection tool maximizes capture of significant defects while
minimizing capture of insignificant defects; and [0201] 7. the
inspection tool is set to the optimal configuration. The inspection
tool may generate its defect map from a different layer than the
layer on which the voltage contrast defect maps are generated. The
above described procedure may also be used to periodically
calibrate or spot check the inspection tool.
[0202] The process can also be automated using standard automatic
nuisance filtering techniques and assign the "killer" defects as
real and the other defects as nuisance and allow the automatic
Segmented Autothreshold and Real Time Classification algorithms to
configure the tool to maximize the capture of the "killer" defects
and minimize the capture of the nuisance defects. See, e.g., U.S.
Provisional Patent Application No. 60/167,955 filed on Nov. 29,
1999 by inventors Bakker et al., entitled "POWER ASSISTED AUTOMATIC
SUPERVISED CLASSIFIER CREATION TOOL FOR SEMICONDUCTOR DEVICES,"
which is incorporated herein by reference in its entirety.
[0203] One example of a system that can be used to automate this
process is KLA-Tencor's product Klarity. Klarity is KLA-Tencor's
automated defect data analysis solution. It allows semiconductor
fabrication facilities to automate analysis of defect data
generated by inspection, classification and review tools. This
yield analysis module allows users to automate complex engineering
methodologies using simple flowcharts in effect, transferring
expert engineering knowledge and defect analysis routines to fab
operators. Such automation enables the user to quickly analyze huge
volumes of defect data and helps reduce the defect data set to
represent only the most critical yield deterrents.
[0204] The voltage contrasting techniques, structures and devices
described above can also be utilized in conjunction with defect
classification methods. For example, the voltage contrasting
techniques, etc. can be used in conjunction with the methods and
apparatus described in the U.S. Provisional application referenced
above and incorporated herein. In one embodiment, electrical (or
voltage contrast) data and optical images are sorted and grouped by
defect type. The electrically obtained defect information may then
be used to characterize the optical images (e.g., sort into killer
and non-killer defects) during the setup phase of an optical
inspection. Furthermore, wafer maps generated as a result of the
inventive voltage contrasting techniques described above can be
studied and analyzed to find systematic defects. For example, if
the wafer maps of several test chips show that defects are
frequently located in a particular area of tested chips, it may
indicate a systematic problem in that particular location.
[0205] The wafer defect maps that are generated from voltage
contrast measurements may also be used in other inspection or
review tools. For example, the defect map is generated on a first
inspection tool, and the defect map is then used to locate the
defects on a second inspection or review tool. For example, a
focused ion beam tool may be used to uncover and view the defect,
as described above. In sum, the defect map may be used to determine
the defect's location after the sample is removed from the voltage
contrast tool.
[0206] Further, certain patterns may emerge in the wafer maps that
identify a particular defective (or out of specification)
manufacturing process. That is, the particular physical
arrangements of the defects on the sample may indicate the type of
defect. An example of a defect that forms an edge type pattern is
shown in FIG. 34. A particular type of fabrication process will
typically have a particular defect footprint. For example, defects
that are arranged in patterns that radiate from the center of the
chip may indicate a problem with equipment that spins a particular
layer onto the wafer. The defect shown in FIG. 34 may originate
from an etch process in which the etch tool has a gas entry port on
one side of the wafer and a gas exhaust port on the opposite side
of the wafer. Thus, a particular arrangement of defects can then be
compared and matched to a particular equipment footprint and
corresponding process step. In addition, the defect data maps from
several wafers across several lots can be stored in a database, and
signature analysis applied across the large data set. This would
allow one to detect low level signatures in the data that are
indicative of systematic process yield problems. A processor may be
utilized to efficiently compare the defect data maps to signature
patterns. Of course, a user may also manually compare the maps to
signatures. By way of another example, the voltage contrast data
may be utilized in conjunction with optical data to determine which
manufacturing process to inspect so that the capture of killer
defects is maximized.
[0207] Electrical defect data from a voltage contrast inspection
may also be associated with other types of data taken during
various steps in the fabrication process. For example, electrical
defect data and a corresponding optical image may be generated from
a test structure after each process step. Each electrical defect is
then characterized and associated with one or more optical images.
Process information (e.g., identity of process step and the process
machine's operating parameters) may also be associated with the
each associated pair of electrical defect and optical image. The
evolution of a defect may then be traced through the defect's
corresponding optical images. For example, a defect that appears
after a particular process may result from such process. The
process may then be adjusted (e.g., the operating conditions are
adjusted). Additionally, once a particular defect type is
associated with a particular optical image, any subsequent optical
images that are characterized as being the same as the previous
optical image can also be identified as having the same defect type
as the previous optical image.
O. Alternative Test Structures
[0208] The above described test structures are merely illustrative
and are not meant to limit the scope of the invention. For example,
any suitable test structure may be utilized that facilitates
efficient inspection mechanisms. For example, a test structure may
simply be a plurality of straight and uniform-width lines. This
configuration is in contrast to the alternating island and
conductive line test structure illustrated in FIGS. 5 and 6a. FIG.
30 illustrates such a test structure 1100. This test structure 1100
includes alternating floating conductive lines 1104 and grounded
conductive lines 1102. In this embodiment, the lines are
substantially straight. One end (1105) of the conductive lines 1102
is tied to ground, while the other end of both conductive lines
1102 and 1104 project into the scan area 1101. The lines projecting
into the scan area may have varying lengths to distinguish between
the two sets of conductive lines (i.e., 1104 and 1102). Of course,
the two sets of lines 1102 and 1104 may have the same length.
[0209] As described above, opens within the conductive lines 1102
may be detected by performing voltage contrast on the conductive
line ends within the scan area 1101. Likewise, opens between a
conductive line 1104 and an adjacent conductive line 1102 may also
be detected by performing voltage contrast on the conductive line
ends 1104 within scan area 1101. Additionally, stacked plugs as
described above with reference to FIGS. 8 through 13 may also be
utilized in conjunction with the structure of FIG. 30. As described
above, a stacked plug may be used to monitor a buried conductive
layer (e.g., for opens).
[0210] The test structures that are positioned partially within the
scan area 1101 may also be utilized to measure other
characteristics, in addition to shorts and opens. For example, the
test structures may be utilized to measure various process
parameters, such as CMP parameters. FIG. 31 illustrates a CMP test
structure 1112 utilized to measure CMP line thickness. As shown, a
routing metal layer is utilized to connect a conductive line 1106
formed during a CMP process to four probe pads (not shown).
Specifically, a first routing strip 1110a and a second routing
strip 1110b are utilized to force a current through an end of the
conductive strip 1106 and out through the opposite end of the
conductive strip. That is, a current source is coupled between two
probe pads coupled via the first and second routing strips 1110 to
each end of the conductive strip 1106. A third and fourth strip are
then utilized to measure a voltage difference between each end of
the conductive line 1106. A resistance value for the conductive
line 1106 may then be calculated based on the measured voltage
difference and current value. The width of the conductive line 1106
may then be derived from the resistance value to determine how much
erosion and/or dishing has occurred in the conductive line 1106
during the CMP process.
[0211] Probe pads may be coupled to any of the above described test
structures, as well as the CMP test structure of FIG. 31. These
probe pads may then be utilized to measure parametric data
regarding the test structure. The parametric data may be utilized
with the voltage contrast defect data to determine various
characteristics regarding the test structure. For example, if it is
determined that a particular conductive line of the test structure
is shorted with an adjacent grounded line, the line may be probed
to determine a leakage current value. Additionally, various mixed
signal tests may be performed via the probe pads.
[0212] FIG. 32 illustrates a serpentine type test structure 1200
that may also be utilized to measure line resistance. As shown, the
test structure 1200 includes a plurality of first scan elements
1202 and a second plurality of second scan elements 1204. Each of
the first scan elements is formed from a stacked plug coupled to
the M1 layer 1210. The M1 layer 1210 forms a serpentine pattern
that is coupled to ground through vias 1212. Each of the second
scan elements 1204 is formed from an M3 conductive line coupled to
an M2 conductive line. The second scan elements 1204 are
floating.
[0213] When voltage contrast is performed on the first scan
elements 1202, each first scan element 1202 is expected to have a
different brightness since each first scan element has a different
line length relative to the grounded vias 1212. For example, the
first scan element 1202c is expected to have a brightness level of
100% since this element is coupled directly to ground. The first
scan elements 1202b and 1202d to either side of element 1202c are
expected to have a 50% brightness level, while the first scan
elements 1202e and 1202a are expected to have a 25% brightness
level. Since brightness level is also related to line width, the
measured brightness level for each first scan element 1202 may be
used to calculate line width deviation and/or line resistance.
[0214] When voltage contrast is performed on the second scan
elements 1204, shorts between M2 and M1 may be monitored. That is,
since the second scan element is expected to be electrically
isolated from the underlying M1 layer 1210, the second scan element
is expected to appear dark. When the second scan element is bright
under voltage contrast, a short has occurred between the second
scan element 1204 and the underlying M1 layer 1210.
[0215] The test structures described above are arranged to
facilitate voltage contrast measurement during a continuous scan
through the primary scan area (as described above). That is,
voltage contrast readings are taken from a plurality of conductive
lines as the electron beam moves continuously across the ends of
the conductive lines. In an alternative embodiment, test structures
may be utilized that facilitate stepper movement techniques to
obtain voltage contrast data. For example, stepper type test
structures may be utilized with a stepper type SEM, such as the
KLA-Tencor 8100 or eV300, Schlumberger, AMAT SEMvision, or Hitachi
CD tool.
[0216] FIG. 33 illustrates test structures 1201 suitable for
stepper-type techniques. Since voltage contrast measurements are
performed on one group of test structures at a time, the test
structures are arranged into voltage contrast groups. Thus, a first
voltage contrast measurement may be conducted on a first group;
then on a second group; etc. As shown, the test structures 1201
include a primary scan area 1201 and two secondary scan areas 1203
and 1205. The primary scan area 1201 includes a plurality of test
fields (e.g., 1207a and 1207b) arranged in an array across the
primary scan area 1250. A plurality of conductive line ends
terminate within each test field 1207. A first portion of the
conductive lines extends into the secondary scan area 1203, and a
second portion extends into secondary scan area 1205.
[0217] Each test field 1207 is sized to facilitate a raster scan of
substantially the entire test field without moving the sample
stage. For example, the test field is sized such that a raster scan
of the field area results in a relatively clear image of the line
ends that terminate within the test field 1207. The field area size
depends on the particular requirements of the stepper type SEM.
Preferably, the test fields are substantially equally spaced from
each other to allow a same stepper distance from one field to the
next field. The test structures may be arranged in any suitable
pattern, such as a two dimensional array or a check board
pattern.
[0218] The secondary scan areas may include any suitable type of
test structures. As shown, the secondary scan area 1205 is arranged
for detection of interconnect defects (e.g., opens and shorts) as
described above. Secondary scan area 1203, on the other hand, is
arranged for detection of via defects as described above. In the
illustrated embodiment, the secondary scan areas 1203 and 1205
includes alternating conductive lines of floating and grounded
lines. A first end of each conductive line stretches into the
secondary scan area, while a second ends extends into the test
field 1207. Additionally, the first ends of the grounded lines are
grounded. During a voltage contrast inspection within the test
field 1207, the second ends of the grounded conductive lines are
expected to have a different brightness than the second ends of the
floating lines. For example, the grounded line ends appear bright
and the floating line ends appear dark. When there is an open
defect in one of the grounded conductive lines, the defective line
appears a same brightness as an adjacent floating line (e.g.,
dark). When there is a short between one of the floating conductive
lines and a grounded line, the shorted floating line will appear a
same brightness as the grounded line (e.g., bright). In sum, when a
particular line is defective, it's scanned second end will appear
to have an unexpected brightness level. The defect position may
then be found by stepping down the particular defective conductive
line.
[0219] The stepper type test structures (e.g., FIG. 33) may be
inspected in any suitable manner that facilitates determining
whether there are any defects within a test structure by scanning
only a portion of the test structure and then determining a
specific location of the defect by scanning the remainder of the
test structure. By way of example, the following inspection
procedures may be utilized:
[0220] 1. pre-align wafer to facilitate location of conductive line
groups;
[0221] 2. the conductive line ends are initially positioned under
the SEM column by moving the wafer stage; (or the SEM column is
positioned over a first group of conductive line ends)
[0222] 3. an electron beam is scanned over the first group to
obtain voltage contrast data;
[0223] 4. a list of defect data and its associated stub (conductive
line end) are stored; and
[0224] 5. steps 1-4 are repeated for a second group of conductive
line ends.
The pre-alignment is performed in any suitable manner so that the
SEM is able to automatically step to each group of conductive line
ends (herein referred to as "fields"). For example, a step size is
entered to ensure that the right step is taken to get from one
field to another field. The stage is then automatically stepped
from field to field.
[0225] A list of defects for each field may be recorded. The
defects may then be located in each group of conductive lines
associated with each defective field based on the recorded list.
For example, the stage is repositioned so that the SEM column is
stepped along a longitudinal axis of a defective conductive line.
Alternatively, the defects field under test may be located prior to
moving to the next field. In this embodiment, a list of defects and
their associated stubs may also be recorded for each field.
Additionally, the specific defect locations may be recorded for
each field.
[0226] A defect in a defective line may be found in any suitable
manner. In one embodiment, a portion of the defective line that is
nearest and outside of the field is positioned under the SEM
column. Voltage contrast data is then taken for this portion to
determine, for example, if there is a transition from bright to
dark within the defective line. The brightness transition position
correlates to the position of the defect. If there is no transition
within this portion, a next portion that is adjacent to the
previously scanned portion of the defective line is positioned
under the SEM column.
[0227] Alternatively, any suitable search algorithm may be utilized
to position portions of the defective line under the SEM column. In
a binary search example, a mid-portion between the ends of the
defective line is initially positioned under the column. If there
is no brightness transition, it is then determined whether the
defect is in a first half of the line nearest the field or the
other half of the line. For example, if the line is expected to be
grounded at the end that is farthest from the field and the
mid-portion of the line appears dark, it is determined that the
defect is probably located in the half of the line that is farthest
from the test field. The search continues on a half portion of the
currently searched portion (e.g., a quarter portion of the line is
searched next) until the defect is found. A binary defect search
mechanism may also be implemented with any other test structures
described herein (e.g., the structure of FIGS. 6a-6c or 33).
[0228] As described above, the defect's location may also be
approximated based on the brightness level in the scanned end. The
wafer under test is pre-charged with a dose that is selected to
partially charge the structures. Shorter lines will have less
capacitance loading and will be charged more completely to an
equilibrium potential. Thus, the potential of floating lines will
vary approximately linearly with the length of the line. Longer
lines will take longer to charge. For example, a length of a
floating conductive line with an open defect may be determined from
the amount of charging or brightness level of the scanned end.
[0229] Shorts between adjacent lines may be quickly found by
scanning between the lines, rather than over a single conductive
line. For example, a non-raster e-beam may be used to scan, e.g.,
in a single line scan, between two adjacent and shorted conductive
lines. Preferably, the spot size of the e-beam has a radius that is
less that the distance between the two adjacent lines. As the
e-beam scans between the lines, a significant change in the
intensity level of the scan area (e.g., the scan area goes from
bright to dark or from dark to bright) indicates the position of
the short between the adjacent lines.
[0230] Each described test structure may also include a guard ring
or one or more conductive structures to control the electrical
field of conductive lines and thereby improve detectability of
defects. Otherwise, a conductive structure that is not adjacent to
another conductive line (e.g., an edge line within a test structure
array or a stub that is longer than adjacent stubs) may appear
brighter (due to a large edge effect) than a conductive line that
is adjacent to another conductive line. In sum, one or more
conductive portions that are not under test are used to control the
electric field within one or more conductive portions that are
under test. In one embodiment, conductive "guard" structures are
placed adjacent to specific conductive portions within the test
structure that are not located next to other conductive portions of
the test structure. The guard structure may be charged to a
predefined potential (e.g., grounded) or left floating. Preferably,
each guard structure has a different potential than the adjacent
conductive line from the test structure. For example, a floating
guard structure is positioned adjacent to a grounded conductive
line of the test structure.
[0231] FIG. 35 is a diagrammatic representation of the test
structure of FIG. 32 1200 with the addition of a conductive guard
ring 3502. The guard ring 3502 encircles the test structure 1200 so
that portions of the guard ring are adjacent to outside portions of
the test structure. In the illustrated embodiment, the guard ring
is adjacent to outside conductive portions 3504a and 3504b. The
guard ring 3502 also includes finger-like portions (e.g., 3506)
that are adjacent to portions of the test structure that do not
extend along the entire length of an adjacent other structure
(e.g., stubs 3508a and 3508b). A similar guard ring structure may
also be utilized with other test structures described herein (e.g.,
the structures of FIGS. 6a-6c and 33).
[0232] In another embodiment, a strip may be placed down the center
of the primary scan area to facilitate random mode alignment. When
the features of a scan area are very repetitive and small, image
aliasing increases and alignment is difficult. Accordingly, one or
more large and unique feature may be placed within the scan area in
the x and y directions to be used for alignment in the x and y
direction.
[0233] Although the foregoing invention has been described in some
detail for purposes of clarity of understanding, it will be
apparent that certain changes and modifications may be practiced
within the scope of the appended claims. It should be noted that
there are many alternative ways of implementing both the process
and apparatus of the present invention. For example, prior to
performing a scan in a primary scan area (e.g., 300 .mu.m), a large
area of the wafer (e.g., 10 mm) may be pre-charged with a flood gun
to establish voltage contrast equilibrium over the test structures
of the wafer. As a result, the amount of time for inspecting the
primary scan areas of the test structures may be significantly
reduced. By way of another alternative embodiment, the test
structures of the present invention may also be utilized in any
suitable critical dimension measurement tool. That is, the test
structures may be formed with structures having critical dimensions
(e.g., minimum line width and line-to-line spacing).
[0234] Any other suitable charge control mechanisms may also be
utilized for inspecting the above-described test structures.
Several mechanisms for controlling charge are described in
co-pending U.S. patent application Ser. Nos. 09/579,867,
09/502,554, and 09/394,133 and U.S. Pat. No. 6,066,849, which
applications and patent are herein incorporated by reference in
their entirety. Additionally, any suitable charged particle beam
(e.g., electron beam) inspection system and/or methodologies may be
used to inspect the above described test structures and to
implement the above described inspection methods (e.g., e-beam
systems and/or methods described in U.S. patent application Ser.
Nos. 09/579,867, 09/502,554, and 09/394,133 and U.S. Pat. No.
6,066,849). Although the test structure embodiments are described
above as being inspected with an electron beam system, of course,
other types of systems may be utilized. For example, a photo
emission system (constant or pulsed beam) may work well for
charging selected portions of the test structures for voltage
contrast analysis. Other systems may be used in conjunction with
(e.g., off-column) or in place of an electron beam system.
[0235] The mechanisms of the present invention may be implemented
for any suitable application, besides semiconductor chip
manufacturing. For example, other applications are data disks,
gallium arsenide semiconductor devices, and multi-chip modules. In
general terms, the embodiments of the present invention may be
applied to any suitable technology for manufacturing electronic
devices or any other type of objects having fine patterns.
Furthermore, techniques for characterizing defects and/or creating
an x and y map of defects may also be applied across an entire
wafer to facilitate detection of systematic process problems. In
other words, defects may be mapped across the wafer. When an
specific area of the wafer is found to have a significantly higher
number of defects than other areas, it may be determined that a
process is performing improperly for such specific area. The
process may then be adjusted to subsequently reduce defects in such
specific area of the wafer. Additionally, the above described test
structures may be formed on any suitable portion of the wafer, such
as within the scribe line or on any portion of one or more
dice.
[0236] Accordingly, the present embodiments are to be considered as
illustrative and not restrictive, and the invention is not to be
limited to the details given herein, but may be modified within the
scope and equivalents of the appended claims.
* * * * *